阅读说明：本技术 一种硅料清洗剂及清洗方法 (Silicon material cleaning agent and cleaning method ) 是由 孟闯 于 2021-01-08 设计创作，主要内容包括：本发明公开了一种硅料清洗剂,清洗剂包含以下重量份原料：氢氟酸1-99份、盐酸1-99份、硝酸1-99份、乙醇1-99份、柠檬酸1-99份、水1-99份。本硅料清洗液清洗效率高,对硅料能够实现大批量处理,无需大型自动设备辅助完成；清洗效果好,其硅料表面的络合作用比混酸腐蚀效果更好,能高效的溶解硅料表面的有机杂质、络合表面金属；清洗过程不腐蚀硅料表面,因其原理为络合反应,不对硅料进行腐蚀过程,提高硅料清洗出料率；本清洗液采用浸泡方式清洗硅料,时间短一般为3-4小时,浸泡过程不需人工、设备操作,浸泡后纯水清洗即可完成；清洗过程环保、无污染,生产过程中降低人身危害,排放过程通过稀释可以实现达标排放。(The invention discloses a silicon material cleaning agent which comprises the following raw materials in parts by weight: 1-99 parts of hydrofluoric acid, 1-99 parts of hydrochloric acid, 1-99 parts of nitric acid, 1-99 parts of ethanol, 1-99 parts of citric acid and 1-99 parts of water. The silicon material cleaning solution has high cleaning efficiency, can realize large-batch treatment on the silicon material, and does not need large-scale automatic equipment for auxiliary completion; the cleaning effect is good, the complexing effect of the surface of the silicon material is better than the corrosion effect of mixed acid, and organic impurities and complexing surface metals on the surface of the silicon material can be efficiently dissolved; the surface of the silicon material is not corroded in the cleaning process, and the silicon material is not corroded due to the principle of complex reaction, so that the cleaning discharge rate of the silicon material is improved; the cleaning solution cleans silicon materials by adopting a soaking mode, the time is short and is generally 3-4 hours, the soaking process does not need manual operation and equipment operation, and the cleaning by pure water can be completed after soaking; the cleaning process is environment-friendly and pollution-free, the personal harm is reduced in the production process, and the discharge up to the standard can be realized through dilution in the discharge process.)

1. A silicon material cleaning agent is characterized in that: the cleaning agent comprises the following raw materials in parts by weight: 1-99 parts of hydrofluoric acid, 1-99 parts of hydrochloric acid, 1-99 parts of nitric acid, 1-99 parts of ethanol, 1-99 parts of citric acid and 1-99 parts of water.

2. The silicon material cleaning agent as claimed in claim 1, wherein: the silicon material cleaning agent comprises the following raw materials in parts by weight: 50 parts of hydrofluoric acid, 50 parts of hydrochloric acid, 50 parts of nitric acid, 50 parts of ethanol, 50 parts of citric acid and 50 parts of water.

3. A cleaning method of a silicon material cleaning agent is characterized by comprising the following steps: the specific method comprises the following steps: immersing the silicon material cleaning agent into the silicon material surface for more than 5cm, adopting an immersion mode, sealing by covering or using a winding film in the immersion process of an immersion container without heating, standing and storing in a ventilated and shady place, wherein the immersion container is made of a PP plate, polytetrafluoroethylene and other metal-free plastic materials;

the soaking time is 3-5 hours, the specific cleaning time is specifically distinguished according to the type of the product, and the surface condition of the product is observed during the soaking period;

the cleaned silicon material can be washed by pure water or ultrasonic waves to remove residual reagents on the surface, other chemicals such as a detergent and the like are not needed, and no residue is left on the surface after cleaning.

Technical Field

The invention relates to a silicon material cleaning agent and a cleaning method, in particular to the technical field of cleaning agents.

Background

At present, solar silicon raw materials are mainly primary polycrystalline materials and single crystal circulating redrawing materials in the production process, various pollutants are usually found on the surface in production and logistics transportation, the pollutants generally come from metal particles, silicon particles and other metal substances, cutting liquid and the like, and the pollutants can be strongly adsorbed on the surface of the silicon materials, so that the qualification rate and the yield of products are seriously influenced.

The traditional cleaning method is generally a mixed acid cleaning method, hydrofluoric acid and nitric acid are mixed according to a certain proportion, a silicon material is put into a mixed acid solution after stirring, and the mixed acid is used for corroding the surface of the silicon material in a stirring and pickling process, so that the purposes of removing impurities such as precipitation on the surface of the silicon material and attaching metal ions are achieved. In addition, if the mixed liquid is adopted, toxic nitrogen oxide gas can be generated, the problem of environmental pollution in the production of the solar cell is aggravated, particularly, the discharged tail gas forms a yellow smoke phenomenon, and the yellow smoke phenomenon can be combined with moisture in the air to form nitrous acid mist (namely acid rain).

The traditional acid washing method needs to frequently replace and supplement acid liquor, the cost of washing materials is relatively increased, and particularly, the price of hydrofluoric acid is higher. The acid gas is discharged in the acid washing process, higher requirements on the sealing performance of equipment are required, and the labor protection equipment of personnel must be matched for protection, so that the operation cost of acid washing is increased. In addition, the corrosion process of the mixed acid solution has a process of oxidation-reduction-reaction-after-self-catalysis, the reaction speed is slow and fast, the control is not easy, the re-washing rate of the unqualified product after acid washing is high, and the acid cost is increased.

Disclosure of Invention

The invention aims to provide a silicon material cleaning agent.

In order to achieve the purpose, the invention provides the following technical scheme: the silicon material cleaning agent comprises the following raw materials in parts by weight: 1-99 parts of hydrofluoric acid, 1-99 parts of hydrochloric acid, 1-99 parts of nitric acid, 1-99 parts of ethanol, 1-99 parts of citric acid and 1-99 parts of water.

Further preferably, the silicon material cleaning agent comprises the following raw materials in parts by weight: 50 parts of hydrofluoric acid, 50 parts of hydrochloric acid, 50 parts of nitric acid, 50 parts of ethanol, 50 parts of citric acid and 50 parts of water.

A cleaning method of a silicon material cleaning agent comprises the following steps: immersing the silicon material cleaning agent on the surface of the silicon material

More than 5cm, adopting a soaking mode, sealing by covering or using a winding film in the soaking process of a soaking container without heating, standing and storing in a ventilated and cool place, wherein the soaking container is made of a PP plate, polytetrafluoroethylene and other metal-free plastic materials;

the soaking time is 3-5 hours, the specific cleaning time is distinguished according to the type of the product,

observing the surface condition of the product during soaking;

the cleaned silicon material is washed by pure water or ultrasonic wave to remove surface residues

The reagent does not need to use other chemicals such as a detergent, and the surface of the cleaned product does not remain.

Compared with the prior art, the invention has the following beneficial effects: the silicon material cleaning solution has high cleaning efficiency, can realize large-batch treatment on the silicon material, and does not need large-scale automatic equipment for auxiliary completion; the cleaning effect is good, the complexing effect of the surface of the silicon material is better than the corrosion effect of mixed acid, and organic impurities and complexing surface metals on the surface of the silicon material can be efficiently dissolved; the surface of the silicon material is not corroded in the cleaning process, and the silicon material is not corroded due to the principle of complex reaction, so that the cleaning discharge rate of the silicon material is improved; the cleaning process is simple and convenient to operate, the cleaning solution cleans the silicon material in a soaking mode, the time is short and is generally 3-4 hours, the soaking process does not need manual operation and equipment operation, and the cleaning by pure water can be completed after soaking; the cleaning process is environment-friendly and pollution-free, the cleaning solution has weak acid performance, the personal harm is reduced in the production process, and the discharge up to the standard can be realized through dilution in the discharge process.

Drawings

FIG. 1 is a flow chart of a cleaning method of the silicon material cleaning agent of the present invention.

Detailed Description

The technical solutions of the present invention will be described clearly and completely in the following embodiments of the present invention, and it should be understood that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

Example 1

The silicon material cleaning agent comprises the following raw materials in parts by weight: 1 part of hydrofluoric acid, 1 part of hydrochloric acid,

1 part of nitric acid, 1 part of ethanol, 1 part of citric acid and 1 part of water; referring to fig. 1, the cleaning method of the silicon material cleaning agent of the embodiment includes: the silicon material cleaning agent is immersed by 5cm on the surface of the silicon material, a soaking mode is adopted, a soaking container needs to be covered and sealed in the soaking process without heating, the soaking container is placed in a ventilated and shady place for standing and storage, a PP plate is selected as the soaking container, the soaking time is 3 hours, the surface condition of a product is observed during soaking, the cleaned silicon material can be washed by pure water or ultrasonic waves, the surface residual reagent can be removed, other chemicals such as a detergent and the like do not need to be used, and no residue exists on the surface after cleaning. The silicon material cleaned by the method has smooth surface, bright section, no foreign matters and no impurity color, and the cleaning yield reaches 97.6%.

Example 2

The silicon material cleaning agent comprises the following raw materials in parts by weight: 99 parts of hydrofluoric acid, 99 parts of hydrochloric acid, 99 parts of nitric acid, 99 parts of ethanol, 99 parts of citric acid and 99 parts of water; the cleaning method of the silicon material cleaning agent comprises the following steps: the silicon material cleaning agent is immersed 6cm on the surface of the silicon material, a soaking mode is adopted, a soaking container needs to be covered and sealed in the soaking process without heating, the soaking container is placed in a ventilated and cool place for standing and storage, the soaking container is made of polytetrafluoroethylene materials, the soaking time is 4 hours, the surface condition of a product is observed during soaking, the cleaned silicon material can be washed by pure water or ultrasonic waves, the surface residual reagent can be removed, other chemicals such as a detergent and the like do not need to be used, and no residue exists on the surface after cleaning. The surface of the cleaned silicon material is smooth, the section of the cleaned silicon material is bright, foreign matters and variegated are avoided, and the cleaning yield reaches 98.7%.

Example 3

The silicon material cleaning agent comprises the following raw materials in parts by weight: 50 parts of hydrofluoric acid, 50 parts of hydrochloric acid, 50 parts of nitric acid, 50 parts of ethanol, 50 parts of citric acid and 50 parts of water; the cleaning method of the silicon material cleaning agent comprises the following steps: the silicon material cleaning agent is immersed by 5.5cm on the surface of the silicon material, a soaking mode is adopted, a soaking container needs to be covered and sealed in the soaking process without heating, the soaking container is placed in a ventilated and shady place for standing and storage, a PP plate is selected as the soaking container, the soaking time is 3.5 hours, the surface condition of a product is observed during soaking, the cleaned silicon material can be washed by pure water or ultrasonic waves, the surface residual reagent can be removed, other chemicals such as a detergent and the like do not need to be used, and no residue exists on the surface after cleaning. The surface of the cleaned silicon material is smooth and bright without foreign matters, the cleaning yield reaches 99.1 percent,

comparative example: mixing hydrofluoric acid and nitric acid according to the mass ratio of 2:1, stirring, then putting the silicon material into a mixed acid solution, and carrying out a stirring and pickling process, wherein the cleaning time is 4 hours, the surface of the cleaned silicon material is smooth, the cross section and the section are bright, but the chromaticity is not uniform enough, and the cleaning yield reaches 90.5%.

Therefore, the cleaning effect of the silicon gel is better in the embodiments 1 to 3, and the cost of the silicon material cleaning agent in the embodiments 1 to 3 is lower than that of the comparative cleaning mode.

Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.