阅读说明：本技术 一种基于桥接方式的芯片电源网络结构 (Chip power network structure based on bridging mode ) 是由 王锐 余燊鸿 李建军 莫军 于 2020-05-11 设计创作，主要内容包括：本申请实施例公开了一种基于桥接方式的芯片电源网络结构。本申请实施例提供的技术方案通过第一过孔连接高层VDD条线和桥接金属层中的桥接VDD条线,并通过第二过孔连接桥接VDD条线和底层VDD条线,从而实现高层VDD条线和底层VDD条线之间的桥接,并通过第三过孔连接高层VSS条线和底层VSS条线,高层金属层、桥接金属层、绕线金属层和底层金属层上可布置信号线,并且绕线金属层在高层VDD条线对应处未设置过孔,在绕线金属层与高层VDD条线对应的位置可在满足DRC规则的情况下自由绕通信号线,缓解芯片绕线资源紧张的情况,提高绕线成功率。(The embodiment of the application discloses a chip power network structure based on a bridging mode. According to the technical scheme provided by the embodiment of the application, the first via hole is connected with the bridging VDD line in the high-level VDD line and the bridging VDD line in the bridging metal layer, the second via hole is connected with the bridging VDD line and the bottom VDD line, bridging between the high-level VDD line and the bottom VDD line is achieved, the third via hole is connected with the high-level VSS line and the bottom VSS line, signal lines can be arranged on the high-level metal layer, the bridging metal layer, the winding metal layer and the bottom metal layer, the via hole is not formed in the corresponding position of the high-level VDD line in the winding metal layer, the signal lines can be freely wound at the position of the winding metal layer corresponding to the high-level VDD line under the condition that DRC rules are met, the condition that.)

1. The utility model provides a chip power network structure based on bridging mode, its characterized in that, including high-level metal layer (1), bridging metal layer (2), wire winding metal level (3) and bottom metal layer (4) that set gradually, be provided with high-level VDD strip line (5) and high-level VSS strip line (6) on high-level metal layer (1), be provided with bottom VDD strip line (7) and bottom VSS strip line (8) on bottom metal layer (4), bridging metal layer (2) are provided with bridging VDD strip line (9), wherein:

the high-level VDD strip line (5) is electrically connected with the bridging VDD strip line (9) through a first via hole (10), the first via hole (10) is arranged at the corresponding position of the high-level VDD strip line (5), and the first via hole (10) is communicated with the high-level metal layer (1) and the bridging metal layer (2);

the bridge VDD strip line (9) is electrically connected with the bottom layer VDD strip line (7) through a second via hole (11), the second via hole (11) is arranged at the corresponding position of the high-layer VSS strip line (6), and the second via hole (11) is communicated with the bridge metal layer (2), the winding metal layer (3) and the bottom metal layer (4);

the high-level VSS line (6) is electrically connected with the bottom VSS line (8) through a third via hole (12), the third via hole (12) is formed in the corresponding position of the high-level VSS line (6), and the third via hole (12) is communicated with the high-level metal layer (1), the bridging metal layer (2), the winding metal layer (3) and the bottom metal layer (4).

2. The bridge-based chip power supply network structure according to claim 1, wherein the upper-level VDD lines (5) and the upper-level VSS lines (6) are arranged in a criss-cross manner with the lower-level VDD lines (7) and the lower-level VSS lines (8), and the direction of the bridge-based VDD lines (9) is identical to the direction of the lower-level VDD lines (7).

3. The bridge-based chip power supply network structure according to claim 2, wherein the high-level VDD line (5) and the high-level VSS line (6) are provided in plurality and staggered along a lateral direction.

4. The bridge-based chip power supply network structure according to claim 3, wherein the bridge-VDD line (9) is arranged in plurality at intervals along the lateral direction, and both ends of the bridge-VDD line correspond to the adjacent high-level VDD line (5) and the high-level VSS line (6), respectively.

5. The bridge-based chip power supply network structure according to claim 2, wherein the bottom VDD line (7) and the bottom VSS line (8) are arranged in plurality and staggered along the longitudinal direction.

6. The bridge-based chip power supply network structure according to claim 5, wherein the bridge-based VDD line (9) is provided in plurality at intervals along the longitudinal direction and corresponds to the bottom layer VDD line (7).

7. The bridge-based chip power network structure according to claim 1, wherein a plurality of first vias (10) are disposed at the electrical connection between the high-level VDD line (5) and the bridge VDD line (9).

8. The bridge-based chip power network structure according to claim 1, wherein a plurality of second vias (11) are disposed at electrical connections between the bridge-VDD strip line (9) and the bottom layer VDD strip line (7).

9. The bridge connection based chip power supply network structure of claim 1, wherein a plurality of third vias (12) are disposed at the electrical connection between the upper layer VSS line (6) and the lower layer VSS line (8).

10. The bridge-based chip power supply network structure according to any one of claims 1-9, wherein the upper metal layer (1) is connected to an external power supply through the upper VDD line (5) and the upper VSS line (6), and the lower metal layer (4) is connected to a standard cell through the lower VDD line (7) and the lower VSS line (8).

Technical Field

The embodiment of the application relates to the technical field of chips, in particular to a chip power supply network structure based on a bridging mode.

Background

The power supply planning is a key step in the physical design of the chip, and aims to design a uniform network for the power supply of the whole chip, so that electric energy can be transmitted to each basic unit of the chip, and the chip can work normally. With the continuous development of chip manufacturing process, the feature size is continuously reduced, the clock frequency is continuously improved, the chip performance is improved, the scale is continuously increased, and the complexity of physical design is increased.

The traditional power supply network is composed of criss-cross power supply lines, and the standard unit of the chip is generally connected with the power supply lines on the lower layer through a power supply PIN (personal identification number), then connected with the lines on the upper layer through via (through hole), and then connected with the external power supply network through the power supply lines on the upper layer.

In an area where via is arranged between a lower-layer power supply line and a higher-layer power supply line in the conventional power supply planning scheme, the connection of the power supply lines between the lower layer and the higher layer can be completed only by communicating via layers of intermediate layers one by one, and in order to reduce the problems of DRC (design rule check) such as short circuit, signal lines of each layer cannot be wound through the area, so that the winding resources of a chip are nervous.

Disclosure of Invention

The embodiment of the application provides a chip power network structure based on a bridging mode, so that the condition of chip winding resource shortage is relieved, and the winding success rate is improved.

The embodiment of the application provides a chip power network structure based on bridging mode, including high-level metal layer, bridging metal layer, wire winding metal level and the bottom metal layer that sets gradually, be provided with high-level VDD strip line and high-level VSS strip line on the high-level metal layer, be provided with bottom VDD strip line and bottom VSS strip line on the bottom metal layer, the bridging metal layer is provided with bridging VDD strip line, wherein:

the high-level VDD strip line is electrically connected with the bridging VDD strip line through a first via hole, the first via hole is arranged at the corresponding position of the high-level VDD strip line, and the first via hole is communicated with a high-level metal layer and the bridging metal layer;

the bridge VDD strip line is electrically connected with the bottom VDD strip line through a second through hole, the second through hole is arranged at the corresponding position of the high-level VSS strip line, and the second through hole is communicated with the bridge metal layer, the winding metal layer and the bottom metal layer;

the high-level VSS strip line is electrically connected with the bottom VSS strip line through a third via hole, the third via hole is formed in the corresponding position of the high-level VSS strip line, and the third via hole is communicated with the high-level metal layer, the bridging metal layer, the winding metal layer and the bottom metal layer.

Furthermore, the high-level VDD lines and the high-level VSS lines and the bottom-level VDD lines and the bottom-level VSS lines are arranged in a crisscross mode, and the direction of the bridging VDD lines is consistent with the direction of the bottom-level VDD lines.

Furthermore, the high-level VDD line and the high-level VSS line are arranged in a plurality and are arranged in a staggered mode at intervals along the transverse direction.

Furthermore, the bridging VDD lines are arranged in a plurality at intervals along the transverse direction, and two ends of the bridging VDD lines respectively correspond to the adjacent high-level VDD lines and the high-level VSS lines.

Furthermore, a plurality of bottom layer VDD lines and a plurality of bottom layer VSS lines are arranged at intervals along the longitudinal direction in a staggered mode.

Furthermore, a plurality of bridging VDD lines are arranged at intervals along the longitudinal direction and correspond to the bottom layer VDD lines.

Furthermore, a plurality of first via holes are arranged at the electric connection position of the high-level VDD strip line and the bridging VDD strip line.

Furthermore, a plurality of second through holes are arranged at the electric connection positions of the bridging VDD line and the bottom layer VDD line.

Furthermore, a plurality of third through holes are formed in the electric connection position of the high-level VSS line and the bottom-level VSS line.

Furthermore, the high-level metal layer is connected with an external power supply through the high-level VDD line and the high-level VSS line, and the bottom-level metal layer is connected with the standard cell through the bottom-level VDD line and the bottom-level VSS line.

According to the embodiment of the application, the first via hole is used for connecting the high-level VDD line and the bridging VDD line in the bridging metal layer, the second via hole is used for connecting the bridging VDD line and the bottom VDD line, bridging between the high-level VDD line and the bottom VDD line is achieved, the third via hole is used for connecting the high-level VSS line and the bottom VSS line, a power supply can be accessed through the high-level VDD line and the high-level VSS line, power is supplied to the standard unit through the bottom VDD line and the bottom VSS line, signal lines can be arranged on the high-level metal layer, the bridging metal layer, the winding metal layer and the bottom metal layer, no via hole is arranged in the corresponding position of the winding metal layer and the high-level VDD line, the signal lines can be freely wound at the position of the winding metal layer corresponding to the high-level VDD line under.

Drawings

FIG. 1 is a schematic diagram of a power strip layout of a power network architecture inside a chip in the prior art;

fig. 2 is a schematic structural diagram of a chip power network structure based on a bridge connection method according to an embodiment of the present disclosure;

fig. 3 is a schematic layout of power lines of a chip power network structure based on a bridge connection method according to an embodiment of the present disclosure.

Reference numerals: 1. a high-level metal layer; 2. bridging the metal layers; 3. winding a metal layer; 4. a bottom metal layer; 5. a high level VDD rail; 6. a high level VSS line; 7. a bottom layer VDD bar line; 8. a bottom layer of VSS lines; 9. bridge a VDD line; 10. a first via hole; 11. a second via hole; 12. a third via hole; 13. a first power strip line; 14. a second power strip line; 15. via holes.

Detailed Description

In order to make the objects, technical solutions and advantages of the present application more apparent, specific embodiments of the present application will be described in detail with reference to the accompanying drawings. It is to be understood that the specific embodiments described herein are merely illustrative of the application and are not limiting of the application. It should be further noted that, for the convenience of description, only some but not all of the relevant portions of the present application are shown in the drawings.

In the description of the embodiments of the present application, unless explicitly stated or limited otherwise, the terms "connected," "connected," and "fixed" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral part; can be mechanically or electrically connected; either directly or indirectly through intervening media, either internally or in any other relationship. The specific meaning of the above terms in the present application can be understood in a specific case by those of ordinary skill in the art.

Fig. 1 shows a schematic layout of power lines of a power network structure inside a chip in the prior art. Referring to fig. 1, the conventional power network structure inside a chip is composed of multiple metal layers, multiple power lines (powerstrips) are disposed on the metal layers, the power lines of the metal layers are distributed in a criss-cross manner, the high-level metal is a thick metal layer, the resistance is low, the power lines are generally used for power line distribution, and the low-level metal is thin and can be used for signal line or power line distribution.

For example, the conventional chip internal power supply network structure is provided with 4 METAL layers, from bottom to top, METAL1 to METAL4, METAL1 and METAL4 are respectively used for arranging the first power supply line 13 and the second power supply line 14, METAL1 to METAL4 are used for arranging signal lines, the routing directions of the second power supply line 14 on METAL4 and the signal lines on METAL2 are longitudinally arranged, and a plurality of second power supply lines 14 are transversely arranged at intervals and are connected into a VDD power supply and a VSS power supply provided by an external power supply network at intervals, wherein the polarities of the VDD power supply and the VSS power supply are opposite. The signal lines on METAL2 and METAL3 are not shown in fig. 1.

The routing directions of the first power supply lines 13 on the METAL1 and the signal lines on the METAL3 are arranged along the transverse direction, the plurality of first power supply lines 13 are arranged at intervals along the longitudinal direction, and the first power supply lines 13 on the METAL1 are connected with the second power supply lines 14 on the METAL4 in sequence at intervals through via holes 15, so that the first power supply lines 13 on the METAL1 are connected with a VDD power supply and a VSS power supply at intervals, and power is supplied to the standard cells. Wherein the via 15 comprises via1 intermediate METAL1 and METAL2, via2 intermediate METAL2 and METAL3, and via3 intermediate METAL3 and METAL 4.

In the existing scheme, when power lines of METAL1 and METAL4 are connected through via 15, via1, via2 and via3 are all located at the same position, which is equivalent to that all via resources are occupied at the same position, and other signal lines cannot be punched or connected through the via, so that the wiring resources of a chip are in shortage. For example, if the signal line of METAL2 has via2, the signal line of METAL2 cannot be routed in the area where the DRC problem such as short circuit occurs when the signal line is routed through the area corresponding to via 2. In order to solve the problem of insufficient chip winding resources, the embodiment of the application provides a chip power network structure based on a bridge connection mode.

Fig. 2 is a schematic structural diagram of a chip power supply network structure based on a bridge connection method according to an embodiment of the present application. Fig. 3 is a schematic diagram of a power strip line layout of a chip power network structure based on a bridge connection method according to an embodiment of the present application.

Specifically, referring to fig. 2 and fig. 3, fig. 2 is an exploded schematic diagram of each layer of a chip power supply network structure, where the chip power supply network structure based on a bridge connection mode includes a high-level metal layer 1, a bridge-connection metal layer 2, a winding metal layer 3, and a bottom-level metal layer 4, which are sequentially arranged from top to bottom.

The high-level metal layer 1 is provided with a high-level VDD line 5 and a high-level VSS line 6, the high-level VDD line 5 and the high-level VSS line 6 are arranged along the longitudinal direction, and the high-level VDD line 5 and the high-level VSS line 6 are arranged in a plurality and are arranged in a staggered mode along the transverse direction at intervals.

The bridging metal layer 2 is provided with a plurality of bridging VDD strips 9 at intervals along the transverse direction, and the bridging VDD strips 9 are routed along the transverse direction. In the present embodiment, the plurality of bridged VDD lines 9 are provided at intervals in the lateral direction, that is, the bridged VDD lines 9 are provided in a line segment shape, and both ends of each bridged VDD line 9 correspond to the adjacent upper-level VDD line 5 and upper-level VSS line 6, respectively. In other embodiments, the bridged VDD bar 9 may also be arranged as a whole in the lateral direction, i.e. the bridged VDD bar 9 is arranged in a continuous bar.

The bottom metal layer 4 is provided with a bottom VDD line 7 and a bottom VSS line 8, the bottom VDD line 7 and the bottom VSS line 8 are arranged along the transverse direction, and the bottom VDD line 7 and the bottom VSS line 8 are arranged in a plurality and are arranged in a staggered mode at intervals along the longitudinal direction. The upper VDD lines 5 and the upper VSS lines 6 are arranged in a crisscross manner with the lower VDD lines 7 and the lower VSS lines 8, and the bridged VDD lines 9 run in the same direction as the lower VDD lines 7.

Further, the bridged VDD strips 9 are arranged in plurality at intervals in the longitudinal direction and correspond to the bottom layer VDD strips 7, that is, the distance between adjacent bridged VDD strips 9 in the longitudinal direction is consistent with the distance between adjacent bottom layer VDD strips 7.

Specifically, the high-level metal layer 1 is connected to an external power supply through a high-level VDD line 5 and a high-level VSS line 6, that is, the high-level VDD line 5 and the high-level VSS line 6 are respectively used for connecting a VDD power supply and a VSS power supply in an external power supply network, so as to access the VDD power supply and the VSS power supply. Wherein the polarity of the VDD power supply and the VSS power supply are opposite. The bottom metal layer 4 is connected to the standard cells through the bottom VDD lines 7 and the bottom VSS lines 8, that is, the bottom VDD lines 7 and the bottom VSS lines 8 are respectively used for connecting powerpins (power supply pins) of the standard cells inside the chip, so as to provide VDD power supply and VSS power supply for the standard cells.

Further, the high-level VDD strip line 5 is electrically connected to the bridging VDD strip line 9 through a first via 10, the first via 10 is disposed at a position where the high-level VDD strip line 5 and the bridging VDD strip line 9 cross vertically and horizontally, and the first via 10 communicates the high-level metal layer 1 and the bridging metal layer 2, so that the high-level VDD strip line 5 and the bridging VDD strip line 9 are electrically connected through a metal plating layer at the first via 10.

Meanwhile, in order to ensure stable electrical connection between the upper-level VDD bar line 5 and the bridged VDD bar line 9, a plurality of first vias 10 are provided at the electrical connection between the upper-level VDD bar line 5 and the bridged VDD bar line 9 (in the figure, 3 first vias 10 are provided at each of the vertical and horizontal intersection correspondences of the upper-level VDD bar line 5 and the bridged VDD bar line 9 as an example).

The bridged VDD strip line 9 is electrically connected with the bottom VDD strip line 7 through a second via hole 11, the second via hole 11 is arranged at the position where the high-level VSS strip line 6 and the bridged VDD strip line 9 are crossed vertically and horizontally, and the second via hole 11 is communicated with the bridged metal layer 2, the winding metal layer 3 and the bottom metal layer 4, so that the bridged VDD strip line 9 and the bottom VDD strip line 7 are electrically connected through metal plating at the second via hole 11.

Meanwhile, in order to ensure stable electrical connection between the bridged VDD bar line 9 and the underlying VDD bar line 7, a plurality of second vias 11 are provided at the electrical connection between the bridged VDD bar line 9 and the underlying VDD bar line 7 (in the figure, 5 second vias 11 are provided at each of the crisscross correspondences of the bridged VDD bar line 9 and the underlying VDD bar line 7 as an example).

The high-level VSS line 6 is electrically connected with the bottom-level VSS line 8 through a third via 12, the third via 12 is arranged at the position where the high-level VSS line 6 and the bottom-level VSS line 8 are crossed vertically and horizontally, and the third via 12 is communicated with the high-level metal layer 1, the bridging metal layer 2, the winding metal layer 3 and the bottom-level metal layer 4, so that the high-level VSS line 6 and the bottom-level VSS line 8 are electrically connected through a metal plating layer at the third via 12. Meanwhile, in order to ensure stable electrical connection between the upper-level VSS lines 6 and the lower-level VSS lines 8, a plurality of third vias 12 are provided where the upper-level VSS lines 6 and the lower-level VSS lines 8 are electrically connected.

In other embodiments, the routing metal layer 3 may be provided with multiple layers, and the signal lines of different layers of the routing metal layer 3 are arranged in a criss-cross manner, so that when the signal lines of the routing metal layer 3 are designed, the signal lines corresponding to the high-layer VDD line 5 region can be freely routed or newly connected with adjacent layer signals through via holes, thereby greatly improving the utilization rate of routing resources.

As described above, the bridging VDD line 9 in the upper VDD line 5 and the bridging VDD line 9 in the bridging metal layer 2 are connected through the first via 10, and the bridging VDD line 9 and the bottom VDD line 7 are connected through the second via 11, so as to bridge between the upper VDD line 5 and the bottom VDD line 7, and the upper VSS line 6 and the bottom VSS line 8 are connected through the third via 12, power can be accessed through the upper VDD line 5 and the upper VSS line 6, and power can be supplied to the standard cell through the bottom VDD line 7 and the bottom VSS line 8, signal lines can be arranged on the upper metal layer 1, the bridging metal layer 2, the routing metal layer 3 and the bottom metal layer 4, and the routing metal layer 3 has no via at the position corresponding to the upper VDD line 5, and signal lines can be freely routed at the position corresponding to the upper VDD line 5 in the case of satisfying the DRC rule, thereby alleviating the situation of the routing resource shortage of the chip, the success rate of winding is improved.

The foregoing is considered as illustrative of the preferred embodiments of the invention and the technical principles employed. The present application is not limited to the particular embodiments described herein, but is capable of various obvious changes, rearrangements and substitutions as will now become apparent to those skilled in the art without departing from the scope of the invention. Therefore, although the present application has been described in more detail with reference to the above embodiments, the present application is not limited to the above embodiments, and may include other equivalent embodiments without departing from the spirit of the present application, and the scope of the present application is determined by the scope of the claims.