阅读说明：本技术 具有带有两个晶体管及一个电容器的存储器单元且具有与参考电压耦合的晶体管的主体区的设备 (Apparatus having a memory cell with two transistors and one capacitor and having a body region of the transistors coupled to a reference voltage ) 是由 卡迈勒·M·考尔道 C·穆利 S·普卢居尔塔 R·N·古普塔 于 2018-07-23 设计创作，主要内容包括：一些实施例包含一种具有两个晶体管及一个电容器的存储器单元。所述晶体管是第一晶体管及第二晶体管。所述电容器具有与所述第一晶体管的源极/漏极区耦合的第一节点,且具有与所述第二晶体管的源极/漏极区耦合的第二节点。所述存储器单元具有与所述第一晶体管的所述源极/漏极区相邻的第一主体区,且具有与所述第二晶体管的所述源极/漏极区相邻的第二主体区。第一主体连接线将所述存储器单元的所述第一主体区耦合到第一参考电压。第二主体连接线将所述存储器单元的所述第二主体区耦合到第二参考电压。所述第一参考电压及所述第二参考电压可彼此相同或可彼此不同。(Some embodiments include a memory cell having two transistors and one capacitor. The transistors are a first transistor and a second transistor. The capacitor has a first node coupled with a source/drain region of the first transistor and has a second node coupled with a source/drain region of the second transistor. The memory cell has a first body region adjacent the source/drain region of the first transistor and has a second body region adjacent the source/drain region of the second transistor. A first body connection line couples the first body region of the memory cell to a first reference voltage. A second body connection line couples the second body region of the memory cell to a second reference voltage. The first reference voltage and the second reference voltage may be the same as each other or may be different from each other.)

1. An apparatus, comprising:

a memory cell having two transistors and one capacitor; the two transistors are a first transistor and a second transistor; the capacitor has a first node coupled to a source/drain region of the first transistor and has a second node coupled to a source/drain region of the second transistor; the memory cell having a first body region vertically offset from the source/drain region of the first transistor and having a second body region vertically offset from the source/drain region of the second transistor;

a first body tie line coupling the first body region of the memory cell to a first conductive region having a first reference voltage; and

a second body tie line coupling the second body region of the memory cell to a second conductive region having a second reference voltage.

2. The apparatus of claim 1, wherein the memory cells are vertically offset from an underlying support substrate; and wherein the first transistor and the second transistor are vertically stacked on top of each other with the capacitor between the vertically stacked first and second transistors.

3. The apparatus of claim 1, wherein the memory cells are vertically offset from an underlying support substrate; and wherein the first and second transistors are laterally offset with respect to each other, wherein the capacitor is vertically offset with respect to the first and second transistors.

4. The apparatus of claim 1, wherein the first conductive region and the second conductive region are comprised of a common conductive structure.

5. The apparatus of claim 1, wherein the first reference voltage and the second reference voltage are the same as each other.

6. The apparatus of claim 1, including a word line coupled with the first transistor and the second transistor of the memory cell; the word line comprises a first gate region and a second gate region of the first transistor and the second transistor respectively; the first gate region and the second gate region are close to the first body region and the second body region; a segment of the word line is between the first gate region and the second gate region; the memory cells and the word lines are over an underlying support substrate; the capacitor is vertically offset with respect to the word line.

7. The apparatus of claim 6, wherein:

the first gate region of the word line has a first upper surface and a first lower surface;

the second gate region of the word line has a second upper surface and a second lower surface;

the segment of the word line has a third upper surface between the first upper surface of the first gate region and the second upper surface of the second gate region;

the segment of the word line has a third lower surface between the first lower surface of the first gate region and the second lower surface of the second gate region;

the third upper surface is substantially planar with the first upper surface and the second upper surface; and is

The third lower surface is substantially planar with the first and second lower surfaces.

8. The apparatus of claim 6, wherein:

the capacitor is over the word line;

the first gate region of the word line has a first upper surface and a first lower surface;

the second gate region of the word line has a second upper surface and a second lower surface;

the segment of the word line has a third upper surface between the first upper surface of the first gate region and the second upper surface of the second gate region;

the segment of the word line has a third lower surface between the first lower surface of the first gate region and the second lower surface of the second gate region;

the third upper surface is substantially planar with the first upper surface and the second upper surface; and is

The third lower surface is vertically offset relative to the first and second lower surfaces.

9. The apparatus of claim 6, wherein:

the capacitor is below the word line;

the first gate region of the word line has a first upper surface and a first lower surface;

the second gate region of the word line has a second upper surface and a second lower surface;

the segment of the word line has a third upper surface between the first upper surface of the first gate region and the second upper surface of the second gate region;

the segment of the word line has a third lower surface between the first lower surface of the first gate region and the second lower surface of the second gate region;

the third upper surface is vertically offset relative to the first upper surface and the second upper surface; and is

The third lower surface is substantially planar with the first and second lower surfaces.

10. The apparatus of claim 6, wherein:

the first and second body tie lines comprise a semiconductor material conductively doped with charge carriers;

the word line is one of a plurality of word lines separated by intervening regions;

segments of the first and second body connection lines are vertically offset from the middle region; and is

A pocket is within the segments, the pocket having a higher charge carrier concentration than regions of the first and second body connection lines between the segments.

11. An apparatus, comprising:

a first memory cell having two transistors and a capacitor; the two transistors of the first memory cell are a first transistor and a second transistor; the first transistor has a first source/drain region and a second source/drain region, and the second transistor has a third source/drain region and a fourth source/drain region; the capacitor of the first memory cell is a first capacitor; the first capacitor has a first node coupled with the first source/drain region of the first transistor and has a second node coupled with the third source/drain region of the second transistor; the first memory cell having a first body region between the first and second source/drain regions of the first transistor and having a second body region between the third and fourth source/drain regions of the second transistor;

a second memory cell having two transistors and a capacitor; the two transistors of the second memory cell are a third transistor and a fourth transistor; the third transistor has fifth and sixth source/drain regions, and the fourth transistor has seventh and eighth source/drain regions; the capacitor of the second memory cell is a second capacitor; the second capacitor has a third node coupled with the fifth source/drain region of the third transistor and has a fourth node coupled with the seventh source/drain region of the fourth transistor; the second memory cell has a third body region between the fifth and sixth source/drain regions of the third transistor and has a fourth body region between the seventh and eighth source/drain regions of the fourth transistor;

a first body connection line coupling the first body region of the first memory cell and the third body region of the second memory cell to a first reference voltage; and

a second body tie line coupling the second body region of the first memory cell and the fourth body region of the second memory cell to a second reference voltage.

12. The apparatus of claim 11, wherein the first reference voltage and the second reference voltage are the same as each other.

13. The apparatus of claim 11, wherein the first and second memory cells share a digit line; and wherein the digit line comprises:

a first compare bit line coupled to the second source/drain region of the first transistor and the sixth source/drain region of the third transistor; and

a second comparison bit line coupled to the fourth source/drain region of the second transistor and the eighth source/drain region of the fourth transistor.

14. The apparatus of claim 13, wherein:

a first word line is coupled with the first transistor and the second transistor of the first memory cell; and is

A second word line is coupled with the third and fourth transistors of the second memory cell.

15. The apparatus of claim 13, wherein the first and second body tie lines are doped to a first conductivity type and are separated from the first and second comparison bit lines by spacers comprising semiconductor material doped to a second conductivity type different from the first conductivity type; the spacers include the second, fourth, sixth, and eighth source/drain regions.

16. An apparatus, comprising:

a first memory cell having two transistors and a capacitor; the two transistors of the first memory cell are a first transistor and a second transistor; the first transistor has a first source/drain region and a second source/drain region, and the second transistor has a third source/drain region and a fourth source/drain region; the capacitor of the first memory cell is a first capacitor; the first capacitor has a first node coupled with the first source/drain region of the first transistor and has a second node coupled with the third source/drain region of the second transistor; the first memory cell having a first body region between the first and second source/drain regions of the first transistor and having a second body region between the third and fourth source/drain regions of the second transistor;

a second memory cell having two transistors and a capacitor; the two transistors of the second memory cell are a third transistor and a fourth transistor; the third transistor has fifth and sixth source/drain regions, and the fourth transistor has seventh and eighth source/drain regions; the capacitor of the second memory cell is a second capacitor; the second capacitor has a third node coupled with the fifth source/drain region of the third transistor and has a fourth node coupled with the seventh source/drain region of the fourth transistor; the second memory cell has a third body region between the fifth and sixth source/drain regions of the third transistor and has a fourth body region between the seventh and eighth source/drain regions of the fourth transistor;

the second memory cell shares a first compare bit line and a second compare bit line with the first memory cell;

a first body connection line coupling the first body region of the first memory cell to a first reference voltage;

a second body connection line coupling the second body region of the first memory cell to a second reference voltage;

a third body connection line coupling the third body region of the second memory cell to a third reference voltage; and

a fourth body connection line coupling the fourth body region of the second memory cell to a fourth reference voltage.

17. The apparatus of claim 16, wherein the first body connection line and the third body connection line are substantially parallel to the first comparison bit line; wherein the second body tie line and the fourth body tie line are substantially parallel to the second compare bit line; and wherein the first, second, third and fourth body tie lines comprise conductively doped semiconductor material.

18. The apparatus of claim 16, wherein the first comparison bit line and the second comparison bit line comprise a metal.

19. The apparatus of claim 18, wherein the first, second, third, and fourth body tie lines are doped to a first conductivity type and are separated from the first and second comparison bit lines by spacers comprising semiconductor material doped to a second conductivity type different from the first conductivity type; the spacers include the second, fourth, sixth, and eighth source/drain regions.

20. The apparatus of claim 16, wherein an axis through the first comparison bit line and the second comparison bit line defines a mirror plane; and wherein the second memory cell is on an opposite side of the mirror plane from the first memory cell and is substantially a mirror image of the first memory cell across the mirror plane.

Technical Field

The present invention relates to an apparatus having a memory cell with two transistors and one capacitor and having a body region of the transistors coupled with a reference voltage.

Background

Dynamic Random Access Memory (DRAM) is used in modern computing architectures. DRAM may provide the advantages of simple structure, low cost, and high speed compared to alternative types of memory.

A memory cell that is expected to be used in DRAM is a memory cell configuration having two transistors and one capacitor (so-called 2T-1C memory cell configuration). The 2T-1C memory cell is schematically illustrated in fig. 1 as memory cell configuration 2. The two transistors of the memory cell are labeled T1 and T2, and the capacitor of the memory cell is labeled CAP.

The source/drain region of T1 is connected to a first node of capacitor CAP, and the other source/drain region of T1 is connected to a first comparison bit line BL-1. The gate of T1 is connected to word line WL. The source/drain region of T2 is connected to the second node of capacitor CAP, and the other source/drain region of T2 is connected to a second comparison bit line BL-2. The gate of T2 is connected to word line WL.

The compare bit lines BL-1 and BL-2 extend to circuit 4, and circuit 4 compares the electrical properties (e.g., voltages) of the compare bit lines BL-1 and BL-2 to confirm the memory state of the memory cell. The circuit 4 may include a sense amplifier. The compare bit lines BL-1 and BL-2 are used in series to address the memory cells and may be considered in some aspects to be used together as a single digit line.

Problems that may occur with respect to the transistors of memory cell configuration 2 are described with reference to fig. 2. A region of transistor T1 is illustrated along with word line WL, bit line BL-1 and capacitor CAP, with only a portion of one of the capacitor's electrical nodes shown. The transistor T1 includes a vertical pillar 5 of semiconductor material. An insulating material 3 is provided alongside the vertical pillars 5 and over the word lines WL. The region of insulating material 3 between the word line WL and the vertical pillar 5 may correspond to a gate dielectric and may have a different composition than other regions of insulating material 3.

The insulating material 3 may comprise any suitable composition; including, for example, silicon dioxide.

The vertical pillars 5 may comprise any suitable composition, and in some embodiments may comprise appropriately doped silicon. The vertical pillar 5 includes the body region 10 of the transistor T1 and includes the source/drain regions 14 and 16 of the transistor 10.

Body region 10 is shown vertically offset from source/drain regions 14 and 16, and between source/drain regions 14 and 16. The approximate interface between source/drain regions 14 and body region 10 is illustrated with dashed line 13, and the approximate interface between source/drain regions 16 and body region 10 is illustrated with dashed line 15. The source/drain regions 14 and 16 may be conductively doped regions of the semiconductor material of the vertical pillars 5.

The bit line BL-1 is supported by an insulating material 7. The insulating material may comprise any suitable composition or combination of compositions; such as, for example, silicon dioxide, silicon nitride, etc.

The transistor T1 is illustrated in two modes of operation a and B. Mode A of operation has electrical isolation between capacitor CAP and bit line BL-1, and mode B of operation has electrical coupling between capacitor CAP and bit line BL-1. The operating mode a may correspond to an operating state of a word line WL, with low or no voltage passing along the word line. The operating mode B may correspond to an operating state of the word line WL, in which a sufficient voltage is passed along the word line to attract charge carriers to segments in the body region 10 near the word line, and thereby form a conductive channel 12 (illustrated by the dashed line) along the body region 10 between the source/drain regions 14 and 16. Since the source/drain regions 14 and 16 are conductive regions coupled to the bit line BL-1 and the capacitor CAP, respectively, the conductive channel 12 electrically couples the capacitor CAP and the bit line BL-1 to each other.

A problem that may occur with the illustrated transistor T1 is that the body region 10 is a floating body. Thus, a memory cell including such a transistor (i.e., memory cell 2) may suffer from a floating body effect, which may lead to reduced charge retention capability, power distribution issues, and/or other issues.

Although not illustrated, the transistor T2 (shown in fig. 1) may include a floating body similar to the floating body 10 of the transistor T1; this may exacerbate the floating body effect of memory cell 2.

It is desirable to develop memory cell configurations that mitigate the above-described floating body effect associated with transistors T1 and T2, and to develop memory arrays that incorporate such memory cell configurations.

Drawings

FIG. 1 is a schematic diagram of a prior art memory cell having 2 transistors and 1 capacitor.

Fig. 2 shows a schematic cross-sectional side view of a region of a prior art transistor in two modes of operation.

Figure 3 is a schematic cross-sectional side view of a region of an example memory array.

Fig. 4 and 5 are schematic cross-sectional side views of the memory array of fig. 3 shown along cross sections orthogonal to the cross section of fig. 3. Fig. 5 shows an alternative configuration to that of fig. 4. The view of fig. 4 and 5 is along line 4/5-4/5 of fig. 3, and the view of fig. 3 is along line 3-3 of fig. 4 and 5.

Fig. 6 and 7 are schematic cross-sectional side views of the memory array of fig. 3 shown along cross-sections that are out-of-plane with respect to the cross-section of fig. 3. Fig. 6 shows an alternative configuration to that of fig. 5.

Figure 8 is a schematic cross-sectional side view of a region of another example memory array.

Fig. 9 and 10 are schematic cross-sectional side views of the memory array of fig. 8 shown along cross sections orthogonal to the cross section of fig. 8. Fig. 10 shows an alternative configuration to that of fig. 9. The view of fig. 9 and 10 is along line 9/10-9/10 of fig. 8, and the view of fig. 8 is along line 9-9 of fig. 9 and 10.

Fig. 11 and 12 are schematic cross-sectional side views of the memory array of fig. 8 shown along cross-sections that are out-of-plane with respect to the cross-section of fig. 8. Fig. 11 shows an alternative configuration to that of fig. 12.

Figure 13 is a schematic cross-sectional side view of a region of another example memory array.

Fig. 14 and 15 are schematic cross-sectional side views of the memory array of fig. 13 shown along cross sections orthogonal to the cross section of fig. 13. Fig. 15 shows an alternative configuration to that of fig. 14. The view of fig. 14 and 15 is along line 14/15-14/15 of fig. 13, and the view of fig. 13 is along line 13-13 of fig. 14 and 15.

Figure 16 is a schematic, cross-sectional side view of a region of an example apparatus having an example memory array and an example region at the periphery of the memory for electrical connection with lines extending across the memory array.

Detailed Description

Some embodiments include 2T-1C memory cell configurations in which the body region of the transistor is coupled with a reference voltage, rather than being electrically floating as occurs in conventional configurations described above in the background section. All body regions of transistors of the memory array may be coupled with the same reference voltage; or alternatively, one or more body regions of transistors of a memory array may be coupled with a different reference voltage than the other body regions. A conductive path (i.e., body tie line) may be provided to extend from the body region to a conductive component having a desired reference voltage. Any suitable reference voltage(s) may be utilized, and in some embodiments the reference voltage(s) may include a ground voltage and/or a common pad voltage. Example embodiments are described with reference to fig. 3-16.

Referring to FIG. 3, the apparatus 20 includes a region of a memory array 22. The memory array includes a plurality of memory cells 24, two of which are illustrated as 24a and 24 b. Dashed line 19 is provided to schematically illustrate the approximate boundary of memory cell 24 a.

Memory cells 24a and 24b are supported by substrate 21. The substrate 21 may include a semiconductor material; and may, for example, comprise, consist essentially of, or consist of monocrystalline silicon. The base 21 may be referred to as a semiconductor substrate. The term "semiconductor substrate" refers to any construction comprising semiconductor material, including, but not limited to, bulk semiconductor materials such as semiconductor wafers (either alone or in assemblies comprising other materials) and layers of semiconductor material (either alone or in assemblies comprising other materials). The term "substrate" refers to any supporting structure, including but not limited to the semiconductor substrate described above. In some applications, base 21 may correspond to a semiconductor substrate containing one or more materials associated with integrated circuit fabrication. Such materials may include, for example, one or more of refractory metal materials, barrier materials, diffusion materials, insulator materials, and the like. A gap is provided between an upper region of the substrate 21 and a lower region of the illustrated portion of the memory array 22 to indicate that additional components, structures, etc. may be provided between the substrate 21 and the illustrated portion of the memory array 22. In other embodiments, the illustrated portion of memory array 22 may be directly against the upper surface of substrate 21.

Each memory cell (24a and 24b) includes two transistors; with the transistors of memory cell 24a labeled as transistors 26a and 28a and the transistors of memory cell 24b labeled as 26b and 28 b. Transistors 26a and 26b correspond to first transistor T1 of memory cells 24a and 24b, respectively; and transistors 28a and 28b correspond to second transistor T2 of memory cells 24a and 24b, respectively. In some embodiments, transistors 26a, 28a, 26b, and 28b may be referred to as first, second, third, and fourth transistors, respectively.

Transistors 26a, 26b, 28a and 28b include regions within semiconductor pillars 40-43 and within spacer regions 79 below the pillars 40-43. Specifically, transistor 26a includes a channel region 50 within semiconductor pillar 40; with the channel region between a pair of source/drain regions 51 and 52. Source/drain region 51 is within pillar 40 and source/drain region 52 is within spacer 79 below pillar 40. Transistor 28a includes a channel region 54 within semiconductor pillar 41, with this channel region between a pair of source/drain regions 55 and 56. Transistor 26b includes a channel region 58 within semiconductor pillar 42, with such channel region being between a pair of source/drain regions 59 and 60. Transistor 28b includes a channel region 62 within semiconductor pillar 43, with such channel region being between a pair of source/drain regions 63 and 64. In some embodiments, source/drain regions 51, 52, 55, 56, 59, 60, 63, and 64 are referred to as first, second, third, fourth, fifth, sixth, seventh, and eighth source/drain regions, respectively.

Semiconductor pillars 40-43 and spacers 79 underlying the pillars may comprise any suitable semiconductor material or combination of semiconductor materials; and in some embodiments may comprise, consist essentially of, or consist of one or both of silicon, germanium. Channel regions 50, 54, 58, and 62 and source/drain regions 51, 52, 55, 56, 59, 60, 63, and 64 within semiconductor pillars 40-43 may comprise appropriately doped regions. For example, the source/drain regions may comprise heavily doped regions within the pillars and spacers 79, and the channel region may comprise a threshold voltage doped region within the pillars. The boundaries between the source/drain regions and the channel regions within pillars 41-43 are not illustrated in fig. 3 and may be provided at any suitable location.

Transistors 26a, 28a, 26b, and 28b include body regions 64, 66, 68, and 70, respectively; with such body regions being similar to the body regions 10 described above with reference to figure 2 (i.e., vertically between the source/drain regions of each of the transistors). In contrast to the prior art construction of fig. 2, however, the body regions 64, 66, 68 and 70 of transistors 26a, 28a, 26b and 28b are not electrically floating, but are instead connected to a reference voltage by body connection lines (or structures) 65, 67, 69 and 71, respectively. The body connection lines extend into and out of the page relative to the cross-sectional view of fig. 3. The approximate upper boundary of the body connecting line is schematically illustrated by dashed line 61. The approximate lower boundary of the body connecting line can be considered along the interface with the spacer 79.

The body connection lines 65, 67, 69, and 71 may be referred to as first, second, third, and fourth body connection lines (or structures), respectively. The first body connection line 65 couples the first body region 64 of the first memory cell 24a to a first reference voltage 72. The second body connection line 67 couples the second body region 66 of the first memory cell 24a to a second reference voltage 73. A third body tie line 69 couples the third body region 68 of the second memory cell 24b to a third reference voltage 74. The fourth body connection line 71 couples the fourth body region 70 of the second memory cell 24b to a fourth reference voltage 75.

In some embodiments, reference voltages 72-75 may all be a common reference voltage. This common reference voltage may be any suitable voltage; including, for example, ground voltage, common pad voltage, etc. In some embodiments, at least one of the reference voltages 72-75 may be different from at least another one of the reference voltages 72-75.

First transistors 26a and 26b include transistor gates 27a and 27b, respectively; and second transistors 28a and 28b include transistor gates 29a and 29b, respectively. Transistor gates 27a, 27b, 29a, and 29b are coupled with word line 38, which corresponds to word line WL of fig. 1. In the illustrated embodiment, the transistor gate is comprised of a region in word line 38 proximate semiconductor pillars 40-43.

The word line 38 may comprise any suitable conductive material, such as, for example, one or more of various metals (e.g., titanium, tungsten, cobalt, nickel, platinum, etc.), metal-containing compositions (e.g., metal silicides, metal nitrides, metal carbides, etc.), and/or conductively-doped semiconductor materials (e.g., conductively-doped silicon, conductively-doped germanium, etc.).

Each memory cell (24a and 24b) includes a capacitor; where the capacitor of memory cell 24a is labeled as capacitor 30a and the capacitor of memory cell 24b is labeled as capacitor 30 b. The capacitor corresponds to the capacitor labeled CAP in fig. 1.

Each capacitor includes a first node (i.e., a first electrode) 32, a second node (i.e., a second electrode) 34, and a dielectric material 36 between the first and second nodes.

The first and second nodes 32, 34 may comprise any suitable conductive material, such as, for example, one or more of various metals (e.g., titanium, tungsten, cobalt, nickel, platinum, etc.), metal-containing components (e.g., metal silicides, metal nitrides, metal carbides, etc.), and/or conductively-doped semiconductor materials (e.g., conductively-doped silicon, conductively-doped germanium, etc.). The first node 32 and the second node 34 may comprise the same components as one another in some embodiments, and may comprise different components from one another in other embodiments.

Dielectric material 36 may comprise any suitable composition or combination of compositions; and in some embodiments may comprise one or more of silicon dioxide, silicon nitride, aluminum oxide, hafnium oxide, zirconium oxide, and the like. In some embodiments, dielectric material 36 may be referred to as a capacitor dielectric material and may be considered a capacitor dielectric film between first electrode 32 and second electrode 34.

First capacitor 30a has a first node 32 coupled to a first source/drain region 51 of first transistor 26a and has a second node 34 coupled to a third source/drain region 55 of second transistor 28 a. Second capacitor 30b has first node 32 coupled to fifth source/drain region 59 of third transistor 26b and has second node 34 coupled to seventh source/drain region 63 of fourth transistor 28 b.

Pillars 40 and 41 of first memory cell 24a are coupled to compare bit lines 76a and 78a, respectively, by a pair of spacers 79. The compare bit lines 76a and 78a are similar to the bit lines BL-1 and BL-2 of FIG. 1 and extend to a circuit 4A (e.g., a sense amplifier) adapted to compare electrical properties (e.g., voltages) of the compare bit lines 76a and 78a to confirm the memory state of the memory cell 24A. Similarly, pillars 42 and 43 of second memory cell 24b are coupled to compare bit lines 76b and 78b, respectively, by a pair of spacers 79. The compare bit lines 76B and 78B extend to circuitry 4B (e.g., sense amplifiers) adapted to compare electrical properties (e.g., voltages) of the compare bit lines 76B and 78B to confirm the memory state of the memory cell 24B.

The comparison bit lines 76a, 78a, 76b, and 78b may comprise any suitable conductive material, such as, for example, one or more of various metals (e.g., titanium, tungsten, cobalt, nickel, platinum, etc.), metal-containing compositions (e.g., metal silicides, metal nitrides, metal carbides, etc.), and/or conductively-doped semiconductor materials (e.g., conductively-doped silicon, conductively-doped germanium, etc.).

The comparison bit lines 76a, 78a, 76b and 78b are supported by the insulating material 7 described above with reference to fig. 2.

Insulative material 3 surrounds memory cells 24a and 24b and extends along word line 38. The region of insulating material 3 between word line 38 and vertical pillars 40-43 may correspond to a gate dielectric and may have a different composition than other regions of insulating material 3.

The memory cells 24a of figure 3 may be considered as examples of memory cells vertically offset from the underlying substrate 21. Memory cell 24a has first transistor 26a and second transistor 28a laterally offset with respect to each other, and has capacitor 30a vertically offset with respect to first capacitor 26a and second capacitor 28 a. The memory cells 24b may be considered as examples of similar memory cells vertically offset from the underlying substrate 21.

In operation, a combination of voltages may be applied to a word line and a pair of compare bit lines to uniquely access a memory cell of the memory array 22. For example, a combination of voltages may be applied to word line 38 and compare bit lines 76a and 78a to uniquely access memory cell 24 a. Voltages may also be applied along the body connection lines (e.g., body connection lines 65 and 67 of the first memory cell 24a) during access of the memory cell. Depending on the desired operation, the voltage on the body tie line may be utilized to facilitate or prevent charge accumulation within the body regions (e.g., body regions 64 and 66 of first memory cell 24a), providing control of leakage current and threshold voltage. Second memory cell 24b may be similarly operated using word line 38, compare bit line 76b/78b, and body tie line 69/71.

Figure 4 shows a cross-section of memory array 22 along a plane orthogonal to the plane of figure 3 and along line 4/5-4/5 of figure 3. FIG. 4 shows memory cell 24a along with additional memory cells 24h, 24i, and 24 j. Memory cells 24h, 24i, and 24j include capacitors 30h, 30i, and 30j, respectively.

Memory cells 24h, 24i, and 24j include a T1 transistor similar to the T1 transistor of memory cell 24 a; and includes semiconductor pillars (not labeled) similar to semiconductor pillars 40 of memory cell 24 a. The semiconductor pillars of memory cells 24h, 24i, and 24j are alongside word lines 80, 81, and 82; this is similar to word line 38 being alongside the semiconductor pillar 40 of memory cell 24 a.

The comparison bit line 76a extends along the plane of the cross-section of fig. 4, and the body connection line (structure) 65 extends above and substantially parallel to the comparison bit line 76a (where the term "substantially parallel" means parallel within reasonable manufacturing and measurement tolerances). Although the body connecting structure 65 is referred to as a "line," it should be understood that the body connecting structure 65 may have any suitable configuration; and in some embodiments may be curved, wavy, etc.

The body tie lines 65 may comprise a doped semiconductor material; and in some embodiments may comprise, consist essentially of, or consist of silicon and germanium with appropriate dopants therein. The body tie 65 may be of opposite conductivity type relative to the source/drain regions 51 and 52. For example, in embodiments in which the source/drain regions 51 and 52 are n-type regions (i.e., having n-type carriers as the majority carrier type), the body tie line 65 may be a p-type region (i.e., may have p-type carriers as the majority carrier type); and in embodiments where the source/drain regions are p-type regions, the body tie 65 may be an n-type region. In the embodiment shown, the body tie line 65 is separated from the compare bit line 76a by a spacer 79. The spacers 79 are configured as lines substantially parallel to the body connection line 65 and the comparison bit line 76a and interposed between the body connection line 65 and the comparison bit line 76 a. The spacer regions 79 may include the same semiconductor material as the body connection lines 65 in some embodiments, and may include a different semiconductor material than the body connection lines 65 in other embodiments. The spacers 79 are conductively doped and include the source/drain regions 52.

It should be noted that the source/drain regions 52 are spaced from the channel region 50 by the thickness T of the body tie 65. In some embodiments, it may be desirable for the thickness T of the body connection lines 65 to be relatively large, and thus the resistance along the body connection lines may be reduced. However, a large thickness T may reduce the conductivity between the comparison bit line 76a and the channel region 50, which may reduce the drive current — resulting in a slower operating speed. Thus, the optimal thickness T may be a compromise between a desired large thickness for achieving low resistance along the body connection line 65 and a narrow thickness for achieving strong coupling between the comparison bit line 76a and the channel region 50. In some example implementations (e.g., the embodiments discussed below with respect to fig. 7), the word line shape may be modified to at least partially compensate for the increased thickness of the body connection lines.

Fig. 5 shows a cross-section similar to that of fig. 4 but according to an embodiment in which pockets 84 are formed along the body attachment lines 65. Such pocket regions may have higher charge carrier concentrations than other regions of the body tie line and may improve conductivity along the body tie line 65. Pocket region 84 may be formed after word lines 38, 80, 81 and 82 by implanting dopants into body connection line 65 while using the word lines as a mask. In some embodiments, the apparatus 20 may be heated after the pocket region 84 is formed, which may diffuse dopants from the pocket region 84 into other regions of the body tie line 65. In some embodiments, word lines 38, 80, 81, and 82 may be considered to be separated from one another by an intermediate region 83, and pocket region 84 may be considered to be formed within a segment 85 of body connection line 65 that is vertically offset from intermediate region 83 (and directly below intermediate region 83 in the shown embodiment). In some embodiments, the body connection line 65 may be considered to include segments 85 with pockets 84, and to include regions 87 between the segments 85. Both segment 85 and region 87 may comprise the same majority carrier type (e.g., both may be p-type); wherein segment 85 includes a higher concentration of charge carriers than region 87.

The body connection lines 67, 69, and 71 may include the same configurations as described with respect to the body connection line 65.

Fig. 6 shows a memory array 22 along a cross-section parallel to that of fig. 3, but offset relative to that of fig. 3. The cross-section of fig. 6 is along word line 38. Capacitors 30a and 30b are behind the plane of the cross-section of fig. 6, and are thus shown in phantom (i.e., phantom) view. The posts 40-43 are also behind the plane of the cross-section of fig. 6, and are also shown in phantom view.

Word line 38 may be considered to include a first gate region along first transistor 26a, where the first gate region corresponds to gate 27 a; a second gate region along the second transistor 28a, wherein the second gate region corresponds to the gate 29 a; a third gate region along third transistor 26b, wherein the third gate region corresponds to gate 27 b; and a fourth gate region along fourth transistor 28b, where the fourth gate region corresponds to gate 29 b. The first, second, third and fourth gate regions 27a, 29a, 27b, 29b are adjacent to the first, second, third and fourth body regions 64, 66, 68, 70, respectively (with the body regions 64, 66, 68, 70 being within the regions of the pillars 40 to 43 behind the plane of the cross-section of fig. 6, and thus indicated by dashed arrows in fig. 6).

The word line 38 includes a first segment 100 between the first and second gate regions 27a and 29a, a second segment 102 between the second and third gate regions 29a and 27b, and a third segment 104 between the third and fourth gate regions 27b and 29 b.

In some embodiments, the first gate region 27a of the word line 38 may be considered as having an upper surface 105a and a lower surface 107 a; the second gate region 29a may be considered as having an upper surface 105c and a lower surface 107 c; the third gate region 27b may be considered to have an upper surface 105e and a lower surface 107 e; and the fourth gate region 29b may be considered to have an upper surface 105g and a lower surface 107 g. The first segment 100 of word line 38 may be considered to have an upper surface 105b and a lower surface 107 b; the second segment 102 of word line 38 can be considered to have an upper surface 105d and a lower surface 107 d; and the third segment 104 of the word line 38 can be considered to have an upper surface 105f and a lower surface 107 f.

In some embodiments, the upper surface 105a of the first gate region 27a and the upper surfaces 105c of the second gate region and 29a may be referred to as a first upper surface and a second upper surface, and the upper surface 105b of the first segment 100 of the word line 38 may be referred to as a third upper surface. Also, the lower surface 107a of the first gate region 27a and the lower surface 107c of the second gate region 29a may be referred to as a first lower surface and a second lower surface, and the lower surface 107b of the first segment 100 of the word line 38 may be referred to as a third lower surface. In the embodiment shown, third upper surface 105b is substantially planar with first upper surface 105a and second upper surface 105c (with the term "substantially planar" meaning planar within reasonable manufacturing and measurement tolerances). The third lower surface 107b is substantially planar with the first lower surface 107a and the second lower surface 107 c. In the particular application of FIG. 6, the entire upper surface of the word line 38 is substantially planar and the entire lower surface of the word line 38 is substantially planar.

The embodiment of fig. 6 may be suitable if the thickness of the body tie line, such as thickness T of body tie line 65 shown in fig. 4, is sufficiently thin such that there is suitable electrical coupling between the channel region of the transistor, such as transistor 26a, and the source/drain regions, such as source/drain region 52 (shown in fig. 4), on the side of the body tie line opposite the channel region. In other embodiments, it may be desirable to modify the shape of the word lines in order to improve electrical coupling through body connection lines near the word lines. For example, FIG. 7 shows the memory array 22 along the same plane as used in FIG. 6 but according to an embodiment in which the word lines 38 are modified relative to the embodiment of FIG. 6.

Like the word lines 38 of FIG. 6, the word lines 38 of FIG. 7 have upper surfaces 105a, 105b, 105c, 105d, 105e, 105f, and 105g that are all substantially planar with one another. However, unlike the wordlines 38 of fig. 6, some lower surfaces of the wordlines 38 of fig. 7 are vertically offset relative to other lower surfaces. Specifically, lower surfaces 107b, 107d, and 107f of word line segments 100, 102, and 104 are vertically offset below lower surfaces 107a, 107c, 107e, and 107g of gate regions 27a, 29a, 27b, and 29b of word line 38. This creates a saddle region 108 (or inset region) in which the word lines bear against the body connection lines 65, 67, 69 and 71. The vertical overlap of the word lines across the body tie lines 65, 67, 69, and 71 provided by the saddle regions 108 may enable the formation of conductive channels within the body tie lines 65, 67, 69, and 71 when a voltage is applied along the word lines 38, which may enable effective electrical coupling between the channel region on one side of the body tie lines and the source/drain regions on the opposite side of the body tie lines (e.g., between the channel region 50 and the source/drain regions 52 shown schematically with respect to the transistors 26 a). Saddle region 108 may have any suitable shape; including, for example, curved shapes, parabolic shapes, and the like. For example, the shape of the word line may be adjusted such that the saddle region 108 vertically overlaps the body connection lines 65, 67, 69, and 71 by a suitable amount.

In some embodiments, memory cells 24a and 24b of the type described above with reference to FIG. 3 may be incorporated in a memory array in which comparison bit lines (e.g., comparison bit lines 76a, 78a, 76b, and 78b) are shared between the memory cells. For example, FIG. 8 is shown in which memory cell 24a and memory cell 24c share compare bit lines 76a and 78 a; and wherein memory cell 24b and memory cell 24d share a region of memory array 22 that compares the configuration of bit lines 76b and 78 b. In the illustrated embodiment, the axis 110 extends through the comparison bit lines 76a, 78a, 76b, and 78b and defines a mirror plane. Memory cells 24c and 24d on one side of the mirror plane are substantially mirror images of memory cells 24a and 24b on the opposite side of the mirror plane; wherein the term "substantially mirror image" means a mirror image within reasonable tolerances for manufacturing and measurement. In some embodiments, memory cells 24a and 24c may be referred to as first and second memory cells, respectively; wherein such memory cells are substantially mirror images of each other with respect to a plane 110 extending through the shared compare bit lines 76a and 78 a.

The memory array 22 of FIG. 8 is shown to include a second word line 38a vertically offset from the first word line 38; with a second word line 38a extending across transistors 26c, 28c, 26d, and 28d of memory cells 24c and 24 d.

Memory cells 24a and 24b have body regions 64, 66, 68, and 70 described above with reference to FIG. 3; and memory cells 24c and 24d have similar body regions 64a, 66a, 68a and 70 a. Body regions 64, 66, 68 and 70 are coupled with body connection lines 65, 67, 69 and 71; and body regions 64a, 66a, 68a and 70a are coupled with similar body connection lines 65a, 67a, 69a and 71 a. Body connections 65, 67, 69 and 71 extend to reference voltages 72, 73, 74 and 75; and body connection lines 65a, 67a, 69a and 71a extend to similar reference voltages 72a, 73a, 74a and 75 a. Reference voltages 72, 73, 74, 75, 72a, 73a, 74a, and 75a may all be the same as each other. Alternatively, one or more of reference voltages 72, 73, 74, 75, 72a, 73a, 74a, and 75a may be different from one or more other of reference voltages 72, 73, 74, 75, 72a, 73a, 74a, and 75 a.

The body connection lines 65a, 67a, 69a, and 71a may comprise any of the materials described above with respect to the body connection lines 65, 67, 69, and 71; and in some embodiments may comprise conductively-doped semiconductor material (e.g., conductively-doped silicon, conductively-doped germanium, etc.).

The body connection lines 65a, 67a, 69a, and 71a are separated from the comparison bit lines 76a, 78a, 76b, and 78b by spacers 79. In some embodiments, the body connection lines 65a, 67a, 69a, and 71a may include a semiconductor material doped to a first conductivity type (e.g., n-type or p-type), and the spacer region may include a semiconductor material doped to a second conductivity type different from the first conductivity type.

In some embodiments, transistors 26a and 28a are considered the transistors of first memory cell 24 a; and such transistors include first 51, second 52, third 55 and fourth 56 source/drain regions, respectively. Transistors 26c and 28c are considered the transistors of second memory cell 24 c; and such transistors include fifth source/drain region 51a, sixth source/drain region 52a, seventh source/drain region 55a, and eighth source/drain region 56a, respectively. The second, fourth, sixth and eighth source/drain regions 52, 56a, 52a and 56a are within the spacers 79.

The body connection lines 65, 67, 69, and 71 extend substantially parallel to the comparison bit lines 76a, 78a, 76b, and 78b, and extend into and out of the page relative to the cross-sectional view of fig. 8. Similarly, the body connection lines 65a, 67a, 69a, and 71a extend substantially parallel to the comparison bit lines 76a, 78a, 76b, and 78b, and extend into and out of the page relative to the cross-sectional view of FIG. 8. In some embodiments, body connection lines 65 and 67 may be referred to as first body connection lines associated with first memory cell 24 a; and the body connection lines 65a and 67a may be referred to as third and fourth body connection lines associated with the second memory cell 24 c. In such embodiments, the first body connection line 65 and the third body connection line 65a may be considered to be substantially parallel to each other and substantially parallel to the first comparison bit line 76 a; and the second and fourth body connection lines 67 and 67a may be considered substantially parallel to each other and substantially parallel to the second comparison bit line 78 a.

FIG. 9 shows a region of memory array 22 along a plane orthogonal to the plane of FIG. 8 and along lines 9/10-9/10 of FIG. 8. FIG. 9 is similar to the view of FIG. 4 (described above), and shows memory cells 24a and 24c along with additional memory cells 24h, 24i, 24j, 24x, 24y, and 24 z. Memory cells 24h, 24i, 24j, 24x, 24y, and 24z include capacitors 30h, 30i, 30j, 30x, 30y, and 30z, respectively.

Memory cells 24h, 24i, 24j, 24x, 24y, and 24z include a T1 transistor similar to the T1 transistor of memory cells 24a and 24 c; and includes semiconductor pillars (not labeled) similar to semiconductor pillars 40 and 40a of memory cells 24a and 24 c. The semiconductor pillars of memory cells 24h, 24i, 24j, 24x, 24y, and 24z are alongside word lines 80, 81, 82, 80a, 81a, and 82 a; this is similar to word lines 38 and 38a being alongside the semiconductor pillars 40 and 40a of memory cells 24a and 24 c.

The comparison bit line 76a extends along the plane of the cross-section of fig. 9. The body connection line 65 extends above and substantially parallel to the comparison bit line 76a, and the body connection line 65a extends below and substantially parallel to the comparison bit line 76 a. In the embodiment shown, the body connection lines 65 and 65a are coupled with a controller 130, the controller 130 being configured to provide the desired reference voltages 72 and 72a to the body connection lines 65 and 65 a. The controller may include control circuitry, such as logic circuitry for example, in some embodiments, or may simply be a board or other structure held at ground or other fixed voltage in other embodiments.

The spacers 79 are configured as lines that are substantially parallel to the body connection lines 65 and 65a and substantially parallel to the comparison bit line 76 a.

Fig. 10 shows a cross-section similar to that of fig. 9 but according to an embodiment in which pockets 84 are formed along body connection lines 65 and 65a (similar to the construction described above with reference to fig. 5). Such pockets may provide the same advantages as described above with reference to fig. 5.

Fig. 11 shows a memory array 22 along a cross-section parallel to that of fig. 8, but offset relative to that of fig. 8. Fig. 11 is along word lines 38 and 38 a. Capacitors 30a, 30b, 30c, and 30d are behind the plane of the cross-section of fig. 11, and are therefore shown in phantom view.

Word line 38 includes first gate region 27a, second gate region 29a, third gate region 27b, and fourth gate region 29 b; and similarly word line 38a includes seventh gate region 27c, eighth gate region 29c, ninth gate region 27d, and tenth gate region 29 d.

Word line 38 includes upper surfaces 105a, 105b, 105c, 105d, 105e, 105f, and 105g described above with reference to FIG. 6; and lower surfaces 107a, 107b, 107c, 107d, 107e, 107f, and 107 g. Word line 38a includes similar upper surfaces 120a, 120b, 120c, 120d, 120e, 120f, and 120 g; and similar lower surfaces 122a, 122b, 122c, 122d, 122e, 122f, and 122 g.

In the embodiment of FIG. 11, the upper surfaces 105a, 105b, 105c, 105d, 105e, 105f, and 105g of word lines 38 are all substantially parallel to one another; and the lower surfaces 107a, 107b, 107c, 107d, 107e, 107f, and 107g of the word lines 38 are all substantially parallel to one another. Moreover, upper surfaces 120a, 120b, 120c, 120d, 120e, 120f, and 120g of wordlines 38a are all substantially parallel to one another; and the lower surfaces 122a, 122b, 122c, 122d, 122e, 122f, and 122g of word line 38a are all substantially parallel to one another.

As with the embodiment of fig. 6, the embodiment of fig. 11 may be suitable if the thickness of the body tie lines, such as the thickness of body tie lines 65 and 65a of fig. 8, is sufficiently thin such that there is suitable electrical coupling between the channel region of the transistors, such as transistors 26a and 26c, and the source/drain regions, such as source/drain regions 52 and 52a (shown in fig. 8), on the side of the body tie lines opposite the channel region. In other embodiments, it may be desirable to modify the shape of the word lines, similar to the modifications discussed above with reference to FIG. 7. For example, FIG. 12 shows the memory array 22 along the same plane as used in FIG. 11 but according to an embodiment in which the word lines 38 and 38a are modified relative to the embodiment of FIG. 11.

The word line 38 of fig. 12 has all upper surfaces 105a, 105b, 105c, 105d, 105e, 105f, and 105g that are substantially planar with one another, and the word line 38a of fig. 12 has all lower surfaces 122a, 122b, 122c, 122d, 122e, 122f, and 122g that are substantially planar with one another. However, the lower portion of word line 38 includes a saddle region 108 like the saddle region discussed above with reference to FIG. 7, and the upper portion of word line 38a includes a similar saddle region 108 a.

In the embodiment shown, the lower surfaces 107b, 107d, and 107f of word line 38 follow word line segments 100, 102, and 104; and vertically offset below the lower surfaces 107a, 107c, 107e and 107g of gate regions 27a, 29a, 27b and 29 b. Similarly, the top surfaces 120b, 120d, and 120f of word line 38a follow word line segments 100a, 102a, and 104 a; and vertically offset above the upper surfaces 120a, 120c, 120e, and 120g of the gate regions 27c, 29c, 27d, and 29 d.

In some embodiments, the gate region 27c may be referred to as a first gate region having a first upper surface 120a, the gate region 29c may be referred to as a second gate region having a second upper surface 120c, and the segment 100a of the word line 38a may be considered to have a third upper surface 120b between the first and second upper surfaces (120a, 102 c). The third upper surface 120b is vertically offset in the embodiment of fig. 12 relative to the first upper surface 120a and the second upper surface 120c, and specifically above such first and second upper surfaces.

The 2T-1C memory cell of fig. 3-12, e.g., memory cell 24a, has transistors, e.g., transistors 26a and 28a, that are laterally adjacent to each other, and the capacitor, e.g., capacitor 30a, is vertically offset relative to the transistors. In other embodiments, the transistors may be vertically offset with respect to each other and with respect to the capacitor. For example, FIG. 13 shows a region of apparatus 20 comprising a memory array 22, wherein the illustrated region comprises a pair of memory cells 24a and 24b similar to the memory cells described above with reference to FIG. 3. However, each of the memory cells (24a and 24b) of FIG. 13 includes two transistors vertically stacked on top of each other, and a capacitor is included between the transistors; where the transistors of memory cell 24a are transistors 26a and 28a, and the capacitor of memory cell 24a is capacitor 30 a; and wherein the transistors of memory cell 24b are transistors 26b and 28b, and the capacitor of memory cell 24b is labeled as capacitor 30 b. In some embodiments, transistors 26a, 28a, 26b, and 28b may be referred to as first, second, third, and fourth transistors, respectively; and the capacitors 30a and 30b may be referred to as first and second capacitors, respectively.

The capacitors 30a and 30b include the first node 32, the second node 34, and the dielectric material 36 described above with reference to fig. 3.

Neighboring memory cells 24a and 24b of figure 3 share a common word line. In contrast, neighboring memory cells 24a and 24b of FIG. 13 share a digit line; wherein the digital word lines include compare bit lines 76a and 78 a. The compare bit lines 76a and 78a extend to circuit 4 where the electrical properties of the compare bit lines can be compared.

Semiconductor pillars 40-43 extend vertically from comparison bit lines 76a and 78a and are separated from such comparison bit lines by spacers 79.

Transistors 26a, 28a, 26b, and 28b include source/drain regions 51, 55, 59, and 63 within semiconductor pillars 40-43, and also include channel regions 50, 54, 58, and 62 within semiconductor pillars 40-43. In addition, transistors 26a, 28a, 26b, and 28b include source/drain regions 52, 56, 60, and 64 within spacers 79 adjacent pillars 40-43. Source/drain regions 51, 52, 55, 56, 59, 60, 63, and 64 may be referred to as first, second, third, fourth, fifth, sixth, seventh, and eighth source/drain regions, respectively.

Transistors 26a, 28a, 26b, and 28b include body regions 64, 66, 68, and 70, respectively; with such body regions connected to appropriate voltages by body tie lines 200 and 202. The body connection lines 200 and 202 are similar to the body connection lines 65, 67, 69, and 71 described above with reference to fig. 3, and may include the same components as described above with respect to the body connection lines 65, 67, 69, and 71. However, neighboring memory cells 24a and 24b share body connection lines 200 and 202, rather than having four different body connection lines 65, 67, 69, and 71 as shown in the embodiment of FIG. 3. The body connection lines 200 and 202 extend along a plane relative to the plane of the page of the cross-sectional view of fig. 13. The approximate boundaries of the body tie lines and the channel regions 50, 54, 58, and 62 of transistors 26a, 28a, 26b, and 28b are schematically illustrated by dashed lines 61. The approximate boundaries of the body tie lines and source/drain regions 52, 56, 60 and 64 may be considered along the interface with the spacers 79.

The body connection lines 200 and 202 may be referred to as first and second body connection lines, respectively. The first body connection lines 202 couple the body regions 64 and 68 to the first reference voltage 72, and the second body connection lines 202 couple the body regions 66 and 70 to the second reference voltage 73. First reference voltage 72 and second reference voltage 73 may be the same as each other in some embodiments, and may be different from each other in other embodiments.

First word line 38 extends along first transistor 26a and second transistor 28 a; and a second word line 38a extends along third transistor 26b and fourth transistor 28 b.

Figure 14 shows a cross-section of memory array 22 along a plane orthogonal to the plane of figure 13 and along line 14/15-14/15 of figure 13. The plane of fig. 14 is along word line 38. Memory cell 24a is shown in fig. 14, but in a dashed view, as it is behind the plane of fig. 14. The other memory cells 24h and 24i are along a row that includes word line 38 and are substantially the same as memory cell 24 a; and, like memory cell 24a, is behind the plane of fig. 14.

Word line 38 is shown having an upper region 210 and a lower region 212. Upper region 210 has a planar upper surface 211 and a planar lower surface 213; and lower region 212 has a planar upper surface 215 and a planar lower surface 217. Thus, the upper portion 210 and lower portion 212 of word line 38 lack saddle regions (i.e., similar to region 108 of FIG. 7) to vertically overlap the regions of body tie lines 200 and 202. In some applications, the embodiment of fig. 14 may be acceptable. In other applications, a saddle region similar to region 108 of FIG. 7 may be desired. Fig. 15 shows an embodiment similar to that of fig. 14, but wherein the upper and lower regions 210 and 212 include saddle regions 108 (similar to that of fig. 7) such that portions of the body connection lines 200 and 202 vertically overlap by word line 38 to achieve advantages of the type described above with reference to fig. 7.

In some embodiments, the body line connection can be routed to the second interconnect and the comparison bit line can be routed to the first interconnect, and the second interconnect can be nested within the first interconnect. This is illustrated in fig. 16. Specifically, a portion of memory cell 24a is illustrated, where such portion includes word line 38 and semiconductor material 300. The pillars 40 and body tie lines 65 are patterned from the semiconductor material 300. The body connection lines 65 are separated from the underlying comparison bit lines 76a by spacers 79. The compare bit line 76a extends to the first interconnect 310 and the body tie line 65 extends to the second interconnect 312. Memory cell 24a may be within a memory array region 22 of apparatus (i.e., assembly) 20; and the first interconnect 310 and the second interconnect 312 can be within a region 320 that is peripheral to the memory array region. In the illustrated embodiment, the second interconnects 312 are nested within the first interconnects 310 such that the semiconductor material 300 does not intersect the material of the comparison bit line 76a when extending to the interconnects 312.

The structures discussed above may be incorporated into an electronic system. Such electronic systems may be used in, for example, memory modules, device drivers, power modules, communication modems, processor modules, and application-specific modules, and may include multilayer, multichip modules. The electronic system may be any of a wide range of systems such as, for example, cameras, wireless devices, displays, chipsets, set-top boxes, gaming consoles, lighting devices, vehicles, clocks, televisions, cell phones, personal computers, automobiles, industrial control systems, airplanes, and the like.

Unless otherwise specified, the various materials, substances, components, etc. described herein can be formed using any suitable method (now known or yet to be developed) including, for example, Atomic Layer Deposition (ALD), Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD), etc.

The terms "dielectric" and "insulating" may be used to describe a material having insulating electrical properties. In the present invention, the terms are considered synonyms. The use of the term "dielectric" in some cases and the term "insulating" (or "electrically insulating") in other cases may provide a linguistic variation within the invention to simplify the premise foundation within the appended claims, and is not intended to indicate any significant chemical or electrical difference.

The particular orientation of the various embodiments in the drawings is for illustrative purposes only, and in some applications the embodiments may be rotated relative to the orientation shown. The detailed description provided herein and the appended claims are directed to any structure having the described relationships between various features, regardless of whether the structure is in a particular orientation in the drawings or rotated relative to such orientation.

The cross-sectional views of the drawings show features only in the plane of the cross-section and do not show material behind the plane of the cross-section (unless otherwise indicated) in order to simplify the drawings.

When a structure is referred to above as being "on" or "against" another structure, it can be directly on the other structure or intervening structures may also be present. In contrast, when a structure is referred to as being "directly on" or "directly against" another structure, there are no intervening structures present.

Structures (e.g., layers, materials, etc.) may be referred to as "vertically extending" to indicate that the structures generally extend upward from an underlying base (e.g., substrate). The vertically extending structures may or may not extend substantially orthogonally relative to the upper surface of the base.

Some embodiments include an apparatus having a memory cell with two transistors and one capacitor. The two transistors are a first transistor and a second transistor. The capacitor has a first node coupled with a source/drain region of the first transistor and has a second node coupled with a source/drain region of the second transistor. The memory cell has a first body region vertically offset from the source/drain region of the first transistor and has a second body region vertically offset from the source/drain region of the second transistor. A first body connection line couples the first body region of the memory cell to a first reference voltage. A second body connection line couples the second body region of the memory cell to a second reference voltage.

Some embodiments include an apparatus comprising a first memory cell and a second memory cell. The first memory cell has two transistors and one capacitor. The two transistors of the first memory cell are a first transistor and a second transistor. The first transistor has a first source/drain region and a second source/drain region, and the second transistor has a third source/drain region and a fourth source/drain region. The capacitor of the first memory cell is a first capacitor. The first capacitor has a first node coupled with the first source/drain region of the first transistor and has a second node coupled with the third source/drain region of the second transistor. The first memory cell has a first body region between the first and second source/drain regions of the first transistor and has a second body region between the third and fourth source/drain regions of the second transistor. The second memory cell has two transistors and one capacitor. The two transistors of the second memory cell are a third transistor and a fourth transistor. The third transistor has fifth and sixth source/drain regions, and the fourth transistor has seventh and eighth source/drain regions. The capacitor of the second memory cell is a second capacitor. The second capacitor has a third node coupled with the fifth source/drain region of the third transistor and has a fourth node coupled with the seventh source/drain region of the fourth transistor. The second memory cell has a third body region between the fifth and sixth source/drain regions of the third transistor and has a fourth body region between the seventh and eighth source/drain regions of the fourth transistor. A first body tie line couples the first body region of the first memory cell and the third body region of the second memory cell to a first reference voltage. A second body tie line couples the second body region of the first memory cell and the fourth body region of the second memory cell to a second reference voltage.

Some embodiments include an apparatus comprising a first memory cell and a second memory cell. The first memory cell has two transistors and one capacitor. The two transistors of the first memory cell are a first transistor and a second transistor. The first transistor has a first source/drain region and a second source/drain region, and the second transistor has a third source/drain region and a fourth source/drain region. The capacitor of the first memory cell is a first capacitor. The first capacitor has a first node coupled with the first source/drain region of the first transistor and has a second node coupled with the third source/drain region of the second transistor. The first memory cell has a first body region between the first and second source/drain regions of the first transistor and has a second body region between the third and fourth source/drain regions of the second transistor. The second memory cell has two transistors and one capacitor. The two transistors of the second memory cell are a third transistor and a fourth transistor. The third transistor has fifth and sixth source/drain regions, and the fourth transistor has seventh and eighth source/drain regions. The capacitor of the second memory cell is a second capacitor. The second capacitor has a third node coupled with the fifth source/drain region of the third transistor and has a fourth node coupled with the seventh source/drain region of the fourth transistor. The second memory cell has a third body region between the fifth and sixth source/drain regions of the third transistor and has a fourth body region between the seventh and eighth source/drain regions of the fourth transistor. The second memory cell shares a first compare bit line and a second compare bit line with the first memory cell. A first body connection line couples the first body region of the first memory cell to a first reference voltage. A second body connection line couples the second body region of the first memory cell to a second reference voltage. A third body connection line couples the third body region of the second memory cell to a third reference voltage. A fourth body connection line couples the fourth body region of the second memory cell to a fourth reference voltage.