阅读说明：本技术 沟槽中薄膜沉积的方法 (Method for depositing thin film in groove ) 是由 郭津睿 卢多维克·戈代 罗格·梅耶·蒂默曼·蒂杰森 徐永安 杨政翰 陈建安 于 2020-02-19 设计创作，主要内容包括：本公开内容的实施方式总体涉及在沉积、蚀刻和/或固化工艺期间利用掩模来处理含有基板的工件,以在工件上具有局部的沉积。将掩模放置在工件的第一层上,所述掩模保护复数个沟槽免受第二层的沉积的影响。在一些实施方式中,在第二层的沉积之前放置掩模。在其他实施方式中,在沉积掩模之前使第二层固化。在其他实施方式中,在沉积掩模之后蚀刻第二层。本文中所公开的方法允许在工件中所存在的沟槽中的一些中沉积第二层,而同时至少部分地防止在工件中所存在的其他沟槽中沉积第二层。(Embodiments of the present disclosure generally relate to processing a workpiece containing a substrate with a mask during a deposition, etching, and/or curing process to have localized deposition on the workpiece. A mask is placed on the first layer of the workpiece, the mask protecting the plurality of trenches from deposition of the second layer. In some embodiments, the mask is placed prior to the deposition of the second layer. In other embodiments, the second layer is cured prior to depositing the mask. In other embodiments, the second layer is etched after the mask is deposited. The methods disclosed herein allow for the deposition of the second layer in some of the trenches present in the workpiece while at least partially preventing the deposition of the second layer in other trenches present in the workpiece.)