阅读说明：本技术 回收利用硅锭切割废料的处理方法 (Treatment method for recycling silicon ingot cutting waste ) 是由 罗昀 于 2019-06-13 设计创作，主要内容包括：本发明涉及一种用于纯化在用金刚石线切割锭而产生的废料中包含的硅微粒的处理方法,包括：a)提供由所述废料产生的污染浆料,所述污染浆料由包含硅微粒、有机物和金属污染物的含水混合物形成；b)向污染浆料中加入稀过氧化氢溶液,以形成第一混合物并搅拌第一混合物；c)进行第一混合物的固/液分离,以便一方面获得第一纯化浆料,另一方面获得载有有机物和金属污染物的第一液体。(The present invention relates to a treatment method for purifying silicon microparticles contained in scrap generated by cutting an ingot with a diamond wire, comprising: a) providing a contaminated slurry produced from the waste material, the contaminated slurry being formed from an aqueous mixture comprising silicon particulates, organics, and metal contaminants; b) adding a dilute hydrogen peroxide solution to the contaminated slurry to form a first mixture and stirring the first mixture; c) a solid/liquid separation of the first mixture is carried out so as to obtain, on the one hand, a first purified slurry and, on the other hand, a first liquid loaded with organic matter and metal contaminants.)

1. A treatment process for purifying silicon particles contained in scrap material produced by cutting an ingot with a diamond wire, comprising:

a) providing a contaminated slurry produced from the waste material, the contaminated slurry being formed from an aqueous mixture comprising the silicon particulates, organic matter, and metal contaminants;

b) adding a dilute hydrogen peroxide solution to the contaminated slurry to form a first mixture consisting of the contaminated slurry, hydrogen peroxide and water and stirring the first mixture;

c) the solid/liquid separation of the first mixture is carried out so as to obtain, on the one hand, a first purified slurry and, on the other hand, a first liquid loaded with organic matter and metal contaminants.

2. The process of treating according to the preceding claim, wherein in step a) the contaminated slurry is obtained from the waste material by a solid/liquid separation technique selected from sedimentation, centrifugation, cyclonic separation or filtration, and comprises about 50% of solid matter and 50% of liquid matter, in weight percentage.

3. The treatment process according to any one of the preceding claims, wherein in step b) the dilute hydrogen peroxide solution has a mass concentration of 1% to 35%.

4. The process of any one of the preceding claims, wherein step b) comprises adding pure water to the first mixture so that the first mixture comprises 5 to 10% by weight of solid matter.

5. The treatment process according to one of the preceding claims, wherein step b) is carried out at a temperature of from 20 ℃ to 95 ℃ for a time of from 10 minutes to 5 hours.

6. The process of one of the preceding claims, wherein the solid/liquid separation of step c) is carried out by a technique selected from filtration, sedimentation, centrifugation or cyclonic separation, and wherein the first purified slurry comprises at least 40% solid matter by weight percentage.

7. Process according to one of the preceding claims, comprising a step c') following step c), during which the following is carried out:

adding pure water to the first purified slurry to form a second mixture;

-performing a solid/liquid separation of said second mixture so as to obtain, on the one hand, a second purified slurry and, on the other hand, a second liquid containing organic matter and metal contaminants.

8. Process according to the preceding claim, in which step c') is repeated one to five times.

9. Method of treatment according to one of claims 1 to 6, comprising a step c ") following step c), during which the following treatments are carried out:

providing a first purified slurry maintained in the form of a filter cake,

circulating a dilute hydrofluoric acid solution with a percentage by weight of between 0.1% and 1% through the filter cake;

circulating pure water through the filter cake, thereby enabling rinsing of the filter cake and removal of hydrofluoric acid;

obtaining a third purified slurry.

10. The process according to one of the preceding claims, comprising a step d): the purified slurry is dried under an inert atmosphere to obtain purified silicon microparticles.

Technical Field

The present invention relates to a silicon production line for the photovoltaic industry. In particular, the invention relates to a treatment process for recycling the scrap resulting from cutting silicon ingots ("kerf").

Background

Currently, silicon wafers for the semiconductor or photovoltaic industry are predominantly made from silicon ingots using the diamond wire slicing method. These methods have gradually replaced slurry sawing because they provide better quality wafers at lower production costs.

The width of the diamond wire is of the same order of magnitude as the thickness of the cut wafer, however these sawing methods generate a large amount of silicon scrap: up to 40 to 50% of the total mass of the ingot. The waste is in the form of very fine powder (surface-oxidized silicon particles) mixed with liquid additives, metal contaminants and organic or inorganic substances.

Silicon powder properly extracted and purified from this mixture is of great value for reuse in various industries including photovoltaics, energy storage, ceramic synthesis, and the like. In particular, the effective purification of the silicon powder must achieve the following three objectives:

reduction of organic matter:

these substances come from organic (liquid) additives used in the sawing process or from polymers contained in e.g. diamond wires or saw blades. The existence of organic residues in the silicon powder reduces the possibility of recycling the silicon powder; in fact, in most cases, the silicon must be subjected to high temperatures during which the organics will tend to produce SiC particles, which is detrimental to most applications.

Reduction of metal contamination:

these contaminants originate mainly from the diamond wire of metallic nature. They may exist in different forms: ions, atoms, particulates, and are found dispersed in the mixture or bound to the surface of the silicon microparticles. The presence of metallic contaminant residues in the silicon powder will adversely affect the performance of the developed devices, particularly in semiconductor and photovoltaic applications.

Reduction of silicon oxide:

the surface of the silicon particles includes a layer of silicon oxide, which may in some cases prevent reuse of the silicon.

Several methods for extracting and purifying silicon particles obtained from cutting scraps ("kerf") have been proposed in the prior art, in particular the methods described in documents WO 2012125942, WO 2010003456 and CN 103373731.

Document WO 2012125942 proposes a method for removing organic matter using ozone, dissolving metal contaminants using hydrochloric acid, and removing a silicon oxide layer using hydrofluoric acid. The main disadvantages of this process are the limited efficiency of ozone due to its low solubility in water and the use of concentrated acids.

Document WO 2010003456 also uses concentrated acids, which easily pollute the environment and generate high process costs.

Document CN 103373731 proposes a process based on oxidation of a silicon powder with a strong oxidizing agent, followed by extraction of the oxidized powder with an organic solvent. The disadvantage of this method is that the silicon powder is deoxidized using environmentally polluting chemicals such as organic solvents and acids. The loss of part of the silicon (due to its oxidation) during the process is also significant.

Other methods provide a sequential treatment sequence with strong base and with strong acid according to conventionally practiced silicon cleaning methods (RCA cleaning). Unfortunately, these very effective cleaning of silicon wafers does not achieve the desired level of purification with the silicon particles dispersed in the contaminated aqueous mixture.

Subject matter of the invention

The present invention aims to overcome all or part of the above disadvantages. The present invention relates to a process for recovering the cutting waste ("kerf") of silicon ingots by sawing with diamond wire (without abrasives).

Disclosure of Invention

The invention relates to a treatment method for purifying silicon particles contained in waste material produced without abrasive material by cutting an ingot with a diamond wire, said method comprising:

a) providing a contaminated slurry produced from the waste material, the contaminated slurry being formed from an aqueous mixture comprising silicon particulates, organics, and metal contaminants;

b) adding a dilute hydrogen peroxide solution to the contaminated slurry to form a first mixture and stirring the first mixture, the first mixture consisting of contaminated slurry, hydrogen peroxide and water;

c) a solid/liquid separation of the first mixture is carried out so as to obtain, on the one hand, a first purified slurry and, on the other hand, a first liquid loaded with organic matter and metal contaminants.

According to other advantageous and non-limiting features of the invention, these can be used alone or in any technically feasible combination:

in step a), obtaining a contaminated slurry from the waste material by a solid/liquid separation technique selected from sedimentation, centrifugation, cyclonic separation or filtration, and the contaminated slurry comprises about 50% of solid matter and 50% of liquid matter, in weight percentage;

in step b), the dilute hydrogen peroxide solution has a mass concentration of 1% to 35%;

step b) comprises adding pure water to the first mixture so that said first mixture comprises 5 to 10% by weight of solid matter;

step b) is carried out at a temperature of from 20 ℃ to 95 ℃ for from 10 minutes to 5 hours;

the solid/liquid separation of step c) is carried out by a technique selected from filtration, sedimentation, centrifugation or cyclonic separation, and wherein the first purified slurry comprises at least 40% solid matter by weight percentage;

the treatment method comprises a step c') following step c), during which the following treatments are carried out:

adding pure water to the first purified slurry to form a second mixture;

o performing a solid/liquid separation of the second mixture to obtain, on the one hand, a second purified slurry and, on the other hand, a second liquid containing organic matter and metallic contaminants.

Applying agitation to the second mixture;

step c') is repeated one to five times;

the treatment method comprises a step c ") following step c), during which the following treatments are carried out:

providing a first purified slurry held in the form of a filter cake,

-circulating a dilute hydrofluoric acid solution having a weight percentage of 0.1% to 1% through the filter cake;

-circulating pure water through the filter cake, thereby enabling rinsing of the filter cake and removal of hydrofluoric acid;

obtaining a third purified slurry.

The treatment method comprises a step c ") following step c', during which the following treatments are carried out:

providing a second purified slurry held in the form of a filter cake,

-circulating a dilute hydrofluoric acid solution having a weight percentage of 0.1% to 1% through the filter cake;

-circulating pure water through the filter cake, thereby enabling rinsing of the filter cake and removal of hydrofluoric acid;

obtaining a third purified slurry;

the treatment method comprises a step d): the purified slurry is dried under an inert atmosphere to obtain purified silicon microparticles.

Drawings

Other features and advantages of the present invention will become apparent from the following detailed description, taken in conjunction with the accompanying drawings, in which:

figure 1 shows the steps of the treatment method of the invention;

figures 2a, 2b and 2c illustrate the treatment process for purifying silicon microparticles of the invention;

figures 3a, 3b, 3c and 3d show cross-sections of the filter cake during a sequence of steps of the treatment process of the invention.

Detailed Description

The invention relates to a treatment method for purifying silicon particles contained in waste material produced without abrasive material from diamond wire-cut ingots (figure 1). As previously mentioned, the silicon in this waste is in the form of a very fine powder (silicon particles with at least partially oxidized surfaces) and is mixed with liquid additives, metal contaminants and organic or inorganic substances. This waste contains mainly liquid substances; the percentage by weight of silicon (which constitutes the majority of the solid matter) is between 2% and 5%.

The treatment method of the invention comprises a step a) of providing a contaminated slurry resulting from sawing waste, the contaminated slurry being formed from silicon particles, organic matter and metal contaminants in an aqueous mixture. Typically, the silicon particles have a size distribution of about 10nm to 5 microns, typically centered at 1 micron.

In the remainder of the invention we will use the term "slurry" to define a substance comprising more than 40% (weight percent) of solid matter (consisting mainly of silicon particles) mixed in an aqueous solution. All proportions relating to the slurries of the present invention are given in weight percent.

Advantageously, in step a), the contaminated slurry comprises about 50% solid matter and 50% liquid matter. The term "about" as used herein means that the weight percent value is +/-10% (absolute: about 50% by weight can vary from 40% to 60%), or even +/-5% (absolute). The contaminated slurry may be obtained from the cutting waste (essentially consisting of liquid substances, with a percentage by weight of silicon of between 2% and 5%) by known solid/liquid separation methods selected from filtration (e.g. vacuum filtration) or tangential filtration, sedimentation, centrifugation or cyclone separation. Thus, the resulting contaminated slurry has more than 40% solids (weight percent).

The treatment method of the invention then comprises a step b) during which a dilute hydrogen peroxide solution (H) is introduced₂O₂) Is added to the contaminated slurry to form a first mixture. By "dilute solution" is meant a solution consisting of hydrogen peroxide and water. The dilute hydrogen peroxide solution may have a mass concentration of 1% to 35% hydrogen peroxide, the remaining percentage being water. Note that no other acidic or basic products were added to form the first mixture. Thus, the first mixture consists of the contaminated slurry, hydrogen peroxide and water.

The respective proportions of the dilute solution and the contaminated slurry in the first mixture depend on H₂O₂And (4) concentration. For example, for 35% H₂O₂The first mixture preferably includes a volume of dilute H relative to a volume of contaminated slurry₂O₂A solution; for 10% H₂O₂The first mixture preferably comprises three volumes of the contaminated slurry with respect to one volumeDilute solution.

Step b) further comprises stirring the first mixture to dilute H₂O₂The solution is uniformly distributed among the silicon particles 1 and other organic 3 or metal contaminants 4.

The silicon particles 1 produced from the contaminated slurry mainly include a layer of silicon oxide 2 on the surface thereof; furthermore, they are wholly or partially "covered" by a layer formed by long chains of organic 3 (fig. 2 a). By the oxidation reaction of the organic 3, the hydrogen peroxide will induce the cleavage of the long organic chains 3, which promotes their separation from the surface of the silicon microparticles 1. As a result, the metal contaminants 4 bound to the silicon particles 1 via the organic layer 3 will also be separated (fig. 2 b). Note that this oxidation reaction also produces carbon dioxide (CO) in gaseous form₂)。

Advantageously, the first mixture comprises about 5% to 10% of solid matter and the remaining percentage of liquid matter (in weight percent): the liquid consistency promotes suspension of the silicon particles 1 and other organic 3 or metallic contaminants 4 in the first mixture. Note that the term "about" is defined as previously described.

When the concentration of H is low₂O₂Such consistency of the first mixture is achieved directly when the solution of (a) is mixed with the contaminated slurry. Has a higher H in solution₂O₂Dilute H added at a concentration of, for example, 10% to 35%₂O₂The volume of the solution is insufficient to achieve 5% to 10% of the solid matter in the first mixture; pure water is added to obtain the desired consistency of the first mixture. "pure water" means deionized or ultrapure water having a resistivity of several hundred k Ω · cm and a resistivity of more than 18.2M Ω · cm, respectively.

Then, the first mixture is stirred so that the distribution of the silicon microparticles 1 and other organic matters 3 or metal contaminants 4 suspended in the first mixture can be made uniform; stirring may also increase the efficiency of the oxidation reaction that breaks up the organic chains 3.

Step b) may be carried out at a temperature of 20 ℃ to 95 ℃ for 10 minutes to 5 hours.

At the end of step b), the first aqueous mixture comprises particles in a homogeneous suspension, comprising silicon microparticles 1, organic matter 3 mainly in the form of broken chains and metal contaminants 4.

The treatment process of the invention then comprises a step c) of subjecting the first mixture to a solid/liquid separation so as to obtain, on the one hand, a first purified slurry and, on the other hand, a first liquid loaded with organic matter and metal contaminants. The first purified slurry consists of at least 40% solid matter (fig. 2 c). The first liquid may be discharged and treated as a liquid effluent.

As the organic chains break apart, the fragments of the organic layer are separated from the silicon particles (step b)), and in step c) they are discharged together with the liquid fraction (first liquid) and thus separated from the solid material (first purified slurry) due to their size reduction and/or their dissolution in water.

The applicant has been able to observe that after step c) for solid/liquid separation, at least 90% of the organic matter originally present in the contaminated slurry is discharged into the first liquid. After this step c), the metal contaminants initially present in the contaminated slurry (all added together) at about 1 to 3% by weight are also greatly reduced, in particular due to their initial binding with the organics.

The solid/liquid separation technique of step c) may be selected from sedimentation, centrifugation, cyclonic separation, filtration or other suitable known techniques.

Advantageously, the treatment process comprises a rinsing step c'), in which pure water is added to the first purified slurry to form a second mixture (fig. 1). The second mixture preferably includes at least ten volumes of water for one volume of the first slurry. Agitation is provided to homogenize the second mixture.

Then, step c') comprises a solid/liquid separation of the second mixture to obtain, on the one hand, a second purified slurry and, on the other hand, a second liquid containing residual organics and metal contaminants. The second purified slurry consists of at least 40% solids. Like the first liquid, the second liquid may be discharged and treated as a liquid effluent.

The second purified slurry is rinsed once more than the first slurry. Therefore, it has a higher purity level: after this step c'), at least 95% of the organic material originally present in the contaminated slurry is removed. After this step c'), the level of metal contaminants is also improved.

Advantageously, step c ') is repeated one to five times to achieve the optimum purity level (typically, at least one hundred times less organic and metal contaminants compared to the original contaminated slurry) while maintaining reasonable costs (resulting from the repetition of step c').

The treatment process of the invention advantageously comprises a step d) in which the purified slurry (first slurry or second slurry) is dried under an inert atmosphere to obtain purified silicon microparticles.

Preferably, the drying is carried out under vacuum with stirring at a temperature of 50 ℃ to 80 ℃. For example, a filter-dryer type device equipped with a mechanical stirrer may be used.

At the end of the above treatment process, a very good level of purification of the silicon microparticles (organic and metallic) is achieved, typically:

less than 0.3% (by weight) carbon;

less than 100ppm (by weight) of metal contaminants (total).

Also, the process does not use the highly contaminated products, such as bases and concentrated acids, used in the prior art processes.

However, the silicon particles retain an oxide layer on their surface.

According to a variant, the treatment method of the invention comprises a step c ") for removing all or part of the oxide present on the silicon particles. Step c ") may be carried out after step c) or after step c') (FIG. 1).

This step first comprises providing a first purified slurry 11 (or a second purified slurry 12) which is maintained in the form of a filter cake 10 (fig. 3 a). The filter cake 10 can be obtained ("press cake") in particular after filtration under a filter press: thus, the first purified slurry 11 (or the second purified slurry 12) remains pressed between the two porous membranes 20, in the form of a filter cake 10.

Step c ") then involves circulating a 0.1 to 1% (weight percent) dilute hydrofluoric acid (HF) solution 30 through the filter cake 10 (fig. 3 b). Thus, the HF solution 30 will all contact the silicon particles of the filter cake 10 along its path between the two membranes 20 and attack the oxide layer surrounding the silicon particles. For example, for one volume of filter cake 10, two volumes of 0.5% HF solution 30 will be circulated. For lower HF concentrations, a larger volume of solution 30 will be used to pass through filter cake 10.

Step c ") then comprises circulating pure water 40 through the filter cake 10, thereby enabling rinsing of said filter cake 10 and removal of hydrofluoric acid (fig. 3 c). In fact, pure water 40 will circulate through the filter cake 10 by taking substantially the same path and gap as the HF solution 30, thereby ensuring an effective rinsing of said filter cake 10. For example, for one volume of filter cake, ten volumes of pure water 40 are circulated through the filter cake 10. pH measurement at the water outlet membrane can check the effectiveness of the rinse: a pH of 7 is the target for a complete rinse.

Step c ") ends with obtaining a third purified slurry 13 (fig. 3d) consisting of more than 40% solid matter. The third purified slurry 13 is formed of silicon microparticles which are substantially free of their surface oxide layer.

According to this variant, the treatment method advantageously comprises a drying step d) during which the third purified slurry is dried under an inert atmosphere to prevent the formation of an oxide layer on the purified silicon microparticles.

This step is followed by conditioning (conditioning) to maintain the dried silicon powder in an inert, non-oxidizing atmosphere.

At the end of the treatment method according to this variant, purified silicon microparticles having a low silicon oxide content are obtained; it may have the following features:

less than 1% by weight of oxygen,

less than 0.3% (by weight) of carbon,

less than 50ppm (by weight) of metal contaminants (total); note that step c ") of removing the oxide can reduce the level of metal contaminants, as metal contaminants are often incorporated into the surface oxide layer covering the silicon particles; thus, removal of this layer facilitates removal of the metal particles.

These properties make silicon powders compatible with most applications, in particular the photovoltaic industry.

The treatment method of the invention enables the recycling of more than 95% of the silicon contained in the sawing waste in particulate form.

Of course, the invention is not limited to the described embodiments and modifications may be added without departing from the scope of the invention as defined by the claims.