阅读说明：本技术 5g基站用高纯低辐射球形硅微粉的制备工艺及设备 (Preparation process and equipment of high-purity low-radiation spherical silicon micropowder for 5G base station ) 是由 何书辉 乔秀娟 于 2020-12-15 设计创作，主要内容包括：本发明公开了一种5G基站用高纯低辐射球形硅微粉的制备工艺及设备,其通过酸洗手段有效地将硅微粉中的铀分离出来,且分离后的铀能够被吸附提纯单元高效吸附,使超细硅微粉中铀(U)元素总含量降低至1×10～(-9)以下。此外,模块化设计的吸附提纯单元通过其内的SiO-2气凝胶在吸附完成后可以方便快速地从系统中分离,以重新涂敷SiO-2气凝胶或者更换不同型号的吸附提纯单元；因而能够实现循环使用和规模化放大。(The invention discloses a preparation process and equipment of high-purity low-radiation spherical silicon micropowder for a 5G base station, which effectively separate uranium in the silicon micropowder by an acid pickling means, and the separated uranium can be efficiently adsorbed by an adsorption and purification unit, so that the total content of uranium (U) elements in the superfine silicon micropowder is reduced to 1 x 10 ‑9 The following. In addition, the adsorption purification unit with modular design passes through SiO in the adsorption purification unit 2 The aerogel can be conveniently and quickly separated from the system after adsorption is finished so as to be coated with SiO again 2 Aerogel or different types of adsorption purification units are replaced; thereby realizing recycling and scale-up.)

1. A preparation system of high-purity low-radiation spherical silica micropowder for a 5G base station is characterized in that: comprises the steps of (a) preparing a mixture of a plurality of raw materials,

the mixing and stirring unit (100) comprises a containing mechanism (101) and a stirring mechanism (102) extending into the containing mechanism (101), wherein the lower end of the containing mechanism (101) is provided with a water outlet joint (101a), and the upper end of the containing mechanism (101) is provided with a water inlet joint (101 b);

a circulating power unit (200) comprising a water inlet end (201) and a water outlet end (202);

the device comprises an adsorption purification unit (300), a liquid inlet (K-1) and a liquid outlet (K-2) are respectively arranged at two ends of the adsorption purification unit, a plurality of axially through flow channels (T-1) are arranged in the adsorption purification unit, and an adsorption layer (301) is arranged in each flow channel (T-1); and the number of the first and second groups,

a conveying unit (400) comprising a first pipeline (401) connected between the water outlet connection (101a) and the water inlet end (201), a second pipeline (402) connected between the water outlet end (202) and the liquid inlet (K-1), and a third pipeline (403) connected between the liquid outlet (K-2) and the water inlet connection (101 b).

2. The system for preparing spherical silica micropowder with high purity and low radiation for a 5G base station according to claim 1, wherein: the mixing and stirring unit (100) adopts a stirring tank; the circulating power unit (200) adopts a circulating water pump.

3. The system for preparing high-purity low-radiation spherical silica micropowder for a 5G base station according to claim 1 or 2, characterized in that: the adsorption purification unit (300) comprises a first connecting body (302) and a second connecting body (303) which are detachably connected;

the first connecting body (302) comprises a reaction section (302a) and a first end cover (302b) integrally formed at the outer end of the reaction section (302a), a plurality of circulation channels (T-1) are uniformly distributed in the reaction section (302a) along the circumferential direction, and a through liquid inlet (K-1) is formed in the center of the first end cover (302 b);

the second connector (303) comprises a connecting section (303a) connected with the reaction section (302a) and a second end cover (303b) integrally formed at the outer end of the connecting section (303a), and a through liquid outlet (K-2) is formed in the center of the second end cover (303 b).

4. The system for preparing spherical silica micropowder with high purity and low radiation for a 5G base station according to claim 3, wherein: an accommodating channel (302c) is arranged at the center of the first connecting body (302); an opening is formed at one end of the accommodating channel (302c) corresponding to the direction of the liquid outlet (K-2), a blocking plate (302d) is arranged at one end corresponding to the direction of the liquid inlet (K-1), the blocking plate (302d) is fixed at the edge of the liquid inlet (K-1) through a connecting section (302e), and liquid passing holes (302e-1) are distributed on the connecting section (302 e);

an axially-through insertion pipe (302f) is inserted into the accommodating channel (302c), limiting convex strips (302f-1) corresponding to the circulation channels (T-1) are distributed on the outer edge of the insertion pipe (302f), and the limiting convex strips (302f-1) extend into the corresponding circulation channels (T-1);

a C-shaped elastic plate (302g) attached to the inner side wall of each flow channel (T-1) is inserted into each flow channel (T-1), and the C-shaped elastic plate (302g) is a plane plate in a natural state; an adsorption layer (301) is adhered to the inner side surface of each C-shaped elastic plate (302 g);

an axially through bend pipe (303c) is arranged at the inner end edge of the liquid outlet (K-2), and when the first connecting body (302) and the second connecting body (303) are connected with each other, the bend pipe (303c) extends into the insertion pipe (302f) and forms an interlayer channel (T-2) between the bend pipe and the insertion pipe.

5. The system for preparing spherical silica micropowder with high purity and low radiation for 5G base station according to claim 4, wherein: an adsorption layer (301) is arranged on the outer side wall of the redirecting pipe (303c) and/or the inner side wall of the insertion pipe (302 f).

6. The system for preparing high-purity low-radiation spherical silica micropowder for a 5G base station according to claim 4 or 5, wherein: a limiting side plate (303b-1) is distributed on the inner side wall of the second end cover (303 b);

when the first connecting body (302) and the second connecting body (303) are connected with each other, the outer edge of the limiting side plate (303b-1) is attached to the end of the insertion pipe (302 f).

7. The system for preparing high-purity low-radiation spherical silica powder for a 5G base station according to any one of claims 1, 2, 4 and 5, wherein: the adsorption layer (301) adopts SiO₂An aerogel.

8. A method for preparing high-purity low-radiation spherical silica micropowder for a 5G base station by using the system for preparing high-purity low-radiation spherical silica micropowder for a 5G base station according to any one of claims 1 to 7, characterized by comprising: comprises the steps of (a) preparing a mixture of a plurality of raw materials,

carrying out ultrafine grinding and fine selection on the common silicon micropowder to obtain ultrafine silicon micropowder;

mixing the superfine silicon powder and deionized water according to a mass ratio of 2: 1 mixing and stirring to prepare slurry;

adjusting the pH value of the slurry by using an acid reagent to ensure that the pH value is less than or equal to 4.5, so that the hexavalent uranium elements on the surface of the powder particles are dispersed in the slurry;

uniformly arranging the adsorption layer (301) in a flow channel (T-1) of the adsorption purification unit (300), and drying the adsorption layer to dry the adsorption layer;

extracting the slurry, enabling the slurry to pass through a flow channel (T-1) of the adsorption and purification unit (300), carrying out adsorption and purification on uranium elements in the slurry, and then separating and drying ultrafine silicon powder in the slurry;

the high-purity low-radiation spherical silicon micro powder is obtained by a flame melting method.

9. 5 according to claim 8The preparation method of the high-purity low-radiation spherical silicon micropowder for the G base station is characterized by comprising the following steps of: the adsorption layer (301) adopts SiO₂An aerogel;

mixing SiO₂The aerogel is uniformly arranged in a flow channel (T-1) of the adsorption purification unit (300) and dried for 4 hours in a 60 ℃ oven, so that the SiO is obtained₂Drying the aerogel and then blowing off the incompletely adhered SiO in the flow channel (T-1)₂An aerogel.

10. The method for preparing high-purity low-radiation spherical silica micropowder for a 5G base station according to claim 8 or 9, comprising: the flame melting method comprises the following steps of,

putting the superfine silicon powder subjected to adsorption purification and separation into a spheroidizing furnace, and controlling a temperature field, an airflow field and material flow to carry out spheroidizing treatment so as to enable the superfine silicon powder to stay in the temperature field for 0.1-3 s; the temperature field is controlled to be 1800-2200 ℃; the gas flow field takes oxygen as carrier gas and combustion improver, natural gas is fuel gas, and the flow ratio of the fuel gas to the combustion improver is 1.05; the material flow speed is controlled to be 50-500 kg/h;

the flame fusion process is carried out on the basis of a non-polluting post-processing technique comprising: the zirconia ceramic protection is added on the surfaces of all parts which are possibly contacted with the superfine silica powder in the subsequent process, so that the secondary pollution caused by introducing uranium element in the subsequent process is avoided.

Technical Field

The invention relates to the technical field of silicon micropowder processing and manufacturing, in particular to a preparation process and equipment of high-purity low-radiation spherical silicon micropowder for a 5G base station.

Background

The spherical silicon micropowder is widely applied to integrated circuit packaging by virtue of the advantages of excellent fluidity, low thermal expansion coefficient and the like, and with the development of large-scale and ultra-large-scale integrated circuit packaging technology, in order to avoid soft errors generated in semiconductor devices, the content (mass fraction) of radioactive elements, particularly uranium (U), is less than 1 multiplied by 10^-9The spherical silica powder with high purity and low radioactivity becomes a hot point of research in recent years. Currently produced high-purity low-radioactivity ballsThere are two main methods for forming silica micropowder. One is to obtain the product after the natural high-purity quartz or high-purity silicon micropowder is spheroidized and cooled by physical methods such as a high-temperature melting spraying method, a flame melting method and a plasma method. The method has simple flow, but has higher requirements on natural quartz, and is limited by mineral resource conditions during industrial production, so that sustainable production and preparation are difficult. The other method is to adopt a chemical method such as a micro-emulsion method, a sol-gel method and the like, to emulsify, concentrate and granulate high-purity organosilane or water glass to obtain high-purity silicon micro powder, and then to carry out roasting and spheroidization processes to obtain the high-purity low-radioactivity spherical silicon micro powder. The product prepared by the method has high purity but complex process flow, and the use performance of the sample is affected by the defects of unsmooth surface, low apparent density, insufficient fluidity, low filling degree and the like, so that the industrial production cannot be realized.

The research shows that: the uranium usually exists in a tetravalent and hexavalent state, and the tetravalent uranium is easily oxidized to the uranyl ion of hexavalent, hexavalent uraniumEasy dissolution and migration, large ionic radius and easy adsorption. In order to remove uranium by adsorption, researchers have washed fine silica powder with inorganic acid water, and also washed Fe₃O₄@SiO₂The functional materials such as the composite nano particles, the graphene oxide/silicon dioxide composite material (GOS) and the SBA-15 rod are used for researching the adsorption and separation of uranium in the aqueous solution, and the result shows that the mesoporous functional material has high adsorption capacity on the uranium in the aqueous solution and can basically reach adsorption saturation within 30 min. However, the purity, structure and recycling effect of the mesoporous functional materials are difficult to limit the purification of the silicon micropowder and further limit the industrial application of the silicon micropowder.

Disclosure of Invention

This section is for the purpose of summarizing some aspects of embodiments of the invention and to briefly introduce some preferred embodiments. In this section, as well as in the abstract and the title of the invention of this application, simplifications or omissions may be made to avoid obscuring the purpose of the section, the abstract and the title, and such simplifications or omissions are not intended to limit the scope of the invention.

The present invention has been made in view of the problems occurring in the prior art.

Therefore, an object of the present invention is to provide a system for preparing high-purity low-emissivity spherical silica micropowder for a 5G base station, which comprises: the mixing and stirring unit comprises a containing mechanism and a stirring mechanism extending into the containing mechanism, wherein the lower end of the containing mechanism is provided with a water outlet joint, and the upper end of the containing mechanism is provided with a water inlet joint; a circulating power unit comprising a water inlet end and a water outlet end; the adsorption purification unit is provided with a liquid inlet and a liquid outlet at two ends respectively, a plurality of axially through flow channels are arranged in the adsorption purification unit, and an adsorption layer is arranged in each flow channel; and the conveying unit comprises a first pipeline connected between the water outlet joint and the water inlet end, a second pipeline connected between the water outlet end and the liquid inlet, and a third pipeline connected between the liquid outlet and the water inlet joint.

As a preferable scheme of the preparation system of the high-purity low-radiation spherical silicon micropowder for the 5G base station, the preparation system comprises the following steps: the mixing and stirring unit adopts a stirring tank; the circulating power unit adopts a circulating water pump.

As a preferable scheme of the preparation system of the high-purity low-radiation spherical silicon micropowder for the 5G base station, the preparation system comprises the following steps: the adsorption purification unit comprises a first connecting body and a second connecting body which are detachably connected; the first connecting body comprises a reaction section and a first end cover integrally formed at the outer end of the reaction section, a plurality of circulation channels are uniformly distributed in the reaction section along the circumferential direction, and a through liquid inlet is formed in the center of the first end cover; the second connector comprises a connecting section connected with the reaction section and a second end cover integrally formed at the outer end of the connecting section, and a through liquid outlet is formed in the center of the second end cover.

As a preferable scheme of the preparation system of the high-purity low-radiation spherical silicon micropowder for the 5G base station, the preparation system comprises the following steps: an accommodating channel is arranged at the center of the first connecting body; an opening is formed at one end of the accommodating channel corresponding to the direction of the liquid outlet, a plugging plate is arranged at one end corresponding to the direction of the liquid inlet, the plugging plate is fixed at the edge of the liquid inlet through a connecting section, and liquid passing holes are distributed on the connecting section; an axially through insertion pipe is inserted into the accommodating channel, limiting convex strips corresponding to the circulation channels are distributed on the outer edge of the insertion pipe, and each limiting convex strip extends into the corresponding circulation channel; a C-shaped elastic plate attached to the inner side wall of each flow channel is inserted into each flow channel, and the C-shaped elastic plate is a plane plate in a natural state; an adsorption layer is adhered to the inner side surface of each C-shaped elastic plate; the inner end edge of the liquid outlet is provided with an axially through bend pipe, and when the first connecting body and the second connecting body are connected with each other, the bend pipe extends into the cannula, and an interlayer channel is formed between the bend pipe and the cannula.

As a preferable scheme of the preparation system of the high-purity low-radiation spherical silicon micropowder for the 5G base station, the preparation system comprises the following steps: and an adsorption layer is arranged on the outer side wall of the redirection pipe and/or the inner side wall of the insertion pipe.

As a preferable scheme of the preparation system of the high-purity low-radiation spherical silicon micropowder for the 5G base station, the preparation system comprises the following steps: the inner side wall of the second end cover is distributed with a limiting side plate; when the first connecting body and the second connecting body are connected with each other, the outer edge of the limiting side plate is attached to the end of the insertion tube.

As a preferable scheme of the preparation system of the high-purity low-radiation spherical silicon micropowder for the 5G base station, the preparation system comprises the following steps: the adsorption layer adopts SiO₂An aerogel.

The invention also aims to provide a preparation method of the high-purity low-radiation spherical silicon micropowder for the 5G base station, which comprises the following steps:

s1: carrying out ultrafine grinding and fine selection on the common silicon micropowder to obtain ultrafine silicon micropowder;

s2: mixing the superfine silicon powder and deionized water according to a mass ratio of 2: 1 mixing and stirring to prepare slurry;

s3: adjusting the pH value of the slurry by using an acid reagent to ensure that the pH value is less than or equal to 4.5, so that the hexavalent uranium elements on the surface of the powder particles are dispersed in the slurry;

s4: uniformly arranging the adsorption layer in a flow channel of the adsorption and purification unit, and drying the adsorption layer to dry the adsorption layer;

s5: extracting the slurry and enabling the slurry to pass through a flow channel of the adsorption and purification unit, carrying out adsorption and purification on uranium elements in the slurry, and then separating and drying the superfine silicon powder in the slurry;

s6: the high-purity low-radiation spherical silicon micro powder is obtained by a flame melting method.

As a preferable scheme of the preparation method of the high-purity low-radiation spherical silicon micropowder for the 5G base station, the preparation method comprises the following steps: the adsorption layer adopts SiO₂An aerogel; mixing SiO₂The aerogel is uniformly arranged in the flow channel of the adsorption purification unit and dried in a 60 ℃ oven for 4 hours to ensure that the SiO₂Drying the aerogel and then blowing off incompletely adhered SiO in the flow channels₂An aerogel.

As a preferable scheme of the preparation method of the high-purity low-radiation spherical silicon micropowder for the 5G base station, the preparation method comprises the following steps: the flame melting method comprises the following steps: putting the superfine silicon powder subjected to adsorption purification and separation into a spheroidizing furnace, and controlling a temperature field, an airflow field and material flow to carry out spheroidizing treatment so as to enable the superfine silicon powder to stay in the temperature field for 0.1-3 s; the temperature field is controlled to be 1800-2200 ℃; the gas flow field takes oxygen as carrier gas and combustion improver, natural gas is fuel gas, and the flow ratio of the fuel gas to the combustion improver is 1.05; the material flow speed is controlled to be 50-500 kg/h; the flame fusion process is carried out on the basis of a non-polluting post-processing technique comprising: the zirconia ceramic protection is added on the surfaces of all parts which are possibly contacted with the superfine silica powder in the subsequent process, so that the secondary pollution caused by introducing uranium element in the subsequent process is avoided.

The invention has the beneficial effects that: the method effectively separates uranium in the silicon micropowder by means of acid washing, and the separated uranium can be adsorbed and purified by the high-purity adsorption and purification unitEffective adsorption to reduce the total content of uranium element in the superfine silicon powder to 1 × 10^-9The following. In addition, the adsorption purification unit with modular design passes through SiO in the adsorption purification unit₂The aerogel can be conveniently and quickly separated from the system after adsorption is finished so as to be coated with SiO again₂Aerogel or different types of adsorption purification units are replaced; thereby realizing recycling and scale-up.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings needed to be used in the description of the embodiments will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without inventive exercise. Wherein:

FIG. 1 is a diagram of a system for preparing high-purity low-radiation spherical silica powder for a 5G base station.

Fig. 2 is a front view of an adsorption purification unit.

Fig. 3 is a cross-sectional view taken along the line a in fig. 2.

Fig. 4 is a diagram showing the internal configuration of the adsorption purification unit.

Fig. 5 is a detailed view of the structure at B in fig. 4.

Detailed Description

In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in detail below.

In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention, but the present invention may be practiced in other ways than those specifically described and will be readily apparent to those of ordinary skill in the art without departing from the spirit of the present invention, and therefore the present invention is not limited to the specific embodiments disclosed below.

Furthermore, reference herein to "one embodiment" or "an embodiment" means that a particular feature, structure, or characteristic described in connection with the embodiment is included in at least one implementation of the invention. The appearances of the phrase "in one embodiment" in various places in the specification are not necessarily all referring to the same embodiment, nor are separate or alternative embodiments mutually exclusive of other embodiments.

Example 1

Referring to fig. 1, a first embodiment of the present invention provides a method for preparing high purity low emissivity spherical silica micropowder for 5G base station by first mixing uranium (U) in ultra-fine silica micropowder⁶⁺) Elements are dispersed in an acidic slurry, and then SiO is used₂The aerogel and adsorption purification unit carries out adsorption on the ultrafine silicon powder to finish material selection and purification, so that the total content of uranium (U) elements in the ultrafine silicon powder is reduced to 1 x 10^-9And finally obtaining the high-purity low-radioactivity spherical silicon micro powder by a flame melting method and a pollution-free post-processing technology.

The adsorption purification unit with modular design passes through SiO in the adsorption purification unit₂The aerogel can be conveniently and quickly separated from the system after adsorption is finished so as to be coated with SiO again₂Aerogel or different types of adsorption purification units are replaced; thereby realizing recycling and large-scale amplification; the obtained sample has the characteristics of high sphericity, controllable particle size distribution and the like, and has good application performance such as fluidity and the like.

The preparation method of the high-purity low-radiation spherical silicon micro powder for the 5G base station comprises the following specific steps:

the method comprises the following steps: pretreating silicon powder containing uranium (U): carrying out ultrafine grinding and selection on common silicon micropowder by adopting pollution-free grinding, grading and screening technologies, and exposing uranium (U) elements originally in particles to the surface to obtain ultrafine silicon micropowder;

step two: mixing superfine silicon powder and deionized water according to a mass ratio of 2: 1 mixing and stirring to prepare slurry;

step three: adjusting pH value of the slurry to be less than or equal to 4.5 by using an acid reagent to ensure that hexavalent uranium (U) on the surface of the powder particles⁶⁺) The elements are fully dispersed in the slurry;

step four: an adsorption purification unit with a plurality of flow channels inside and two through ends (capable of flowing and transmitting liquid) is used, and the block SiO is put in₂Aerogel (specific surface area of 400-60)0m²/g) uniformly adhering to the flow channel of the adsorption purification unit; then drying the mixture in an oven at 60 ℃ for 4 hours to ensure that the SiO is obtained₂Drying the aerogel and then blowing off incompletely adhered SiO in the flow channels₂An aerogel; thus finishing the preparation of the adsorption purification unit;

step five: pumping the slurry obtained in the step three by using a circulating water pump, enabling the slurry to pass through a flow channel of the adsorption and purification unit prepared in the step four, carrying out adsorption separation on uranium (U) elements in the slurry, and carrying out circulating adsorption for 2 hours; then separating the superfine silicon powder in the dried slurry and detecting the content of uranium (U) elements;

step six: zirconium oxide ceramic protection is added on the surfaces of all parts which are possibly contacted with the superfine silicon powder in the subsequent procedure, so that secondary pollution caused by introduction of uranium (U) element is avoided in the subsequent procedure;

step seven: putting the superfine silicon powder into a spheroidizing furnace, and controlling a temperature field (1800-2200 ℃), an airflow field (oxygen is used as a carrier gas and a combustion improver, natural gas is used as fuel gas, the ratio of the flow of the fuel gas to the flow of the combustion improver is 1.05) and a material flow (50-500 kg/h) to carry out spheroidizing treatment, so that the superfine silicon powder stays in the temperature field for 0.1-3 s under certain air pressure.

Step eight: and (3) carrying out granularity grading and compounding on the product after the sphericization, and designing corresponding granularity distribution according to different packaging requirements.

Through the steps, uranium in the silicon micropowder can be effectively separated through an acid washing method, and the separated uranium can be adsorbed to SiO in the purification unit₂The aerogel is efficiently adsorbed, so that the content (mass fraction) of uranium (U) in the superfine silicon powder is from 9.7 multiplied by 10^-9Reduced to 6X 10^-10And uranium (U) content of less than 1 x 10 can be obtained by sphericizing and designing particle size distribution^-9The spherical silicon powder with high purity and low radioactivity reduces the excessive dependence of the spherical silicon powder with high purity and low radioactivity on high-purity raw materials to a certain extent.

In addition, the silicon powder prepared by the invention has the characteristics of high sphericity, narrow and controllable particle size distribution and the like, shows ideal effects of good fluidity, low viscosity, low coarse particle content (long flash) and the like when being applied, meets the requirements of large-scale integrated circuit (LSI) packaging on high-purity low-radioactivity spherical silicon powder filler, and can be widely applied to 5G base stations due to the fact that the process technology can be used for subsequent batch production.

Example 2

Based on the preparation method in embodiment 1, this embodiment provides a system for preparing high-purity low-radiation spherical silica micropowder for a 5G base station, that is: the preparation method in example 1 can be implemented by the preparation system in this example.

As shown in fig. 1, the system for preparing high-purity low-emissivity spherical silica micropowder for a 5G base station comprises a mixing and stirring unit 100, a circulating power unit 200, an adsorption and purification unit 300 and a conveying unit 400.

The mixing and stirring unit 100 is used for mixing and stirring the ultrafine silicon powder and deionized water to prepare slurry, and adjusting the pH value in the slurry. The mixing and stirring unit 100 includes a holding mechanism 101 capable of holding the slurry and a stirring mechanism 102 extending into the holding mechanism 101, wherein the lower end of the holding mechanism 101 has a water outlet 101a, and the upper end of the holding mechanism 101 has a water inlet 101 b.

Preferably, the mixing and stirring unit 100 adopts an existing stirring tank/reaction kettle; the accommodating mechanism 101 is a tank body of the stirring tank/reaction kettle; the stirring mechanism 102 is a stirring paddle and a driving mechanism thereof of the stirring tank/reaction kettle; the water inlet connector 101b is positioned on the top of the stirring tank/reaction kettle and is communicated with the interior of the tank body; the water outlet joint 101a is positioned at the bottom of the stirring tank/reaction kettle and is communicated with the interior of the tank body.

The circulation power unit 200 is used for extracting the slurry from the mixing and stirring unit 100, continuously conveying the slurry to the adsorption and purification unit 300, and finally discharging the slurry back to the mixing and stirring unit 100 to realize circulation adsorption of the slurry. The circulating power unit 200 includes a water inlet end 201 and a water outlet end 202.

Preferably, the circulation power unit 200 employs a circulation water pump.

The main body of the adsorption purification unit 300 is a hollow cylinder structure, the two ends of which are respectively a liquid inlet K-1 and a liquid outlet K-2, and the interior of which is provided with a plurality of axially through flow channels T-1The inside of each flow channel T-1 is provided with an adsorption layer 301, and the adsorption layers 301 are used for adsorbing uranium (U) element in the slurry, preferably SiO₂Aerogel, and SiO₂The aerogel is preferably adhered to the inner side walls of the respective flow channels T-1.

The transfer unit 400 is a circulation pipe connected between the mixing and stirring unit 100, the circulation power unit 200, and the adsorption and purification unit 300.

The delivery unit 400 comprises a first pipe 401 connected between the water outlet connection 101a and the water inlet end 201, a second pipe 402 connected between the water outlet end 202 and the liquid inlet K-1, and a third pipe 403 connected between the liquid outlet K-2 and the water inlet connection 101 b.

The use mode of the system is as follows:

the method comprises the following steps: mixing superfine silicon powder and deionized water according to a mass ratio of 2: 1, mixing and putting into a mixing and stirring unit 100, and stirring by the mixing and stirring unit 100 to prepare slurry;

step two: the pH value of the slurry in the mixing and stirring unit 100 is adjusted by using an acid reagent to ensure that the pH value is less than or equal to 4.5, so that the hexavalent uranium (U) on the surface of the powder particles⁶⁺) The elements are fully dispersed in the slurry;

step three: taking an adsorption purification unit 300, and adding bulk SiO₂Aerogel (specific surface area of 400-600 m)²/g) is uniformly adhered in the flow channel T-1 of the adsorption purification unit; then drying the mixture in an oven at 60 ℃ for 4 hours to ensure that the SiO is obtained₂Drying the aerogel, and then blowing off the incompletely adhered SiO in the flow channel T-1₂An aerogel; thus finishing the preparation of the adsorption purification unit;

step four: the modular adsorption purification unit 300 is connected between the water outlet 202 of the circulation power unit 200 and the water inlet 101b of the mixing and stirring unit 100 by the transfer unit 400, while the water inlet 201 of the circulation power unit 200 is connected with the water outlet 101a of the mixing and stirring unit 100.

Step five: pumping the slurry obtained in the step two by using a circulating water pump, enabling the slurry to pass through a flow channel T-1 of the adsorption and purification unit prepared in the step three, carrying out adsorption separation on uranium (U) elements in the slurry, and carrying out circulating adsorption for 2 hours;

since the adsorption purification unit 300 is a removable modular structure, when it is necessary to replace SiO₂The release system can be easily removed for recoating SiO during aerogel coating₂Aerogel or change the adsorption purification unit of different models.

Example 3

This embodiment differs from the previous embodiment in that: the adsorption purification unit in the embodiment adopts a method which is more convenient for adhering SiO₂Aerogel modular purification unit 300.

As shown in fig. 2 to 5, the adsorption purification unit 300 includes a first connector 302 and a second connector 303 detachably connected.

The first connecting body 302 comprises a columnar reaction section 302a and a first end cover 302b integrally formed at the outer end of the reaction section 302 a; a plurality of axially through circulation channels T-1 are uniformly distributed in the reaction section 302a along the circumferential direction, and an adsorption layer 301 is arranged in each circulation channel T-1; a through liquid inlet K-1 is arranged at the center of the first end cover 302b, so that the liquid inlet K-1 is communicated with one end of each circulation channel T-1.

The second connector 303 comprises a connecting section 303a in threaded connection with the reaction section 302a and a second end cover 303b integrally formed at the outer end of the connecting section 303a, and a through liquid outlet K-2 is arranged at the center of the second end cover 303b, so that the liquid outlet K-2 is communicated with the other end of each flow channel T-1.

The connecting section 303a is an annular structure, an internal thread is arranged on the inner side wall of the connecting section 303a, a corresponding external thread is arranged on the outer side wall of the end part of the reaction section 302a, and the connecting section 303a and the reaction section 302a are detachably connected through the matching of the threads.

Further, an accommodating passage 302c is provided at the center of the first connecting body 302; an opening is formed at one end of the accommodating channel 302c corresponding to the direction of the liquid outlet K-2, a blocking plate 302d is arranged at one end corresponding to the direction of the liquid inlet K-1, the blocking plate 302d is fixed at the edge of the liquid inlet K-1 through a connecting section 302e, and a plurality of liquid passing holes 302e-1 are distributed on the connecting section 302e, so that the inner space and the outer space of the connecting section 302e are communicated.

An axially through insertion pipe 302f is inserted into the accommodating channel 302c, a limiting convex strip 302f-1 corresponding to each flow channel T-1 is distributed on the outer edge of the insertion pipe 302f, and each limiting convex strip 302f-1 extends into the corresponding flow channel T-1; the edge of each flow channel T-1 also has a notch corresponding to the retention tab 302f-1 to facilitate the retention tab 302f-1 extending from the notch into the flow channel T-1.

A C-shaped elastic plate 302g attached to the inner side wall of each flow channel T-1 is inserted into the flow channel. The C-shaped elastic plate 302g is made of elastic materials and can be elastically deformed, the C-shaped elastic plate 302g is a flat plate in a natural state, and when the C-shaped elastic plate is bent and rolled into a C shape and inserted into the corresponding flow channel T-1, a C-shaped notch formed by bending and rolling the C-shaped elastic plate 302g can be just clamped on the limiting convex strip 302f-1 extending into the flow channel T-1; the adsorption layer 103 is adhered to one side of each C-shaped elastic plate 302g, and when the C-shaped elastic plate 302g is bent into a C-shape, it is necessary to ensure that the adsorption layer 301 is located on the inner side wall of the C-shaped elastic plate 302 g.

Therefore, when the adsorption layer 301 in the flow channel T-1 needs to be replaced or re-coated, the C-shaped elastic plate 302g in the flow channel T-1 can be directly pulled out, the C-shaped elastic plate 302g can restore the natural state of a flat plate, so that the adsorption layer 301 can be conveniently coated on the surface of the adsorption layer 301, and after the adsorption layer 301 is completely coated, the adsorption layer 301 can be rolled into a C shape and then re-inserted into the flow channel T-1.

The C-shaped elastic plate 302g of the present invention has the following effects:

the carrier serving as the adsorption layer 301 can facilitate rapid arrangement/replacement of the adsorption layer 301 in the flow channel T-1, and avoids the process problem of directly coating the adsorption layer 301 on the inner side wall of the flow channel T-1;

the C-shaped elastic plate 302g has elasticity, and can be attached to the inner side wall of the flow channel T-1 due to tension when being rolled into a C shape and inserted into the flow channel T-1; and when the C-shaped elastic plate 302g is pulled out, the plate can automatically return to the flat shape, so that the coating process is convenient, and two purposes are achieved.

It should be noted that: after the C-shaped elastic plate 302g rolled into the C shape is inserted into the circulation channel T-1, a C-shaped gap formed by the C-shaped elastic plate 302g can be just clamped on the limiting convex strip 302f-1 extending into the circulation channel T-1; and the limiting convex strip 302f-1 is limited in the C-shaped notch, so that the circumferential rotation movement of the C-shaped elastic plate 302g in the flow channel T-1 can be prevented.

The inner end edge of the liquid outlet K-2 is provided with an axially through bend pipe 303c, when the first connector 302 and the second connector 303 are connected with each other, the bend pipe 303c extends into the insertion pipe 302f, and a sandwich channel T-2 is formed between the bend pipe 303c and the insertion pipe 302 f.

The plugging plate 302d of the present invention has two functions:

firstly, the cannula 302f inserted into the accommodating channel 302c is limited;

second, one end of receiving channel 302c is closed, and the path of the slurry flowing into adsorption purification unit 300 is restricted so that it flows through: a liquid inlet K-1, a liquid passing hole 302e-1, each flow channel T-1, an interlayer channel T-21, a liquid outlet K-2 inside a redirection pipe 303 c; the circulation path of the slurry in the adsorption purification unit 300 is prolonged, the contact time and the contact opportunity of the slurry and the adsorption layer 301 are increased, and the adsorption purification process is more thorough.

Further, an adsorption layer 301 is disposed on an outer side wall of the redirecting tube 303c and/or an inner side wall of the insertion tube 302 f. SiO is preferably used for the adsorption layer 301₂An aerogel.

Further, a limiting side plate 303b-1 is distributed on the inner side wall of the second end cover 303 b; when the first connector 302 and the second connector 303 are connected to each other, the outer edge of the limiting side plate 303b-1 is attached to the end of the insertion tube 302f, or to the end of each C-shaped elastic plate 302g, so as to limit the position in the axial direction and prevent the axial separation.

In summary, since the first connector 302, the second connector 303 and the C-shaped elastic plate 302g in each flow channel T-1 are all detachable, the SiO layer is formed by a detachable structure₂The coating process of the aerogel can be easily and quickly unfolded, and the overall processing and preparation efficiency is improved.

It is important to note that the construction and arrangement of the present application as shown in the various exemplary embodiments is illustrative only. Although only a few embodiments have been described in detail in this disclosure, those skilled in the art who review this disclosure will readily appreciate that many modifications are possible (e.g., variations in sizes, dimensions, structures, shapes and proportions of the various elements, values of parameters (e.g., temperatures, pressures, etc.), mounting arrangements, use of materials, colors, orientations, etc.) without materially departing from the novel teachings and advantages of the subject matter recited in this application. For example, elements shown as integrally formed may be constructed of multiple parts or elements, the position of elements may be reversed or otherwise varied, and the nature or number of discrete elements or positions may be altered or varied. Accordingly, all such modifications are intended to be included within the scope of this invention. The order or sequence of any process or method steps may be varied or re-sequenced according to alternative embodiments. In the claims, any means-plus-function clause is intended to cover the structures described herein as performing the recited function and not only structural equivalents but also equivalent structures. Other substitutions, modifications, changes and omissions may be made in the design, operating conditions and arrangement of the exemplary embodiments without departing from the scope of the present inventions. Therefore, the present invention is not limited to a particular embodiment, but extends to various modifications that nevertheless fall within the scope of the appended claims.

Moreover, in an effort to provide a concise description of the exemplary embodiments, all features of an actual implementation may not be described (i.e., those unrelated to the presently contemplated best mode of carrying out the invention, or those unrelated to enabling the invention).

It should be appreciated that in the development of any such actual implementation, as in any engineering or design project, numerous implementation-specific decisions may be made. Such a development effort might be complex and time consuming, but would nevertheless be a routine undertaking of design, fabrication, and manufacture for those of ordinary skill having the benefit of this disclosure, without undue experimentation.

It should be noted that the above-mentioned embodiments are only for illustrating the technical solutions of the present invention and not for limiting, and although the present invention has been described in detail with reference to the preferred embodiments, it should be understood by those skilled in the art that modifications or equivalent substitutions may be made on the technical solutions of the present invention without departing from the spirit and scope of the technical solutions of the present invention, which should be covered by the claims of the present invention.