Electrolyte for depositing a dark grey/black rhodium/ruthenium alloy layer
阅读说明:本技术 用于沉积深灰色/黑色铑/钌合金层的电解质 (Electrolyte for depositing a dark grey/black rhodium/ruthenium alloy layer ) 是由 P·施拉梅克 M·施特格迈尔 于 2020-04-07 设计创作,主要内容包括:本发明涉及电解质,其允许电解制备由铑和钌组成的黑色金属层。本发明还涉及制备相应制品的方法以及电解质的用途。(The invention relates to an electrolyte which allows the electrolytic production of a black metal layer consisting of rhodium and ruthenium. The invention also relates to a method for producing the corresponding article and to the use of the electrolyte.)
1. An aqueous acidic electrolyte for producing a dark colored metal layer on a conductive material, the electrolyte comprising:
-from 0.5 to 15.0g/l of a soluble rhodium compound (relative to the metal);
0.5 to 10.0g/l of a soluble ruthenium compound (relative to the metal);
-5 to 150g/l of an acid;
-phosphonic acids and dicarboxylic acids.
2. The electrolyte as set forth in claim 1,
it is characterized in that
The ruthenium is present in the electrolyte as a dinuclear complex.
3. Use of an electrolyte according to any one of claims 1 to 2 for the preparation of an article having an electrodeposited metal layer comprising, based on the sum of the weights of the two metals, the metal rhodium and ruthenium in a weight% composition of 40:60 to 90:10, the metal layer having an L of less than 65 according to the Cielab color system (en iso 11664-4, latest edition since filing date)*A value of-3 to +3*The value is obtained.
4. The use according to claim 3, wherein,
it is characterized in that
B of the metal layer*The value is between-7 and + 7.
5. The use according to claim 3 and/or 4,
it is characterized in that
The metal layer serves as a backing layer for an additional rhodium electrodeposited metal layer having a thickness of 0.05 μm to 0.5 μm.
6. The use according to claim 5, wherein,
it is characterized in that
The sequence of layersL of a column*The value is less than 50.
7. The use according to any one of claims 3 to 6,
it is characterized in that
The resulting metal layer has an abrasion resistance (in the Bosch-Weinmann test) of less than 0.75 μm/1000 stroke.
8. Method for the galvanic deposition of a metal layer on an electrically conductive material, wherein:
a) contacting the electrically conductive material as a cathode with the aqueous acidic electrolyte of any one of claims 1 or 2;
b) an anode in contact with the electrolyte; and
c) sufficient current is established between the cathode and the anode.
9. The method of claim 8, wherein the first and second light sources are selected from the group consisting of,
it is characterized in that
The current density in the electrolyte was 0.1A/dm2To 50A/dm2。
10. The method according to any one of claims 8 or 9,
it is characterized in that
The pH of the electrolyte is between 0.2 and 2.
11. The method according to any one of claims 8 to 10,
it is characterized in that
The temperature during electrolysis was between 20 ℃ and 65 ℃.
12. The method according to any one of claims 8 to 11,
it is characterized in that
Subjecting the deposited metal layer to an anodic post-treatment.