阅读说明：本技术 一种耐高压电源板的生产工艺 (Production process of high-voltage-resistant power panel ) 是由 罗方明 唐令新 赖建平 于 2019-07-31 设计创作，主要内容包括：本发明公开一种耐高压电源板的生产工艺,S1.将基板开料后进行烘烤；S2.内层芯板加工处理；S3.层压加工处理；S4.根据实际生产需求进行钻孔；S5.沉铜板电加工处理,S6.外层线路加工处理,S7.在外层线路的表面印刷阻焊层。与现有的单面板或双面板的电源板相比,本发明采用多层板的线路板生产工艺制作电源板,可以增大电源板的线路面积,从而提高电源板的耐压能力；本发明对电源板生产工艺中的参数进行调整和严格控制,保证线路的均匀性和过孔的铜厚,可以降低因线路发热而产生的应力对线路的影响,以及保证过孔的过电能力。(The invention discloses a production process of a high-voltage-resistant power panel, which comprises the following steps of S1, cutting a substrate and baking; s2, processing the inner-layer core plate; s3, carrying out lamination processing treatment; s4, drilling according to actual production requirements; s5, electro-processing a copper plate, S6, processing an outer layer circuit, and S7, printing a solder mask on the surface of the outer layer circuit. Compared with the existing power panel with a single panel or double panels, the power panel is manufactured by adopting the production process of the circuit board with the multi-layer board, so that the circuit area of the power panel can be increased, and the voltage resistance of the power panel is improved; the invention adjusts and strictly controls the parameters in the power panel production process, ensures the uniformity of the line and the copper thickness of the via hole, can reduce the influence of stress generated by the heating of the line on the line, and ensures the over-current capability of the via hole.)

1. a production process of a high-voltage-resistant power panel is characterized by comprising the following steps:

s1, cutting a substrate and baking;

s2, processing the inner-layer core plate, which comprises the following steps:

s21, carrying out micro-etching on the baked substrate, wherein the micro-etching amount is 0.8-1.5 um;

s22, pasting a film on the substrate subjected to the microetching, wherein the temperature of the pasting film is 115 +/-5 ℃, and the pressure of the pasting film is 3.5-4.5 kg/cm²the film sticking speed is 1.5-2.0 m/min;

s23, exposing the substrate after film pasting by using a CCD exposure machine, wherein the exposed film size and the loose-leaf binder alignment degree are +/-1 mil, the exposure energy uniformity is more than 80%, an exposure ruler is 6-7 levels, and etching treatment is carried out on the exposed substrate;

s3, laminating processing treatment, which comprises the following steps:

S31, performing browning treatment on the inner-layer core plate, wherein the conductivity of deionized water adopted in the browning process is less than or equal to 2 us/cm;

S32, stacking the copper foil, the prepreg and the inner core board, and then sending the stacked copper foil, prepreg and inner core board into a riveting machine for hot melting and riveting;

s4, drilling according to actual production requirements;

S5, electro-processing treatment of the copper deposition plate, which comprises the following steps:

S51, baking the laminated core plate for more than 2 hours at the temperature of 150 +/-5 ℃;

s52, chemical copper deposition, wherein the alkali equivalent of bulking treatment is 0.12-0.17N, the alkali equivalent of degumming slag treatment is 1.2-1.3N, and KMmO₄has an equivalent weight of 40 to 65g/L, K₂MmO₄the equivalent weight is less than or equal to 25 g/L;

S53, carrying out whole-plate electroplating twice at a current density of 11ASF (alternating current) for 90min, wherein the current deviation is +/-5%;

s6, outer layer line processing comprises the following steps:

s61, pretreatment, namely carrying out acid pickling on the core plate with the thickness of the grinding plate, wherein the acid pickling has the sulfuric acid concentration of 3-5% and the sodium persulfate content of 20-40 g/L;

s62, pasting a film on the pretreated core plate, wherein the temperature of the pasting film is 115 +/-5 ℃, and the pressure of the pasting film is 4.0-5.0 kg/cm²the film sticking speed is 1.0-1.3 m/min;

s63, exposing the plate with the film by using a CCD (charge coupled device) exposure machine, developing the exposed core plate, wherein the size of an exposed film is +/-1 mil, the uniformity of exposure energy is more than 80%, and the exposure ruler is 6-7 grades;

and S7, printing a solder mask layer on the surface of the outer layer circuit.

2. the production process of the high voltage resistant power panel according to claim 1, characterized in that: step S22 is that the inner layer circuit is compensated integrally before film pasting, the compensation value is 0.13mm, and the minimum width of the circuit is more than or equal to 0.25 mm.

3. The production process of the high voltage resistant power panel according to claim 1, characterized in that: the substrate of step S1 was made of FR4 plate material with Tg of 170 ℃ and copper thickness of 3Oz on both sides.

4. the production process of the high voltage resistant power panel according to claim 3, characterized in that: the baking temperature of the substrate in the step S1 is 150 +/-5 ℃, and the baking time is more than 4 hours.

5. the process for producing a high voltage power supply board according to claim 1, wherein the cleaning frequency of the exposure in the steps S23 and S63 is once per board cleaning.

Technical Field

the invention relates to the technical field of circuit board production, in particular to a production process of a high-voltage-resistant power panel.

Background

the conventional power panel is generally a single-sided panel or a double-sided panel, and the withstand voltage value thereof is generally below 1 KV. When the power panel is powered on with high voltage, the circuit of the power panel generates large heat, especially via holes between layers. In addition, the common plate of the current power panel is CEM-3, which has poor heat resistance and is easy to deform under high-voltage current, thereby causing circuit fracture and seriously reducing the safety performance of the power panel.

disclosure of Invention

Aiming at the defects of the prior art, the invention provides a production process of a high-voltage-resistant power panel, which is used for solving the problem of poor performance of the conventional power panel when the high voltage is applied.

The invention comprises the following contents:

A production process of a high-voltage-resistant power panel comprises the following steps:

s1, cutting a substrate and baking;

S2, processing the inner-layer core plate, which comprises the following steps:

s21, carrying out micro-etching on the baked substrate, wherein the micro-etching amount is 0.8-1.5 um;

S22, pasting a film on the substrate subjected to the microetching, wherein the temperature of the pasting film is 115 +/-5 ℃, and the pressure of the pasting film is 3.5-4.5 kg/cm²the film sticking speed is 1.5-2.0 m/min;

s23, exposing the substrate after film pasting by using a CCD exposure machine, wherein the exposed film size and the loose-leaf binder alignment degree are +/-1 mil, the exposure energy uniformity is more than 80%, an exposure ruler is 6-7 levels, and etching treatment is carried out on the exposed substrate;

S3, laminating processing treatment, which comprises the following steps:

S31, performing browning treatment on the inner-layer core plate, wherein the conductivity of deionized water adopted in the browning process is less than or equal to 2 us/cm;

s32, stacking the copper foil, the prepreg and the inner core board, and then sending the stacked copper foil, prepreg and inner core board into a riveting machine for hot melting and riveting;

s4, drilling according to actual production requirements;

s5, electro-processing treatment of the copper deposition plate, which comprises the following steps:

S51, baking the laminated core plate for more than 2 hours at the temperature of 150 +/-5 ℃;

S52, chemical copper deposition, wherein the alkali equivalent of bulking treatment is 0.12-0.17N, the alkali equivalent of degumming slag treatment is 1.2-1.3N, and KMmO₄equivalent of (c) is 40 ℃65g/L，K₂MmO₄the equivalent weight is less than or equal to 25 g/L;

s53, carrying out whole-plate electroplating twice at a current density of 11ASF (alternating current) for 90min, wherein the current deviation is +/-5%;

S6, outer layer line processing comprises the following steps:

S61, pretreatment, namely carrying out acid pickling on the core plate with the thickness of the grinding plate, wherein the acid pickling has the sulfuric acid concentration of 3-5% and the sodium persulfate content of 20-40 g/L;

s62, pasting a film on the pretreated core plate, wherein the temperature of the pasting film is 115 +/-5 ℃, and the pressure of the pasting film is 4.0-5.0 kg/cm²the film sticking speed is 1.0-1.3 m/min;

s63, exposing the plate with the film by using a CCD (charge coupled device) exposure machine, developing the exposed core plate, wherein the size of an exposed film is +/-1 mil, the uniformity of exposure energy is more than 80%, and an exposure ruler is 6-7 grades;

and S7, printing a solder mask layer on the surface of the outer layer circuit.

preferably, step S22 further includes performing circuit overall compensation on the inner layer circuit before the film is attached, where the compensation value is 0.13mm, and the minimum width of the circuit is greater than or equal to 0.25 mm.

preferably, the substrate of step S1 is FR4 plate material with Tg of 170 ℃ and copper thickness of 3Oz on both sides.

preferably, the baking temperature of the substrate in step S1 is 150 ± 5 ℃, and the baking time is 4 hours or more.

Preferably, the cleaning frequency of the exposure in step S23 and step S63 is once per plate cleaning.

the invention has the beneficial effects that: compared with the existing power panel with a single panel or double panels, the power panel is manufactured by adopting the production process of the circuit board of the multilayer board, so that the circuit area of the power panel can be increased, and the voltage resistance of the power panel is improved; the invention adjusts and strictly controls the parameters in the power panel production process, ensures the uniformity of the line and the copper thickness of the via hole, can reduce the influence of stress generated by the line heating on the line, and ensures the over-current capability of the via hole.

Detailed Description

the foregoing description is only an overview of the technical solutions of the present invention, and in order to make the technical means of the present invention more clearly understood, the present invention may be implemented in accordance with the content of the specification, and in order to make the above and other objects, features, and advantages of the present invention more apparent, the following specific examples are given as preferred embodiments, and the detailed description is given below.

The production process of the high-voltage-resistant power panel disclosed by the embodiment comprises the following steps:

s1, cutting a substrate and baking, wherein the substrate is made of an FR4 board, and compared with a CEM-3 board, the FR4 board is lower in thermal expansion coefficient and higher in bending strength and is more suitable for manufacturing a multilayer board, the Tg value of the substrate is 170 ℃, the mechanical strength and dimensional stability of the high-Tg substrate in a thermal state are better than those of a common substrate, the requirement of thermal stability of a power panel under high pressure is met, the thickness of copper on two sides of the substrate is 3Oz (ampere), the baking temperature of the substrate is 150 +/-5 ℃, the baking time is more than 4 hours, the internal stress of the substrate can be effectively eliminated, and the substrate is prevented from deforming;

s2, processing the inner-layer core plate, which comprises the following steps:

s21, microetching the baked substrate, wherein the microetching amount is 0.8-1.5 um, so that the adverse effect of grease or dust on the surface of the inner core plate on the film can be avoided, the inner core plate is enabled to form a rough surface, and the combination of the inner core plate and a dry film is facilitated;

S22, pasting a film on the substrate subjected to the microetching, wherein the dry film pasting is adopted in the embodiment, the temperature of the pasting is 115 +/-5 ℃, and the pressure of the pasting is 3.5-4.5 kg/cm²The film pasting speed is 1.5-2.0 m/min, so that the dry film is ensured to be in good contact with the substrate, and an air gap is avoided between the dry film and the substrate;

s23, exposing the substrate after film pasting by using a CCD (charge coupled device) exposure machine, wherein the exposed film size and the loose-leaf binder alignment degree are +/-1 mil (thousandth of an inch), the exposure energy uniformity is over 80 percent, an exposure ruler is 6-7 grades, and etching treatment is carried out on the exposed substrate;

S3, laminating processing treatment, which comprises the following steps:

S31, performing browning treatment on the inner-layer core plate, wherein the conductivity of deionized water adopted in the browning process is less than or equal to 2us/cm (microsiemens per centimeter), so that poor browning caused by overhigh chloride ion content in the browning process is avoided;

S32, stacking the copper foil, the prepreg and the inner core board, and then sending the stacked copper foil, the prepreg and the inner core board into a riveting machine for hot melting riveting, wherein the copper foil adopts a 2Oz copper foil, the Tg value of the prepreg is 170 ℃, and referring to Table 1, the Table 1 shows a laminated structure information table of an eight-layer power supply board:

TABLE 1

The thickness after lamination is 3.2 +/-0.13 mm, and compared with the existing power panel with a single panel or double panels, the power panel manufactured by adopting the multi-layer circuit board production process can increase the circuit area of the power panel, thereby improving the voltage resistance of the power panel.

s4, drilling according to actual production requirements;

S5, electro-processing treatment of the copper deposition plate, which comprises the following steps:

s51, baking the laminated core plate for more than 2 hours at the temperature of 150 +/-5 ℃, so that the internal stress of the core plate can be eliminated, and the core plate is prevented from deforming in the processing process;

s52, chemical copper deposition, which comprises the following steps:

a. the grinding plate is used for removing burrs of the hole and cleaning dust in the hole;

b. the degumming slag comprises bulking treatment, degumming slag treatment and neutralization, wherein the alkali equivalent of the bulking treatment is 0.12-0.17N (equivalent concentration), so that the epoxy resin in the bulking holes can be effectively softened, the bonding energy of the polymer on the core plate is reduced, and the degumming is facilitated; the alkali equivalent weight of the degumming residue treatment is 1.2-1.3N, and KMmO₄Has an equivalent weight of 40 to 65g/L, K₂MmO₄The equivalent weight is less than or equal to 25g/L, the glue residue in the hole can be effectively removed, the uniformity of copper deposition in the hole is ensured, and the loss of large current caused by the non-uniform hole copper is reduced;

c. Chemical copper deposition;

s53, carrying out whole-plate electroplating twice at a current density of 11ASF (alternating current) for 90min, wherein the current deviation is +/-5%, and in order to improve the uniformity of whole-plate electroplating, inverting the hanging plate for the inner-layer core plate during the second whole-plate electroplating, wherein the ASF is ampere per square meter;

S6, outer layer line processing comprises the following steps:

S61, pretreatment, namely carrying out acid pickling on the core plate with the thickness of the grinding plate, wherein the acid pickling has the sulfuric acid concentration of 3-5% and the sodium persulfate content of 20-40 g/L;

s62, pasting a film on the pretreated core plate, wherein the temperature of the pasting film is 115 +/-5 ℃, and the pressure of the pasting film is 4.0-5.0 kg/cm²The film sticking speed is 1.0-1.3 m/min;

S63, exposing the plate with the film by using a CCD (charge coupled device) exposure machine, developing the exposed core plate, wherein the size of an exposed film is +/-1 mil, the uniformity of exposure energy is more than 80%, and an exposure ruler is 6-7 grades;

And S7, printing a solder mask layer on the surface of the outer layer circuit.

In step S22, before the film is attached, the method further includes performing line integral compensation on the inner layer line, where the compensation value is 0.13mm, and the minimum width of the line is greater than or equal to 0.25mm, so as to ensure that the line width of the finished product meets the requirement of the power panel on the high-voltage condition.

the cleaning frequency of the exposure in the step S23 and the step S63 is once per board cleaning, so that the cleanness of the surface of the core board can be ensured, the uneven or gap of the circuit caused by poor exposure can be avoided, and the high-voltage performance of the power panel is reduced.

The above description is only a preferred embodiment of the present invention, and the present invention is not limited to the above embodiment, and the present invention shall fall within the protection scope of the present invention as long as the technical effects of the present invention are achieved by the same means. The invention is capable of other modifications and variations in its technical solution and/or its implementation, within the scope of protection of the invention.