阅读说明：本技术 一种真空蒸镀系统及真空蒸镀方法 (Vacuum evaporation system and vacuum evaporation method ) 是由 梁丰 牛晶华 戴铭志 李巍 于 2020-05-20 设计创作，主要内容包括：本申请公开一种真空蒸镀系统及真空蒸镀方法,涉及蒸镀领域,包括：移动载台,移动载台上设置有M个蒸发源和M个角度限制单元,角度限制单元包括第一开口,蒸镀材料的蒸镀范围由第一开口限定；信号发射单元向蒸镀范围内发射第一红外信号,第一红外信号经过蒸镀材料后形成第二红外信号；信号探测单元接收第二红外信号,通过第二红外信号分析蒸镀范围内所包含的蒸镀材料；当蒸镀范围内包含N种蒸镀材料时,第一驱动单元驱动角度限制单元运动,调节蒸镀范围,其中N为小于M的整数。本申请通过第一驱动单元驱动角度限制单元运动,调节各种蒸镀材料的蒸镀范围,使得多种蒸镀材料在蒸镀面上完全重合,避免出现超薄层,从而提高器件性能和产品良率。(The application discloses vacuum evaporation system and vacuum evaporation method relates to the evaporation coating field, includes: the evaporation device comprises a movable carrying platform, wherein M evaporation sources and M angle limiting units are arranged on the movable carrying platform, each angle limiting unit comprises a first opening, and the evaporation range of evaporation materials is limited by the first opening; the signal transmitting unit transmits a first infrared signal to the evaporation coating range, and the first infrared signal forms a second infrared signal after passing through the evaporation coating material; the signal detection unit receives the second infrared signal and analyzes the evaporation material contained in the evaporation range through the second infrared signal; when N evaporation materials are contained in the evaporation range, the first driving unit drives the angle limiting unit to move, and the evaporation range is adjusted, wherein N is an integer smaller than M. This application limits the unit motion through first drive unit drive angle, adjusts various coating by vaporization materials's coating by vaporization scope for multiple coating by vaporization material coincides completely on the face of evaporating, avoids appearing the ultrathin layer, thereby improves device performance and product yield.)

1. A vacuum evaporation system, comprising:

the vapor deposition substrate comprises a vapor deposition surface;

the evaporation device comprises a movable carrying platform, wherein M evaporation sources and M angle limiting units are arranged on the movable carrying platform, M is an integer greater than or equal to 2, and the evaporation surface is the surface of the evaporation substrate close to the evaporation sources; the evaporation source comprises evaporation materials, and the evaporation materials contained in different evaporation sources are different; the angle limiting unit comprises a first opening, and the first opening is positioned between the evaporation source and the evaporation substrate in a direction perpendicular to the plane of the evaporation substrate; the evaporation range of the evaporation material on the evaporation substrate is limited by the first opening;

the signal transmitting unit transmits a first infrared signal to the evaporation coating range, and the first infrared signal forms a second infrared signal after passing through an evaporation coating material;

at least one signal detection unit, wherein the signal detection unit receives the second infrared signal and analyzes the evaporation material contained in the evaporation range through the second infrared signal;

the first driving unit is electrically connected with the angle limiting unit, and when N evaporation materials are contained in the evaporation range, the angle limiting unit is driven to move through the first driving unit to adjust the evaporation range, wherein N is an integer smaller than M.

2. A vacuum evaporation system according to claim 1, further comprising:

and the second driving unit is electrically connected with the movable carrier and drives the movable carrier to move along a first direction.

3. A vacuum evaporation system according to claim 2, further comprising:

the position sensor is positioned on one side of the evaporation substrate, which is far away from the moving carrier;

the position sensor detects the position of the first infrared signal on the plane of the evaporation substrate.

4. The vacuum evaporation system according to claim 1, wherein the angle limiting unit comprises a bottom part, two side parts and at least one angle limiting part, and an orthographic projection of the angle limiting part on a plane of the bottom part is positioned in a range limited by the bottom part; the first driving unit drives the angle limiting part and/or the side part to move to adjust the evaporation range.

5. A vacuum evaporation system according to claim 1, further comprising:

the mask plate is positioned on the evaporation surface of the evaporation substrate; the mask plate comprises a plurality of second openings, and the evaporation materials are deposited at the positions of the second openings.

6. A vacuum evaporation system according to claim 1, further comprising:

the supporting mechanism is fixed in the vacuum evaporation system and is positioned on one side, close to the moving carrier, of the mask plate; the supporting mechanism comprises a hollow part and a supporting part surrounding the hollow part, and the orthographic projection of the hollow part on the plane of the supporting mechanism is positioned in a range limited by the orthographic projection of the mask plate on the plane of the supporting mechanism; the supporting part is used for supporting the mask plate.

7. A vacuum evaporation system according to claim 6,

the signal emission unit comprises a first signal emission unit and a second signal emission unit, and the first signal emission unit and the second signal emission unit are positioned on one side of the evaporation substrate close to the moving carrier; along a first direction, the first signal transmitting unit and the second signal transmitting unit are respectively positioned at two opposite sides of the mobile carrying platform.

8. A vacuum evaporation system according to claim 7,

the signal detection unit comprises a first signal detection unit and a second signal detection unit, and the first signal detection unit and the second signal detection unit are positioned on one side of the evaporation substrate close to the moving carrier; along a first direction, the first signal detection unit and the second signal detection unit are respectively positioned at two opposite sides of the mobile carrier.

9. A vacuum evaporation system according to claim 8, further comprising:

the first reflection unit and the second reflection unit are fixed on the surface, close to the moving carrier, of the support part; in a first direction, the first reflection unit and the second reflection unit are respectively positioned at two opposite sides of the hollowed part;

the first reflection unit comprises a first reflection surface, and the first signal emission unit and the first signal detection unit are both positioned on one side of the first reflection surface, which is far away from the evaporation substrate;

the second reflection unit comprises a second reflection surface, and the second signal emission unit and the second signal detection unit are both positioned on one side of the second reflection surface, which is far away from the evaporation substrate.

10. A vacuum evaporation system according to claim 9, further comprising:

the orthographic projection of the first reflecting baffle on the plane where the first reflecting surface is located covers the first reflecting surface; the orthographic projection of the second reflecting baffle on the plane of the second reflecting surface covers the second reflecting surface.

11. A vacuum evaporation system according to claim 1,

the evaporation material is at least one of a metal material, an organic material or an inorganic material.

12. The vacuum evaporation system of claim 1, wherein the first driving unit is a stepper motor.

13. A vacuum evaporation method is characterized by comprising the following steps:

providing an evaporation substrate, wherein the evaporation substrate comprises an evaporation surface;

providing a movable carrier, and arranging M evaporation sources and M angle limiting units on the movable carrier, wherein M is an integer greater than or equal to 2, and the evaporation surface is the surface of the evaporation substrate close to the evaporation sources; the evaporation source comprises evaporation materials, and the evaporation materials contained in different evaporation sources are different; the angle limiting unit comprises a first opening, and the first opening is positioned between the evaporation source and the evaporation substrate in a direction perpendicular to the plane of the evaporation substrate; the evaporation range of the evaporation material on the evaporation substrate is limited by the first opening;

arranging at least one signal transmitting unit, wherein the signal transmitting unit transmits a first infrared signal, and the first infrared signal forms a second infrared signal after passing through the evaporation material;

arranging at least one signal detection unit, wherein the signal detection unit receives the second infrared signal and analyzes the evaporation materials contained in the evaporation range through the second infrared signal;

and a first driving unit is arranged and electrically connected with the angle limiting unit, and when the evaporation range contains N evaporation materials, the first driving unit drives the angle limiting unit to move to adjust the evaporation range, wherein N is an integer less than M.

14. The vapor deposition method according to claim 13, further comprising: arranging a position sensor on one side of the evaporation substrate, which is far away from the moving carrier;

the position sensor detects the position of the first infrared signal on the plane where the evaporation substrate is located, and sends the detected position information to the signal transmitting unit, and the signal transmitting unit adjusts the transmitting angle according to the position information, specifically:

if the position of the first infrared signal on the plane of the evaporation substrate does not contain evaporation materials or contains M evaporation materials, the signal transmitting unit adjusts the transmitting angle to enable the first infrared signal to be transmitted to one side edge of the evaporation substrate close to the transmitting unit.

15. The vapor deposition method according to claim 14, further comprising:

and a reflection unit is arranged and comprises a reflection surface, when the signal emission unit adjusts the emission angle, the reflection unit adjusts the reflection angle, and the signal detection unit receives a second infrared signal reflected by the reflection surface.