Novel anode layer ion source
阅读说明:本技术 一种新型阳极层离子源 (Novel anode layer ion source ) 是由 吴忠振 余浩洋 崔岁寒 刘亮亮 吴忠灿 于 2019-11-07 设计创作,主要内容包括:本发明提供一种新型阳极层离子源,包括位于轴心位置的内阴极,环绕在所述内阴极外侧的外阴极,所述内阴极和所述外阴极之间的间隙为离子束流通道;均匀排列在内阴极与外阴极之间的永磁体;位于所述内阴极和所述外阴极之间且环绕所述内阴极的阳极环,开设在所述阳极环内的通气孔,开设在所述阳极环上且连通所述通气孔的通气狭缝,所述通气狭缝朝向所述离子束流通道。通过改变离子源的通气方式,减少工作气体与阳极接触,从而降低工作气体对阳极造成污染和附着物吹出造成对沉积涂层的污染。(The invention provides a novel anode layer ion source, which comprises an inner cathode positioned at an axis position and an outer cathode surrounding the outer side of the inner cathode, wherein a gap between the inner cathode and the outer cathode is an ion beam flow channel; permanent magnets uniformly arranged between the inner cathode and the outer cathode; the ion beam current path comprises an anode ring, a vent hole and a vent slit, wherein the anode ring is positioned between the inner cathode and the outer cathode and surrounds the inner cathode, the vent hole is formed in the anode ring, the vent slit is formed in the anode ring and communicated with the vent hole, and the vent slit faces the ion beam current path. By changing the ventilation mode of the ion source, the contact between the working gas and the anode is reduced, so that the pollution of the working gas to the anode and the pollution of the deposited coating caused by the blowout of attachments are reduced.)
1. A novel anode layer ion source, comprising:
the inner cathode is positioned at the axis position, the outer cathode surrounds the outer side of the inner cathode, and a gap between the inner cathode and the outer cathode is an ion beam flow channel;
permanent magnets uniformly arranged between the inner cathode and the outer cathode;
the ion beam current path comprises an anode ring, a vent hole and a vent slit, wherein the anode ring is positioned between the inner cathode and the outer cathode and surrounds the inner cathode, the vent hole is formed in the anode ring, the vent slit is formed in the anode ring and communicated with the vent hole, and the vent slit faces the ion beam current path.
2. The novel anode layer ion source of claim 1, wherein the anode ring is provided with an anode chamfer at an inner edge of one end facing the ion beam flow channel, and the vent slit is located at an intersection of an end face of the anode ring facing the ion beam flow channel and the anode chamfer edge.
3. The anode layer ion source of claim 2, wherein the magnetic pole pieces of the inner cathode have a cathode chamfer formed at an edge facing the anode chamfer, the cathode chamfer being parallel to the anode chamfer.
4. The anode layer ion source according to claim 1, wherein a gas homogenizing chamber is arranged inside the anode, the gas homogenizing chamber is communicated with the vent hole and the vent slit, a gas homogenizing plate is arranged in the gas homogenizing chamber, and a gas homogenizing hole is arranged on the gas homogenizing plate.
5. The novel anode layer ion source of claim 4, wherein the uniform pore diameter near the vent hole location is smaller than the uniform pore diameter far from the vent hole location.
6. The anode layer ion source of claim 1, wherein two vent tubes are connected to the anode ring, and wherein the vent tubes are arranged symmetrically along the axis of the ion source.
7. The novel anode layer ion source according to claim 1, wherein the width of the vent slit is 0.5-1.5 mm.
8. The anode layer ion source of claim 1, wherein said anode ring is made of an electrically and magnetically non-conductive material; the inner cathode and the outer cathode are both made of magnetic materials.
9. The anode layer ion source of claim 1, wherein the permanent magnet is a cylindrical permanent magnet or electromagnet, one end of the permanent magnet abuts against the lower surface of the outer cathode, and the other end of the permanent magnet is connected with the magnetic yoke of the inner cathode.
10. The anode layer ion source of any one of claims 1 to 9, further comprising a bottom plate, a permanent magnet mounting bracket disposed above the bottom plate and coaxial with the inner cathode, a height limiting pillar disposed below the anode ring, wherein the vent hole penetrates the height limiting pillar and extends through the bottom plate, and a sealing assembly is disposed at a position where the vent hole penetrates the bottom plate.
Technical Field
The invention relates to the field of vacuum coating equipment, in particular to a novel anode layer ion source.
Background
An anode layer ion source is generally used in a PECVD (plasma enhanced chemical vapor deposition) reaction, and is used to ionize an inert gas such as argon to form an ion flow to be injected into a reaction vacuum chamber during the deposition of a diamond-like carbon film (DLC), and increase the ionization rate of the deposition reaction gas (acetylene), thereby increasing the proportion and deposition rate of SP3 in the DLC coating, thereby improving the quality of the deposited film and shortening the deposition time.
The existing anode layer ion source comprises an inner cathode, wherein the inner cathode is a circular disc with a chamfer, the part of the inner cathode with the chamfer is a magnetic pole shoe, an outer cathode is arranged on the outer ring of the inner cathode, an annular anode is arranged below the inner cathode and the outer cathode, a permanent magnet is arranged around the periphery below the outer cathode, and a magnetic yoke is formed by the permanent magnet and the inner cathode. When a positive voltage is applied to the anode and the inner cathode and the outer cathode are grounded, an electric field is formed between the anode and the cathode, thereby forming an orthogonal electric field and a magnetic field. The coupling of the electromagnetic field affects the motion of the charged particles in the plasma, and in particular, the electrons are most affected. The electromagnetic field acts to limit the movement of electrons, prolong the movement track of the electrons, and make the electrons confined in the annular range between the inner cathode and the outer cathode to do spinning wheel drifting movement in the range, so that the electrons are just like to be trapped on the annular runway and only drift on the annular closed runway in a cycle.
A large number of electrons drift on a 'runway' to form an annular high-density electron cloud, and when gas is injected onto the annular runway with the drift electron cloud, the probability of collision of inert gas molecules and the electrons is greatly increased, so that the inert gas molecules can be efficiently ionized. Meanwhile, the existence of the annular high-density electron cloud enables an anode layer with high potential gradient to be formed on the surface of the anode plate, and after the inert gas is ionized in the annular electron cloud, the inert gas is immediately pushed by the high potential gradient and is emitted along the normal direction of the surface of the anode plate, so that the inert gas becomes the required high-energy charged positive ions.
As shown in fig. 7, in the conventional ion source, a working gas is introduced into the bottom of the ion source, and a path of the working gas passes through the outer surface of the anode, so that the working gas is deposited on the surface of the anode under the action of plasma and heat to form contamination, and loose attachments deposited on the surface of the anode are blown out by subsequent gas flow to form large particle contamination on the coating.
Accordingly, the prior art is yet to be improved and developed.
Disclosure of Invention
The present invention provides a novel anode layer ion source, which reduces the contact between the working gas and the anode by changing the ventilation mode of the ion source, thereby reducing the pollution of the working gas to the anode surface and the coating pollution caused by the blown-out pollutant, and improving the working life of the ion source and the quality of the deposited coating.
The technical scheme adopted by the invention for solving the technical problem is as follows:
a novel anode layer ion source, comprising:
the inner cathode is positioned at the axis position, the outer cathode surrounds the outer side of the inner cathode, and a gap between the inner cathode and the outer cathode is an ion beam flow channel;
permanent magnets which are uniformly arranged between the outer cathode and the inner cathode and are positioned on the periphery below the outer cathode;
the ion beam current path comprises an anode ring, a vent hole and a vent slit, wherein the anode ring is positioned between the inner cathode and the outer cathode and surrounds the inner cathode, the vent hole is formed in the anode ring, the vent slit is formed in the anode ring and communicated with the vent hole, and the direction of the vent slit faces the ion beam current path.
Further, an anode chamfer is arranged at the edge of the inner side of one end, facing the ion beam flow channel, of the anode ring, and the ventilation slit is located at the intersection of the end face, facing the ion beam flow channel, of the anode ring and the anode chamfer edge.
Furthermore, a cathode chamfer is formed at the edge of one end, facing the anode chamfer, of the magnetic pole shoe of the inner cathode, and the cathode chamfer is parallel to the anode chamfer.
Further, an air homogenizing chamber is arranged inside the anode and is communicated with the vent hole and the vent slit, an air homogenizing plate is arranged in the air homogenizing chamber, and air homogenizing holes are formed in the air homogenizing plate.
Further, the diameter of the uniform air hole close to the position of the vent hole is smaller than that of the uniform air hole far away from the position of the vent hole.
Furthermore, the anode ring is connected with two vent pipes, the vent holes are formed in the vent pipes, and the two vent pipes are symmetrically arranged along the axis of the ion source.
Furthermore, the width of the ventilation slit is 0.5-1.5 mm.
Further, the anode ring is a strip-shaped annular body or a circular annular body made of an electric conducting and non-magnetic conducting material, and the inner cathode and the outer cathode are made of magnetic conducting materials.
Further, the permanent magnet is a columnar permanent magnet or electromagnet, one end of the permanent magnet abuts against the lower surface of the outer cathode, and the other end of the permanent magnet is connected with the magnetic yoke of the inner cathode.
Further, still including the bottom plate, set up bottom plate top and with the coaxial permanent magnet mounting bracket of interior negative pole is located anode ring below and with the coaxial limit for height post of air vent, anode ring's air vent link up limit for height post and extend and link up the bottom plate is located the air vent link up be provided with seal assembly in the position of bottom plate.
The beneficial effect who adopts above-mentioned scheme is: the invention provides a novel anode layer ion source. Working gas is directly discharged through the vent holes in the anode ring, the working gas is uniformly ejected to the electromagnetic coupling area through the vent slits, the working gas is directly ejected from the outer surface of the anode ring, a small part of the working gas is in contact with the surface of the anode ring close to the inner cathode side, and most of the working gas enters the electromagnetic coupling area for ionization treatment. The pollution of active gas to an anode ring, an inner cathode and other parts of the ion source in the process of coating the anode layer ion source and the pollution of a coating caused by blowing out of pollutants which are not firmly bonded are reduced. Meanwhile, the uniformity and cleanliness of the ion beam in the processes of processing, heating, cleaning, etching, sputtering, ion implantation and the like can be effectively improved.
Drawings
Fig. 1 is a cross-sectional view of a snorkel position of an embodiment of a novel anode layer ion source of the present invention.
Fig. 2 is an enlarged view of a portion a of fig. 1.
Fig. 3 is a cross-sectional view of the position of the inlet tube of a novel anode layer ion source embodiment of the present invention.
Fig. 4 is a top view of a gas distribution plate in an embodiment of a novel anode layer ion source of the present invention.
Fig. 5 is a magnetic field profile for an embodiment of a novel anode layer ion source of the present invention.
Fig. 6 is a gas flow diagram for a novel embodiment of an anode layer ion source of the present invention.
Fig. 7 is a gas flow diagram of the prior art.
Fig. 8 is a top view of an inner cathode in an embodiment of a novel anode layer ion source of the present invention.
Fig. 9 is a top view of an outer cathode in an embodiment of a novel anode layer ion source of the present invention.
Fig. 10 is a top view of an anode ring in an embodiment of a novel anode layer ion source of the present invention.
In the figure: 100. an inner cathode; 110. chamfering the inner cathode; 200. an outer cathode; 210. an ion beam flow path; 300. a permanent magnet; 400. an anode ring; 410. chamfering the anode; 420. a breather pipe; 430. a vent hole; 440. a vent slit; 500. an air homogenizing chamber; 510. a gas homogenizing plate; 520. air homogenizing holes; 600. a base plate; 610. a permanent magnet mounting rack; 620. a height limiting column; 700. a seal assembly; 800. an ion source housing; 900. a water inlet pipe; 910. and (5) discharging a water pipe.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention clearer and clearer, the present invention is further described in detail below with reference to the accompanying drawings and examples. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
As shown in fig. 1 and fig. 2, the present embodiment provides a novel anode layer ion source, which is arranged in an axisymmetric manner, and includes an
In this embodiment, as shown in fig. 1 and 5, a closed magnetic circuit is formed by the
As shown in fig. 1 and 2, an
The edge of one end of the magnetic pole piece of the
The
As shown in fig. 3 and 4, among the air uniforming holes 520 on the
As shown in fig. 4, the anode ring is further connected with a
The novel anode layer ion source in the scheme further comprises a bottom plate 600, wherein the bottom plate 600 is disc-shaped, the inner cathode 100 is coaxially and fixedly arranged in the middle of the bottom plate 600, a permanent magnet mounting frame 610 is arranged above the bottom plate 600, the permanent magnet mounting frame 610 and the inner cathode 100 are coaxially arranged, the permanent magnet 300 is arranged on the permanent magnet mounting frame 610 and is positioned above the bottom plate, a height limiting column 620 is arranged below the lower surface of the anode and coaxially with the water inlet pipe 900, the water outlet pipe 910 and the vent pipe, the vent pipe 420, the water inlet pipe 900 and the water outlet pipe 910 are communicated with the height limiting column 620 and extend to communicate with the bottom plate 600, the height limiting column 620 enables the inner cathode 100 to be spaced apart from the anode ring 400, a sealing assembly 700 is arranged at the position where the water inlet pipe 900, the water outlet pipe 910 and the vent pipe 420 are communicated with the bottom, The gap between the water outlet pipe 910 and the bottom plate 600 is provided with the ion source shell 800 on the bottom plate 600, the ion source shell 800 is sleeved on the outer side of the permanent magnet mounting frame 610, and the upper part of the ion source shell 800 is sleeved on the outer side of the outer cathode 200. The novel anode layer ion source is preferably of an axisymmetric structure formed about a central axis, and the symmetric structure has uniform overall magnetic field distribution, simple structure and easy processing.
In summary, the present invention provides a novel anode layer ion source, wherein the working gas is directly discharged through the vent holes 430 in the
In summary, the structure of the anode layer ion source satisfying the principle should be within the scope of the present patent application, and is not affected by the size and position of the gas outlet, the material, size, shape and other deformation structure of other parts of the ion source.
It is to be understood that the invention is not limited to the examples described above, but that modifications and variations may be effected thereto by those of ordinary skill in the art in light of the foregoing description, and that all such modifications and variations are intended to be within the scope of the invention as defined by the appended claims.
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