阅读说明：本技术 一种改善物理气相沉积金属氮化物薄膜方阻均匀性的装置 (Device for improving sheet resistance uniformity of physical vapor deposition metal nitride film ) 是由 罗正勇 金補哲 林保璋 于 2021-09-16 设计创作，主要内容包括：本发明公开了一种改善物理气相沉积金属氮化物薄膜方阻均匀性的装置,包括腔体组件,腔体组件周侧设置安装有冷泵,冷泵底端设置安装有高度调节组件,高度调节组件内设置安装有卡合组件,高度调节组件后方设置安装有高度限位组件,腔体组件包括腔壳,腔壳顶端设置有与腔壳卡合连接的腔壳顶盖,腔壳外侧固定安装有进气口。本发明通过设置有两个进气口,使得工艺气体Ar和N2在腔体中保持均匀分布,沉积出的金属氮化薄膜方阻均匀性最优,通过设置有高度调节组件和高度限位组件,可以调节冷泵的打开程度,从而控制腔体压力,优化工艺在腔体中分布的均匀性,这样便提高了金属氮化物薄膜方阻均匀性,提高产品稳定性,提高产品良率。(The invention discloses a device for improving the sheet resistance uniformity of a physical vapor deposition metal nitride film, which comprises a cavity assembly, wherein a cold pump is arranged on the periphery of the cavity assembly, a height adjusting assembly is arranged at the bottom end of the cold pump, a clamping assembly is arranged in the height adjusting assembly, a height limiting assembly is arranged behind the height adjusting assembly, the cavity assembly comprises a cavity shell, a cavity shell top cover connected with the cavity shell in a clamping manner is arranged at the top end of the cavity shell, and an air inlet is fixedly arranged on the outer side of the cavity shell. According to the invention, the two air inlets are arranged, so that the process gases Ar and N2 are uniformly distributed in the cavity, the uniformity of the square resistance of the deposited metal nitride film is optimal, and the opening degree of the cold pump can be adjusted by arranging the height adjusting assembly and the height limiting assembly, so that the pressure of the cavity is controlled, the uniformity of the distribution of the process in the cavity is optimized, the uniformity of the square resistance of the metal nitride film is improved, the stability of the product is improved, and the yield of the product is improved.)

1. The device for improving the sheet resistance uniformity of the physical vapor deposition metal nitride film is characterized by comprising a cavity component (1), wherein a cold pump (2) is arranged on the periphery of the cavity component (1), a height adjusting component (3) is arranged at the bottom end of the cold pump (2), a clamping component (4) is arranged in the height adjusting component (3), and a height limiting component (5) is arranged behind the height adjusting component (3);

the cavity assembly (1) comprises a cavity shell (11), a cavity shell top cover (12) clamped and connected with the cavity shell (11) is arranged at the top end of the cavity shell (11), two symmetrically arranged air inlets (13) are fixedly mounted on the outer side of the cavity shell (11), an air suction opening (111) penetrating through the interior of the cavity shell (11) is formed in the outer side of the cavity shell (11) and located below the air inlets (13), and a cold pump (2) is inserted into the air suction opening (111) and fixedly connected with the cavity shell (11);

the height adjusting assembly (3) comprises ratchet bars (31), linkage swing rods (33), fixed guide pillars (34), a fixed plate (35) and a sliding plate (36) which are symmetrically arranged, wherein the rear part of each ratchet bar (31) is fixedly connected with a driving rotating rod (311), the outer side of each ratchet bar (31) is fixedly connected with a horizontal seat (32) below the driving rotating rod (311), a first linkage hole (321) is formed in the front surface of each horizontal seat (32), one end of each linkage swing rod (33) is fixedly connected with a first linkage rotating rod (331) which is rotatably connected with the corresponding first linkage hole (321), the other end of each linkage swing rod (33) is fixedly connected with a second linkage rotating rod (332), a bottom limiting disc (341) is fixedly connected to the bottom end of each fixed guide pillar (34), a connecting and fixing hole (351) is formed in the top end of the fixed plate (35), and the fixed guide pillars (34) penetrate through the connecting and fixing holes (351) to be fixedly connected with the fixed plate (35), the front surface of the fixed plate (35) is provided with a second linkage hole (352) which is rotationally connected with the second linkage rotating rod (332), the top end of the sliding plate (36) is provided with a sliding guide hole (361), the fixed guide pillar (34) penetrates through the sliding guide hole (361) to be slidably connected with the sliding plate (36), the front surface of the sliding plate (36) is provided with a driving round hole (362), the driving rotating rod (311) is inserted into the driving round hole (362) to be rotationally connected with the sliding plate (36), and the rear surface of the sliding plate (36) is provided with a yielding chute (363).

2. The device for improving the sheet resistance uniformity of the physical vapor deposition metal nitride film according to claim 1, wherein the clamping assembly (4) comprises a height adjusting rod (41) fixedly connected with the cold pump (2), a movable clamping block (42), a central disc (43) and a horizontal rod (44), a sliding groove (411) is formed on the periphery of the height adjusting rod (41), the movable clamping block (42) is slidably connected with the height adjusting rod (41) through the sliding groove (411), fixed inserting holes (421) symmetrically arranged are formed on the top end of the movable clamping block (42) and positioned outside the sliding groove (411), a fixed vertical rod (431) is fixedly connected to the bottom end of the central disc (43), the bottom end of the fixed vertical rod (431) is fixedly connected with the top end of the height adjusting rod (41), horizontal rods (44) are fixedly connected to the two ends of the central disc (43), and a vertical rod (45) perpendicular to the horizontal rod (44) is fixedly connected to one end of the horizontal rod (44) far away from the central disc (43), the vertical rod (45) is inserted into the fixed insertion hole (421) and is fixedly connected with the movable clamping block (42), and the first spring (46) is movably sleeved on the peripheral side of the horizontal rod (44).

3. The apparatus of claim 1, wherein the apparatus for improving sheet resistance uniformity of the physical vapor deposition metal nitride film, the height limiting assembly (5) comprises a limiting vertical block (51), a sliding insertion rod (52) and a fixed transverse column (54), a limiting insertion hole (511) which is in a linear array is formed in the front face of the limiting vertical block (51), one end of the sliding insertion rod (52) is inserted into the limiting insertion hole (511) and is in sliding connection with the limiting vertical block (51), a convex disc (521) is driven by fixedly connected with the periphery of the sliding insertion rod (52), a second spring (53) is movably sleeved on the periphery of the sliding insertion rod (52), a sliding round hole (541) is formed in the end face of the fixed transverse column (54), the other end of the sliding insertion rod (52) is inserted into the sliding round hole (541) and is in sliding connection with the fixed transverse column (54), the bottom end of the fixed transverse column (54) is fixedly connected with a connecting vertical rod (55), and the bottom end of the connecting vertical rod (55) is fixedly connected with the top end of a sliding plate (36).

4. The apparatus for improving sheet resistance uniformity of PVD metal nitride films as recited in claim 1, wherein the fixed plate (35) is located above the sliding plate (36), and the top ends of the fixed guide posts (34) are fixedly connected to the bottom end of the chamber shell (11).

5. The device for improving the sheet resistance uniformity of the PVD metal nitride film as recited in claim 1, wherein the bottom end of the fixed plate (35) is fixedly connected to the top end of the position-limiting upright block (51), and the position-limiting upright block (51) is slidably connected to the sliding plate (36) through an abdicating chute (363).

6. The device for improving the sheet resistance uniformity of the PVD metal nitride film as recited in claim 2, wherein one end of the first spring (46) is connected with the central plate (43) in a contact manner, and the other end of the first spring (46) is connected with the vertical rod (45) in a contact manner.

7. The device for improving the sheet resistance uniformity of the PVD metal nitride film as recited in claim 3, wherein one end of the second spring (53) is connected with the driving convex disc (521) in a contact manner, and the other end of the second spring (53) is connected with the fixed cross column (54) in a contact manner.

Technical Field

The invention belongs to the field of metal nitride films, and particularly relates to a device for improving the sheet resistance uniformity of a physical vapor deposition metal nitride film.

Background

In the existing physical vapor deposition equipment, metal is used as a target material for a metal nitride film, Ar and N2 are used as process gases, Ar and N2 are ionized into argon ions and nitrogen ions under high pressure, the argon ions and the nitrogen ions bombard the target material, and meanwhile, the nitrogen ions are combined with bombarded metal particles to form the metal nitride film, the sheet resistance of the metal nitride film is in direct proportion to the penetration of nitrogen, and the uniformity of the sheet resistance of the metal nitride film is influenced by the uniformity of N2.

At present, process gas Ar and N2 are introduced into the equipment at one side, the process gas is unevenly distributed in a cavity, the gas concentration of the gas inlet end is higher than that of other areas, so that the sheet resistance of the metal nitride film is even and poor, and the sheet resistance of the gas inlet end is large.

In the process of the existing equipment, a cold pump valve is fully opened, the pumping speed of a cold pump is high, and process gas close to the cold pump is pumped away quickly, so that the process gas is distributed unevenly in a cavity, and the sheet resistance uniformity of a metal nitride film is poor.

Therefore, we improve this and propose a device for improving the sheet resistance uniformity of physical vapor deposition metal nitride thin film.

Disclosure of Invention

The invention aims to overcome the problems in the prior art and provides a device for improving the sheet resistance uniformity of a physical vapor deposition metal nitride film, wherein two air inlets are arranged, so that process gases Ar and N2 are uniformly distributed in a cavity, the sheet resistance uniformity of the deposited metal nitride film is optimal, and the opening degree of a cold pump can be adjusted by arranging a height adjusting assembly and a height limiting assembly, so that the pressure of the cavity is controlled, the uniformity of the process distributed in the cavity is optimized, the sheet resistance uniformity of the metal nitride film is improved, the stability of a product is improved, and the yield of the product is improved.

In order to achieve the technical purpose and achieve the technical effect, the invention is realized by the following technical scheme:

a device for improving the sheet resistance uniformity of a physical vapor deposition metal nitride film comprises a cavity assembly, wherein a cold pump is arranged on the periphery of the cavity assembly, a height adjusting assembly is arranged at the bottom end of the cold pump, a clamping assembly is arranged in the height adjusting assembly, and a height limiting assembly is arranged behind the height adjusting assembly;

the cavity assembly comprises a cavity shell, a cavity shell top cover clamped and connected with the cavity shell is arranged at the top end of the cavity shell, an air inlet is fixedly arranged on the outer side of the cavity shell, an air suction opening penetrating through the inner part of the cavity shell is formed in the outer side of the cavity shell below the air inlet, and a cold pump is inserted into the air suction opening and is fixedly connected with the cavity shell;

the height adjusting component comprises a ratchet rack, a linkage swing rod, a fixed guide post, a fixed plate and a sliding plate which are symmetrically arranged, a driving rotating rod is fixedly connected at the rear part of the ratchet rack, a horizontal seat is fixedly connected below the driving rotating rod at the outer side of the ratchet rack, a first linkage hole is arranged on the front surface of the horizontal seat, one end of the linkage swing rod is fixedly connected with a first linkage rotating rod which is rotatably connected with the first linkage hole, the other end of the linkage swing rod is fixedly connected with a second linkage rotating rod, the bottom end of the fixed guide post is fixedly connected with a bottom limiting disc, a connecting and fixing hole is arranged at the top end of the fixed plate, the fixed guide post penetrates through the connecting and fixing hole to be fixedly connected with the fixed plate, a second linkage hole which is rotatably connected with the second linkage rotating rod is arranged on the front surface of the fixed plate, a sliding guide hole is arranged on the top end of the sliding plate, the fixed guide post penetrates through the sliding guide hole to be slidably connected with the sliding plate, and a driving round hole is arranged on the front surface of the sliding plate, the driving rotating rod is inserted into the driving round hole to be rotationally connected with the sliding plate, and the back of the sliding plate is provided with a abdicating sliding groove.

Further, the block subassembly includes the altitude mixture control pole that links to each other with the cold pump is fixed, remove the fixture block, the center pan, the horizon bar, the sliding tray has been seted up to altitude mixture control pole week side, it passes through sliding tray and altitude mixture control pole sliding connection to remove the fixture block, it sets up the fixed jack of symmetry setting to remove the fixture block top to be located the sliding tray outside, center pan bottom end fixedly connected with fixes the pole setting, fixed pole setting bottom and altitude mixture control pole top fixed connection, center pan both ends fixedly connected with horizon bar, the horizon bar is kept away from center pan one end fixedly connected with and horizon bar looks vertically pole, vertical pole inserts fixed jack and removes fixture block fixed connection, the movable sleeve of horizon bar week side is equipped with first spring.

Further, height-limiting component includes spacing upright piece, slip inserted bar, fixed spreader, and spacing upright piece openly sets up the spacing jack that is linear array, and slip inserted bar one end inserts spacing jack and spacing upright piece sliding connection, and slip inserted bar week side fixedly connected with drives the flange, and slip inserted bar week side activity cover is equipped with the second spring, and slip round hole has been seted up to fixed spreader terminal surface, and the slip inserted bar other end inserts slip round hole and fixed spreader sliding connection, and fixed spreader bottom fixedly connected with connects the pole setting, connects pole setting bottom and sliding plate top fixed connection.

Furthermore, the fixed plate is positioned above the sliding plate, and the top end of the fixed guide post is fixedly connected with the bottom end of the cavity shell.

Furthermore, the bottom end of the fixed plate is fixedly connected with the top end of the limiting vertical block, and the limiting vertical block is connected with the sliding plate in a sliding mode through the abdicating sliding groove.

Further, one end of the first spring is in contact connection with the central disc, and the other end of the first spring is in contact connection with the vertical rod.

Furthermore, second spring one end with drive the flange contact and be connected, the second spring other end with fixed spreader contact is connected.

The invention has the beneficial effects that: this kind of improve device of physics vapour deposition metal nitride film side resistance homogeneity, through being provided with two air inlets, make process gas Ar and N2 keep evenly distributed in the cavity, the metal nitride film side resistance homogeneity of deposit is optimum, through being provided with altitude mixture control subassembly and high spacing subassembly, can adjust the degree of opening of cold pump, thereby control cavity pressure, the homogeneity that the optimization technology distributes in the cavity, metal nitride film side resistance homogeneity has just so been improved, and the product stability is improved, and the product yield is improved.

Drawings

The accompanying drawings, which are included to provide a further understanding of the invention and are incorporated in and constitute a part of this application, illustrate embodiment(s) of the invention and together with the description serve to explain the invention without limiting the invention. In the drawings:

FIG. 1 is a schematic structural view of the present invention;

FIG. 2 is a schematic view of a portion of the present invention;

FIG. 3 is a schematic view of a partial structure of the present invention;

FIG. 4 is an exploded view of a portion of the structure of the present invention;

FIG. 5 is an exploded view of a portion of the structure of the present invention;

fig. 6 is an exploded view of a partial structure of the present invention.

In the figure: 1. a cavity assembly; 11. a chamber housing; 111. an air extraction opening; 12. a chamber housing top cover; 13. an air inlet; 2. a cold pump; 3. a height adjustment assembly; 31. a ratchet bar; 311. driving the rotating rod; 32. a horizontal base; 321. a first linkage hole; 33. linking a swing rod; 331. a first linkage rotating rod; 332. a second linkage rotating rod; 34. fixing the guide post; 341. a bottom limiting disc; 35. a fixing plate; 351. connecting the fixing holes; 352. a second linkage hole; 36. a sliding plate; 361. a sliding guide hole; 362. driving the circular hole; 363. a yielding chute; 4. clamping the assembly; 41. a height adjustment lever; 411. a sliding groove; 42. moving the fixture block; 421. fixing the jack; 43. a central disk; 431. fixing the vertical rod; 44. a horizontal bar; 45. a vertical rod; 46. a first spring; 5. a height limiting assembly; 51. a limiting vertical block; 511. limiting the jacks; 52. a sliding insertion rod; 521. driving the convex disc; 53. a second spring; 54. fixing the transverse column; 541. sliding the circular hole; 55. and connecting the vertical rods.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

In the description of the present invention, it is to be understood that the terms "opening," "upper," "lower," "thickness," "top," "middle," "length," "inner," "peripheral," and the like are used in an orientation or positional relationship that is merely for convenience in describing and simplifying the description, and do not indicate or imply that the referenced component or element must have a particular orientation, be constructed and operated in a particular orientation, and thus should not be considered as limiting the present invention.

The device for improving the sheet resistance uniformity of the physical vapor deposition metal nitride film comprises a cavity assembly 1, wherein a cold pump 2 is arranged on the periphery of the cavity assembly 1, a height adjusting assembly 3 is arranged at the bottom end of the cold pump 2, a clamping assembly 4 is arranged in the height adjusting assembly 3, and a height limiting assembly 5 is arranged behind the height adjusting assembly 3.

As shown in fig. 3, the chamber assembly 1 includes a chamber shell 11, a chamber shell top cover 12 connected to the chamber shell 11 in a clamping manner is disposed at a top end of the chamber shell 11, two symmetrically disposed air inlets 13 are fixedly mounted at an outer side of the chamber shell 11, an air suction port 111 penetrating through an inner portion of the chamber shell 11 is disposed below the air inlet 13 at an outer side of the chamber shell 11, and the cold pump 2 is inserted into the air suction port 111 and fixedly connected to the chamber shell 11.

As shown in fig. 4, the height adjusting assembly 3 includes a ratchet rack 31, a linkage swing rod 33, a fixed guide pillar 34, a fixed plate 35, and a sliding plate 36, which are symmetrically disposed, a driving rotation rod 311 is fixedly connected to the rear of the ratchet rack 31, a horizontal seat 32 is fixedly connected to the outer side of the ratchet rack 31 below the driving rotation rod 311, a first linkage hole 321 is formed on the front surface of the horizontal seat 32, a first linkage rotation rod 331 rotatably connected to the first linkage hole 321 is fixedly connected to one end of the linkage swing rod 33, a second linkage rotation rod 332 is fixedly connected to the other end of the linkage swing rod 33, a bottom limiting plate 341 is fixedly connected to the bottom end of the fixed guide pillar 34, a connection fixing hole 351 is formed on the top end of the fixed plate 35, the fixed guide pillar 34 is fixedly connected to the fixed plate 35 through the connection fixing hole 351, a second linkage hole 352 rotatably connected to the second linkage rotation rod 332 is formed on the front surface of the fixed plate 35, a sliding guide hole 361 is formed on the top end of the sliding plate 36, the fixed guide pillar 34 penetrates through the sliding guide hole 361 to be slidably connected with the sliding plate 36, the front surface of the sliding plate 36 is provided with a driving round hole 362, the driving rotating rod 311 is inserted into the driving round hole 362 to be rotatably connected with the sliding plate 36, the back surface of the sliding plate 36 is provided with a yielding chute 363, the fixed plate 35 is positioned above the sliding plate 36, the top end of the fixed guide pillar 34 is fixedly connected with the bottom end of the cavity shell 11, the bottom end of the fixed plate 35 is fixedly connected with the top end of the limiting vertical block 51, and the limiting vertical block 51 is slidably connected with the sliding plate 36 through the yielding chute 363.

As shown in fig. 5, the engaging assembly 4 comprises a height adjusting rod 41 fixedly connected with the cold pump 2, a moving latch 42, center disc 43, horizontal rod 44, sliding groove 411 has been seted up to height-adjusting pole 41 week side, remove fixture block 42 through sliding groove 411 and height-adjusting pole 41 sliding connection, remove fixture block 42 top and be located the sliding groove 411 outside and set up the fixed jack 421 that the symmetry set up, center disc 43 bottom fixedly connected with fixes pole 431, fix pole 431 bottom and height-adjusting pole 41 top fixed connection, center disc 43 both ends fixedly connected with horizontal rod 44, horizontal rod 44 is kept away from center disc 43 one end fixedly connected with and is connected with horizontal rod 44 mutually perpendicular vertical pole 45, vertical pole 45 inserts fixed jack 421 and removes fixture block 42 fixed connection, the movable sleeve of horizontal rod 44 week side is equipped with first spring 46, first spring 46 one end is connected with center disc 43 contact, the straight pole of first spring 46 other end and vertical pole 45 contact connection.

As shown in fig. 6, the height limiting assembly 5 includes a limiting vertical block 51, a sliding insertion rod 52, and a fixed horizontal column 54, wherein a limiting insertion hole 511 in a linear array is disposed on the front surface of the limiting vertical block 51, one end of the sliding insertion rod 52 is inserted into the limiting insertion hole 511 and slidably connected with the limiting vertical block 51, a driving convex disc 521 is fixedly connected to the periphery of the sliding insertion rod 52, a second spring 53 is movably sleeved on the periphery of the sliding insertion rod 52, a sliding circular hole 541 is disposed on the end surface of the fixed horizontal column 54, the other end of the sliding insertion rod 52 is inserted into the sliding circular hole 541 and slidably connected with the fixed horizontal column 54, a connecting vertical rod 55 is fixedly connected to the bottom end of the fixed horizontal column 54, the bottom end of the connecting vertical rod 55 is fixedly connected to the top end of the sliding plate 36, one end of the second spring 53 is in contact with the driving convex disc 521, and the other end of the second spring 53 is in contact with the fixed horizontal column 54.

In the invention, process gases Ar and N2 uniformly enter the cavity shell 11 through the air inlet 13, the movable fixture block 42 is moved inwards, the movable fixture block 42 is separated from the inner side tooth surface of the ratchet bar 31 to adjust the height of the height adjusting rod 41, the height adjusting rod 41 adjusts the opening and closing degree of the cold pump 2, the height adjusting rod 41 is released, the movable fixture block 42 is clamped in the ratchet bar 31 under the action of the elastic force of the first spring 46, when rapid air suction is required, the sliding insertion rod 52 is moved to enable the sliding insertion rod 52 to leave the limiting insertion hole 511, the sliding plate 36 is moved downwards along the fixed guide pillar 34, the circular hole 362 is driven to drive the first linkage rotating rod 331 to move downwards, the rotating rod 311 is driven to drive the ratchet bar 31 to open outwards, the internal teeth of the ratchet bar 31 lose the clamping effect on the movable fixture block 42, the height adjusting rod 41 can move downwards under full force, and the air suction is opened to the maximum extent.

In the description herein, references to the description of "one embodiment," "an example," "a specific example" or the like are intended to mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.

The foregoing shows and describes the general principles, essential features, and advantages of the invention. It will be understood by those skilled in the art that the present invention is not limited to the embodiments described above, which are described in the specification and illustrated only to illustrate the principle of the present invention, but that various changes and modifications may be made therein without departing from the spirit and scope of the present invention, which fall within the scope of the invention as claimed.