阅读说明：本技术 蒸镀装置及蒸镀方法 (Vapor deposition apparatus and vapor deposition method ) 是由 齐英旭 郭宏伟 于上智 卓林海 王亚 周小康 于 2020-11-18 设计创作，主要内容包括：本发明实施例提供一种蒸镀装置及蒸镀方法,蒸镀装置包括：承载台,包括主体部、升降部和由主体部围合形成的中空部,主体部具有承载面,升降部在垂直于承载面的方向上可伸缩地设于主体部；掩模组件,设置于承载台,掩模组件包括掩模框架和连接于掩模框架的掩模板,掩模板由中空部露出,掩模框架设置于承载面,以通过升降部的升降能够调节掩模框架与承载面的相对位置。在本发明实施例提供的蒸镀装置中,可以调节掩模板和待蒸镀基板的相对位置,提高掩模板和待蒸镀基板的对位精度,进而提高蒸镀精度。(The embodiment of the invention provides an evaporation device and an evaporation method, wherein the evaporation device comprises: the bearing table comprises a main body part, a lifting part and a hollow part formed by enclosing the main body part, wherein the main body part is provided with a bearing surface, and the lifting part is arranged on the main body part in a telescopic manner in a direction vertical to the bearing surface; the mask assembly is arranged on the bearing platform and comprises a mask frame and a mask plate connected with the mask frame, the mask plate is exposed out of the hollow part, and the mask frame is arranged on the bearing surface so that the relative position of the mask frame and the bearing surface can be adjusted through the lifting of the lifting part. In the vapor deposition device provided by the embodiment of the invention, the relative position of the mask plate and the substrate to be vapor deposited can be adjusted, the alignment precision of the mask plate and the substrate to be vapor deposited is improved, and the vapor deposition precision is further improved.)

1. An evaporation apparatus, comprising:

the bearing table comprises a main body part, a lifting part and a hollow part formed by enclosing the main body part, wherein the main body part is provided with a bearing surface, and the lifting part is arranged on the main body part in a telescopic manner in a direction vertical to the bearing surface;

the mask assembly is arranged on the bearing table and comprises a mask frame and a mask plate connected to the mask frame, the mask plate is exposed out of the hollow part, and the mask frame is arranged on the bearing surface so that the relative position of the mask frame and the bearing surface can be adjusted through the lifting of the lifting part.

2. The vapor deposition device according to claim 1, wherein the elevating section includes a plurality of elevating blocks, and the plurality of elevating blocks are spaced apart from each other in the main body;

preferably, the distance between two adjacent lifting blocks is 1.5-5 mm.

3. The vapor deposition apparatus according to claim 2,

the main body part comprises two first side parts oppositely arranged along a first direction and two second side parts oppositely arranged along a second direction, and the mask frame is supported on the first side parts and the second side parts;

the lifting part is arranged on the two first side parts and/or the two second side parts.

4. The vapor deposition device according to claim 3, wherein a plurality of the lift blocks are provided on each of the first side portion and the second side portion, and the plurality of the lift blocks are distributed in rows and columns in the first direction and the second direction on the first side portion, and the plurality of the lift blocks are distributed in rows and columns in the first direction and the second direction on the second side portion.

5. The vapor deposition device according to claim 2, further comprising:

the detection component is used for detecting the position deviation between the actual position and the preset position of the evaporation pixels on the display panel formed by evaporation;

the driving device is used for adjusting the lifting of the lifting block according to the position deviation;

preferably, the driving device is used for driving the lifting block to lift at the speed of 1-2 μm/time.

6. The evaporation device according to claim 2, wherein an orthogonal projection shape of the lifting block on a plane of the carrying surface is at least one of a circle, an ellipse, a polygon and a combination thereof.

7. The evaporation device according to claim 2, wherein the main body has a side edge facing the hollow portion, and a minimum distance of the lift block from the side edge is 2mm or more.

8. An evaporation method of a display panel is characterized by comprising the following steps:

providing a substrate to be evaporated, wherein the substrate to be evaporated comprises an evaporation area;

arranging a mask assembly on a bearing table, wherein the bearing table comprises a main body part, a lifting part and a hollow part formed by the main body part in a surrounding mode, the main body part is provided with a bearing surface, the lifting part is arranged on the main body part in a telescopic mode in the direction perpendicular to the bearing surface, the mask assembly comprises a mask frame and a mask plate connected to the mask frame, the mask frame is located on the bearing surface, and the mask plate is exposed out of the hollow part;

aligning the bearing table with the mask assembly with the substrate to be evaporated, and enabling the mask plate to correspond to the evaporation area;

adjusting the height of the lifting part extending out of the bearing surface so that the orthographic projection of the mask plate on the substrate to be evaporated covers the evaporation area;

and evaporating an evaporation material in the evaporation area through a mask opening to form the display panel.

9. The method of claim 1, further comprising:

acquiring the position deviation between the actual position and the preset position of an evaporation pixel formed by the evaporation material on the display panel;

and adjusting the height of the lifting part extending out of the bearing surface according to the position deviation.

10. The method of claim 9, wherein the elevator portion comprises a plurality of elevator blocks arranged in a plurality of rows and columns in the body portion;

and in the step of adjusting the height of the lifting part extending out of the bearing surface according to the position deviation:

adjusting the height of at least part of the lifting block extending out of the bearing surface, wherein the lifting block is positioned on the outer periphery side of the evaporation pixel with the position deviation;

preferably, the plurality of lifting blocks are distributed in a plurality of rows, the plurality of rows of lifting blocks comprise a first row and a second row which are distributed at intervals along the direction away from the hollow part, and the evaporation area comprises a central area and a peripheral area which is positioned on the peripheral side of the central area;

the adjusting the lifting part according to the position deviation includes:

when the actual position in the peripheral area is far away from the central area relative to the preset position, raising at least part of the lifting blocks in the second row and/or lowering at least part of the lifting blocks in the first row;

and when the actual position in the peripheral area is close to the central area relative to the preset position, raising at least part of the lifting blocks in the first row and/or lowering at least part of the lifting blocks in the second row.

Technical Field

The invention relates to the technical field of evaporation equipment, in particular to an evaporation device and an evaporation method.

Background

Organic Light-Emitting diodes (OLEDs) are active Light-Emitting devices. Compared with the traditional Liquid Crystal Display (LCD) Display mode, the OLED Display technology does not need a backlight lamp and has the self-luminous characteristic. The OLED adopts a thin organic material film layer and a glass substrate, and when a current flows, the organic material can emit light. Therefore, the OLED display panel can save electric energy remarkably, can be made lighter and thinner, can endure a wider range of temperature variation than the LCD display panel, and has a larger visual angle. The OLED display panel is expected to become a next-generation flat panel display technology following the LCD, and is one of the technologies that receives the most attention among the flat panel display technologies at present.

At present, pixels of an OLED display panel are prepared by an evaporation method, that is, organic materials are sublimated at a high temperature and deposited on a substrate to be evaporated through a Fine Metal Mask (FMM), so that light emitting display of a mobile phone screen is realized. In the evaporation process, Pixel Position Accuracy (PPA) is a very important parameter, and the smaller the PPA is, the more accurate the display color is, and the better the display effect is.

However, in the existing evaporation process, the alignment between the evaporation mask plate and the display panel is not accurate, so that the PPA of evaporation is inclined, and the yield of the display screen is seriously influenced.

Therefore, a new evaporation apparatus and a new evaporation method are needed.

Disclosure of Invention

The embodiment of the invention provides an evaporation device and an evaporation method, aiming at improving the evaporation precision.

An embodiment of a first aspect of the present invention provides an evaporation apparatus, including: the bearing table comprises a main body part, a lifting part and a hollow part formed by enclosing the main body part, wherein the main body part is provided with a bearing surface, and the lifting part is arranged on the main body part in a telescopic manner in a direction vertical to the bearing surface; the mask assembly is arranged on the bearing platform and comprises a mask frame and a mask plate connected with the mask frame, the mask plate is exposed out of the hollow part, and the mask frame is arranged on the bearing surface so that the relative position of the mask frame and the bearing surface can be adjusted through the lifting of the lifting part.

According to an embodiment of the first aspect of the present invention, the lifting portion includes a plurality of lifting blocks, and the plurality of lifting blocks are spaced apart from each other in the main body portion.

According to any one of the previous embodiments of the first aspect of the present invention, the distance between two adjacent lifting blocks is 1.5mm to 5 mm.

According to any one of the preceding embodiments of the first aspect of the present invention, the main body portion includes two first side portions disposed opposite to each other in the first direction and two second side portions disposed opposite to each other in the second direction, and the mask frame is supported by the first side portions and the second side portions;

the lifting part is arranged on the two first side parts and/or the two second side parts.

According to any one of the preceding embodiments of the first aspect of the invention, the first side portion and the second side portion are each provided with a plurality of lifting blocks, and the plurality of lifting blocks are distributed in rows and columns along the first direction and the second direction on the first side portion, and the plurality of lifting blocks are distributed in rows and columns along the first direction and the second direction on the second side portion.

According to any one of the preceding embodiments of the first aspect of the invention, further comprising:

the detection component is used for detecting the position deviation between the actual position and the preset position of the evaporation pixels on the display panel formed by evaporation;

and the driving device is used for adjusting the lifting of the lifting block according to the position deviation.

According to any one of the preceding embodiments of the first aspect of the present invention, the driving device is configured to drive the lifting block to lift at a rate of 1 μm/time to 2 μm/time.

According to any one of the embodiments of the first aspect of the present invention, the orthogonal projection shape of the lifting block on the plane of the bearing surface is at least one of a circle, an ellipse, a polygon and a combination thereof.

According to any one of the preceding embodiments of the first aspect of the invention, the body portion has a side edge facing the hollow portion, and the minimum distance of the elevator block from the side edge is greater than or equal to 2 mm.

Embodiments of the second aspect of the present invention further provide an evaporation method, including:

providing a substrate to be evaporated, wherein the substrate to be evaporated comprises an evaporation area;

the mask assembly is arranged on a bearing platform, the bearing platform comprises a main body part, a lifting part and a hollow part formed by the main body part in a surrounding mode, the main body part is provided with a bearing surface, the lifting part is arranged on the main body part in a telescopic mode in the direction perpendicular to the bearing surface, the mask assembly comprises a mask frame and a mask plate connected to the mask frame, the mask frame is located on the bearing surface, and the mask plate is exposed out of the hollow part;

aligning the bearing table with the mask assembly with a substrate to be evaporated, and enabling the mask plate to correspond to the evaporation area;

adjusting the height of the lifting part extending out of the bearing surface so that the orthographic projection of the mask plate on the substrate to be vapor-deposited covers the vapor deposition area;

the display panel is formed by depositing a deposition material in the deposition region through the mask opening.

According to an embodiment of the second aspect of the present invention, further comprising:

acquiring the position deviation between the actual position and the preset position of an evaporation pixel formed by an evaporation material on a display panel;

and adjusting the height of the lifting part extending out of the bearing surface according to the position deviation.

According to any one of the embodiments of the second aspect of the present invention, the lifting portion includes a plurality of lifting blocks, and the plurality of lifting blocks are distributed in a plurality of rows and a plurality of columns in the main body portion;

and adjusting the height of the lifting part extending out of the bearing surface according to the position deviation:

and adjusting the height of at least part of the lifting block extending out of the bearing surface, wherein the lifting block is positioned on the outer periphery side of the evaporation pixel with the position deviation.

According to a second aspect of the present invention, in any one of the embodiments described above, the plurality of lifting blocks are arranged in a plurality of rows, the plurality of rows of lifting blocks include a first row and a second row spaced apart from the hollow portion, and the evaporation region includes a central region and a peripheral region located on a peripheral side of the central region;

the step of adjusting the lifting part according to the position deviation includes:

when the actual position in the peripheral area is far away from the central area relative to the preset position, raising at least part of the lifting blocks in the second row and/or lowering at least part of the lifting blocks in the first row;

when the actual position in the peripheral area is close to the central area relative to the preset position, at least part of the lifting blocks in the first row are lifted and/or at least part of the lifting blocks in the second row are lowered.

In the evaporation device provided by the embodiment of the invention, the evaporation device comprises a bearing platform and a mask assembly, and the bearing platform is used for bearing the mask assembly. The bearing table comprises a main body part, a lifting part and a hollow part. The mask assembly includes a mask frame and a mask plate exposed from the hollow portion so that the mask plate can evaporate an evaporation material on a substrate to be evaporated. The mask frame is arranged on the bearing surface of the main body part, and the lifting part is arranged in a telescopic mode in the direction perpendicular to the bearing surface, so that the relative position of the mask frame and the bearing surface can be adjusted by adjusting the lifting of the lifting part, and then the relative position of the mask plate and the substrate to be evaporated can be adjusted. Therefore, in the vapor deposition device provided by the embodiment of the invention, the relative position of the mask plate and the substrate to be vapor deposited can be adjusted, the alignment precision of the mask plate and the substrate to be vapor deposited is improved, and the vapor deposition precision is further improved.

Drawings

Other features, objects and advantages of the invention will become apparent from the following detailed description of non-limiting embodiments with reference to the accompanying drawings in which like or similar reference characters refer to the same or similar parts.

Fig. 1 is a schematic structural diagram of an evaporation apparatus according to an embodiment of the first aspect of the present invention;

fig. 2 is a schematic structural diagram of a susceptor of an evaporation apparatus according to an embodiment of the first aspect of the present invention;

fig. 3 is a schematic structural diagram of an evaporation apparatus provided in an embodiment of a first aspect of the present application in a first state;

fig. 4 is a schematic structural diagram of a mask plate in an evaporation device according to an embodiment of a first aspect of the present application in a state shown in fig. 3.

Fig. 5 is a schematic structural diagram of an evaporation apparatus provided in an embodiment of the first aspect of the present application in another state;

fig. 6 is a schematic structural diagram of a mask plate in an evaporation device according to an embodiment of the first aspect of the present application in a state shown in fig. 5.

Fig. 7 is a schematic structural diagram of an evaporation apparatus provided in an embodiment of the first aspect of the present application in a further state;

fig. 8 is a schematic structural diagram of a mask plate in an evaporation device provided in an embodiment of the first aspect of the present application in the state shown in fig. 7;

FIG. 9 is a flowchart of an evaporation method for a display panel according to an embodiment of a second aspect of the present invention;

FIG. 10 is a flowchart illustrating a method for evaporation coating a display panel according to another embodiment of the second aspect of the present invention;

fig. 11 is a schematic structural diagram of a susceptor of an evaporation apparatus according to an embodiment of the present disclosure;

FIG. 12 is a bottom view of FIG. 11;

FIG. 13 is a right side view of FIG. 11;

fig. 14 is a schematic structural view of a display panel formed by vapor deposition by the vapor deposition device shown in fig. 11 to 13;

fig. 15 is a schematic structural view of a susceptor of an evaporation apparatus according to another embodiment of the present disclosure;

FIG. 16 is a bottom view of FIG. 15;

FIG. 17 is a right side view of FIG. 15;

fig. 18 is a schematic structural view of a display panel formed by vapor deposition using the vapor deposition device shown in fig. 15 to 17.

Description of reference numerals:

10. an evaporation device;

100. a bearing table; 110. a main body portion; 110a, a bearing surface; 111. a first side portion; 112. a second side portion; 120. a lifting part; 120a, a first row; 120b, second row; 121. a lifting block; 130. A hollow part;

200. a mask assembly; 210. a mask frame; 220. a mask plate;

20. and (5) evaporating the substrate.

Detailed Description

Features and exemplary embodiments of various aspects of the present invention will be described in detail below. In the following detailed description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. It will be apparent, however, to one skilled in the art that the present invention may be practiced without some of these specific details. The following description of the embodiments is merely intended to provide a better understanding of the present invention by illustrating examples of the present invention. In the drawings and the following description, at least some well-known structures and techniques have not been shown in detail in order to avoid unnecessarily obscuring the present invention; also, the dimensions of some of the structures may be exaggerated for clarity. Furthermore, the described features, structures, or characteristics may be combined in any suitable manner in one or more embodiments.

In the description of the present invention, it is to be noted that, unless otherwise specified, "a plurality" means two or more; the terms "upper," "lower," "left," "right," "inner," "outer," and the like, as used herein, refer to an orientation or positional relationship indicated for convenience in describing the invention and to simplify description, but do not indicate or imply that the referenced device or element must have a particular orientation, be constructed and operated in a particular orientation, and thus should not be construed as limiting the invention. Furthermore, the terms "first," "second," and the like are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.

The directional terms appearing in the following description are intended to be illustrative in all directions, and are not intended to limit the specific construction of embodiments of the present invention. In the description of the present invention, it should also be noted that, unless otherwise explicitly specified or limited, the terms "mounted" and "connected" are to be interpreted broadly, e.g., as either a fixed connection, a removable connection, or an integral connection; can be directly connected or indirectly connected. The specific meaning of the above terms in the present invention can be understood as appropriate to those of ordinary skill in the art.

At present, the luminescent material of the sub-pixels of the OLED display panel is realized by an evaporation method, that is, the organic material is sublimated at a high temperature and deposited on a substrate to be evaporated through the FMM, so that the luminescent display of the display panel is realized. In the evaporation process, PPA (pixel Position accuracy) is a very important parameter, the smaller PPA is, the more accurate the display color is, and the evaporation yield can be improved, thereby improving the productivity and reducing the cost. The inventor of the present application finds that one of the important factors that seriously affect PPA during the evaporation process is the flatness of the stage of the evaporation apparatus.

The mask plate is arranged on the bearing table through the mask frame in the vapor deposition process. After the bearing table is matched with the mask plate, mask openings on the mask plate may deflect relative to a substrate to be evaporated, so that evaporation pixels formed by evaporation have positional deviation. Therefore, the flatness of the susceptor is an important factor affecting the yield of evaporation plating, and improving the alignment precision between the mask plate and the substrate to be evaporated is the most important factor for improving the yield.

The present invention has been made to solve the above problems. For better understanding of the present invention, a vapor deposition device 10 and a vapor deposition method according to an embodiment of the present invention will be described in detail below with reference to fig. 1 to 18.

Referring to fig. 1 and fig. 2 together, fig. 1 is a schematic structural diagram of an evaporation apparatus 10 according to an embodiment of the first aspect of the present invention. Fig. 2 is a schematic structural diagram of a susceptor 100 of an evaporation apparatus 10 according to an embodiment of the first aspect of the present invention.

According to the vapor deposition device 10 provided in the embodiment of the present invention, the vapor deposition device 10 includes: the susceptor 100 includes a main body 110, an elevating part 120, and a hollow part 130 surrounded by the main body 110, wherein the main body 110 has a receiving surface 110a, and the elevating part 120 is telescopically arranged on the main body 110 in a direction perpendicular to the receiving surface 110 a; the mask assembly 200 is disposed on the susceptor 100, the mask assembly 200 includes a mask frame 210 and a mask plate coupled to the mask frame 210, the mask plate 220 is exposed from the hollow portion 130, and the mask frame 210 is disposed on the supporting surface 110a such that a relative position between the mask frame 210 and the supporting surface 110a can be adjusted by the elevation of the elevating portion 120.

The lifter 120 is provided to the body 110 to be extendable and retractable in the Z direction shown in fig. 1, for example, so that the lifter 120 can extend out of the carrying surface 110a and provide support to the mask frame 210.

The mask plate 220 may be disposed in various ways, and the mask plate 220 includes a plurality of evaporation openings, for example, so as to evaporate an evaporation material on the substrate 20 to be evaporated through the evaporation openings. The mask plate 220 is a portion of the evaporation assembly where the evaporation opening is disposed, and the mask plate 220 is disposed corresponding to the hollow portion 130, so that the evaporation material can be evaporated on the substrate 20 to be evaporated through the hollow portion 130 and the evaporation opening.

In other embodiments, the mask plate 220 may be connected to the mask frame 210 through a connection portion. There are various ways in which the mask plate 220 and the mask frame 210 are connected to each other through a connecting portion, and the mask plate 220 is integrally formed with the mask frame 210 through a connecting portion, for example. Or the mask plate 220 is soldered to the mask frame 210 through a connection portion.

In the vapor deposition device 10 according to the embodiment of the present invention, the vapor deposition device 10 includes the carrier 100 and the mask assembly 200, and the carrier 100 is used to carry the mask assembly 200. The susceptor 100 includes a main body 110, an elevating unit 120, and a hollow unit 130. The mask assembly 200 includes a mask frame 210 and a mask plate 220, and the mask plate 220 is exposed from the hollow portion 130 so that the mask plate 220 can evaporate an evaporation material on the substrate 20 to be evaporated. The mask frame 210 is disposed on the carrying surface 110a of the main body 110, and the elevating unit 120 is disposed to be extendable in a direction perpendicular to the carrying surface 110a, so that the relative position between the mask frame 210 and the carrying surface 110a can be adjusted by adjusting the elevation of the elevating unit 120, and the relative position between the mask plate 220 and the substrate 20 to be evaporated can be adjusted. Therefore, in the vapor deposition device 10 according to the embodiment of the present invention, the relative position between the mask plate 220 and the substrate 20 to be vapor deposited can be adjusted, and the alignment accuracy between the mask plate 220 and the substrate 20 to be vapor deposited can be improved, thereby improving the vapor deposition accuracy.

The lifting unit 120 may be provided in various manners, and optionally, the lifting unit 120 includes a plurality of lifting blocks 121, and the plurality of lifting blocks 121 are spaced apart from each other in the main body 110. The lifting part 120 comprises a plurality of lifting blocks 121, so that each lifting block 121 can be adjusted conveniently according to actual requirements, and adjustment requirements of different positions can be realized by adjusting the lifting blocks 121 arranged at different positions.

When the lifting part 120 includes a plurality of lifting blocks 121, the distance D1 between two adjacent lifting blocks 121 is optionally 1.5mm to 5 mm. For example, the distance D1 between the two lifting blocks 121 is 2mm, 3mm or 4 mm. When the distance D1 between the two lifting blocks 121 is within the above range, the distance D1 between two adjacent lifting blocks 121 can be prevented from being too close, and the difficulty in setting the lifting blocks 121 is increased; it is also possible to avoid that the distance D1 between two adjacent lifting blocks 121 is too far, resulting in some positions on the main body 110 where the position of the mask frame 210 cannot be adjusted by the lifting blocks 121.

Optionally, the body portion 110 has a side edge facing the hollow portion 130, and the minimum distance D2 of the lifting block 121 from the side edge is greater than or equal to 2 mm. The lifting block 121 is prevented from affecting the structural strength of the main body 110.

The shape of the carrier 100 can be varied, and in some alternative embodiments, the carrier 100 is a rectangular frame-shaped structure. The main body 110 includes two first side portions 111 disposed opposite to each other in a first direction (X direction shown in fig. 2) and two second side portions 112 disposed opposite to each other in a second direction (Y direction shown in fig. 2), and the mask frame 210 is supported by the first and second side portions 111 and 112. The first side portion 111 and the second side portion 112 are detachably connected to each other, for example, to facilitate assembly and transportation of the evaporation apparatus 10.

The lifter 120 may be provided at any position on the mounting surface 110a of the body 110, and the relative position between the mask frame 210 and the mounting surface 110a may be adjusted by adjusting the lifter 120. That is, only a part of the carriage frame is supported by the elevating unit 120.

Optionally, the lifter 120 is disposed at both of the first sides 111 and/or both of the second sides 112. That is, the elevating part 120 is provided at both sides of the body part 110 in the first direction and/or the second direction. The relative positions of the mask frame 210 and the carrying surface 110a can be adjusted conveniently according to the use requirement, so as to meet various adjustment requirements.

Optionally, a plurality of lifting blocks 121 are disposed on each of the first side portion 111 and the second side portion 112. That is, the lifting blocks 121 are disposed at different positions of the main body 110, so that the relative heights between the mask frame 210 and the carrying surface 110a at different positions can be adjusted according to actual use requirements.

When the plurality of lifting blocks 121 are disposed on both the first side portion 111 and the second side portion 112, the plurality of lifting blocks 121 are distributed in rows and columns in the first direction and the second direction on the first side portion 111, and the plurality of lifting blocks 121 are distributed in rows and columns in the first direction and the second direction on the second side portion 112.

Referring to fig. 2, the first side portion 111 and the second side portion 112 are respectively provided with a plurality of lifting portions 120 distributed in rows and columns, so as to adjust the lifting blocks 121 at different positions according to the evaporation requirement, and further adjust the relative heights between the mask frame 210 and the carrying surface 110a at different positions.

Alternatively, the plurality of lift blocks 121 are arranged in two rows and a plurality of rows on the first side portion 111, and the plurality of lift blocks 121 are arranged in two rows and a plurality of columns on the second side portion 112, such that the plurality of lift blocks 121 are arranged along two annular paths on the peripheral side of the hollow portion 130. The plurality of lifting blocks 121 include first and second rows 120a and 120b, respectively, on the first and second side portions 111 and 112, respectively, spaced apart from the hollow portion 130. For example, each first side portion 111 is provided with a first row 120a and a second row 120b spaced apart in a direction away from the hollow portion 130, and each second side portion 112 is provided with a first row 120a and a second row 120b spaced apart in a direction away from the hollow portion 130. When the relative position between the mask plate 220 exposed from the hollow portion 130 and the substrate 20 to be vapor-deposited deviates, the relative position between different portions of the mask plate 220 and the substrate 20 to be vapor-deposited can be adjusted by adjusting the lifting blocks 121 at different positions, so that the positional deviation between the mask plate 220 and the substrate 20 to be vapor-deposited is compensated, and the vapor deposition accuracy is ensured.

In some optional embodiments, the evaporation apparatus 10 further includes: a detection member (not shown in the figure) and a driving device (not shown in the figure). The detection device is used for detecting the position deviation between the actual position and the preset position of the evaporation pixels on the display panel formed by evaporation, and the driving device is used for adjusting the lifting of the lifting block 121 according to the position deviation. The detection device is, for example, a PPA detector.

After the evaporation material is evaporated on the substrate 20 to be evaporated through the mask plate 220 to form the display panel, the detection device can detect the position deviation between the actual position and the preset position of the evaporation pixel, and the driving device can adjust the lifting of the lifting block 121 according to the position deviation, so that the position deviation is improved, and the evaporation precision is improved.

There are various ways for the driving means to drive the lifting block 121 to move up and down, and the driving means is, for example, a stepping motor, and the driving means drives the lifting block 121 to move up and down at a rate of 1 μm/time to 2 μm/time.

Optionally, the number of the driving devices is multiple, and each driving device is respectively arranged corresponding to each lifting block 121. That is, each of the lifting blocks 121 is correspondingly provided with one driving device, so that each of the lifting blocks 121 can be driven by each driving device, and the lifting of the plurality of lifting blocks 121 is not influenced by each other.

The optional elevating part 120 extends out of the bearing surface 110a by a height of 1mm to 5 mm. The alignment accuracy between the mask plate 220 and the substrate 20 to be evaporated can not be well adjusted due to the too low height of the lifting block 121 extending out of the carrying surface 110a, and the oversize of the carrying table 100 due to the too high height of the lifting block 121 can be avoided.

The shape of the lifting block 121 is not limited, and the orthographic projection shape of the lifting block 121 on the plane of the bearing surface 110a is at least one of a circle, an ellipse, a polygon and a combination thereof. For example, the lifting block 121 is cylindrical, and an orthogonal projection shape of the lifting block 121 on the plane of the bearing surface 110a is circular, or the lifting block 121 is prism-shaped, and an orthogonal projection shape of the lifting block 121 on the plane of the bearing surface 110a is polygonal.

Example 1:

referring to fig. 3 and fig. 4 together, fig. 3 is a schematic structural diagram illustrating a vapor deposition apparatus 10 according to an embodiment of the first aspect of the present application in a first state; fig. 4 is a schematic structural diagram of a mask plate 220 in an evaporation apparatus 10 according to an embodiment of the first aspect of the present application in a state shown in fig. 3.

In fig. 3, the lifting block 121 does not extend out of the supporting surface 110a, the supporting surface 110a is relatively flat, the mask assembly 200 is supported on the supporting surface 110a of the main body 110, and the mask assembly 200 and the supporting surface 110a are attached to each other. Fig. 4 is a schematic structural view of the mask plate 220 in this state. Referring to fig. 3 and 4, when the surface of the susceptor 100 is relatively flat, the mask plate 220 is substantially rectangular after the mask plate 220 and the susceptor 100 are fitted to each other.

Comparative example 1

Referring to fig. 5 and fig. 6, fig. 5 is a schematic structural diagram of an evaporation apparatus 10 provided in an embodiment of the first aspect of the present application in another state; fig. 6 is a schematic structural view of a mask plate 220 in the vapor deposition device 10 according to an embodiment of the first aspect of the present application in a state shown in fig. 5.

In fig. 5, the plurality of rows of lift blocks 121 include a first row 120a and a second row 120b spaced apart from the hollow 130. The lifting blocks 121 in the second row 120b on the first side portion 111 are lifted, so that the outer peripheral side of the mask frame is lifted relative to the susceptor 100, and the mask plate 220 in the hollow portion 130 is recessed downward. The mask plate 220 is deformed as shown in fig. 6, a structural schematic view of the mask plate 220 when the mask plate 220 is not deformed is shown in fig. 6 by a dotted line, and a structural schematic view of the mask plate 220 when the lifting blocks 121 of the second row 120b on the first side portion 111 extend out of the carrying surface 110a is shown by a solid line. When the mask plate 220 is used in cooperation with the substrate 20 to be vapor-deposited in the state shown in fig. 6, the actual positions of the vapor deposition pixels near the first side portion 111 are caused to be located close to the central region with respect to the preset positions.

Comparative example 2

Referring to fig. 7 and 8 together, fig. 7 is a schematic structural diagram of a vapor deposition device 10 provided in an embodiment of the first aspect of the present application in another state; fig. 8 is a schematic structural view of a mask plate 220 in the vapor deposition device 10 according to an embodiment of the first aspect of the present application in a state shown in fig. 7.

In fig. 7, the lifting blocks 121 in the first row 120a on the first side portion 111 are lifted, so that the mask frame 210 near the hollow portion 130 is lifted up relative to the susceptor 100, and the mask plate 220 in the hollow portion 130 is lifted up. The mask plate 220 is deformed as shown in fig. 8, a structural schematic view of the mask plate 220 when the mask plate 220 is not deformed is shown in a dotted line in fig. 8, and a structural schematic view of the mask plate 220 when the lifting blocks 121 of the first row 120a on the first side portion 111 extend out of the carrying surface 110a is shown in a solid line. When the mask plate 220 is used in cooperation with the substrate 20 to be vapor-deposited in the state shown in fig. 7, the actual position of the vapor deposition pixel close to the first side portion 111 is caused to be located away from the central region with respect to the preset position.

As can be seen from the comparison between the embodiment 1 and the comparative examples 1 and 2, the relative positions of the mask frame 210 and the carrying surface 110a can be changed by adjusting the lifting blocks 121 of the first row 120a or the second row 120b, so as to change the shape of the mask plate 220. When the carrying surface 110a of the carrying platform 100 is uneven, the shape of the mask plate 220 can be changed by adjusting the height of the lifting block 121 extending out of the carrying surface 110a, so as to improve the alignment accuracy between the mask plate 220 and the substrate 20 to be vapor-deposited and improve the vapor deposition accuracy.

Referring to fig. 9, fig. 9 is a flowchart illustrating an evaporation method for a display panel according to a second embodiment of the present invention.

According to a second aspect of the present invention, an evaporation method for a display panel is provided, including:

step S01: a substrate 20 to be vapor-deposited is provided, wherein the substrate 20 to be vapor-deposited includes a vapor deposition region.

Step S02: the mask assembly 200 is disposed on the susceptor 100.

The susceptor 100 includes a main body 110, an elevating unit 120, and a hollow portion 130 surrounded by the main body 110, the main body 110 has a bearing surface 110a, the elevating unit 120 is telescopically disposed on the main body 110 in a direction perpendicular to the bearing surface 110a, the mask assembly 200 includes a mask frame 210 and a mask plate connected to the mask frame 210, the mask frame 210 is disposed on the bearing surface 110a, and the mask plate 220 is exposed from the hollow portion 130.

Step S03: the bearing table 100 with the mask assembly 200 is aligned with the substrate 20 to be evaporated, and the mask plate is made to correspond to the evaporation area.

Step S04: the height of the elevating part 120 extending from the carrying surface 110a is adjusted so that the orthographic projection of the mask plate 220 on the substrate 20 to be vapor-deposited covers the vapor deposition region.

Step S05: the display panel is formed by depositing a deposition material in the deposition region through the mask opening.

In the vapor deposition method according to the second embodiment of the present invention, after the susceptor 100 is aligned with the substrate 20 to be vapor deposited, the relative position between the mask frame 210 and the supporting surface 110a can be adjusted by adjusting the height of the elevating unit 120 extending out of the supporting surface 110 a. The position of the mask plate 220 can be adjusted by adjusting the position of the mask frame 210, so that the orthographic projection of the mask plate 220 on the vapor deposition substrate covers the vapor deposition area, the alignment precision between the mask plate 220 and the substrate 20 to be vapor deposited is improved, and the vapor deposition precision is further improved.

In step S04, the positions of the mask plate 220 and the vapor deposition region may be manually visually observed, and then the relative positions of the mask plate 220 and the vapor deposition region may be adjusted by adjusting the elevating portion 120 according to the visual observation result.

Referring to fig. 10, fig. 10 is a flowchart illustrating an evaporation method for a display panel according to another embodiment of the second aspect of the present invention.

In further alternative embodiments, step S04 includes:

step S041: and acquiring the position deviation between the actual position and the preset position of the evaporation pixel formed by the evaporation material on the display panel.

Step S042: the height of the lifter 120 protruding from the supporting surface 110a is adjusted according to the position deviation.

In these alternative embodiments, the height of the elevating portion 120 may be adjusted according to the position deviation between the actual position and the preset position of the deposition pixel on the display panel that has been deposited, so as to further improve the alignment accuracy between the mask plate 220 and the substrate 20 to be deposited.

In the process of vapor deposition of a display panel, a plurality of display panels are generally vapor deposited by the same vapor deposition device 10. Whether the position of the mask plate 220 in the vapor deposition device 10 is accurate or not can be confirmed according to the actual position of the vapor deposition pixel formed on the display panel which has been subjected to vapor deposition last time, and then the elevating portion 120 is adjusted to adjust the position of the mask plate 220, so that the alignment precision between the mask plate 220 and the substrate 20 to be vapor deposited at the next time of vapor deposition can be improved.

The elevating unit 120 may be provided in various ways, and the elevating unit 120 includes a plurality of elevating blocks 121, the elevating blocks 121 are arranged in a plurality of rows and columns on the body 110, and at step S042, the elevating blocks 121 located on the outer peripheral side of the vapor deposition pixels having the positional deviation are adjusted to have a height that extends beyond the mounting surface 110 a.

When the actual position and the preset position of only part of the evaporation pixels on the display panel have position deviation, the partial lifting block 121 on the outer periphery of the evaporation pixels with the position deviation is adjusted, and then the position of the mask plate 220 corresponding to the evaporation pixels is adjusted, so that the alignment precision of the mask plate 220 and the substrate 20 to be evaporated is improved.

Referring to fig. 11 to 14, fig. 11 is a schematic structural diagram of a susceptor 100 of an evaporation apparatus 10 according to an embodiment of the present disclosure. Fig. 12 is a bottom view of fig. 11, fig. 13 is a right side view of fig. 11, and fig. 14 is a schematic structural view of a display panel vapor-deposited by the vapor deposition device 10 shown in fig. 11 to 13.

When the thickness of the I region on the susceptor 100 is small and the supporting surface 110a in the I region of the susceptor 100 is low, the actual position and the predetermined position of the evaporation pixels in the I region facing the partial region of the susceptor 100 are deviated. As shown in fig. 14, the dotted line in fig. 14 indicates the actual evaporation position of the evaporation pixel, and the solid line indicates the preset position of the evaporation pixel. When the thickness of the I region on the carrier 100 is relatively thin, the actual position of the evaporation pixels in the I region facing the partial region in the carrier 100 is far from the central position of the display region relative to the preset position, and the evaporation pixels of the display panel are inclined and spread outwards at a single angle.

In step S042, the partial lift block 121 on the outer peripheral side of the evaporation pixel where the positional deviation exists, that is, the lift block 121 in the I region is adjusted, so that the thickness of the I region is increased, thereby improving the alignment accuracy between the mask plate 220 and the substrate 20 to be evaporated.

Optionally, the lifting blocks 121 are distributed in a plurality of rows, the lifting blocks 121 in the plurality of rows include a first row 120a and a second row 120b spaced apart from the hollow portion 130, and the evaporation region includes a central region and a peripheral region located on a peripheral side of the central region.

In step S042, when the actual position in the peripheral region is far from the central region relative to the preset position, raising at least a part of the lifting blocks 121 in the second row 120b and/or lowering at least a part of the lifting blocks 121 in the first row 120 a; when the actual position in the peripheral area is close to the central area relative to the preset position, at least part of the lifting blocks 121 in the first row 120a is lifted and/or at least part of the lifting blocks 121 in the second row 120b is lowered.

For example, when the main body 110 includes two first side portions 111 oppositely disposed in a first direction and two second side portions 112 oppositely disposed in a second direction. The peripheral region includes a first region adjacent to the first side portion 111 and a second region adjacent to the second side portion 112. A plurality of lifting blocks 121 are arranged on each of the first side portion 111 and the second side portion 112. The first region and the second region may at least partially overlap.

Referring to fig. 15 to 18, fig. 15 is a schematic structural diagram of a susceptor 100 of an evaporation apparatus 10 according to another embodiment of the present disclosure. Fig. 16 is a bottom view of fig. 15, fig. 17 is a right side view of fig. 15, and fig. 18 is a schematic structural view of a display panel formed by vapor deposition by the vapor deposition device 10 shown in fig. 15 to 17.

When the surface of the first side portion 111 of the carrier 100 is uneven, for example, the middle portion of the first side portion 111 is higher in the first direction, and the two side portions of the first side portion 111 are lower in the first direction, a position deviation between the actual position and the preset position of the evaporation pixel near the first side portion 111 is caused. As shown in fig. 18, the dotted line in fig. 18 indicates the actual evaporation position of the evaporation pixel, and the solid line indicates the preset position of the evaporation pixel. When the surface of the first side portion 111 on the carrier 100 is uneven and disposed in the manner shown in fig. 17, the actual position of the evaporation pixels in the partial area close to the first side portion 111 is far from the center position of the display area relative to the preset position, and the evaporation pixels of the display panel have two-side spreading. Therefore, when the actual position of the vapor deposition pixel in the first region is away from the center region with respect to the preset position, it means that the mask plate spreads out in the first direction with respect to the substrate 20 to be vapor deposited.

In step S042, the partial lift blocks 121 on the outer peripheral side of the evaporation pixels having the position deviation, that is, the lift blocks 121 on the first side portion 111 and the second side portion 112 are adjusted so that the support areas of the first side portion 111 and the second side portion 112 are flat, thereby improving the alignment accuracy of the mask plate 220 and the substrate to be evaporated 20.

Adjusting the height of at least part of the lifting blocks 121 on the outer periphery of the first region extending out of the carrying surface 110a, for example, lifting the lifting blocks 121 in the second row 120b on the first side portion 111, so as to lift the mask frame 210, wherein the mask frame 210 drives part of the mask plate 220 in the first region to be close to the substrate 20 to be evaporated, thereby improving the alignment accuracy between the mask plate 220 and the substrate 20 to be evaporated.

In other embodiments, when the actual position of the evaporation pixels in the first area is far away from the central area relative to the preset position, the lifting blocks 121 of the first row 120a on the first side portion 111 may be lowered, so as to lower the mask frame 210, and the mask frame 210 drives a part of the mask plate 220 in the gravity center area to be far away from the substrate 20 to be evaporated, so as to improve the alignment accuracy between the mask plate 220 and the substrate 20 to be evaporated.

When the actual position of the evaporation pixels in the first region is close to the central region relative to the preset position, it indicates that the mask plate 220 is retracted in the first direction relative to the substrate 20 to be evaporated. The lifting blocks 121 in the second row 120b on the first side portion 111 are lowered, so that the mask frame 210 is lowered, the mask frame 210 drives a part of the mask plate 220 in the first region to be away from the substrate 20 to be evaporated, and the alignment accuracy of the mask plate 220 and the substrate 20 to be evaporated can be improved.

In other embodiments, when the actual position of the evaporation pixels in the first area is close to the central area relative to the preset position, the lifting blocks 121 of the first row 120a on the first side portion 111 may be lifted, so as to lift the mask frame 210, and the mask frame 210 drives a portion of the mask plate 220 in the central area to be close to the substrate 20 to be evaporated, so as to improve the alignment accuracy between the mask plate 220 and the substrate 20 to be evaporated.

In still other alternative embodiments, when there is a position deviation between the actual position and the preset position of the evaporation pixel in the first area near the second area, at least a part of the lifting block 121 on the outer periphery of the evaporation pixel in the first area near the second area is adjusted, for example, the lifting block 121 on the first side 111 near the second side 112 may be adjusted to improve the alignment accuracy between the mask plate 220 and the substrate 20 to be evaporated.

While the application has been described with reference to a preferred embodiment, various modifications may be made and equivalents may be substituted for elements thereof without departing from the scope of the application. In particular, the technical features mentioned in the embodiments can be combined in any way as long as there is no structural conflict. The present application is not intended to be limited to the particular embodiments disclosed herein but is to cover all embodiments that may fall within the scope of the appended claims.