阅读说明：本技术 光学薄膜用溅射阴极布气系统 (Sputtering cathode gas distribution system for optical film ) 是由 靳伟 戴秀海 陈建飞 于 2020-09-02 设计创作，主要内容包括：本发明涉及薄膜制备技术领域,尤其是一种光学薄膜用溅射阴极布气系统,系统包括至少一段双套管管路,双套管管路连接有气体质量流量控制器且其输送的工艺气体的质量及流量由气体质量流量控制器控制；双套管管路由内管以及套设在内管外围的外管构成,内管和外管上分别开设有出气孔。本发明的优点是：1)工艺气体由多段式布局,并由气体质量流量控制器分别独立控制,可以根据工艺需求分段式的调节进入阴极单元腔体的气体的流量；2)双套管的使用,可以有效的减小单段的外管上分布的各个出气孔处的压差；3)气流传输导流挡板可以使气体多次反射并且引导气体往靶面定向流出；4)扩散导流板可以控制引导气体进入腔体内部的方向。(The invention relates to the technical field of film preparation, in particular to a sputtering cathode gas distribution system for an optical film, which comprises at least one section of double-sleeve pipeline, wherein the double-sleeve pipeline is connected with a gas mass flow controller, and the mass and the flow of process gas conveyed by the double-sleeve pipeline are controlled by the gas mass flow controller; the double-sleeve pipeline is composed of an inner pipe and an outer pipe sleeved on the periphery of the inner pipe, and air outlet holes are respectively formed in the inner pipe and the outer pipe. The invention has the advantages that: 1) the process gas is distributed in a multi-section way and is respectively and independently controlled by the gas mass flow controllers, and the flow of the gas entering the cavity of the cathode unit can be adjusted in a sectional way according to the process requirement; 2) the use of the double sleeves can effectively reduce the pressure difference at each air outlet distributed on the single-section outer pipe; 3) the airflow transmission flow guide baffle can reflect the gas for multiple times and guide the gas to flow out directionally to the target surface; 4) the diffusion baffle may control the direction of the gas introduced into the interior of the chamber.)

1. A sputtering cathode gas distribution system for an optical film is arranged in a magnetron sputtering cathode unit and is characterized in that: the system comprises at least one section of double-casing pipeline, wherein the double-casing pipeline is connected with a gas mass flow controller, and the mass and the flow of the process gas conveyed by the double-casing pipeline are controlled by the gas mass flow controller; the double-sleeve pipeline is composed of an inner pipe and an outer pipe sleeved on the periphery of the inner pipe, and air outlet holes are formed in the inner pipe and the outer pipe respectively.

2. The sputtering cathode gas distribution system for optical films according to claim 1, characterized in that: two or more sections of double-casing pipelines are arranged in the system, the double-casing pipelines are mutually independent, and each section of double-casing pipeline is respectively and independently connected with the gas mass flow controller.

3. The sputtering cathode gas distribution system for optical films according to claim 1, characterized in that: and an airflow transmission guide structure is arranged on the periphery of the outer pipe and is used for carrying out pressure equalizing, flow dividing and guide on the process gas conveyed by the outer pipe.

4. The sputtering cathode gas distribution system for optical films according to claim 3, characterized in that: the gas flow transmission guide structure comprises an upper plate body arranged above the gas outlet hole of the outer tube and a lower plate body arranged below the upper plate body, and the process gas reaches the surface of the target material in the magnetron sputtering cathode unit after being reflected and guided by the upper plate body and the lower plate body.

5. The sputtering cathode gas distribution system for optical films according to claim 1, characterized in that: and a gas diffusion guide structure is arranged in the magnetron sputtering cathode unit, and the process gas can diffuse from the magnetron sputtering cathode unit to the process cavity under the guide effect of the gas diffusion guide structure.

6. The sputtering cathode gas distribution system for optical films according to claim 1, characterized in that: the air outlets on the inner pipe and the outer pipe are arranged in an array manner.

7. The sputtering cathode gas distribution system for optical films according to claim 1, characterized in that: the double-sleeve pipeline is connected with the gas mass flow controller positioned on the atmosphere side through a process gas inlet joint.

Technical Field

The invention relates to the technical field of film preparation, in particular to a sputtering cathode gas distribution system for an optical film.

Background

With the increasing use of magnetron cathodes in the production of optical films, the requirements of different optical film systems on the optical constants of the produced films are higher and higher, and the stable operation of the magnetron sputtering cathode needs a good process gas distribution system to ensure besides a stable power supply system.

During the production of optical films, the rotating operation of the turret or the transport travel of the substrate can easily cause turbulence in the process gas flow inside the process chamber. The turbulent air flow can cause the material sputtered from the target surface to adhere to the target surface of another station again, which can cause mutual contamination of the target surfaces. The turbulent flow of the active gas causes a change in the gas atmosphere of the remaining target sites. This situation may cause the optical constants of the produced film to be unstable, the film thickness to be difficult to control, and sometimes even cause cathode poisoning, resulting in the working state of the cathode gradually changing all the time.

Disclosure of Invention

The invention aims to provide a sputtering cathode gas distribution system for an optical film according to the defects of the prior art, wherein a double-sleeve structure is adopted to convey gas and is matched with an airflow transmission guide structure and an airflow diffusion guide structure to improve the stability of process gas conveyed by a magnetron sputtering cathode unit, so that the flow direction of the airflow is ensured to meet the process requirement and the airflow disorder is avoided.

The purpose of the invention is realized by the following technical scheme:

a sputtering cathode gas distribution system for an optical film is arranged in a magnetron sputtering cathode unit and is characterized in that: the system comprises at least one section of double-casing pipeline, wherein the double-casing pipeline is connected with a gas mass flow controller, and the mass and the flow of the process gas conveyed by the double-casing pipeline are controlled by the gas mass flow controller; the double-sleeve pipeline is composed of an inner pipe and an outer pipe sleeved on the periphery of the inner pipe, and air outlet holes are formed in the inner pipe and the outer pipe respectively.

Two or more sections of double-casing pipelines are arranged in the system, the double-casing pipelines are mutually independent, and each section of double-casing pipeline is respectively and independently connected with the gas mass flow controller.

And an airflow transmission guide structure is arranged on the periphery of the outer pipe and is used for carrying out pressure equalizing, flow dividing and guide on the process gas conveyed by the outer pipe.

The gas flow transmission guide structure comprises an upper plate body arranged above the gas outlet hole of the outer tube and a lower plate body arranged below the upper plate body, and the process gas reaches the surface of the target material in the magnetron sputtering cathode unit after being reflected and guided by the upper plate body and the lower plate body.

And a gas diffusion guide structure is arranged in the magnetron sputtering cathode unit, and the process gas can diffuse from the magnetron sputtering cathode unit to the process cavity under the guide effect of the gas diffusion guide structure.

The air outlets on the inner pipe and the outer pipe are arranged in an array manner.

The double-sleeve pipeline is connected with the gas mass flow controller positioned on the atmosphere side through a process gas inlet joint.

The invention has the advantages that: 1) the process gas is distributed in a multi-section way and is respectively and independently controlled by the gas mass flow controllers, and the flow of the gas entering the cavity of the cathode unit can be regulated in a sectional way according to the process requirement, so that the process is convenient to implement, and the quality of a finished product is improved; 2) the use of the double sleeves can effectively reduce the pressure difference at each air outlet distributed on the single-section outer pipe, so that the air flow is stable; 3) the airflow transmission flow guide baffle can reflect the gas for multiple times and guide the gas to flow out directionally to the target surface, so that the airflow flowing to the target surface is uniform and stable, and the working performance of the target material is effectively guaranteed; 4) the diffusion guide plate can control the direction of guiding gas to enter the cavity, effectively improves the film forming quality, and particularly ensures the optical constant of the film and the uniformity of the film thickness.

Drawings

FIG. 1 is a schematic structural view of the present invention;

FIG. 2 is a schematic longitudinal sectional view of the present invention;

fig. 3 is a schematic view of a diffuser baffle according to the present invention.

Detailed Description

The features of the present invention and other related features are described in further detail below by way of example in conjunction with the following drawings to facilitate understanding by those skilled in the art:

as shown in fig. 1-3, reference numerals 1-12 in the drawings denote: the device comprises a double-casing pipeline 1, an outer pipe 2, an inner pipe 3, an outer pipe air outlet 4, an inner pipe air outlet 5, an airflow transmission flow guide baffle 6, a diffusion flow guide plate 7, a cathode target pipe 8, a gas mass flow controller 9, a process gas inlet joint 10, a cathode cover plate 11 and a cathode end 12.