阅读说明：本技术 滚筒式磁控溅射镀膜机 (Drum-type magnetron sputtering film coating machine ) 是由 黄永生 田梦军 董悦 薛涛 于 2019-11-22 设计创作，主要内容包括：本发明涉及一种滚筒式磁控溅射镀膜机,通过设置在滚筒座上的导电滚轮与溅射滚筒的外侧壁面接触导电的方式,对溅射内腔中的待镀工件施加偏压,导电滚轮可适应于溅射滚筒的转动过程中的电传导,磁控溅射工艺过程中的高温真空环境不会对导电滚轮产生不利影响,且导电滚轮不会污染真空镀膜环境。进一步地,导电滚轮起到导电作用的同时还起到支撑溅射滚筒的作用,承担溅射滚筒及其中的待镀工件的重量,驱动装置仅需进行传动而不承担压力,可减轻驱动装置的负担,达到溅射滚筒平稳转动的效果。(The invention relates to a drum-type magnetron sputtering film coating machine, which applies bias voltage to a workpiece to be coated in a sputtering inner cavity in a mode that a conductive roller arranged on a drum seat is in contact with the outer side wall surface of a sputtering drum for conduction, the conductive roller can adapt to the conduction of electricity in the rotation process of the sputtering drum, the high-temperature vacuum environment in the magnetron sputtering process cannot generate adverse effect on the conductive roller, and the conductive roller cannot pollute the vacuum film coating environment. Furthermore, the conductive roller plays a role in supporting the sputtering roller while playing a role in conducting, and bears the weight of the sputtering roller and a workpiece to be plated in the sputtering roller, the driving device only needs to transmit without bearing pressure, the burden of the driving device can be reduced, and the effect of stable rotation of the sputtering roller is achieved.)

1. A drum-type magnetron sputtering film coating machine is characterized by comprising a sputtering drum, a drum base and a driving device; the sputtering roller is provided with a sputtering inner cavity for magnetron sputtering, the sputtering roller is arranged on the roller base and connected with the driving device so as to be driven by the driving device to rotate, the roller base is provided with a conductive roller, the wheel surface of the conductive roller is abutted against the outer side wall of the sputtering roller, the radial direction of the conductive roller is vertical to the axial direction of the sputtering roller, and the conductive roller is used for transmitting current to the sputtering roller so as to apply bias voltage to a workpiece to be plated in the sputtering inner cavity.

2. The roller magnetron sputter coating machine as recited in claim 1 wherein said conductive roller comprises a first plurality of conductive rollers, said sputter roller being commonly supported by said first plurality of conductive rollers.

3. The drum-type magnetron sputtering coating machine according to claim 2, wherein the drum base comprises a support and a first supporting shaft and a second supporting shaft arranged on the support, the first supporting shaft and the second supporting shaft are arranged oppositely, the first supporting shaft and the second supporting shaft are both parallel to the axial direction of the sputtering drum, and a plurality of first conductive rollers are arranged on the first supporting shaft and the second supporting shaft.

4. The roller-type magnetron sputtering coating machine according to claim 2 wherein the outer side wall of said sputtering roller is provided with a plurality of limiting rails, said plurality of limiting rails are circumferentially wound on said sputtering roller along the circumferential direction of said sputtering roller, and said first conductive roller is in rolling engagement with said limiting rails.

5. The roller-type magnetron sputtering coating machine according to any one of claims 2 to 4, wherein the conductive roller further comprises a second conductive roller, a lever and an extension spring are arranged on the roller base, the lever is rotatably connected to the roller base, two ends of the lever are respectively connected to the second conductive roller and the extension spring, and under the tension of the extension spring, the lever presses the wheel surface of the second conductive roller on the outer side wall of the sputtering roller.

6. The roller-type magnetron sputtering coating machine according to any one of claims 1 to 4, wherein a gear ring is arranged on the outer side wall of the sputtering roller, the gear ring is arranged on the sputtering roller in a surrounding manner along the circumferential direction of the sputtering roller, the driving device comprises a motor and a gear driven by the motor to rotate, and the gear is in transmission fit with the gear ring.

7. The drum-type magnetron sputtering coating machine according to any one of claims 1 to 4 wherein said sputtering drum comprises an inner cylinder and an outer cylinder, said outer cylinder being fitted over said inner cylinder, said inner cylinder being movable into and out of said outer cylinder, said inner cylinder having said sputtering chamber.

8. The drum-type magnetron sputtering coating machine according to claim 7 wherein said inner cylinder and said outer cylinder are connected by fitting a linear limiting groove and a limiting protrusion movably fitted in said limiting groove.

9. The drum-type magnetron sputtering coating machine according to claim 8 wherein said inner cylinder and said outer cylinder conduct current through said limiting rib and an inner wall of said limiting groove.

10. The drum-type magnetron sputtering coating machine as claimed in claim 9, wherein said inner cylinder and said outer cylinder are further connected by a conductive wire.

11. The roller magnetron sputtering coating machine according to any one of claims 1 to 4 and 8 to 10, wherein a plurality of stirring blades are provided on an inner wall of the sputtering chamber.

12. The roller-type magnetron sputtering coating machine according to claim 11 wherein said stirring vanes are variable cross-section blades.

13. A roller magnetron sputter coating machine as recited in any of claims 1 to 4, 8 to 10 and 12 further comprising a vacuum enclosure, said sputter roller and said roller base being disposed in said vacuum enclosure.

14. The roller magnetron sputtering coating machine according to any one of claims 1 to 4, 8 to 10 and 12, wherein a cylindrical target source is installed in said sputtering inner cylinder, and a rotating shaft is installed in said target source, and by rotating said rotating shaft, the direction of a magnetic field of a magnet in said target source can be adjusted, thereby adjusting the sputtering direction of said target source.

Technical Field

The invention relates to the technical field of magnetron sputtering equipment, in particular to a drum-type magnetron sputtering coating machine.

Background

Compared with the technologies of electroplating, spraying and the like, the magnetron sputtering vacuum coating has the advantages of good film-substrate binding force, smooth and compact film layer, high deposition rate, easy control of film layer elements and structure, clean and environment-friendly technological process and the like, and is the mainstream technology for high-grade decorative coating at present.

The magnetron sputtering technology requires that a rotating frame or a column for loading the object to be plated has electric conductivity, that is, the equipment has a function of applying bias voltage on the object to be plated. In the existing magnetron sputtering technology, a conductive device of a rotating frame usually adopts a graphite electric brush, and the graphite electric brush is connected with the rotating frame to apply bias voltage to an object to be plated. However, the sputtered material is deposited on the graphite brush during the coating process, and the high temperature vacuum environment in the process reduces the service life of the graphite brush. In addition, dust such as graphite on the graphite brush can pollute the vacuum coating environment if the dust is not protected properly, and the quality of the coating is influenced.

Disclosure of Invention

Therefore, a drum-type magnetron sputtering coating machine is needed to solve the problems that the service life of a graphite brush is shortened due to the high-temperature vacuum environment of the graphite brush adopted by the traditional conductive device, and dust such as graphite on the graphite brush can pollute the vacuum coating environment.

A drum-type magnetron sputtering coating machine comprises a sputtering drum, a drum seat and a driving device; the sputtering roller is provided with a sputtering inner cavity for magnetron sputtering, the sputtering roller is arranged on the roller base and connected with the driving device so as to be driven by the driving device to rotate, the roller base is provided with a conductive roller, the wheel surface of the conductive roller is abutted against the outer side wall of the sputtering roller, the radial direction of the conductive roller is vertical to the axial direction of the sputtering roller, and the conductive roller is used for transmitting current to the sputtering roller so as to apply bias voltage to a workpiece to be plated in the sputtering inner cavity.

In one embodiment, the conductive roller includes a plurality of first conductive rollers, and the sputtering drum is commonly supported by the plurality of first conductive rollers.

In one embodiment, the roller base comprises a bracket, and a first supporting shaft and a second supporting shaft which are arranged on the bracket, the first supporting shaft and the second supporting shaft are arranged oppositely, the first supporting shaft and the second supporting shaft are both parallel to the axial direction of the sputtering roller, and a plurality of first conductive rollers are arranged on the first supporting shaft and the second supporting shaft.

In one embodiment, a plurality of limiting rails are arranged on the outer side wall of the sputtering roller and surround the sputtering roller along the circumferential direction of the sputtering roller, and the first conductive roller is in rolling fit with the limiting rails.

In one embodiment, the outer side wall of the sputtering roller is provided with a gear ring, the gear ring surrounds on the sputtering roller along the circumferential direction of the sputtering roller, the driving device comprises a motor and a gear driven by the motor to rotate, and the gear is in transmission fit with the gear ring.

In one embodiment, the conductive roller further comprises a second conductive roller, a lever and an extension spring are arranged on the roller base, the lever is rotatably connected to the roller base, two ends of the lever are respectively connected to the second conductive roller and the extension spring, and under the tension of the extension spring, the lever presses the roller surface of the second conductive roller on the outer side wall of the sputtering roller.

In one embodiment, the sputtering roller comprises an inner cylinder and an outer cylinder, the outer cylinder is sleeved on the inner cylinder, the inner cylinder can move in or out of the outer cylinder, and the inner cylinder is provided with the sputtering inner cavity.

In one embodiment, the inner cylinder and the outer cylinder are connected in a matching way through a linear limiting groove and a limiting convex strip movably embedded in the limiting groove.

In one embodiment, the inner cylinder and the outer cylinder conduct current through the limiting convex strip and the inner wall of the limiting groove.

In one embodiment, the inner barrel and the outer barrel are further connected by an electrically conductive wire.

In one embodiment, the inner wall of the sputtering inner cavity is provided with a plurality of stirring blades.

In one embodiment, the stirring blade is a variable cross-section blade.

In one embodiment, the roller type magnetron sputtering coating machine further comprises a vacuum shell, and the sputtering roller and the roller base are arranged in the vacuum shell.

Compared with the prior art, the drum-type magnetron sputtering coating machine has the following beneficial effects:

above-mentioned drum-type magnetron sputtering coating machine, through the electrically conductive mode of setting up electrically conductive gyro wheel on the cylinder seat and the outside wall contact of sputter cylinder, to treating the plating work piece and exert bias voltage in the sputtering inner chamber, electrically conductive gyro wheel is adaptable in the electric conduction of the rotation in-process of sputter cylinder, and the high temperature vacuum environment among the magnetron sputtering process can not produce adverse effect to electrically conductive gyro wheel, and electrically conductive gyro wheel can not pollute the vacuum coating environment.

Furthermore, the conductive roller plays a role in supporting the sputtering roller while playing a role in conducting, bears the weight of the sputtering roller and a workpiece to be plated in the sputtering roller, the driving device is a non-bearing device, only transmission is needed to be carried out without bearing pressure, the burden of the driving device can be reduced, and the effects of stably rotating the sputtering roller and prolonging the maintenance period and the service life of the driving device are achieved.

Drawings

FIG. 1 is a schematic structural view of a drum-type magnetron sputtering coater according to an embodiment;

FIG. 2 is a schematic structural view of the drum-type magnetron sputtering coating machine shown in FIG. 1 from another view angle;

FIG. 3 is a schematic view of a connection structure of a sputtering roller and a driving device in the drum-type magnetron sputtering coating machine shown in FIG. 1;

FIG. 4 is a schematic structural diagram of an outer cylinder of the drum-type magnetron sputtering coating machine shown in FIG. 1;

FIG. 5 is a schematic view of a connection structure between a sputtering roller and a roller base in the roller-type magnetron sputtering coating machine shown in FIG. 1;

FIG. 6 is a cross-sectional view of an inner cylinder of the drum-type magnetron sputtering coating machine shown in FIG. 1;

FIG. 7 is a schematic view of another view angle of the connecting structure of the sputtering roller and the roller base in the roller-type magnetron sputtering coating machine shown in FIG. 1;

FIG. 8 is a schematic structural view of an insulating base in the drum-type magnetron sputtering coating machine shown in FIG. 1;

FIG. 9 is a schematic structural view of a coating target source in the drum-type magnetron sputtering coating machine shown in FIG. 1;

FIG. 10 is a schematic cross-sectional view of the coating target source of FIG. 9.

Detailed Description

To facilitate an understanding of the invention, the invention will now be described more fully with reference to the accompanying drawings. Preferred embodiments of the present invention are shown in the drawings. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.

It will be understood that when an element is referred to as being "disposed on" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present.

Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.

Referring to fig. 1 to 4, a drum-type magnetron sputtering coating machine 10 according to an embodiment of the present invention includes a sputtering drum 100, a drum base 200, and a driving device 300.

The sputtering drum 100 has a sputtering chamber 101 for magnetron sputtering. The sputtering roller 100 is disposed on the roller base 200 and connected to the driving device 300 to be driven to rotate by the driving device 300. The roller base 200 is provided with a conductive roller. The wheel surface of the conductive roller abuts against the outer side wall of the sputtering roller 100, and the radial direction of the conductive roller is perpendicular to the axial direction of the sputtering roller 100. In operation, the sputtering roller 100 and the conductive roller rotate synchronously, and the conductive roller is a conductor and is used for transmitting current to the sputtering roller 100 to bias the workpiece to be plated in the sputtering cavity 101.

In one example, the conductive roller is a copper roller or a copper-plated roller.

As shown in fig. 2 and 3, in one example, the sputtering cylinder 100 is a horizontal cylinder, i.e., the axial direction of the sputtering cylinder 100 is horizontally arranged. The conductive roller includes a plurality of first conductive rollers 210, and the sputtering drum 100 is commonly supported by the plurality of first conductive rollers 210 disposed on the drum base 200. In this example, the plurality of first conductive rollers 210 serve as a conductive function and a function of supporting the sputtering roller 100, and share the weight of the sputtering roller 100 and the workpiece to be plated therein, and the driving device 300 only needs to transmit without bearing pressure, so that the burden of the driving device 300 can be reduced, and the effect of stable rotation of the sputtering roller 100 can be achieved.

As shown in FIG. 1, the coating target source 20 can be loaded into the sputtering chamber 101 along the axial direction of the sputtering drum 100. The independent target source of the film plating machine is positioned on the axis of the roller, the target base distance can be adjusted according to actual needs, and the target is more convenient to disassemble and maintain by matching with the removable sputtering roller 100.

As shown in FIG. 1, the drum-type magnetron sputtering coater 10 further includes a vacuum casing 400, and the sputtering drum 100 and the drum base 200 are disposed in the vacuum casing 400. The vacuum enclosure 400 is electrically isolated from the sputtering drum 100, and the vacuum enclosure 400 can provide a vacuum environment for the sputtering drum 100. The vacuum housing 400 is provided with a rear cover plate 410 and a front opening door 420, wherein the rear cover plate 410 can fix the coating target source 20, and the front opening door 420 is used for an operator to operate.

In one example, a cylindrical target 20 is installed in the sputtering inner cylinder 100, a rotating shaft 1203 is installed in the target 20, and the rotating shaft 1203 is rotated to adjust the magnetic field direction of the magnet in the target 20, thereby adjusting the sputtering direction of the target 20.

More specifically, as shown in fig. 1, 9 and 10, the roll magnetron sputter coating machine 10 further includes a target source driving head 1300 mounted on the outer side of the back cover plate 410 and connected to the coating target source 20. The target source drive tip 1300 is used to adjust the rotation angle of the magnet within the target material outside the coater.

As shown in fig. 10, the coating target source 20 includes a target holder 1201 for holding a target 1202, a rotating shaft 1203 connected to a magnet holder 1205 is installed at a central axis inside the coating target source 20, and a magnet 1204 is installed on the magnet holder 1205.

As shown in fig. 1 and 10, the sputtering direction of the sputtering target can be adjusted by adjusting the target driving head 13 and adjusting the rotation angle of the magnet 1204 by the rotating shaft 1203 in the coating target 20.

The rotating shaft 1203 is installed in the target source 20, so that the magnetic field direction of the magnet in the target source 20 can be flexibly adjusted according to the load capacity of the sputtering roller 100, and further the sputtering direction of the target 1202 can be adjusted. The position of the object to be plated in the rotating sputtering drum 100 changes with the change of the load amount in the sputtering drum 100. When the cargo capacity is small, the objects to be plated mainly gather at the position close to the center of the bottom of the sputtering roller 100 when rotating in the sputtering roller 100; when the load capacity is large, the objects to be plated are mainly biased to the position of the bottom of the sputtering roller 100 biased to the rotation direction of the roller. The adjustability of the magnetic field direction of the coating target source 20 enables the sputtering direction of the target 1202 to be directed at the object to be coated under the condition of different loading capacity, thereby reducing the influence of the loading capacity on the film-substrate bonding force and the deposition rate.

In one example, the roller base 200 includes a bracket 220, and a first support shaft 231 and a second support shaft 232 disposed on the bracket 220, the first support shaft 231 and the second support shaft 232 are disposed opposite to each other, the first support shaft 231 and the second support shaft 232 are both parallel to the axial direction of the sputtering roller 100, and a plurality of first conductive rollers 210 are disposed on each of the first support shaft 231 and the second support shaft 232.

In one example, the outer side wall of the sputtering roller 100 is provided with a plurality of limiting rails 121, the plurality of limiting rails 121 are wound on the sputtering roller 100 along the circumferential direction of the sputtering roller 100, and the first conductive rollers 210 are respectively in rolling fit with the limiting rails 121. By providing a plurality of limit rails 121, smooth rotation of the sputtering roller 100 is facilitated.

In the illustrated specific example, the first and second support shafts 231 and 232 are provided at both ends thereof with first conductive rollers 210, respectively. The outer side wall of the sputtering roller 100 is provided with a limit track 121 close to the two ends, and the two limit tracks 121 are provided, and the first conductive rollers 210 on the first support shaft 231 and the second support shaft 232 share one limit track 121, so that the weight of the sputtering roller 100 and the internal goods is borne in a four-wheel supporting manner, and the purpose of stable rotation of the sputtering roller 100 is achieved. When the sputtering roller 100 rotates, the outer side wall of the sputtering roller and the first conductive roller 210 are in rolling friction, so that the transmission assembly is not affected by the loading capacity, and the service life of the transmission assembly can be effectively prolonged.

Referring to fig. 3 and 8, the roller base 200 further includes a base platform 240 and an insulating base 250, the supporter 220 is disposed on the base platform 240, and the insulating base 250 electrically insulates the base platform 240 from the sputtering roller 100 and the vacuum enclosure 400 to ensure that the electric energy is not conducted to the ground along with the bottom of the vacuum enclosure 400.

As shown in fig. 8, the insulating base 250 has a welding bolt 251 passing through the base platform 240 from bottom to top, a first insulating gasket 252 and a second insulating gasket 253 are respectively disposed between the welding bolt 251 and the upper and lower surfaces of the base platform 240, an insulating sleeve 254 is further sleeved on a portion of the welding bolt 251 penetrating through the base platform 240, the welding bolt 251 and the insulating gasket are locked on the base platform 240 by a locking nut 255, and a portion of the insulating base 250 located above the base platform 240 is covered by a protecting sleeve 256.

As shown in fig. 5, in one example, the outer sidewall of the sputtering drum 100 is provided with a gear ring 122, the gear ring 122 surrounds the sputtering drum 100 along the circumferential direction of the sputtering drum 100, the driving device 300 comprises a motor and a gear 560 driven by the motor to rotate, and the gear 560 is in transmission fit with the gear ring 122. More specifically, the gear 560 is disposed below the sputtering drum 100, and a radial direction of the gear 560 is perpendicular to an axial direction of the sputtering drum 100. In this example, the gear 560 is not affected by the gravity of the sputtering roller 100 but only by the rotation moment, and the sputtering chamber 101 can be increased appropriately according to the load capacity without providing an excessively high power by the driving device 300.

As shown in fig. 5, in one example, the driving device 300 is a motor, the driving device 300 is disposed outside the vacuum casing 400, the vacuum casing 400 is provided with a mounting hole, the driving device 300 is connected with the speed reducer 510, the pulley transmission assembly 520, the rotary magnetic fluid seal 530 and the universal coupling 540 in sequence and is connected to the gear shaft 550 of the gear 560, the gear shaft 550 is provided with a rolling bearing, and the rolling bearing is disposed on the base platform 240.

Wherein the rotating magnetic fluid seal 530 seals the mounting hole while transmitting. Specifically, the rotary magnetic fluid sealing member 530 includes a magnetic fluid seat 531, an insulating sealing gasket 532 and a magnetic fluid rotating shaft 533, wherein the magnetic fluid seat 531 and the insulating sealing gasket 532 are located outside the vacuum casing 400, the insulating sealing gasket 532 is disposed between the magnetic fluid seat 531 and the mounting hole, the magnetic fluid rotating shaft 533 is connected to the universal coupling 540 disposed inside the vacuum casing 400 through the mounting hole, and the size of the magnetic fluid rotating shaft 533 is matched with the mounting hole. The rotary motion of the driving device 300 is transmitted to the magnetic fluid transmission shaft through the speed reducer 510 and the belt pulley transmission assembly 520, the magnetic fluid seat 531 and the insulating sealing gasket 532 play a sealing role on the vacuum casing 400, and the magnetic fluid rotating shaft 533 transmits the rotary motion from the outside of the vacuum casing 400 to the inside of the vacuum casing 400. The gear ring 122 is driven by the universal coupling 540, the gear shaft 550 supported by the rolling bearing and the gear 560, so that the sputtering roller 100 rotates. The universal coupling 540 has the effect of compensating installation errors, can effectively reduce the requirement on installation precision, and enables the transmission assembly to have the characteristics of low processing difficulty and low assembly precision requirement.

In one example, the conductive roller further includes a second conductive roller 220, a lever 230 and an extension spring 240 are disposed on the roller base 200, the lever 230 is rotatably connected to the roller base 200, and two ends of the lever 230 are respectively connected to the second conductive roller 220 and the extension spring 240. The tension spring 240 has both ends connected to the roller holder 200 and the lever 230, respectively. The lever 230 presses the tread of the second conductive roller 220 against the outer sidewall of the sputtering drum 100 under the tension of the tension spring 240. In this example, the extension spring 240 may make the second conductive roller 220 closely contact with the outer sidewall of the sputtering roller 100, and the circuit conduction design has a dual guarantee.

In one example, the sputtering barrel 100 comprises an inner barrel 110 and an outer barrel 120, the outer barrel 120 is sleeved on the inner barrel 110, the inner barrel 110 can move into or out of the outer barrel 120, and the inner barrel 110 is provided with a sputtering inner cavity 101.

The sputtering roller 100 is designed into the inner cylinder 110 and the outer cylinder 120, and has the following beneficial effects:

(1) the loading and unloading of the workpiece to be plated are convenient: when the workpiece to be plated is loaded and unloaded, only the inner cylinder 110 needs to be moved out, the inner cylinder 110 is small in size, simple in structure and convenient to load and unload the workpiece to be plated.

(2) The service life of the equipment can be prolonged: the outer cylinder 120 is tightly assembled with the multiple parts of the device, and if the inner cylinder 110 is not arranged, the objects to be plated need to be moved out of the whole sputtering roller 100 each time the objects to be plated are assembled and disassembled again with the device, and the service life of other parts on the device can be influenced by repeated assembling and disassembling. Therefore, the design of the inner cylinder 110 is added, and only the inner cylinder 110 with simpler assembly structure and fewer matching parts is needed when the objects to be plated are assembled and disassembled, thereby being beneficial to the maintenance of the whole equipment and the prolonging of the service life of the equipment.

(3) Is beneficial to production and maintenance: furnace cleaning is an important part of a Physical Vapor Deposition (PVD) process, and the furnace is required to be cleaned and maintained after a certain number of furnaces are deposited. The design of the inner cylinder 110 is added, so that the conventional maintenance and the cleaning work in the furnace during production can be facilitated, namely, only the inner cylinder 110 needs to be moved out to clean the inner cylinder 110.

In one example, the inner cylinder 110 and the outer cylinder 120 are connected by a linear limiting groove 123 and a limiting convex strip 111 movably embedded in the limiting groove 123. In the illustrated specific example, the outer sidewall of the inner cylinder 110 is provided with a plurality of limiting ribs 111, the plurality of limiting ribs 111 extend along the axial direction of the inner cylinder 110, and the inner sidewall of the outer cylinder 120 is provided with a plurality of limiting grooves 123 engaged therewith. The inner cylinder 110 can be drawn out or inserted in the axial direction without moving the outer cylinder 120 and the plating target source 20, and if necessary, a cart can be incorporated. After the inner barrel 110 is removed, the plurality of sputtering target source materials can be replaced.

The outer side wall of the outer cylinder 120 is provided with a limiting rail 121.

As shown in fig. 6, in one example, the outer cylinder 120 is provided with a plurality of openings 124 to reduce weight. The end of the outer cylinder 120 is further provided with a stopper 125 to prevent the inner cylinder 110 from being unintentionally separated.

In one example, the inner cylinder 110 and the outer cylinder 120 conduct current through the inner walls of the limit protrusions 111 and the limit grooves 123.

Further, in one example, the outer cylinder 120 and the inner cylinder 110 are further connected by a conductive wire 130, and the circuit conduction design has a double guarantee. Preferably, the conductive wire 130 has high temperature resistance.

As shown in FIG. 7, in one example, a handle 112 is provided at one end of the inner barrel 110 to facilitate the pulling out or inserting of the inner barrel 110 into the outer barrel 120. The two handles 112 are oppositely arranged, so that the operation of a person is facilitated.

The inner wall of the sputtering inner cavity 101 is provided with a plurality of stirring blades 113. When the sputtering roller 100 rotates, the stirring blade 113 in the sputtering inner cavity 101 drives and stirs the workpiece at the bottom, and after reaching a certain height, the workpiece falls under the action of gravity, so that the stirring and the vertical turning of the workpiece are realized. The coating can be made more uniform by the stirring action of the stirring blade 113. The number of stirring blades 113 can be adjusted according to the size and shape of the cargo.

In one example, the plurality of stirring vanes 113 are uniformly distributed in the sputtering chamber 101.

In one example, the stirring blade 113 extends in a direction non-parallel to the axial direction of the sputtering drum 100 with a certain inclination angle. The stirring blade 113 is a variable cross-section blade. The design is beneficial to the full and uniform stirring of the workpiece to be plated, can accelerate the effective turnover of the object to be plated, improves the uniform contact between the surface to be plated and sputtering particles, and avoids the risk that the workpiece to be plated falls from a high place and is damaged.

The above-mentioned drum-type magnetron sputtering coating machine 10, through the electrically conductive gyro wheel that sets up on the roller seat 200 and the electrically conductive mode of the outside wall contact of the sputter cylinder 100, to treat the work piece of plating in the sputtering inner chamber 101 and exert bias voltage, electrically conductive gyro wheel is adaptable in the electric conduction of the rotation in-process of sputter cylinder 100, and the high temperature vacuum environment in the magnetron sputtering technological process can not produce adverse effect to electrically conductive gyro wheel, and electrically conductive gyro wheel can not pollute the vacuum coating environment.

Furthermore, the conductive roller has the function of supporting the sputtering roller 100 while having the conductive function, and bears the weight of the sputtering roller 100 and the workpiece to be plated therein, the driving device 300 is a non-bearing device, and only needs to transmit without bearing pressure, so that the burden of the driving device 300 can be reduced, and the effects of stably rotating the sputtering roller 100 and prolonging the maintenance period and the service life of the driving device are achieved.

The drum-type magnetron sputtering coating machine 10 has the characteristics of simple and flexible structure, and the like, and the sputtering drum 100, the driving device 300, the transmission assembly and the coating target source 20 are mutually independent and are easy to disassemble, assemble and maintain.

The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.

The above-mentioned embodiments only express several embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention. Therefore, the protection scope of the present patent shall be subject to the appended claims.