阅读说明：本技术 一种Logo褪镀工艺 (Logo deplating process ) 是由 周群飞 吴遇青 于 2018-09-04 设计创作，主要内容包括：本发明提供了一种Logo褪镀工艺,包括以下步骤：第一步、将产品放入褪镀液A中浸泡褪除PVD膜层表面氧化物；第二步、将产品放入褪镀液B中浸泡褪除PVD膜层；第三步、将产品放入褪镀液C中浸泡褪除保护油墨；第四步、将浸泡后的产品进行清洗,即得褪镀后的产品；所述褪镀液A以质量百分含量计包括如下组分：无机碱10％-20％,碳酸盐1％-2％,助剂1％-3％以及余量的水。采用本发明的褪镀工艺达到了很好的褪镀效果且可实现自动化作业,使产品良率保持在88％左右；所述褪镀液A、B和C对产品褪镀时温度低、褪镀时间短,从而便于节约能源、降低作业风险以及提高褪镀效率。(The invention provides a Logo deplating process, which comprises the following steps: firstly, putting a product into a deplating solution A to soak and deplate oxides on the surface of a PVD (physical vapor deposition) film layer; secondly, putting the product into a deplating liquid B to soak and deplate the PVD film layer; thirdly, putting the product into a deplating solution C to soak and deplate the protective printing ink; fourthly, cleaning the soaked product to obtain a deplated product; the deplating liquid A comprises the following components in percentage by mass: 10-20% of inorganic base, 1-2% of carbonate, 1-3% of auxiliary agent and the balance of water. The plating removing process achieves good plating removing effect and can realize automatic operation, so that the yield of products is kept about 88%; the deplating liquid A, B and C has low temperature and short deplating time when deplating the product, thereby being convenient for saving energy, reducing operation risk and improving deplating efficiency.)

1. A Logo deplating process is characterized by comprising the following steps:

firstly, putting a product into a deplating solution A to soak and deplate oxides on the surface of a PVD (physical vapor deposition) film layer;

secondly, putting the product into a deplating liquid B to soak and deplate the PVD film layer;

thirdly, putting the product into a deplating solution C to soak and deplate the protective printing ink;

fourthly, cleaning the soaked product to obtain a deplated product;

the deplating liquid A comprises the following components in percentage by mass: 10-20% of inorganic base, 1-2% of carbonate, 1-3% of auxiliary agent and the balance of water.

2. The Logo deplating process according to claim 1, wherein the deplating solution A comprises the following components in percentage by mass: 15% of inorganic base, 2% of carbonate, 3% of auxiliary agent and the balance of water;

the inorganic base is potassium hydroxide; the carbonate is potassium carbonate; the auxiliary agent is sodium dodecyl sulfate and sodium fatty alcohol-polyoxyethylene ether sulfate.

3. The Logo deplating process according to claim 2, wherein the pH value of the deplating solution A is 6; when the product is deplated: the temperature is 15-25 ℃, and the deplating time is 30-60 s.

4. The Logo deplating process according to claim 1, wherein the deplating solution B comprises a deplating solution B1 and a deplating solution B2;

the deplating liquid B1 comprises the following components in percentage by mass: 12-18% of inorganic base, 10-12% of anhydrous sodium citrate, 2-4% of auxiliary agent and the balance of water;

the deplating liquid B2 comprises the following components in percentage by mass: 25-30% of inorganic base, 15-20% of anhydrous sodium citrate, 10-15% of auxiliary agent and the balance of water.

5. The Logo deplating process according to claim 4, wherein the deplating solution B1 comprises the following components in percentage by mass: 15% of inorganic base, 11% of anhydrous sodium citrate, 3% of an auxiliary agent and the balance of water; the pH value of the deplating liquid B1 is 13;

the deplating liquid B2 comprises the following components in percentage by mass: 28% of inorganic base, 18% of anhydrous sodium citrate, 13% of auxiliary agent and the balance of water; the pH value of the deplating liquid B2 is 6;

the inorganic alkali in the deplating liquid B1 and the deplating liquid B2 is potassium hydroxide; the auxiliary agents in the deplating solution B1 comprise potassium ferrate and sodium dodecyl sulfate; the auxiliary agent in the deplating liquid B2 is hydrogen peroxide.

6. The Logo deplating process according to claim 5, wherein the deplating liquid B1 and the deplating liquid B2 are mixed to deplate a product when the deplating liquid B deplates, and the deplating liquid B1 and the deplating liquid B2 are mixed according to the volume ratio of 1: 1; when the product is deplated: the temperature is 15-25 ℃, and the deplating time is 150-180 s.

7. The Logo deplating process according to claim 1, wherein the deplating solution C comprises the following components in percentage by mass: 20-30% of dimethyl carbonate, 10-20% of propylene glycol, 5-10% of an auxiliary agent and the balance of water.

8. The Logo deplating process according to claim 7, wherein the deplating solution C comprises the following components in percentage by mass: 25% of dimethyl carbonate, 15% of propylene glycol, 7% of an auxiliary agent and the balance of water; the auxiliary agent comprises at least one of propylene glycol methyl ether, glycerol and benzotriazole; the pH value of the deplating liquid C is 8, and when the product is deplated: the temperature is 70-90 ℃, and the deplating time is 300-360 s.

9. The Logo deplating process according to any one of claims 1 to 8, wherein stock solutions are used for deplating the products by the deplating solutions A, B and C.

10. The Logo deplating process according to claim 9, wherein the fourth step is carried out by pure water cleaning at 50-70 ℃ for 150-200 s.

Technical Field

The invention relates to the technical field of Logo processing, in particular to a Logo deplating process.

Background

With the progress of society, glass has been used as the rear cover of mobile phone, and is a fashion, and compared with the rear cover of traditional plastics and metal mobile phone, the rear cover of glass has advantages such as frivolous, transparent clean, anti-fingerprint, anti-dazzle, signal transmission are strong. The traditional Logo mode adopts a silver ink printing method or an aluminum-electroplating ink re-printing method, and the Logo produced by the mode is not attractive, large in step position and free of metal texture. Later, the Logo was prepared using a hollowing process: printing protective ink by silk screen; cleaning; electroplating aluminum and titanium; deplating protects the ink. The novel Logo preparation method adopts a solid process: electroplating aluminum and titanium; then screen printing protective ink (Logo shape); then, removing aluminum and titanium except the Logo; and finally, removing the protective printing ink. The Logo manufactured by adopting the solid process has beautiful appearance, small step and strong metal texture; there are many advantages over previous hollowing processes.

However, in the solid process, how to remove aluminum, titanium and protective ink except Logo is an important factor influencing Logo quality on the rear cover of the mobile phone glass. The skilled person has also made some studies on this deplating problem. For example, the invention patent with the application number of 201410387687.9 discloses a sapphire wafer deplating process, which comprises the following steps: firstly, high-temperature deinking, namely heating the sapphire wafer to 450-480 ℃; secondly, cooling, namely cooling the temperature of the sapphire wafer to 80-100 ℃; thirdly, demoulding, namely cleaning the sapphire wafer by using 100% by mass of alkaline optical glass cleaning agent; step four, rinsing, namely rinsing the sapphire wafer by using deionized water; fifthly, cleaning, namely cleaning the sapphire wafer by using 10-15% by mass of an alkaline water-based environment-friendly cleaning agent; sixthly, removing residues, and soaking the sapphire wafer by using a citric acid solution; and step seven, rinsing for the second time, wherein the sapphire wafer is rinsed by using deionized water.

The invention patent with application number 201710216595.8 discloses an optical coating deplating process, which comprises the following steps: s1: designing a shielding pattern and a screen printing plate: designing by using CAD and COREIDRAW software, then outputting patterns and developing the film, and developing the film pattern on a screen plate at the developing temperature of 25-30 ℃ for 25-35 min; s2: printing: debugging a printing machine, installing a screen printing plate on a screen frame arm of the printing machine for fixing, pouring characteristic printing ink on the screen printing plate and uniformly coating the characteristic printing ink, placing an electroplated product on a printing table, and printing the pattern on the screen printing plate on the electroplated product by using the printing machine; s3: drying and curing; s4: electroplating: debugging a coating machine, putting a coating material into the coating machine, fixing an electroplated product on the coating machine, and electroplating the electroplated product by using the coating machine; s5: cleaning: and (3) putting the product into clean water for cleaning for 15-20 min, and cleaning the ink to obtain the deplating product.

In addition, other deplating processes are provided, and the existing technology can deplate the PVD film layer and the protective printing ink when the product is deplated, but has the following defects: 1. the deplating temperature is high: energy waste and operation risk are increased; 2. the deplating time is long: the deplating efficiency is reduced.

In summary, there is a need for a Logo deplating process to solve the problems in the prior art.

Disclosure of Invention

The invention aims to provide a Logo deplating process, which comprises the following specific technical scheme:

a Logo deplating process comprises the following steps:

firstly, putting a product into a deplating solution A to soak and deplate oxides on the surface of a PVD (physical vapor deposition) film layer;

secondly, putting the product into a deplating liquid B to soak and deplate the PVD film layer;

thirdly, putting the product into a deplating solution C to soak and deplate the protective printing ink;

fourthly, cleaning the soaked product to obtain a deplated product;

the deplating liquid A comprises the following components in percentage by mass: 10-20% of inorganic base, 1-2% of carbonate, 1-3% of auxiliary agent and the balance of water.

Preferably, in the above technical scheme, the deplating solution a comprises the following components in percentage by mass: 15% of inorganic base, 2% of carbonate, 3% of auxiliary agent and the balance of water;

the inorganic base is potassium hydroxide; the carbonate is potassium carbonate; the auxiliary agent is sodium dodecyl sulfate and sodium fatty alcohol-polyoxyethylene ether sulfate.

Preferably, in the above technical scheme, the pH value of the deplating liquid a is 6; when the product is deplated: the temperature is 15-25 ℃, and the deplating time is 30-60 s.

Preferably, in the above technical scheme, the deplating solution B comprises a deplating solution B1 and a deplating solution B2;

the deplating liquid B1 comprises the following components in percentage by mass: 12-18% of inorganic base, 10-12% of anhydrous sodium citrate, 2-4% of auxiliary agent and the balance of water;

the deplating liquid B2 comprises the following components in percentage by mass: 25-30% of inorganic base, 15-20% of anhydrous sodium citrate, 10-15% of auxiliary agent and the balance of water.

Preferably in the above technical scheme, the deplating solution B1 comprises the following components in percentage by mass: 15% of inorganic base, 11% of anhydrous sodium citrate, 3% of an auxiliary agent and the balance of water; the pH value of the deplating liquid B1 is 13;

the deplating liquid B2 comprises the following components in percentage by mass: 28% of inorganic base, 18% of anhydrous sodium citrate, 13% of auxiliary agent and the balance of water; the pH value of the deplating liquid B2 is 6;

the inorganic alkali in the deplating liquid B1 and the deplating liquid B2 is potassium hydroxide; the auxiliaries in the deplating solution B1 comprise potassium ferrate and sodium dodecyl sulfate; the auxiliary agent in the deplating liquid B2 is hydrogen peroxide.

Preferably, in the technical scheme, when the deplating liquid B is deplated, the product is deplated by mixing the deplating liquid B1 and the deplating liquid B2, and the deplating liquid B1 and the deplating liquid B2 are mixed according to the volume ratio of 1: 1; when the product is deplated: the temperature is 15-25 ℃, the deplating time is 150-180 s, and the pH value is 11-13.

Preferably in the above technical scheme, the deplating solution C comprises the following components in percentage by mass: 20-30% of dimethyl carbonate, 10-20% of propylene glycol, 5-10% of an auxiliary agent and the balance of water.

Preferably in the above technical scheme, the deplating solution C comprises the following components in percentage by mass: 25% of dimethyl carbonate, 15% of propylene glycol, 7% of an auxiliary agent and the balance of water; the auxiliary agent comprises at least one of propylene glycol methyl ether, glycerol and benzotriazole; the pH value of the deplating liquid C is 8, and when the product is deplated: the temperature is 70-90 ℃, and the deplating time is 300-360 s.

Preferably, in the above technical scheme, the deplating solutions A, B and C are both subjected to stock solution deplating when the product is deplated.

Preferably, in the above technical scheme, the fourth step adopts pure water for cleaning, the cleaning temperature is 50-70 ℃, and the cleaning time is 150-200 s.

Preferably, in the above technical scheme, each step of the Logo deplating process is performed in an ultrasonic cleaning machine, and the ultrasonic current is 2-4 amperes.

The technical scheme of the invention has the following beneficial effects:

(1) in the invention, the stock solutions of the deplating solution A, B and the deplating solution C are adopted to deplate the product, so that the oxide on the surface of the PVD film layer, the PVD film layer and the protective printing ink can be effectively deplated; the plating removing process achieves good plating removing effect and can realize automatic operation, so that the yield of products is kept about 88%; the plating removal effect achieved by the prior hollow-out process can only keep the product yield at about 65%, and the hollow-out process also remains manual plating removal.

(2) When the deplating liquid A deplates the product: the temperature is 15-25 ℃, and the deplating time is 30-60 s; when the deplating liquid B deplates the product: the temperature is 15-25 ℃, and the deplating time is 150-180 s; when the deplating liquid C deplates the product: the temperature is 70-90 ℃, and the deplating time is 300-360 s. This shows that the deplating solutions A, B and C have low temperature and short deplating time when deplating the products, thereby being convenient for saving energy, reducing operation risk and improving deplating efficiency.

(3) In the invention, when the deplating liquid B is deplated, the product is deplated by mixing the deplating liquid B1 and the deplating liquid B2, and the product is deplated by mixing the deplating liquid B1 and the deplating liquid B2 according to the volume ratio of 1:1, so that the deplating effect of the PVD (physical vapor deposition) film layer is ensured.

(4) The pH value of the deplating liquid A is 6, the pH value of the deplating liquid B is 11-13, and the pH value of the deplating liquid C is 8, so that the pH values of the deplating liquid A, B and C are relatively mild, the operation risk is reduced, the product quality is improved, and the service life of equipment is prolonged.

In addition to the objects, features and advantages described above, other objects, features and advantages of the present invention are also provided. The present invention will be described in further detail with reference to examples.

Detailed Description

The invention is described in detail below with reference to specific examples, but it can be implemented in many different ways as defined and covered by the claims.