阅读说明：本技术 磁控溅射阴极系统 (Magnetron sputtering cathode system ) 是由 王三军 刘圣烈 黄维邦 余晓军 于 2017-12-26 设计创作，主要内容包括：一种磁控溅射阴极系统(10),磁控溅射阴极系统(10)包括靶材(12)和设置在靶材(12)一侧的多个电磁系统单元(14)。每个电磁系统单元(14)独立工作并能够产生不同的磁力效应,电磁系统单元(14)的磁场线穿过靶材(12)的溅射面(122)。(A magnetron sputtering cathode system (10), the magnetron sputtering cathode system (10) comprising a target (12) and a plurality of electromagnetic system units (14) arranged at one side of the target (12). Each electromagnetic system unit (14) operates independently and is capable of generating different magnetic effects, and magnetic field lines of the electromagnetic system unit (14) pass through a sputtering surface (122) of the target (12).)