阅读说明：本技术 一种双层金属复合丝材的制作方法 (Method for manufacturing double-layer metal composite wire ) 是由 徐海东 陈文强 胡轶 段金炽 于 2021-08-05 设计创作，主要内容包括：本发明属于金属复合技术领域,具体公开了一种双层金属复合丝材的制作方法,包括以下步骤：S1:选材并进行表面处理：选取一种廉金属丝材作为基材,选取一种贵金属作为靶材；并对基材和靶材进行表面处理；S2:镀膜处理：采用磁控溅射的方式,在廉金属丝材表面镀一层贵金属薄膜,形成初步的双层金属复合丝材；S3:热处理：对初步的双层金属复合丝材进行热处理；S4:拉拔处理：对热处理后的双层金属复合丝材进行拉拔处理,拉拔至所需的尺寸,形成双层金属复合丝材成品。上述制备方法,能够解决现有方式制备的双层金属存在的薄膜层易脱落、复合材料性能低等问题,并且能够达到降本增效的效果。(The invention belongs to the technical field of metal compounding, and particularly discloses a manufacturing method of a double-layer metal composite wire material, which comprises the following steps: s1, selecting materials and carrying out surface treatment: selecting a cheap metal wire as a base material, and selecting a noble metal as a target material; and carrying out surface treatment on the substrate and the target material; s2, coating treatment: plating a layer of noble metal film on the surface of the cheap metal wire by adopting a magnetron sputtering mode to form a primary double-layer metal composite wire; s3, heat treatment: carrying out heat treatment on the preliminary double-layer metal composite wire; s4, drawing treatment: and drawing the double-layer metal composite wire subjected to heat treatment to a required size to form a finished product of the double-layer metal composite wire. The preparation method can solve the problems that the film layer of the double-layer metal prepared by the existing method is easy to fall off, the performance of the composite material is low and the like, and can achieve the effects of cost reduction and efficiency improvement.)

1. A method for manufacturing a double-layer metal composite wire is characterized by comprising the following steps: the method comprises the following steps:

s1, selecting materials and carrying out surface treatment: selecting a cheap metal wire (3) as a base material, and selecting a noble metal as a target material (2); and carrying out surface treatment on the base material and the target material (2);

s2, coating treatment: plating a layer of noble metal film layer on the surface of the cheap metal wire (3) by adopting a magnetron sputtering mode to form a primary double-layer metal composite wire;

s3, heat treatment: carrying out heat treatment on the preliminary double-layer metal composite wire;

s4, drawing treatment: and drawing the double-layer metal composite wire subjected to heat treatment to a required size to form a finished product of the double-layer metal composite wire.

2. The method for manufacturing the double-layer metal composite wire according to claim 1, wherein the method comprises the following steps: in step S2, a magnetron sputtering device is used for processing, a sample stage (4) is provided in the magnetron sputtering device, and a fixing component for mounting the cheap metal wire material (3) is provided on the sample stage (4); the noble metal target material (2) is arranged on the direct current sputtering target seat.

3. The method for manufacturing the double-layer metal composite wire according to claim 2, wherein the method comprises the following steps: in step S2, the specific method of the plating process is:

s21, mounting the noble metal target material (2) on the DC sputtering target base, and mounting the cheap metal wire material (3) on the fixed component;

s22, placing the cheap metal wire (3) on a sample table (4) in a vacuum chamber (1) of a magnetron sputtering device;

s23, adjusting the air pressure in the vacuum chamber (1), filling inert gas into the vacuum chamber (1), and heating the cheap metal wire (3) on the sample table (4);

and S24, connecting the direct current sputtering target seat into a pulse direct current power supply, and preparing the noble metal thin film layer on the surface of the cheap metal wire material (3).

4. The method for manufacturing the double-layer metal composite wire according to claim 3, wherein the method comprises the following steps: in step S23, the pressure in the vacuum chamber (1) is less than 10 DEG^-3Pa。

5. The method for manufacturing the double-layer metal composite wire according to claim 3, wherein the method comprises the following steps: in step S23, the inert gas is argon and nitrogen in a ratio of 2: 1.

6. The method for manufacturing the double-layer metal composite wire according to claim 2, wherein the method comprises the following steps: the fixing assembly comprises two fixing plates (5), and connecting rods are correspondingly connected to the positions of four corners of the two fixing plates (5) respectively to form a rectangular frame; a plurality of through holes (6) or through grooves (7) are correspondingly arranged on the two fixing plates (5); the metal wire (3) can pass through the through hole (6) or the through groove (7); the through holes (6) or the through grooves (7) can prevent the metal wires (3) from contacting with each other.

7. The method for manufacturing the double-layer metal composite wire according to claim 1, wherein the method comprises the following steps: in step S3, the coated double-layer metal composite wire is placed in a high temperature furnace for heat treatment, and inert gas is filled in the high temperature furnace.

8. The method for manufacturing the double-layer metal composite wire according to claim 1, wherein the method comprises the following steps: in step S4, a drawing process is performed using a sizing-drawing die.

9. The method for manufacturing the double-layer metal composite wire according to claim 1, wherein the method comprises the following steps: in step S4, the diameter of the finished double-layer metal composite wire is 0.2mm-0.25 mm; the thickness of the noble metal thin film layer in the double-layer metal composite wire finished product is 0.1-0.2 mu m.

10. The method for manufacturing the double-layer metal composite wire according to claim 1, wherein the method comprises the following steps: the noble metal target material (2) adopts a platinum target, and the cheap metal wire material (3) adopts a nickel wire.

Technical Field

The invention belongs to the technical field of metal compounding, and particularly relates to a manufacturing method of a double-layer metal composite wire.

Background

The noble metal has good conductivity, chemical stability, proper hardness and elasticity, is an electric contact material with wide application range, generally does not use single noble metal at present, mainly uses alloy and composite materials thereof, and is prepared by processes of smelting, powder metallurgy, solid-phase rolling, electroplating, magnetron sputtering and the like. Although the performance of noble metals is relatively good, the use of noble metals alone leads to increased costs. Although the price of the cheap metal is low, the cheap metal is easy to be oxidized, has poor welding performance, is not resistant to corrosion and the like. In order to take cost and performance into consideration, usually, the cheap metal and the noble metal are compounded, the compounding method usually adopts smelting, electroplating, continuous hot rolling forming and the like, and by adopting the smelting method, a continuous solid solution is difficult to form between two metals, so that the performance of the alloy material is reduced; by adopting the electroplating method, the thin film layer is not firmly grown on the base layer and is easy to fall off; by adopting the continuous hot rolling forming method, the two metals are difficult to achieve good uniformity, and the mechanical properties of the materials are not favorable.

Disclosure of Invention

The invention aims to provide a method for manufacturing a double-layer metal composite wire, which aims to solve the problems that a thin film layer is easy to fall off, the performance of a composite material is low and the like caused by double-layer metal prepared by the conventional method.

In order to achieve the purpose, the technical scheme of the invention is as follows: a manufacturing method of a double-layer metal composite wire material comprises the following steps:

s1, selecting materials and carrying out surface treatment: selecting a cheap metal wire as a base material, and selecting a noble metal as a target material; and carrying out surface treatment on the substrate and the target material;

s2, coating treatment: plating a layer of noble metal thin film on the surface of the cheap metal wire by adopting a magnetron sputtering mode to form a primary double-layer metal composite wire;

s3, heat treatment: carrying out heat treatment on the preliminary double-layer metal composite wire;

s4, drawing treatment: and drawing the double-layer metal composite wire subjected to heat treatment to a required size to form a finished product of the double-layer metal composite wire.

Further, in step S2, a magnetron sputtering device is used for processing, a sample stage is arranged in the magnetron sputtering device, and a fixing assembly for mounting the base metal wire material is arranged on the sample stage; the noble metal target is arranged on a direct current sputtering target seat.

Further, in step S2, the specific method of the plating process is:

s21, mounting the noble metal target material on the DC sputtering target base, and mounting the cheap metal wire material on the fixing component;

s22, placing the cheap metal wire on a sample table in a vacuum chamber of the magnetron sputtering equipment;

s23, adjusting the air pressure in the vacuum chamber, filling inert gas into the vacuum chamber, and heating the cheap metal wire on the sample stage;

and S24, connecting the direct current sputtering target seat to a pulse direct current power supply, and preparing a noble metal thin film layer on the surface of the cheap metal wire material.

Further, in step S23, the air pressure in the vacuum chamber is less than 10^-3Pa。

Further, in step S23, argon and nitrogen are used as the inert gases in a ratio of 2: 1.

Furthermore, the fixing assembly comprises two fixing plates, and connecting rods are correspondingly connected to the positions of four corners of the two fixing plates respectively to form a rectangular frame; a plurality of through holes or through grooves are correspondingly arranged on the two fixing plates; the cheap metal wire can pass through the through hole or the through groove; the through holes or the through grooves can avoid mutual contact between the cheap metal wires.

Further, in step S3, the coated double-layer metal composite wire is placed in a high temperature furnace for heat treatment, and inert gas is charged into the high temperature furnace.

Further, in step S4, the drawing process is performed using a sizing-drawing die.

Further, in step S4, the diameter of the finished double-layer metal composite wire is 0.2mm-0.25 mm; the thickness of the noble metal thin film layer in the double-layer metal composite wire finished product is 0.1-0.2 mu m.

Further, the noble metal target material is a platinum target, and the cheap metal wire material is a nickel wire.

The beneficial effects of this technical scheme lie in: firstly, magnetron sputtering coating and heat treatment technology are used in a matching way, and inert gas is filled in the heat treatment process to protect the film, so that impurities in a high-temperature furnace can be taken away, and the chemical reaction of the film at high temperature can be prevented. After heat treatment, the adhesive force between the noble metal film layer and the cheap metal wire can be improved, and the surface hardness and the wear resistance of the composite metal wire can be improved. Secondly, a layer of noble metal film is plated on the surface of the cheap metal wire, so that the smoothness of the cheap metal wire can be improved. Thirdly, because the expansion coefficients of the noble metal and the cheap metal are different, the influence of the factors on the double-layer metal composite wire material can be effectively reduced by adopting the technical scheme for manufacturing. In the double-layer metal composite wire material in the technical scheme, the consumption of noble metal is reduced under the condition of ensuring the performance, so that the cost is saved. And fifthly, a magnetron sputtering coating mode is adopted, so that the noble metal film layer and the cheap metal wire have good bonding property, small pores, compact and uniform structure, large crystal grain size, good compactness and high film purity. The double-layer metal composite wire material in the technical scheme has the advantages of good welding performance, high overall strength, difficult oxidation, good corrosion resistance and the like.

Drawings

FIG. 1 is a flow chart of a method for manufacturing a double-layer metal composite wire according to the present invention;

FIG. 2 is a schematic structural view of a fixing plate with a through hole;

FIG. 3 is a schematic structural view of a fixing plate with through slots;

fig. 4 is a schematic structural view during magnetron sputtering.

Detailed Description

The following is further detailed by way of specific embodiments:

reference numerals in the drawings of the specification include: vacuum chamber 1, target 2, silk material 3, sample platform 4, fixed plate 5, through-hole 6, logical groove 7.

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

The examples are substantially as shown in figures 1 to 4 of the accompanying drawings: a manufacturing method of a double-layer metal composite wire material comprises the following steps:

s1, selecting materials and carrying out surface treatment: selecting a cheap metal wire 3 as a base material, selecting a nickel wire 3 in the embodiment, selecting a noble metal as a target material 2, and selecting a platinum target material 2 in the embodiment; and the nickel wire 3 and the platinum target 2 are subjected to surface treatment such as polishing treatment and the like.

S2, coating treatment: plating a platinum film layer on the surface of the nickel wire 3 by adopting a magnetron sputtering mode to form a primary double-layer metal composite wire; specifically, magnetron sputtering equipment is adopted for processing, as shown in fig. 4, a sample stage 4 is arranged in the magnetron sputtering equipment, and a fixing component for mounting the base metal wire 3 is arranged on the sample stage 4; the fixing assembly comprises two fixing plates 5, and connecting rods are correspondingly connected to the positions of four corners of the two fixing plates 5 respectively to form a rectangular frame; a plurality of through holes 6 or through grooves 7 are correspondingly arranged on the two fixing plates 5, as shown in fig. 2 and 3; the nickel wire 3 can pass through the through hole 6 or the through groove 7; the through holes 6 or the through grooves 7 can prevent the contact between the inexpensive metal wire materials 3. For example, in fig. 4, a fixing plate 5 with a through hole 6 is adopted, and the nickel wire 3 can be suspended in the sputtering vacuum chamber 1 through the through hole 6, so that the condition that the nickel wire 3 is contacted with each other to cause uneven film coating on certain parts can be avoided; mounting a platinum target material 2 on a direct current sputtering target seat; the specific coating method is as follows:

s21, mounting the platinum target 2 on a direct current sputtering target holder, and mounting the nickel wire 3 on a fixed assembly;

s22, placing the nickel wire 3 on a sample table 4 in a vacuum chamber 1 of a magnetron sputtering device;

s23, adjusting the air pressure in the vacuum chamber 1 to make the air pressure less than 10^-3Pa; filling inert gas into the vacuum chamber 1, wherein the inert gas adopts argon and nitrogen in a ratio of 2: 1; heating the nickel wire 3 on the sample table 4;

and S24, connecting the direct current sputtering target base to a pulse direct current power supply, and preparing a platinum film layer on the surface of the nickel wire 3.

S3, heat treatment: and (3) putting the double-layer metal composite wire subjected to film coating into a high-temperature furnace for heat treatment, and filling inert gas into the high-temperature furnace.

S4, drawing treatment: and (3) carrying out drawing treatment on the double-layer metal composite wire subjected to heat treatment, specifically carrying out drawing treatment by using a sizing drawing die, and drawing to a required size (for example, the diameter of the double-layer metal composite wire is 0.2-0.25 mm, and the thickness of a platinum film layer in the double-layer metal composite wire is 0.1-0.2 mu m) to form a finished product of the double-layer metal composite wire.

It is noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.

The foregoing is merely an example of the present invention, and common general knowledge in the field of known specific structures and characteristics is not described herein in any greater extent than that known in the art at the filing date or prior to the priority date of the application, so that those skilled in the art can now appreciate that all of the above-described techniques in this field and have the ability to apply routine experimentation before this date can be combined with one or more of the present teachings to complete and implement the present invention, and that certain typical known structures or known methods do not pose any impediments to the implementation of the present invention by those skilled in the art. It should be noted that, for those skilled in the art, without departing from the structure of the present invention, several changes and modifications can be made, which should also be regarded as the protection scope of the present invention, and these will not affect the effect of the implementation of the present invention and the practicability of the patent. The scope of the claims of the present application shall be determined by the contents of the claims, and the description of the embodiments and the like in the specification shall be used to explain the contents of the claims.