阅读说明：本技术 借助于磁控溅射涂覆具有平面或成形表面的基片的装置和方法 (Device and method for coating a substrate having a planar or profiled surface by means of magnetron sputtering ) 是由 M·维尔戈 A·普夫卢格 S·布伦斯 A·凯撒 T·梅尔齐格 T·齐肯罗特 于 2020-04-09 设计创作，主要内容包括：根据本发明,提供了一种借助于磁控溅射涂覆具有平面或成形表面的基片的装置,借助于该装置可以涂覆具有任何形状的表面,例如具有可设定层厚度轮廓的透镜、非球面或自由形态表面,从而在基本完成的表面上保持层功能。还提供了一种借助于磁控溅射涂覆具有平面或成形表面的基片的方法。(According to the invention, a device for coating substrates with a planar or profiled surface by means of magnetron sputtering is provided, by means of which surfaces with any shape can be coated, for example lenses with settable layer thickness profiles, aspherical surfaces or freeform surfaces, so that the layer function is maintained on the substantially finished surface. A method for coating a substrate having a planar or contoured surface by means of magnetron sputtering is also provided.)