阅读说明：本技术 一种毫米波封装结构及其制备方法 (Millimeter wave packaging structure and preparation method thereof ) 是由 赵浩然 王玮 温博 杨宇驰 徐涵 韩笑 杜建宇 于 2021-06-25 设计创作，主要内容包括：本发明涉及一种毫米波封装结构。该毫米波封装结构采取在硅衬底表面刻槽,并将射频芯片填埋的方式,减小了封装结构的厚度,使封装结构更加紧凑。本发明的天线、接地单元、硅衬底与芯片垂直互联,也使得封装结构更加紧凑。本发明利用由低损耗的介电材料旋涂玻璃生成的SiO-(2)薄膜作为层间的介质层。SiO-(2)作为介质层,具有优良的介电性能,能够降低芯片与天线之间的互连损耗。此外,由旋涂玻璃生成SiO-(2)薄膜的方法比通过等离子体增强化学气相淀积法沉积SiO-(2)的工作温度低,与芯片的兼容性更好。另外,本发明的传输线不经过硅衬底,电学信号在垂直方向上由芯片通过波导传至天线,也能够降低损耗,最大限度的提高天线的增益。本发明还涉及所述毫米波封装结构的制备方法。(The invention relates to a millimeter wave packaging structure. According to the millimeter wave packaging structure, the groove is cut on the surface of the silicon substrate, and the radio frequency chip is buried, so that the thickness of the packaging structure is reduced, and the packaging structure is more compact. The antenna, the grounding unit, the silicon substrate and the chip are vertically interconnected, so that the packaging structure is more compact. The present invention utilizes SiO generated by spin-coating glass on a low-loss dielectric material 2 The film is used as an interlayer dielectric layer. SiO 2 2 As a dielectric layer, a dielectric layer is formed,the dielectric performance is excellent, and the interconnection loss between the chip and the antenna can be reduced. Furthermore, SiO is generated from spin-on glass 2 Film deposition method vs. deposition of SiO by plasma enhanced chemical vapor deposition 2 The working temperature of (2) is low, and the compatibility with the chip is better. In addition, the transmission line of the invention does not pass through a silicon substrate, and the electric signal is transmitted to the antenna by the chip through the waveguide in the vertical direction, thereby reducing the loss and improving the gain of the antenna to the maximum extent. The invention also relates to a preparation method of the millimeter wave packaging structure.)

1. A millimeter wave package structure comprising:

a chip;

the silicon substrate is provided with a TSV structure, and the top of the silicon substrate is provided with a first groove for filling the chip;

the first rewiring layer is arranged on the upper surface of the silicon substrate and is connected with the TSV structure and the electrical I/O PAD on the chip;

a first silicon oxide layer covering the first rewiring layer and provided with a second groove exposing a part of the upper surface of the first rewiring layer;

the second rewiring layer is arranged on the upper surface of the first silicon oxide layer, is filled in the second groove, and comprises a waveguide, a transmission line and a grounding unit;

a second silicon oxide layer covering the second rewiring layer and provided with a third groove exposing a part of the upper surface of the second rewiring layer; and

and the third triple wiring layer is arranged on the upper surface of the second silicon dioxide layer, fills the third groove, and comprises a waveguide, a transmission line and an antenna.

2. The millimeter wave package structure according to claim 1, wherein the silicon substrate is a high resistance silicon substrate.

3. The millimeter wave package structure according to claim 1 or 2, wherein a third silicon oxide layer is disposed between the silicon substrate and the first redistribution layer, the third silicon oxide layer fills a gap between the chip and the first groove and covers the chip and an upper surface of the silicon substrate, and a through hole is disposed on the third silicon oxide layer to expose an electrical I/opad of the chip and an upper surface of the TSV structure.

4. The millimeter wave package structure according to claim 1 or 2, wherein the waveguides in the second and third rewiring layers are coplanar waveguides; the antenna adopts a patch antenna.

5. The millimeter wave package structure according to claim 1 or 2, wherein the first silicon oxide layer and the second silicon oxide layer each have a thickness of 5 to 15 μm.

6. The method for preparing a millimeter wave package structure according to claim 1, 2, 4 or 5, characterized by comprising:

providing a silicon substrate, and forming a TSV structure and a first groove on the silicon substrate;

burying a chip into the first groove;

forming a first rewiring layer on the upper surface of the silicon substrate, and enabling the first rewiring layer to be respectively connected with the TSV structure and the electrical I/O PAD on the chip;

forming a first silicon oxide layer covering the first rewiring layer on the upper surfaces of the silicon substrate and the chip, and forming a second groove on the first silicon oxide layer to expose part of the upper surface of the first rewiring layer;

forming a second rewiring layer including a waveguide, a transmission line and a ground unit on the first silicon oxide layer, and filling the second groove;

forming a second silicon oxide layer covering the second rewiring layer on the first silicon oxide layer, and forming a third groove on the second silicon oxide layer to expose part of the upper surface of the second rewiring layer; and

and forming a third redistribution layer comprising a waveguide, a transmission line and an antenna on the second silicon dioxide layer, wherein the third redistribution layer fills the third groove.

7. The method according to claim 6, wherein after the chip is buried and before the first redistribution layer is formed, a third silicon oxide layer is formed to fill a gap between the chip and the first groove and cover upper surfaces of the chip and the silicon substrate, and a through hole is formed in the third silicon oxide layer to expose an electrical I/O PAD of the chip and an upper surface of the TSV structure.

8. The method of claim 7, wherein the via is formed by photolithography, dry etching, wet etching or a combination thereof.

9. The method of claim 6 or 7, wherein the burying includes placing the chip in the first groove and bonding the two; the bonding is adhesive bonding or low temperature eutectic bonding.

10. The manufacturing method according to claim 6 or 7, wherein the first, second and third grooves are formed by a photolithography process, a wet etching process, a dry etching process or a combination thereof.

Technical Field

The invention relates to the field of microelectronic packaging, in particular to a millimeter wave packaging structure and a preparation method thereof.

Background

With the rise of the 5G communication era, heterogeneous integration and three-dimensional integration of active and passive devices have become key technical strategies for realizing high-performance millimeter wave systems. And the antenna integrated packaging module is suitable for all 5G products such as mobile phones, base stations and the like. The more compact package volume, the low loss interconnection between the chip and the antenna, and the high gain and high bandwidth antenna are essential factors for realizing the excellent performance of the millimeter wave system. Therefore, in the antenna packaging module, the packaging design with good performance and compact size, the selection of the low-loss interlayer dielectric layer film, the cooperative design of the active and passive devices and the antenna and the three-dimensional integration of the active and passive devices and the antenna in the millimeter wave band are the technological directions which should be the first breakthrough at present. The millimeter wave packaging structure is provided aiming at the requirements of the 5G communication era on more compact packaging size and low transmission loss.

Disclosure of Invention

The invention aims to overcome the defects of the prior art and provide a millimeter wave packaging structure which has a more compact packaging volume and low interconnection loss between a chip and an antenna.

The invention also aims to provide a preparation method of the millimeter wave packaging structure.

In order to achieve the above object, the present invention provides the following technical solutions.

A millimeter wave package structure comprising:

a chip;

the silicon substrate is provided with a TSV structure, and the top of the silicon substrate is provided with a first groove for filling the chip;

the first rewiring layer is arranged on the upper surface of the silicon substrate and is connected with the TSV structure and the electrical I/O PAD on the chip;

a first silicon oxide layer covering the first rewiring layer and provided with a second groove exposing a part of the upper surface of the first rewiring layer;

the second rewiring layer is arranged on the upper surface of the first silicon oxide layer, is filled in the second groove, and comprises a waveguide, a transmission line and a grounding unit;

a second silicon oxide layer covering the second rewiring layer and provided with a third groove exposing a part of the upper surface of the second rewiring layer; and

and the third triple wiring layer is arranged on the upper surface of the second silicon dioxide layer, fills the third groove, and comprises a waveguide, a transmission line and an antenna.

The preparation method of the millimeter wave packaging structure comprises the following steps:

providing a silicon substrate, and forming a TSV (through-silicon-via) structure and a first groove on the silicon substrate;

burying a chip into the first groove;

forming a first rewiring layer on the upper surface of the silicon substrate, and enabling the first rewiring layer to be respectively connected with the TSV structure and the electrical I/O PAD on the chip;

forming a first silicon oxide layer covering the first rewiring layer on the upper surfaces of the silicon substrate and the chip, and forming a second groove on the first silicon oxide layer to expose part of the upper surface of the first rewiring layer;

forming a second rewiring layer including a waveguide, a transmission line and a ground unit on the first silicon oxide layer, and filling the second groove;

forming a second silicon oxide layer covering the second rewiring layer on the first silicon oxide layer, and forming a third groove on the second silicon oxide layer to expose part of the upper surface of the second rewiring layer; and

and forming a third redistribution layer comprising a waveguide, a transmission line and an antenna on the second silicon dioxide layer, wherein the third redistribution layer fills the third groove.

Compared with the prior art, the invention achieves the following technical effects:

1. the millimeter wave packaging structure adopts the mode of notching the surface of the silicon substrate and burying the radio frequency chip, so that the thickness of the packaging structure is reduced, and the packaging structure is more compact. The antenna, the grounding unit, the silicon substrate and the chip are vertically interconnected, so that the packaging structure is more compact.

2. The present invention utilizes SiO generated from Spin-on-Glass (Spin-on-Glass) which is a low loss dielectric material₂The film is used as an interlayer dielectric layer. SiO 2₂As the dielectric layer, the dielectric layer has excellent dielectric property and can reduce the interconnection loss between the chip and the antenna. Furthermore, SiO is generated from spin-on glass₂The method of film deposition is superior to the deposition of SiO by Plasma Enhanced Chemical Vapor Deposition (PECVD)₂The working temperature of (2) is low, and the compatibility with the chip is better. In addition, the transmission line of the invention does not pass through a silicon substrate, and the electric signal is transmitted to the antenna by the chip through the waveguide in the vertical direction, thereby reducing the loss and improving the gain of the antenna to the maximum extent.

Drawings

Various other advantages and benefits will become apparent to those of ordinary skill in the art upon reading the following detailed description of the preferred embodiments. The drawings are only for purposes of illustrating the preferred embodiments and are not to be construed as limiting the invention. Also, like reference numerals are used to refer to like parts throughout the drawings. In the drawings:

fig. 1 shows a schematic diagram of the millimeter wave package structure of the present invention.

FIGS. 2 to 12 are schematic views showing the structures obtained at each step in the production process provided in example 1 of the present invention.

Description of the reference numerals

100 is a chip, 200 is a silicon substrate, 201 is a TSV structure, 202 is a first groove, 300 is a first redistribution layer, 400 is a first silicon oxide layer, 401 is a second groove, 500 is a second redistribution layer, 600 is a third silicon oxide layer, 601 is a third groove, 700 is a third redistribution layer, 800 is a third silicon oxide layer, 801 is a through hole, 900 is SiO₂An insulating layer.

Detailed Description

Hereinafter, embodiments of the present disclosure will be described with reference to the accompanying drawings. It should be understood that the description is illustrative only and is not intended to limit the scope of the present disclosure. Moreover, in the following description, descriptions of well-known structures and techniques are omitted so as to not unnecessarily obscure the concepts of the present disclosure.

Various structural schematics according to embodiments of the present disclosure are shown in the figures. The figures are not drawn to scale, wherein certain details are exaggerated and possibly omitted for clarity of presentation. The shapes of various regions, layers, and relative sizes and positional relationships therebetween shown in the drawings are merely exemplary, and deviations may occur in practice due to manufacturing tolerances or technical limitations, and a person skilled in the art may additionally design regions/layers having different shapes, sizes, relative positions, as actually required.

In the context of the present disclosure, when a layer/element is referred to as being "on" another layer/element, it can be directly on the other layer/element or intervening layers/elements may be present. In addition, if a layer/element is "on" another layer/element in one orientation, then that layer/element may be "under" the other layer/element when the orientation is reversed.

The invention will be further described with reference to the accompanying drawings.

Fig. 1 shows a schematic diagram of the millimeter wave package structure of the present invention. Specifically, as shown in fig. 1, the millimeter wave package structure of the present invention includes: a chip 100; a silicon substrate 200 provided with a TSV structure 201, and the top of the silicon substrate is provided with a first groove 202 for burying the chip 100; a first redistribution layer 300 disposed on the upper surface of the silicon substrate 200 and connected to the TSV structure 201 and the electrical I/opad on the chip 100, respectively; a first silicon oxide layer 400 covering the first redistribution layer 300 and provided with a second groove 401 exposing a part of the upper surface of the first redistribution layer 300; a second rewiring layer 500 disposed on the upper surface of the first silicon oxide layer 400 and filling the second groove 401, and including a waveguide, a transmission line, and a ground unit; a second silicon oxide layer 600 covering the second rewiring layer 500 and provided with a third groove 601 exposing a part of the upper surface of the second rewiring layer 500; and a third rewiring layer 700 disposed on an upper surface of the second silicon oxide layer 600 and filling the third groove 601, and including a waveguide, a transmission line, and an antenna.

In the present invention, the chip 100 may be a radio frequency chip (RFIC) for 5G communication, preferably a radio frequency chip in Ka or Ku band.

In order to reduce the interconnection loss between the chip and the antenna, the silicon substrate 200 is preferably a high-resistance silicon substrate. The TSV structure 201 penetrates through the upper and lower surfaces of the silicon substrate 200, and the conductive material therein may be copper, tungsten, polysilicon, or the like. The size of the first recess 202 may be determined according to the size of the chip, which should be slightly larger than the size of the chip, for example, a margin of 1-2 μm may be left for the subsequent chip filling. The millimeter wave packaging structure adopts the mode of notching the surface of the silicon substrate and burying the radio frequency chip, so that the thickness of the packaging structure is reduced, and the packaging structure is more compact.

The material of the metallization lines in the first redistribution layer 300 is not particularly limited in the present invention. Preferably, the metallization wiring may be gold wire, aluminum wire, copper wire, or the like. The first redistribution layer 300 is connected with the electrical I/O PAD on the chip 100 to realize I/O fan-out of the chip, so that the electrical I/O PAD in the chip area is led out and arranged in the whole silicon substrate area, and the PAD pitch is amplified. In addition, the first redistribution layer 300 is connected with the TSV structure 201, and can lead out an electrical I/O signal on the chip down to the interposer. The adapter plate is located below the silicon substrate 200 and connected with the TSV structure 201 of the silicon substrate 200 through solder balls, and may be a silicon-based adapter plate, an LTCC adapter plate, a PCB adapter plate, or the like. The solder balls may be a conventional metal such as tin metal.

Preferably, a third silicon oxide layer 800 is provided between the silicon substrate 200 and the first rewiring layer 300. The third silicon oxide layer 800 covers the upper surfaces of the chip 100 and the silicon substrate 200 and fills the gap between the chip 100 and the first groove 202. The layer thickness on the upper surfaces of the chip 100 and the silicon substrate 200 may be 1 to 5 micrometers. The third silicon oxide layer 800 is further provided with a through hole 801 for exposing the upper surfaces of the TSV structure 201 and the electrical I/opad of the chip 100. In the case where the third silicon oxide layer 800 and the via hole 801 are provided, the first rewiring layer 300 fills the via hole 801.

The thickness of the first silicon oxide layer 400 may be 5-15 microns.

The second redistribution layer 500 includes a waveguide, a transmission line, and a ground unit in addition to conventional metallization wiring (e.g., gold, aluminum, or copper wires, etc.). The waveguide, transmission line and ground element may be structures conventionally used in the art, and the waveguide is preferably a coplanar waveguide. The dimensions of the waveguide are designed according to the frequency band of operation. The invention preferably uses Ka and Ku wave bands, and the waveguide needs to have 50 omega impedance matching with the chip. The second redistribution layer 500 fills the second groove 401 so as to electrically communicate with the first redistribution layer 300.

The thickness of the second silicon oxide layer 600 may be 5-15 microns.

The third redistribution layer 700 includes a waveguide, a transmission line, and an antenna, in addition to conventional metallization wiring (e.g., gold, aluminum, or copper wire). The waveguides, transmission lines and antennas may be structures conventionally used in the art, with the waveguides preferably being coplanar waveguides. The antenna is a patch antenna or other antenna. The dimensions of the antenna and the waveguide are designed according to the frequency band of operation. The invention preferably uses Ka and Ku wave bands, and the waveguide needs to have 50 omega impedance matching with the chip. The third redistribution layer 700 fills the third recess 601 so as to be in electrical communication with the second redistribution layer 500.

The antenna, the grounding unit, the silicon substrate and the chip are vertically interconnected, so that the packaging structure is more compact. In addition, the transmission line of the invention does not pass through a silicon substrate, and the electric signal is transmitted to the antenna by the chip through the waveguide in the vertical direction, thereby reducing the loss and improving the gain of the antenna to the maximum extent.

The invention also provides a preparation method of the millimeter wave packaging structure, which comprises the following steps.

Firstly, a silicon substrate is provided, and a TSV structure and a first groove are formed on the silicon substrate.

The method of forming the TSV structure is not particularly limited. Through-silicon vias (TSVs) may be formed in a silicon substrate using, for example, a photolithography process, an etching process, a combination thereof, or the like. The etching process comprises conventional wet etching and dry etching, and the dry etching can also comprise ion milling etching, plasma etching and deep reactive ion etching. And then filling a conductive substance in the TSV by an electroplating or CVD method and the like to form the TSV structure. Conventional conductive substances may be metallic Cu, W, or polysilicon, etc. In one embodiment, the forming step of the TSV structure comprises etching, filling copper and thinning.

The method for forming the first groove in the present invention is not particularly limited, and for example, a photolithography process, a wet etching process, a dry etching process, a combination thereof, or the like may be used.

And then burying the chip into the first groove.

The embedding includes placing the chip in the first recess and bonding the two. The bonding method may be adhesive bonding, low temperature eutectic bonding, or the like. The binder used may be epoxy, polyurethane, polyvinyl acetate, polyvinyl acetal, or mixtures thereof, and the like. The present invention preferably uses daf (die attach film) film, which is an ultra-thin film adhesive used to connect semiconductor chips to package substrates and to connect chips to chips in semiconductor packaging processes. The DAF film is commercially available.

And then forming a first rewiring layer on the upper surface of the silicon substrate, and enabling the first rewiring layer to be respectively connected with the TSV structure and the electrical I/O PAD on the chip.

The method of forming the first rewiring layer of the present invention is not particularly limited, and may include the steps of forming a wiring pattern by photolithography, sputtering a metal adhesion layer, sputtering a metal seed layer, removing photoresist, and plating metal.

Preferably, after the chip is buried and before the first rewiring layer is formed, a third silicon oxide layer is formed to fill the gap between the chip and the first groove and to cover the chip and the upper surface of the silicon substrate. The third silicon oxide layer is formed by heating and curing a spin-on glass material. The thickness may be 1 to 5 microns, and if too thick, it may be thinned. Thereafter, a via is formed in the layer by photolithography, dry etching, wet etching or a combination thereof to expose the upper surfaces of the electrical I/O PAD and TSV structures of the chip.

And then forming a first silicon oxide layer covering the first rewiring layer on the upper surfaces of the silicon substrate and the chip, and forming a second groove on the first silicon oxide layer to expose part of the upper surface of the first rewiring layer. Under the condition that the third silicon oxide layer exists in the millimeter wave packaging structure, the first silicon oxide layer is formed on the third silicon oxide layer and covers the first rewiring layer.

The first silicon oxide layer may be formed by heat curing a spin-on-glass material. The spin-on-glass material is a siloxane-based liquid material, such as a tetraethoxysilane-based liquid material. The material can form SiO when heated at 200-300 DEG C₂Thin film, SiO deposition by PECVD₂The working temperature (generally 350 ℃) is low, the compatibility with the chip is good, and the chip can be directly purchased from the market or prepared by the market. SiO 2₂As the dielectric layer, the dielectric layer has excellent dielectric property and can reduce the interconnection loss between the chip and the antenna. The thickness of the first silicon oxide layer may be 5-15 microns. If too thick, thinning may be performed.

The method for forming the second groove in the present invention is not particularly limited, and for example, a photolithography process, a wet etching process, a dry etching process, a combination thereof, or the like may be used.

And then forming a second rewiring layer comprising a waveguide, a transmission line and a grounding unit on the first silicon oxide layer, wherein the second rewiring layer fills the second groove.

The method of forming the second rewiring layer of the present invention is not particularly limited, and may include the steps of forming a wiring pattern by photolithography, sputtering a metal adhesion layer, sputtering a metal seed layer, removing photoresist, and plating metal. And after the electroplating step, the second groove is filled with metal. The waveguide, transmission line and ground element may each be formed during or introduced after the electroplating step.

And then forming a second silicon oxide layer covering the second rewiring layer on the first silicon oxide layer, and forming a third groove on the second silicon oxide layer to expose part of the upper surface of the second rewiring layer.

The second silicon dioxide layer may be formed by heat curing a spin-on-glass material. The thickness may be 5-15 microns. If too thick, thinning may be performed.

The method for forming the third groove in the present invention is not particularly limited, and for example, a photolithography process, a wet etching process, a dry etching process, a combination thereof, or the like may be used.

Next, a third redistribution layer including a waveguide, a transmission line, and an antenna is formed on the second silicon oxide layer, filling the third groove.

The method for forming the third redistribution layer according to the present invention is not particularly limited, and may include the steps of forming a wiring pattern by photolithography, sputtering a metal adhesion layer, sputtering a metal seed layer, removing a photoresist, and plating a metal. And after the electroplating step, the third groove is filled with metal. The waveguide, transmission line and antenna may each be formed during or introduced after the electroplating step.

The invention will be further described with reference to specific embodiments and drawings, but the invention is not limited thereto.

Example 1

The method of forming the millimeter wave package structure includes the following steps.

The method comprises the following steps: forming a TSV structure on a high-resistance silicon wafer by using a TSV process, which comprises the following specific steps: 1. deep reactive ion etching is carried out on the high-resistance silicon wafer 200 to etch a round blind hole with the diameter of 30 microns and the depth of 300 micronsThe structure is shown in fig. 2 a; 2. growing a layer of SiO by a thermal oxidation process₂An insulating layer having a thickness of the order of hundreds of nanometers, the resulting structure being shown in FIG. 2 b; 3. in SiO₂Sputtering a Ti adhesion layer on the insulating layer, and then sputtering a Cu seed layer; 4. copper is electroplated to fill the blind via, and the resulting structure is shown in FIG. 2 c; 5. the front surface of the high-resistance silicon wafer 200 is chemically and mechanically polished and the back surface thereof is ground, so that Cu is exposed on both surfaces, thereby forming a TSV structure 201, and the resulting structure is shown in fig. 2 d.

Step two: a deep reactive ion etch process is used to etch a first recess 202 in the structure shown in fig. 2d, the size of the recess being determined by the size of the chip, leaving a 1-2 micron margin, and the resulting structure is shown in fig. 3.

Step three: the landfill comprises the following specific processes: 1. attaching a DAF film to the bottom surface of the radio frequency chip 100; 2. it is placed in the first recess 202 of the high resistance silicon wafer 200 using a bonding machine, and the resulting structure is shown in fig. 4.

Step four: forming a third silicon oxide layer 800, specifically including the following steps: 1. spin-coating a spin-on glass material to fill a gap between the rf chip 100 and the first groove 202 and cover the rf chip 100 and the upper surface of the high-resistance silicon wafer 200; 2. heating and curing to form SiO₂A thin film, i.e., a third silicon oxide layer 800; 3. performing chemical mechanical polishing to remove SiO on the upper surface₂The thickness is reduced to 1 micron to 5 microns; 4. and photoetching and etching the silicon oxide layer on the upper surface to form a through hole 801, thereby exposing the electrical I/O PAD of the radio frequency chip 100 and the upper surface of the TSV structure 201, so as to form a rewiring layer in the following step, and the obtained structure is shown in FIG. 5.

Step five: performing a rewiring process on the upper surface of the third silicon oxide layer 800 to form a first rewiring layer 300, specifically: 1. forming a rewiring pattern by photoetching; 2. sputtering a Ti metal adhesion layer of about 100 nm; 3. the sputtered Cu seed layer is about 100 nanometers; 4. removing the photoresist in the photoresist removing solution; 5. cu is electroplated to form a first redistribution layer 300, the first redistribution layer 300 fills the via 801, and the resulting structure is shown in fig. 6.

Step six: spin-coating a spin-on-glass material on the third silicon oxide layer 800 and heatingSolidified to form a first silicon oxide layer 400 (SiO)₂A thin film) covering the first redistribution layer 300 and having a thickness of 5-15 μm, and chemically and mechanically polishing the surface after curing is completed, the resulting structure being shown in fig. 7.

Step seven: photolithography and dry etching are performed on the upper surface of the first silicon oxide layer 400 to form a second groove 401, and the resulting structure is shown in fig. 8.

Step eight: performing a rewiring process on the upper surface of the first silicon oxide layer 400 to form a second rewiring layer 500 including a waveguide, a transmission line, a grounding unit and the like, specifically including the following steps: 1. forming a rewiring pattern by photoetching; 2. sputtering a Ti metal adhesion layer of about 100 nm; 3. the sputtered Cu seed layer is about 100 nanometers; 4. removing the photoresist in the photoresist removing solution; 5. cu is electroplated to form a second redistribution layer 500, the second redistribution layer 500 filling the second recess 401, and the resulting structure is shown in fig. 9.

Step nine: spin-on glass material is spin-coated on the first silicon oxide layer 400 and heat-cured, thereby forming a second silicon oxide layer 600 (SiO)₂A thin film) covering the second redistribution layer 500 and having a thickness of 5-15 μm, and chemically mechanically polishing the surface after curing is completed, the resulting structure being shown in fig. 10.

Step ten: photolithography and dry etching are performed on the upper surface of the second silicon oxide layer 600, thereby forming a third groove 601, as shown in fig. 11.

Step eleven: performing a rewiring process on the upper surface of the second silicon oxide layer 600 to form a third rewiring layer 700 including structures such as waveguides, transmission lines, antennas and the like, specifically including the following steps: 1. forming a rewiring pattern by photoetching; 2. sputtering a Ti metal adhesion layer of about 100 nm; 3. the sputtered Cu seed layer is about 100 nanometers; 4. removing the photoresist in the photoresist removing solution; 5. cu is electroplated to form a third redistribution layer 700, and the third redistribution layer 700 fills the third recess 601, resulting in the structure shown in fig. 1.

Step twelve: plating a layer of electroless nickel gold on the surface of the third redistribution layer 700 to prevent oxidation of the Cu metal; and implanting tin metal solder balls at the bottom of the TSV structure, welding the obtained packaging structure on a PCB, and supplying power through a power supply on the PCB, wherein the obtained structure is shown in figure 12.

As shown in fig. 12, the packaged chip emits radio frequency signals, and the signals are transmitted to an antenna through a waveguide to emit electromagnetic waves, which can be used as a Transmitter/Receiver (T/R) component.

The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any changes or substitutions that can be easily conceived by those skilled in the art within the technical scope of the present invention are included in the scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the appended claims.