阅读说明：本技术 半导体封装及其制造方法 (Semiconductor package and method of manufacturing the same ) 是由 沈钟辅 金知晃 赵汊济 韩相旭 于 2019-06-04 设计创作，主要内容包括：一种半导体封装包括：下基板；连接基板,耦合到下基板,所述连接基板具有围绕空腔的横向部分以及横向部分的顶表面上的第一导电图案；下基板上的下半导体芯片,所述下半导体芯片位于连接基板的空腔中,所述下半导体芯片包括下半导体芯片的顶表面上的第二导电图案；接合构件,将第一导电图案和第二导电图案彼此连接；以及第一导电图案和第二导电图案上的顶部封装。(A semiconductor package includes: a lower substrate; a connection substrate coupled to the lower substrate, the connection substrate having a lateral portion surrounding the cavity and a first conductive pattern on a top surface of the lateral portion; a lower semiconductor chip on the lower substrate, the lower semiconductor chip being located in the cavity of the connection substrate, the lower semiconductor chip including a second conductive pattern on a top surface of the lower semiconductor chip; a bonding member connecting the first conductive pattern and the second conductive pattern to each other; and a top package over the first and second conductive patterns.)

1. A semiconductor package, comprising:

A lower substrate;

A connection substrate coupled to the lower substrate, the connection substrate including:

A transverse portion surrounding the cavity, an

a first conductive pattern on a top surface of the lateral portion;

A lower semiconductor chip on the lower substrate, the lower semiconductor chip being located in the cavity of the connection substrate, the lower semiconductor chip including a second conductive pattern on a top surface of the lower semiconductor chip;

A bonding member connecting the first conductive pattern and the second conductive pattern to each other; and

a top package over the first conductive pattern and the second conductive pattern.

2. The semiconductor package of claim 1, wherein the top package comprises:

An upper substrate;

An upper semiconductor chip on the upper substrate; and

A connection terminal on a bottom surface of the upper substrate.

3. The semiconductor package of claim 2, wherein the connection terminal is located on the lower semiconductor chip.

4. The semiconductor package according to claim 2, wherein the connection terminal comprises:

A first connection terminal coupled to the first conductive pattern; and

A second connection terminal coupled to the second conductive pattern.

5. The semiconductor package according to claim 4, wherein the second connection terminal is electrically coupled to the lower substrate through the second conductive pattern, the bonding member, and the connection substrate.

6. The semiconductor package according to claim 2, wherein the connection terminal is electrically insulated from the lower semiconductor chip.

7. the semiconductor package of claim 2, wherein a width of the upper semiconductor chip is greater than a width of the lower semiconductor chip.

8. The semiconductor package of claim 1, wherein the top surface of the lower semiconductor die is a non-active surface.

9. The semiconductor package of claim 1, wherein the top surface of the lateral portion of the connection substrate and the top surface of the lower semiconductor chip are at the same height.

10. The semiconductor package of claim 1, wherein the bonding member comprises:

A bonding wire; or

A third conductive pattern between the first conductive pattern and the second conductive pattern.

11. The semiconductor package of claim 1, further comprising a lower molding member burying the lower semiconductor chip and the connection substrate on the lower substrate,

Wherein the lower molding member exposes the first conductive pattern and the second conductive pattern.

12. The semiconductor package of claim 1, wherein the lower semiconductor chip further comprises a via penetrating the lower semiconductor chip and electrically connecting the second conductive pattern to the lower substrate.

13. The semiconductor package of claim 1, wherein the lower substrate comprises a redistribution layer directly coupled to lower chip pads of the lower semiconductor chip and substrate pads of the connection substrate.

14. A semiconductor package, comprising:

A connection substrate, comprising:

Around the transverse part of the cavity there is,

A first conductive pattern on a top surface of the lateral portion, an

a via passing through the lateral portion and connected to the first conductive pattern;

A semiconductor chip within the cavity, comprising:

A second conductive pattern on the non-active surface of the semiconductor chip, the semiconductor chip and the second conductive pattern being electrically insulated from each other, an

An active surface facing the non-active surface; and

A bonding member electrically connecting the first conductive pattern and the second conductive pattern to each other.

15. The semiconductor package of claim 14, wherein the top surface of the lateral portion of the connection substrate and the non-active surface of the semiconductor chip are coplanar with one another.

16. The semiconductor package of claim 14, further comprising a top package coupled to the first and second conductive patterns.

17. the semiconductor package of claim 16, wherein the top package comprises first and second connection terminals under the top package,

Wherein the first connection terminal is coupled to the first conductive pattern, an

Wherein the second connection terminal is coupled to the second conductive pattern.

18. The semiconductor package of claim 16, wherein the top package has a width that is the same as a width of the connection substrate.

19. the semiconductor package of claim 16, further comprising an additional substrate below the connection substrate,

Wherein the connection substrate and the semiconductor chip are coupled to the additional substrate, an

Wherein the active surface of the semiconductor chip faces the additional substrate.

20. the semiconductor package of claim 19, wherein the semiconductor chip further comprises a chip via passing through the semiconductor chip, the chip via electrically connecting the second conductive pattern to the additional substrate.

21. The semiconductor package of claim 14, further comprising: a molding member covering the top surface of the lateral portion of the connection substrate and the inactive surface of the semiconductor chip, the molding member exposing the first and second conductive patterns.

22. A method of manufacturing a semiconductor package, the method comprising:

Providing a lower semiconductor chip comprising a first conductive pattern on a non-active surface of the lower semiconductor chip;

Providing a connection substrate including a cavity in the connection substrate and a second conductive pattern on a top surface of the connection substrate;

Disposing the lower semiconductor chip and the connection substrate on a lower substrate to place the lower semiconductor chip in the cavity of the connection substrate;

Bonding the first conductive pattern and the second conductive pattern to each other;

Providing a top package including a plurality of connection terminals on a bottom surface of the top package; and

Mounting the top package on the lower semiconductor chip and the connection substrate to couple the plurality of connection terminals to the first conductive patterns and the second conductive patterns.

23. The method of claim 22, wherein providing the lower semiconductor chip comprises:

Providing a conductive layer on the non-active surface of the lower semiconductor chip; and

And patterning the conductive layer.

24. The method of claim 22, wherein joining the first and second conductive patterns comprises:

Forming a molding member to cover the connection substrate and the lower semiconductor chip;

Performing an etching process on the molding member to form first recesses exposing the first and second conductive patterns; and

Wire bonding the first conductive pattern and the second conductive pattern to each other.

25. The method of claim 22, wherein joining the first and second conductive patterns comprises:

forming a molding member to cover the connection substrate and the lower semiconductor chip;

Patterning the molding member to form a second recess while exposing the first conductive pattern and the second conductive pattern; and

Filling the second recess with a conductive material to form a third conductive pattern.

Technical Field

The present disclosure relates to a semiconductor package and a method of manufacturing the same.

Background

Semiconductor packages are used to implement integrated circuit chips that are qualified for use in electronic products. In one type of semiconductor package, a semiconductor chip is mounted on a printed circuit board, and the semiconductor chip is electrically connected to the printed circuit board using bonding wires or bumps. With recent developments in the electronics industry, semiconductor packages have been variously developed to achieve the goals of small size, light weight, and/or low manufacturing cost. In addition, many kinds of semiconductor packages also include, for example, mass storage devices.

Disclosure of Invention

According to some example embodiments, a semiconductor package may include: a lower substrate; a connection substrate coupled to the lower substrate, the connection substrate having a lateral portion surrounding the cavity and a first conductive pattern on a top surface of the lateral portion; a lower semiconductor chip on the lower substrate, the lower semiconductor chip being located in the cavity of the connection substrate, the lower semiconductor chip including a second conductive pattern on a top surface of the lower semiconductor chip; a bonding member connecting the first conductive pattern and the second conductive pattern to each other; and a top package over the first and second conductive patterns.

According to some example embodiments, a semiconductor package may include: a connection substrate including a cavity therein and a first conductive pattern on a top surface of the connection substrate; a semiconductor chip located in the cavity and including a second conductive pattern, the semiconductor chip having a non-active surface on which the second conductive pattern is disposed and an active surface facing the non-active surface; and a bonding member electrically connecting the first conductive pattern and the second conductive pattern to each other. The semiconductor chip and the second conductive pattern may be electrically insulated from each other. The connection substrate may further include a via hole penetrating the connection substrate and connected to the first conductive pattern.

According to some example embodiments, a method of manufacturing a semiconductor package may include: providing a lower semiconductor chip comprising a first conductive pattern on a non-active surface of the lower semiconductor chip; providing a connection substrate including a cavity in the connection substrate and a second conductive pattern on a top surface of the connection substrate; disposing the lower semiconductor chip and the connection substrate on the lower substrate to place the lower semiconductor chip in the cavity of the connection substrate; bonding the first conductive pattern and the second conductive pattern to each other; providing a top package including a plurality of connection terminals on a bottom surface of the top package; and mounting a top package on the lower semiconductor chip and the connection substrate to couple the connection terminals to the first conductive patterns and the second conductive patterns.

drawings

Features will become apparent to those skilled in the art by describing in detail exemplary embodiments with reference to the attached drawings, wherein:

fig. 1 illustrates a cross-sectional view of a semiconductor package, according to some example embodiments.

Fig. 2 shows a plan view of the first conductive pattern, the second conductive pattern, and the joint member.

Fig. 3-5 illustrate cross-sectional views of semiconductor packages according to some example embodiments.

Fig. 6-12 show cross-sectional views of some stages in a method of manufacturing a semiconductor package, according to some example embodiments.

fig. 13-15 show cross-sectional views of some stages in a method of manufacturing a semiconductor package, according to some example embodiments.

fig. 16-23 show cross-sectional views of some stages in a method of manufacturing a semiconductor package, according to some example embodiments.

Detailed Description

A semiconductor package according to example embodiments is described below with reference to the accompanying drawings. Fig. 1 illustrates a cross-sectional view of a semiconductor package, according to some example embodiments.

Referring to fig. 1, a bottom package P100 may be provided. The bottom package P100 may include a lower substrate 100, a connection substrate 200, a lower semiconductor chip 300, and a lower molding member 400.

for example, the lower substrate 100 may be or may include a Printed Circuit Board (PCB) provided with a signal pattern on a top surface thereof. In another example, the lower substrate 100 may have an alternating structure of dielectric layers and wiring layers.

The external terminal 110 may be disposed under the lower substrate 100, for example, on a bottom surface of the lower substrate 100 facing away from the lower semiconductor chip 300. The external terminals 110 may include solder balls or solder bumps, and the bottom package P100 may include one of a Ball Grid Array (BGA) type, a Fine Ball Grid Array (FBGA) type, and a Land Grid Array (LGA) type, based on the type of the external terminals 110.

The connection substrate 200 may be disposed on the lower substrate 100. The connection substrate 200 may be mounted on a top surface of the lower substrate 100, for example, on a surface opposite to a bottom surface of the lower substrate 100. For example, the connection substrate 200 may be mounted on the lower substrate 100 by solder bumps or solder balls. The connection substrate 200 may be electrically connected to the external terminal 110 through the lower substrate 100. In this specification, the phrase "electrically connected/coupled" may include "directly or indirectly electrically connected/coupled".

The connection substrate 200 may include an opening OP penetrating the connection substrate 200, i.e., a cavity OP. For example, the opening OP may be shaped as an open hole, e.g., a cavity, connecting the bottom surface 200b and the top surface 200a of the connection substrate 200 to each other. For example, as shown in fig. 1, the opening OP may pass through the entire thickness of the connection substrate 200, and thus a lateral portion of the connection substrate 200 may surround the opening OP, for example, to provide a space to accommodate the lower semiconductor chip 300 described in more detail below.

The connection substrate 200 may include a base layer 210 and a conductive member 220 in the base layer 210. For example, the base layer 210 may include silicon oxide. The conductive member 220 may occupy an outer side (e.g., a peripheral side) of the connection substrate 200, and the opening OP may occupy an inner side (e.g., a central side) of the connection substrate 200. For example, as shown in fig. 1, the opening OP may pass through the entire thickness of the base layer 210, and the conductive member 220 may be located in and on a surface of a portion of the base layer 210 surrounding the opening OP (e.g., a lateral portion of the base layer 210 surrounding the opening OP). For example, the base layer 210 of the connection substrate 200 may surround the entire circumference of the opening OP (fig. 2). The conductive member 220 may include a connection substrate pad 222, a connection substrate via 224, and a first conductive pattern 226.

The connection substrate pad 222 may be disposed at a lower portion of the connection substrate 200, for example, on the bottom surface 200b of the connection substrate 200. The connection substrate 200 may be electrically connected to the lower substrate 100 through solder balls or solder bumps disposed on the connection substrate pads 222. The connection substrate via 224 may penetrate the base layer 210 and have an electrical connection with the connection substrate pad 222. The first conductive pattern 226 may be disposed on an upper portion of the connection substrate 200, for example, on the top surface 200a of the connection substrate 200. The first conductive pattern 226 may include a first pad CP1 on which the below-described top package P200 is mounted, a second pad CP2 coupled to the connection substrate via 224, a first wire EL1, and a first bonding pad BP 1. The first electric wire EL1, the first pad CP1, the second pad CP2, and the first bonding pad BP1 may constitute a circuit. As shown in fig. 1, the top package P200 may also be mounted on the second pad CP 2. For example, the bottom package P100 may be configured such that the first pad CP1 has the same function as the second pad CP 2. However, example embodiments of the present disclosure are not limited thereto.

The lower semiconductor chip 300 may be disposed on the lower substrate 100. As shown in fig. 1, the lower semiconductor chip 300 may be located in the opening OP of the connection substrate 200 (e.g., within the opening OP). The lower semiconductor chip 300 may have a planar shape smaller than that of the opening OP when viewed in a plan view. For example, the lower semiconductor chip 300 may be spaced apart from the inner sidewall of the opening OP, and for example, the connection substrate 200 may surround the periphery of the lower semiconductor chip 300 (fig. 2).

The lower semiconductor chip 300 may have a bottom surface 300b facing the lower substrate 100 and a top surface 300a opposite to the bottom surface 300 b. The bottom surface 300b of the lower semiconductor chip 300 may be an active surface, and the top surface 300a of the lower semiconductor chip 300 may be a non-active surface. The lower semiconductor chip 300 may be mounted on the top surface of the lower substrate 100. For example, the lower semiconductor chip 300 may be flip-chip bonded to the lower substrate 100. The lower semiconductor chip 300 may have a first circuit EC1, and the first circuit EC1 is electrically connected to the lower substrate 100 through lower chip terminals 310 (e.g., solder balls or solder bumps) disposed on the lower chip pads 305. The flux 340 may fill a space between the lower semiconductor chip 300 and the lower substrate 100. The lower semiconductor chip 300 may be, for example, a logic chip or a memory chip. The logic chip may include a logic portion and a memory portion. The memory chip may be or may include, for example, one or more of Dynamic Random Access Memory (DRAM), NAND flash memory, NOR flash memory, phase change random access memory (PRAM), resistive random access memory (ReRAM), and Magnetoresistive Random Access Memory (MRAM). The lower semiconductor chip 300 may be electrically connected to the external terminal 110. Fig. 1 shows only one lower semiconductor chip 300, but the lower semiconductor chip 300 may be provided in plurality.

The lower semiconductor chip 300 may include a second conductive pattern 320 on a top surface 300a, which is a non-active surface of the lower semiconductor chip 300. The top surface 300a of the lower semiconductor chip 300 may be located at the same height as the top surface 200a of the connection substrate 200, for example, the top surfaces 300a and 200a may be coplanar. The second conductive pattern 320 may include a third pad CP3 on which the top package P200 is mounted, a second wire EL2, and a second bonding pad BP 2. The second wire EL2 may redistribute the electrical connection between the third pad CP3 and the second bond pad BP 2. The second conductive pattern 320 may not be directly electrically connected with the lower semiconductor chip 300, for example, the lower semiconductor chip 300 and the second conductive pattern 320 may be electrically insulated from each other via the non-active top surface 300 a.

for example, the lower semiconductor chip 300 may include a chip via 330 therethrough. The chip via 330 may extend from the top surface 300a toward the bottom surface 300b of the lower semiconductor chip 300. The chip via 330 may be coupled to one of the third pads CP 3. The chip vias 330 may also be coupled to the lower substrate 100. In this case, the chip via 330 may electrically connect the second conductive pattern 320 to the lower substrate 100. In this configuration, the chip via 330 may not be coupled to the first circuit EC1 of the lower semiconductor chip 300 or may be electrically insulated from the first circuit EC1 of the lower semiconductor chip 300, for example, the first circuit EC1 of the lower semiconductor chip 300 and the chip via 330 may extend through opposite ends of the lower semiconductor chip 300. In another example, unlike fig. 1, the lower semiconductor chip 300 may not include the chip via 330.

The joint member BM may be provided. The bonding member BM may electrically connect the first bonding pad BP1 on the connection substrate 200 and the second bonding pad BP2 on the lower semiconductor chip 300 to each other. In some example embodiments, the joining member BM may be or may include a joining line. The second wire EL2 and the third pad CP3 may be electrically connected to the connection substrate 200 and the lower substrate 100 through the first and second bonding pads BP1 and BP2 and the bonding member BM.

fig. 2 is a plan view for explaining the first conductive pattern 226, the second conductive pattern 320, and the joint member BM shown in fig. 1, in which the lower semiconductor chip 300 and the connection substrate 200 are partially shown. Referring to fig. 2, the first pad CP1, the second pad CP2, and the first bonding pad BP1 of the connection substrate 200 may be electrically connected to each other by a first wire EL 1. The third pad CP3 and the second bonding pad BP2 of the lower semiconductor chip 300 may be electrically connected to each other by a second wire EL 2. The first and second bonding pads BP1 and BP2 may be electrically connected to each other through a bonding member BM. Fig. 2 arbitrarily shows the arrangement of the pads CP1, CP2, and CP3 and the bonding pads BP1 and BP2 for convenience of description, but the present disclosure is not limited thereto, and for example, one additional second pad CP2 may be located at the right side of fig. 2, adjacent to the first pad CP1 and connected to the first pad CP1 through the first wire EL1 (as shown in fig. 1).

Referring again to fig. 1, a lower molding member 400 may be disposed on the lower substrate 100. The lower molding member 400 may fill a space between the connection substrate 200 and the lower semiconductor chip 300. The lower molding member 400 may cover the top surface 300a of the lower semiconductor chip 300 and the top surface 200a of the connection substrate 200. The lower molding member 400 may cover the first electric wire EL1, the second electric wire EL2, the first bonding pad BP1, the second bonding pad BP2, and the bonding member BM. The lower mold member 400 may have a first recess RS1 therein, the first recess RS1 exposing the first and second pads CP1 and CP2 of the connection substrate 200 and the third pad CP3 of the lower semiconductor chip 300. Lower mold structurethe member 400 may comprise a polymer material, such as Ajinomoto bulk filmepoxy-based polymers or thermosetting resins.

in some example embodiments, the lower molding member 400 may expose the top surface 300a of the lower semiconductor chip 300. Fig. 3 illustrates a cross-sectional view showing a semiconductor package according to some example embodiments. As shown in fig. 3, the lower molding member 400 may expose the second wire EL2 and the third pad CP3 on the top surface 300a of the lower semiconductor chip 300. In this case, the lower molding member 400 may bury the bonding member BM and the second bonding pad BP2 of the lower semiconductor chip 300.

referring again to fig. 1, a top package P200 may be disposed on the bottom package P100. The top package P200 may include an upper substrate 500, an upper semiconductor chip 600, an upper mold member 700, and connection terminals 510.

for example, the upper substrate 500 may be or may include a Printed Circuit Board (PCB) provided with a signal pattern on a top surface thereof. In another example, the upper substrate 500 may have an alternating structure of dielectric layers and wiring layers. The width of the upper substrate 500 may be greater than the width W1 of the lower semiconductor chip 300, as shown in fig. 1. The width of the upper substrate 500 may be the same as or less than the width of the lower substrate 100, but example embodiments are not limited thereto. The width of the top package P200 (which may be the same as the width of the upper substrate 500) may be the same as the width of the connection substrate 200 (which may be the same as the width of the lower substrate 100).

The upper semiconductor chip 600 may be disposed on the upper substrate 500. The width W2 of the upper semiconductor chip 600 may be greater than the width W1 of the lower semiconductor chip 300. When viewed in a plan view, the upper semiconductor chip 600 may overlap the lower semiconductor chip 300 and also overlap a portion of the connection substrate 200, for example, the upper semiconductor chip 600 may completely overlap the lower semiconductor chip 300 and the lower molding member 400 in the opening OP around the lower semiconductor chip 300. The upper semiconductor chip 600 may have a bottom surface 600b facing the upper substrate 500 and a top surface 600a opposite to the bottom surface 600 b. The top surface 600a of the upper semiconductor chip 600 may be an active surface. The upper semiconductor chip 600 may be mounted on the top surface of the upper substrate 500. For example, the upper semiconductor chip 600 may be wire bonded to the upper substrate 500. The upper semiconductor chip 600 may be electrically connected to the upper substrate 500 through, for example, one or more bonding wires 610. The upper semiconductor chip 600 may be, for example, a logic chip or a memory chip. The logic chip may include a logic portion and a memory portion.

the upper mold member 700 may be disposed on the upper substrate 500. The upper mold member 700 may cover the top surface of the upper substrate 500 and the top surface 600a of the upper semiconductor chip 600. The upper molding member 700 may include a polymer material, such as Ajinomoto filmepoxy-based polymers or thermosetting resins.

the connection terminal 510 may be disposed under the upper substrate 500. The connection terminals 510 may include solder balls or solder bumps, and the top package P200 may include one of a Ball Grid Array (BGA) type, a Fine Ball Grid Array (FBGA) type, and a Land Grid Array (LGA) type, based on the type of the connection terminals 510. The upper semiconductor chip 600 may be electrically connected to the connection terminals 510.

the connection terminal 510 may include a first connection terminal 512 and a second connection terminal 514. The first connection terminal 512 may be disposed on the connection substrate 200. The first connection terminal 512 may be coupled to the first pad CP1 of the connection substrate 200. The second connection terminal 514 may be disposed on the lower semiconductor chip 300. The second connection terminal 514 may be coupled to the third pad CP3 of the lower semiconductor chip 300. The upper semiconductor chip 600 may be electrically connected to the first connection terminal 512 and the second connection terminal 514 through the upper substrate 500. The upper semiconductor chip 600 may include a second circuit EC2, the second circuit EC2 being electrically connected to the external terminals 110 through the second connection terminals 514, the second conductive patterns 320, the bonding members BM, and the first conductive patterns 226, and the upper semiconductor chip 600 may further include a third circuit EC2, the third circuit EC3 being electrically connected to the external terminals 110 through the first connection terminals 512 and the first conductive patterns 226. The second circuit EC2 and the third circuit EC3 may not be electrically connected or electrically insulated from the first circuit EC1 of the lower semiconductor chip 300, for example, the first connection terminal 512 may be electrically insulated from the lower semiconductor chip 300.

Fig. 4 and 5 illustrate cross-sectional views showing semiconductor packages according to some example embodiments. For convenience of description, descriptions of elements in fig. 4-5 corresponding to the reference numerals previously described with reference to fig. 1-3 are omitted or simplified.

Referring to fig. 4, a joint member BM may be provided. The bonding member BM may electrically connect the first and second bonding pads BP1 and BP2 to each other. In some example embodiments, the joining member BM may be or may include the third conductive pattern 410. The third conductive pattern 410 may be disposed in the second recess RS2 of the lower molding member 400. The second recess RS2 may be located between the first bonding pad BP1 and the second bonding pad BP 2. For example, in the second recess RS2 of the lower mold member 400, the third conductive pattern 410 may have a shape extending from the first bonding pad BP1 to the second bonding pad BP 2.

Referring to fig. 5, the bottom package P100 may be a fan-out board level package (FO-PLP). For example, the lower substrate 100 may be a redistribution substrate, i.e., a redistribution layer. The lower substrate 100 may include, for example, a dielectric layer 102 and a conductive layer 104. The conductive layer 104 may include one or more vias that penetrate the dielectric layer 102. For example, the dielectric layer 102 may include an inorganic insulating layer, e.g., a silicon oxide layer or a silicon nitride layer. In another example, the dielectric layer 102 may include a polymer material. The conductive layer 104 may be surrounded by the dielectric layer 102 or embedded in the dielectric layer 102. The conductive layer 104 may redistribute the electrical connection between the lower chip pad 305 of the lower semiconductor chip 300 and the external terminal 110 of the lower substrate 100. The bottom package P100 may have a fan-out type structure through the lower substrate 100. The conductive layer 104 may include a metal. The conductive layer 104 may be connected to a substrate pad 106 disposed on the bottom surface of the lower substrate 100. The passivation layer 108 may be disposed on the bottom surface of the lower substrate 100. The passivation layer 108 may include Ajinomoto deposited filmOrganic materials, inorganic materials or insulating polymers such as epoxy-based polymers. The external terminal 110 may be disposed on a bottom surface of the lower substrate 100. The external terminal 110 may be disposed on the substrate pad 106. The external terminal 110 may be electrically connected to the conductive layer 104 through the substrate pad 106.

The lower substrate 100 may directly contact the bottom surface 200b of the connection substrate 200 and the bottom surface 300b of the lower semiconductor chip 300. For example, the lower substrate 100 may be in direct contact with the lower chip pad 305 of the lower semiconductor chip 300 and the connection substrate pad 222 of the connection substrate 200.

in the semiconductor package according to some example embodiments, the conductive patterns 226 and 320 may be disposed on the top surface 200a of the connection substrate 200 and the top surface 300a of the lower semiconductor chip 300, and the top package P200 may be mounted on the conductive patterns 226 and 320. The connection terminals 510 of the top package P200 may be all disposed on the connection substrate 200 and the lower semiconductor chip 300. In this case, the connection terminals 510 may have an increased area for their positions, and as a result, the top package P200 may increase the number of output terminals (e.g., the connection terminals 510) on the bottom package P100. The conductive patterns 226 and 320 may redistribute the circuit of the top package P200, which may result in an increased degree of freedom in routing between the top package P200 and the bottom package P100. Accordingly, the electrical characteristics of the semiconductor package may be improved.

In addition, redistribution between the bottom package P100 and the top package P200 may be performed without an additional substrate, and thus, the thickness of the semiconductor package may be reduced. Even if a substrate for redistribution is not provided, the top package P200 may redistribute its electrical connections by using the conductive patterns 226 and 320 having a small thickness. Accordingly, the semiconductor package can facilitate size reduction.

The reduction in the total thickness of the semiconductor package may allow the thickness of the lower semiconductor chip 300 to be increased, and thus, the lower semiconductor chip 300 may have an advantage of heat dissipation. In addition, heat generated from the lower semiconductor chip 300 may be discharged through the conductive patterns 226 and 320. As a result, the semiconductor package may increase heat dissipation and operational stability.

fig. 6-12 show cross-sectional views of some stages in a method of manufacturing a semiconductor package, according to some example embodiments.

referring to fig. 6, a lower semiconductor chip 300 may be provided. The lower semiconductor chip 300 may have a bottom surface 300b and a top surface 300a facing each other. The bottom surface 300b of the lower semiconductor chip 300 may be an active surface, and the top surface 300a of the lower semiconductor chip 300 may be a non-active surface. The lower semiconductor chip 300 may include a lower chip pad 305 disposed on a bottom surface 300b thereof. The lower semiconductor chip 300 may include a chip via 330 therethrough. The chip via 330 may extend from the top surface 300a toward the bottom surface 300b of the lower semiconductor chip 300. The lower chip terminals 310 may be attached to the lower chip pads 305.

Referring to fig. 7, a second conductive pattern 320 may be formed on the top surface 300a of the lower semiconductor chip 300. For example, a conductive layer may be formed on the top surface 300a of the lower semiconductor chip 300, and then the conductive layer may be patterned to form the second conductive pattern 320. In another example, a shadow mask may be formed on the top surface 300a of the lower semiconductor chip 300, and then a conductive material may be deposited in a pattern of the shadow mask, which may result in the formation of the second conductive pattern 320. The pattern of the shadow mask may partially expose the top surface 300a of the lower semiconductor chip 300 and may define an area where the second conductive pattern 320 is formed. After the second conductive pattern 320 is formed, the shadow mask may be removed. The second conductive pattern 320 may include a third pad CP3, a second wire EL2, and a second bonding pad BP 2.

Referring to fig. 8, a lower semiconductor chip 300 may be mounted on the lower substrate 100. The lower semiconductor chip 300 may be mounted in a flip-chip bonding manner. For example, the flux 340 may be coated on the bottom surface 300b, which is a non-active surface of the lower semiconductor chip 300, and then the lower semiconductor chip 300 may be positioned such that the lower chip terminals 310 on the bottom surface 300b face the top surface of the lower substrate 100. At this stage, the flux 340 may protrude onto the lateral surface of the lower semiconductor chip 300. The flux 340 may include a resin, an activator, and a solvent. The solvent may include, for example, a glycol ether ester compound, a glycol ether compound, an ester compound, a ketone compound, or a cyclic ester compound. A reflow process may be performed on the lower chip terminal 310, and thus, the lower semiconductor chip 300 may be mounted on the lower substrate 100.

referring to fig. 9, a connection substrate 200 may be provided. The connection substrate 200 may include a base layer 210 and a conductive member 220 in the base layer 210. The conductive member 220 may include a connection substrate pad 222, a connection substrate via 224, and a first conductive pattern 226. The first conductive pattern 226 may include a first pad CP1, a second pad CP2, a first wire EL1, and a first bonding pad BP 1. For example, the base layer 210 may be etched, and then the inside thereof may be filled with a conductive material to form the connection substrate pad 222, the connection substrate via 224, and the first conductive pattern 226.

an opening OP (also referred to as a cavity) may be formed in the connection substrate 200. For example, a portion of the connection substrate 200 may be removed to form an opening OP penetrating, for example, the entire thickness of the connection substrate 200, and for example, a portion of the base layer 210 may be removed to provide an opening OP, i.e., a cavity, for accommodating the lower semiconductor chip 300. The opening OP may be formed, for example, by an etching process such as drilling, laser ablation, or laser cutting.

The connection substrate 200 may be mounted on the lower substrate 100. At this stage, the connection substrate 200 may be disposed to place the lower semiconductor chip 300 in the opening OP, for example, with a portion of the connection substrate 200 surrounding the lower semiconductor chip 300 in the opening OP. The solder balls or solder bumps on the connection substrate pads 222 may be reflowed to mount the connection substrate 200 on the lower substrate 100.

Referring to fig. 10, a joint member BM may be formed. For example, the first bonding pads BP1 of the connection substrate 200 and the second bonding pads BP2 of the lower semiconductor chip 300 may be connected to each other in a wire bonding manner. In some example embodiments, it may be desirable that the top surface 200a of the connection substrate 200 is at the same height as the top surface 300a of the lower semiconductor chip 300, and this configuration may easily achieve wire bonding between the first and second bonding pads BP1 and BP 2.

Referring to fig. 11, a lower molding member 400 may be formed on the lower substrate 100. The lower molding member 400 may fill a space between the connection substrate 200 and the lower semiconductor chip 300. For example, an insulating substance may be injected into a space between the connection substrate 200 and the lower semiconductor chip 300, and then the insulating substance may be cured to form the lower molding member 400. The insulating substance may cover the first conductive pattern 226 of the connection substrate 200, the second conductive pattern 320 of the lower semiconductor chip 300, and the joint member BM. The insulating substance may include an insulating polymer or a thermosetting resin.

For example, the lower molding member 400 may be etched to form the first recess RS1 exposing the first pad CP1, the second pad CP2, and the third pad CP 3. In another example, the lower molding member 400 may be etched to further expose the top surface 300a of the lower semiconductor chip 300. For example, the lower molding member 400 may expose the first pad CP1, the second pad CP2, the third pad CP3, and the second wire EL2 on the top surface 300a of the lower semiconductor chip 300. When the lower molding member 400 is formed to further expose the top surface 300a of the lower semiconductor chip 300, the semiconductor package of fig. 3 may be manufactured. An example in which the lower molding member 400 selectively exposes the first, second, and third pads CP1, CP2, and CP3 is described below.

referring to fig. 12, an external terminal 110 may be formed on a bottom surface of the lower substrate 100. The external terminal 110 may include a solder ball or a solder bump. The external terminal 110 may be electrically connected to the first and second conductive patterns 226 and 320 through the lower substrate 100, the conductive member 220 of the connection substrate 200, and the joint member BM. The bottom package P100 may be formed through the above process.

Referring again to fig. 1, a top package P200 may be disposed on the bottom package P100. The top package P200 may include an upper substrate 500, an upper semiconductor chip 600, an upper mold member 700, and connection terminals 510. The upper substrate 500 may be or may include a Printed Circuit Board (PCB) provided with a signal pattern on a top surface thereof. The upper semiconductor chip 600 may be mounted on the upper substrate 500. The upper mold member 700 may cover the top surface of the upper substrate 500 and the top surface 600a of the upper semiconductor chip 600. The connection terminal 510 may be disposed under the upper substrate 500. The connection terminal 510 may include a first connection terminal 512 and a second connection terminal 514. The second connection terminal 514 may be farther from a position below the edge of the upper substrate 500 than the first connection terminal 512.

The bottom package P100 and the top package P200 may be aligned with each other to place the first connection terminal 512 on the first conductive pattern 226 and to place the second connection terminal 514 on the second conductive pattern 320. The first and second connection terminals 512 and 514 may be brought into contact with the first and second conductive patterns 226 and 320, respectively, and then may be reflowed to mount the top package P200 on the bottom package P100. Through the above processes, the semiconductor package of fig. 1 may be manufactured.

Fig. 13-15 illustrate cross-sectional views showing some stages in a method of manufacturing a semiconductor package, according to some example embodiments.

referring to fig. 13, a lower mold member 400 may be formed on the structure manufactured as described with reference to fig. 1 to 9. The lower molding member 400 may fill a space between the connection substrate 200 and the lower semiconductor chip 300. For example, an insulating substance may be injected into a space between the connection substrate 200 and the lower semiconductor chip 300, and then the insulating substance may be cured to form the lower molding member 400. The lower molding member 400 may cover the first conductive pattern 226 and the second conductive pattern 320.

Referring to fig. 14, the lower molding member 400 may be etched to form a first recess RS1 and a second recess RS 2. The first recess RS1 may expose the first, second, and third pads CP1, CP2, and CP 3. The second recess RS2 may be formed between the connection substrate 200 and the lower semiconductor chip 300 or between the first bonding pad BP1 of the connection substrate 200 and the second bonding pad BP2 of the lower semiconductor chip 300 when viewed in a plan view. The second recess RS2 may expose respective lateral surfaces of the first and second bonding pads BP1 and BP 2.

Referring to fig. 15, a third conductive pattern 410 may be formed in the second recess RS 2. The third conductive pattern 410 may be formed by filling the second recess RS2 with a conductive material. For example, an electroplating process may be performed to fill the second recess RS2 with a conductive material. In another example, a printing process, such as inkjet printing, may be performed to fill the second recesses RS2 with a conductive material. The bottom package P100 may be formed through the above process.

Thereafter, the process described with reference to fig. 1 may be performed. For example, the top package P200 may be mounted on the bottom package P100 to manufacture the semiconductor package of fig. 4.

Fig. 16-23 show cross-sectional views of some stages in a method of manufacturing a semiconductor package, according to some example embodiments.

Referring to fig. 16, a connection substrate 200 may be provided. The connection substrate 200 may include a base layer 210 and a conductive member 220 in the base layer 210. The conductive member 220 may include a connection substrate pad 222, a connection substrate via 224, and a first conductive pattern 226. For example, the base layer 210 may be etched and then the etched portions may be filled with a conductive material to form the connection substrate pads 222, the connection substrate vias 224, and the first conductive patterns 226.

referring to fig. 17, an opening OP may be formed in the connection substrate 200. A portion of the connection substrate 200 may be removed to form an opening OP penetrating the connection substrate 200. The opening OP may be formed, for example, by an etching process such as drilling, laser ablation, or laser cutting. The removed portion of the connection substrate 200 may be a region where the lower semiconductor chip 300 is disposed in a subsequent process.

The connection substrate 200 may be attached to the carrier substrate 800. For example, the carrier substrate 800 may be an insulating substrate (including glass or polymer) or a conductive substrate (including metal). The top surface of the carrier substrate 800 may include an adhesion member for adhering the carrier substrate 800 to the bottom surface 200b of the connection substrate 200. The adhesive member may comprise, for example, an adhesive tape.

Referring to fig. 18, the lower semiconductor chip 300 may be disposed on the carrier substrate 800, for example, within the opening OP of the connection substrate 200. The lower semiconductor chip 300 may be identical to the lower semiconductor chip 300 manufactured as described with reference to fig. 6 and 7. The lower semiconductor chip 300 may be disposed in the opening OP of the connection substrate 200. At this stage, the lower semiconductor chip 300 may be adhered to the carrier substrate 800. The lower semiconductor chip 300 may include a lower chip pad 305 on a lower portion thereof. For example, the bottom surface 300b of the lower semiconductor chip 300 may correspond to an active surface in contact with the carrier substrate 800.

Referring to fig. 19, a joint member BM may be formed. For example, the first bonding pads BP1 of the connection substrate 200 and the second bonding pads BP2 of the lower semiconductor chip 300 may be connected to each other in a wire bonding manner.

Referring to fig. 20, a lower molding member 400 may be formed on a carrier substrate 800. The lower molding member 400 may fill a space between the connection substrate 200 and the lower semiconductor chip 300. For example, an insulating substance may be injected into a space between the connection substrate 200 and the lower semiconductor chip 300, and then the insulating substance may be cured to form the lower molding member 400. The lower mold member 400 may cover the first conductive patterns 226 of the connection substrate 200 and the second conductive patterns 320 of the lower semiconductor chip 300.

Referring to fig. 21, a support substrate 910 may be disposed on the connection substrate 200. The support substrate 910 may be, for example, an insulating substrate such as glass. The support substrate 910 may be adhered to the top surface of the lower molding member 400 using a glue layer 920. The glue layer 920 may be, for example, a resin film.

the carrier substrate 800 may be removed. The carrier substrate 800 may be removed as indicated by a dotted line to expose the bottom surface 300b of the lower semiconductor chip 300 and the bottom surface 200b of the connection substrate 200. The carrier substrate 800 may be removed by applying a shear stress or by chemically treating the adhesion member.

Referring to fig. 22, the lower substrate 100 may be formed on the bottom surface 300b of the lower semiconductor chip 300 and the bottom surface 200b of the connection substrate 200. For example, the dielectric layer 102, the conductive layer 104, and the substrate pad 106 may be formed on the bottom surface 300b of the lower semiconductor chip 300 and the bottom surface 200b of the connection substrate 200, so that the lower substrate 100 may be manufactured. A dielectric material layer (e.g., a silicon oxide layer) may be formed on the bottom surface 300b of the lower semiconductor chip 300 and the bottom surface 200b of the connection substrate 200 and then patterned to form a portion of the dielectric layer 102. The lower chip pads 305 and the connection substrate pads 222 may be exposed through the dielectric layer 102. A layer of conductive material may be formed on the bottom surface of the dielectric layer 102 and then patterned to form a conductive layer 104 and a substrate pad 106. The conductive layer 104 may be electrically connected to the lower semiconductor chip 300 and the connection substrate 200. A layer of dielectric material may be formed on the bottom surface of the conductive layer 104 and then patterned to form other portions of the dielectric layer 102. At this stage, the substrate pad 106 may be exposed through the dielectric layer 102.

the external terminal 110 may be formed on the exposed substrate pad 106. The external terminal 110 may include a solder ball or a solder bump.

Referring to fig. 23, the support substrate 910 may be removed. For example, the support substrate 910 may be removed by applying a shear stress or by chemically treating the glue layer 920. The support substrate 910 may be removed as indicated by a dotted line to expose the top surface of the lower molding member 400.

the lower molding member 400 may be etched to form a first recess RS1 exposing the first, second, and third pads CP1, CP2, and CP 3. The bottom package P100 may be manufactured through the above process.

Thereafter, the process described with reference to fig. 1 may be performed. For example, the top package P200 may be mounted on the bottom package P100 to manufacture the semiconductor package of fig. 5.

To summarize and review, some example embodiments provide semiconductor packages having improved electrical characteristics and methods of fabricating the same. Some example embodiments also provide a compact-sized semiconductor package and a method of manufacturing the same. Some example embodiments also provide a semiconductor package having improved thermal stability and a method of manufacturing the same.

That is, the semiconductor package according to some example embodiments may be configured such that the connection terminals of the top package may be all disposed on the connection substrate and the lower semiconductor chip. Accordingly, the conductive pattern may redistribute the circuit of the top package and may increase the degree of freedom of wiring between the top package and the bottom package.

in addition, since an additional substrate is not required for redistribution between the bottom package and the top package, the thickness of the semiconductor package can be reduced. As a result, the semiconductor package can have an overall reduced size. In addition, the reduction in the total thickness of the semiconductor package may allow the lower semiconductor chip to have an increased thickness, and thus the lower semiconductor chip may advantageously dissipate heat. In addition, heat generated from the lower semiconductor chip may be released through the conductive pattern, thereby increasing heat dissipation.

Example embodiments have been disclosed herein, and although specific terms are employed, they are used and are to be interpreted in a generic and descriptive sense only and not for purposes of limitation. In some instances, features, characteristics and/or elements described in connection with a particular embodiment may be used alone or in combination with features, characteristics and/or elements described in connection with other embodiments, as would be apparent to one of ordinary skill in the art upon submission of the present application, unless specifically indicated otherwise. It will, therefore, be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as set forth in the appended claims.