阅读说明：本技术 半导体封装结构和其制造方法 (Semiconductor package structure and manufacturing method thereof ) 是由 邱基综 谢慧英 陈国华 陈证元 于 2020-10-22 设计创作，主要内容包括：本公开涉及一种半导体封装结构和用于制造半导体封装结构的方法。所述半导体封装结构包括基底、至少一个半导体元件、第一介电层、第二介电层以及电路层。所述半导体元件设置在所述基底上,且其具有上表面。所述第一介电层覆盖所述半导体元件的外围表面的至少一部分,且其具有顶面。所述顶面与所述半导体元件的所述上表面不共平面。所述第二介电层覆盖所述半导体元件和所述第一介电层。所述电路层贯穿所述第二介电层,以电连接所述半导体元件。(The present disclosure relates to a semiconductor package structure and a method for manufacturing the semiconductor package structure. The semiconductor packaging structure comprises a substrate, at least one semiconductor element, a first dielectric layer, a second dielectric layer and a circuit layer. The semiconductor element is disposed on the substrate and has an upper surface. The first dielectric layer covers at least a portion of a peripheral surface of the semiconductor element and has a top surface. The top surface is not coplanar with the upper surface of the semiconductor element. The second dielectric layer covers the semiconductor element and the first dielectric layer. The circuit layer penetrates through the second dielectric layer to be electrically connected with the semiconductor element.)

1. A semiconductor package structure, comprising:

a substrate;

at least one semiconductor element disposed on the substrate and having an upper surface;

a first dielectric layer covering at least a portion of a peripheral surface of the semiconductor element and having a top surface, wherein the top surface is not coplanar with the upper surface of the semiconductor element;

a second dielectric layer covering the semiconductor element and the first dielectric layer; and

and the circuit layer penetrates through the second dielectric layer to be electrically connected with the semiconductor element.

2. The semiconductor package structure of claim 1, wherein the second dielectric layer is made of a photosensitive material.

3. The semiconductor package structure of claim 1, wherein the top surface of the first dielectric layer is lower than the upper surface of the semiconductor element.

4. The semiconductor package structure of claim 1, wherein a height difference between the top surface of the first dielectric layer and the upper surface of the semiconductor element is less than or equal to about 30 μ ι η.

5. The semiconductor package structure of claim 4, wherein the height difference is about 5 μm to about 30 μm.

6. The semiconductor package structure of claim 1, wherein the semiconductor element is a power chip.

7. The semiconductor package structure of claim 1, further comprising at least one dam disposed on the upper surface of the semiconductor element and protruding from the top surface of the first dielectric layer.

8. The semiconductor package structure of claim 1, wherein the base has a surface and comprises at least one conductive post protruding from the surface, and the conductive post protrudes from the top surface of the first dielectric layer.

9. The semiconductor package structure of claim 8, wherein the second dielectric layer defines at least one opening through the second dielectric layer to reveal a portion of the conductive pillar, and the circuit layer extends into the opening and contacts the revealed portion of the conductive pillar.

10. The semiconductor package structure of claim 8, wherein the conductive pillar has a top surface lower than an upper surface of the semiconductor element.

11. A semiconductor package structure, comprising:

a substrate having a surface and comprising at least one conductive post protruding from the surface;

at least one semiconductor element disposed on the surface of the substrate;

a first dielectric layer covering a portion of the conductive post and a portion of the semiconductor element, wherein the conductive post protrudes from a top surface of the first dielectric layer;

a second dielectric layer covering the conductive pillar, the semiconductor element, and the first dielectric layer; and

and the circuit layer penetrates through the second dielectric layer to be electrically connected with the semiconductor element.

12. The semiconductor package structure of claim 11, wherein the height of the conductive pillar is less than the thickness of the semiconductor element.

13. The semiconductor package of claim 11, wherein the semiconductor element has an upper surface and a lower surface opposite the upper surface, and comprises a plurality of first contacts disposed adjacent the upper surface and at least one second contact disposed adjacent the lower surface, and the second contact electrically connects the conductive pillar through the base.

14. The semiconductor package structure of claim 11, further comprising at least one dam disposed on an upper surface of the semiconductor element and protruding from the top surface of the first dielectric layer.

15. The semiconductor package structure of claim 11, further comprising at least one semiconductor device disposed adjacent a bottom surface of the base, wherein the base further comprises at least one conductive pin spaced apart from the conductive pillar, and the semiconductor device electrically connects the conductive pin by at least one bond wire.

16. The semiconductor package structure of claim 15, wherein the conductive pin protrudes from the top surface of the first dielectric layer.

17. The semiconductor package structure of claim 15, wherein the circuit layer electrically connects the conductive pins.

18. A method for fabricating a semiconductor package structure, comprising:

(a) providing a substrate;

(b) disposing at least one semiconductor device on the substrate;

(c) forming a first dielectric layer to cover the substrate and a portion of the semiconductor element;

(d) forming a second dielectric layer to cover the semiconductor element and the first dielectric layer, wherein the second dielectric layer is made of a photosensitive material; and

(e) and forming a circuit layer penetrating through the second dielectric layer to electrically connect the semiconductor element.

19. The method of claim 18, wherein (c) comprises:

(c1) providing a multilayer film comprising a release film and a first dielectric layer attached on the release film;

(c2) laminating the multilayer film on the substrate such that the first dielectric layer covers the substrate and a portion of the semiconductor element; and

(c3) and removing the release film.

20. The method of claim 19, wherein in (c2), the release film covers an upper surface of the semiconductor element.

Technical Field

The present disclosure relates to a semiconductor package structure and a manufacturing method, and to a semiconductor package structure including a first dielectric layer covering a portion of a semiconductor element and a method for manufacturing the semiconductor package structure.

Background

For embedded chip package structures (embedded chip packages), a number of through holes (vias) are formed by laser drilling (laser drilling) to electrically connect chips (chips). However, the use of laser drilling increases manufacturing costs. In addition, the circuit layers (circuits) of the embedded chip package structure are covered with a protection layer (e.g., a solder mask), and thus, heat generated from the chip during operation is difficult to dissipate through the circuit layers.

Disclosure of Invention

In some embodiments, a semiconductor package structure includes a substrate, at least one semiconductor element, a first dielectric layer, a second dielectric layer, and a circuit layer. The semiconductor element is disposed on the substrate and has an upper surface. The first dielectric layer covers at least a portion of a peripheral surface of the semiconductor element and has a top surface. The top surface is not coplanar with the upper surface of the semiconductor element. The second dielectric layer covers the semiconductor element and the first dielectric layer. The circuit layer penetrates through the second dielectric layer to be electrically connected with the semiconductor element.

In some embodiments, a semiconductor package structure includes a substrate, at least one semiconductor element, a first dielectric layer, a second dielectric layer, and a circuit layer. The base has a surface and includes at least one conductive post protruding from the surface. The semiconductor element is disposed on the surface of the substrate. The first dielectric layer covers a portion of the conductive pillar and a portion of the semiconductor element. The conductive posts protrude from a top surface of the first dielectric layer. The second dielectric layer covers the conductive pillar, the semiconductor element, and the first dielectric layer. The circuit layer penetrates through the second dielectric layer to be electrically connected with the semiconductor element.

In some embodiments, a method for fabricating a semiconductor package structure includes: (a) providing a substrate; (b) disposing at least one semiconductor device on the substrate; (c) forming a first dielectric layer to cover the substrate and a portion of the semiconductor element; (d) forming a second dielectric layer to cover the semiconductor element and the first dielectric layer, wherein the second dielectric layer is made of a photosensitive material; and (e) forming a circuit layer penetrating through the second dielectric layer to electrically connect the semiconductor element.

Drawings

Aspects of some embodiments of the present disclosure can be readily understood from the following detailed description when read in conjunction with the accompanying drawings. It should be noted that the various structures may not be drawn to scale, and that the dimensions of the various structures may be arbitrarily increased or decreased for clarity of discussion.

Fig. 1 shows a cross-sectional view of a semiconductor package structure of some embodiments of the present disclosure.

Fig. 2 shows a cross-sectional view of a semiconductor package structure of some embodiments of the present disclosure.

Fig. 3 shows a cross-sectional view of a semiconductor package structure of some embodiments of the present disclosure.

Fig. 4 shows a cross-sectional view of a semiconductor package structure of some embodiments of the present disclosure.

Fig. 5 shows a cross-sectional view of a semiconductor package structure of some embodiments of the present disclosure.

Fig. 6 shows a cross-sectional view of a semiconductor package structure of some embodiments of the present disclosure.

Fig. 7 shows one or more stages of some embodiments of a method for fabricating a semiconductor package structure of the present disclosure.

Fig. 8 shows one or more stages of some embodiments of a method for fabricating a semiconductor package structure of the present disclosure.

Fig. 9 shows one or more stages of some embodiments of a method for fabricating a semiconductor package structure of the present disclosure.

Fig. 10 shows one or more stages of some embodiments of a method for fabricating a semiconductor package structure of the present disclosure.

Fig. 11 shows one or more stages of some embodiments of a method for fabricating a semiconductor package structure of the present disclosure.

Fig. 12 shows one or more stages of some embodiments of a method for fabricating a semiconductor package structure of the present disclosure.

Fig. 13 shows one or more stages of some embodiments of a method for fabricating a semiconductor package structure of the present disclosure.

Fig. 14 shows one or more stages of some embodiments of a method for fabricating a semiconductor package structure of the present disclosure.

Fig. 15 shows one or more stages of some embodiments of a method for fabricating a semiconductor package structure of the present disclosure.

Fig. 16 shows one or more stages of some embodiments of methods for fabricating semiconductor package structures of the present disclosure.

Fig. 17 shows one or more stages of some embodiments of methods for fabricating semiconductor package structures of the present disclosure.

Fig. 18 shows one or more stages of some embodiments of methods for fabricating semiconductor package structures of the present disclosure.

Fig. 19 shows one or more stages of some embodiments of a method for fabricating a semiconductor package structure of the present disclosure.

Fig. 20 shows one or more stages of some embodiments of a method for fabricating a semiconductor package structure of the present disclosure.

Fig. 21 shows one or more stages of some embodiments of methods for fabricating semiconductor package structures of the present disclosure.

Fig. 22 shows one or more stages of some embodiments of methods for fabricating semiconductor package structures of the present disclosure.

Fig. 23 shows one or more stages of some embodiments of a method for fabricating a semiconductor package structure of the present disclosure.

Fig. 24 shows one or more stages of some embodiments of a method for fabricating a semiconductor package structure of the present disclosure.

Detailed Description

Common reference numerals are used throughout the drawings and the detailed description to indicate the same or similar components. Embodiments of the present disclosure will be more readily understood from the following detailed description taken in conjunction with the accompanying drawings.

The following disclosure provides many different embodiments, or examples, for implementing different features of the provided subject matter. Specific examples of components and arrangements are described below to illustrate certain aspects of the present disclosure. Of course, these are merely examples and are not intended to be limiting. For example, in the following description, the formation of a first feature over or on a second feature may include embodiments in which the first and second features are formed or disposed in direct contact, and may also include embodiments in which additional features may be formed or disposed between the first and second features, such that the first and second features may not be in direct contact. Additionally, the present disclosure may repeat reference numerals and/or letters in the various examples. This repetition is for the purpose of simplicity and clarity and does not in itself dictate a relationship between the various implementations and/or configurations discussed.

At least some embodiments of the present disclosure provide a semiconductor package structure that may improve heat dissipation and reduce manufacturing costs. In some embodiments, the semiconductor package structure includes a first dielectric layer covering a portion of a semiconductor element. At least some embodiments of the present disclosure further provide techniques for fabricating the semiconductor package structure.

Fig. 1 shows a cross-sectional view of a semiconductor package structure 1 of some embodiments of the present disclosure. The semiconductor package structure 1 includes a substrate (base)10, at least one semiconductor element (semiconductor element)20, a first dielectric layer (first dielectric layer)30, a second dielectric layer (second dielectric layer)40, a circuit layer (circuit layer)50, and a surface treating layer (surface treating layer) 70.

The base 10 may be, for example, a lead frame (lead frame) or a substrate (substrate). The substrate 10 has a top surface 11 and a bottom surface 12 opposite the top surface 11. The material of the substrate 10 may include a metal, such as copper (copper). Thus, the substrate 10 may be a heat dissipating element.

The semiconductor element 20 may be, for example, a power chip (power chip) or a power die (power die). The material of the semiconductor element 20 may be silicon (Si), silicon carbide (SiC), gallium nitride (GaN), or other suitable material. The semiconductor element 20 is disposed on the top surface 11 of the substrate 10. The semiconductor element 20 has an upper surface 21 (e.g., an active surface), a lower surface 22 (e.g., a backside surface) opposite the upper surface 21, and a peripheral surface 23 extending between the upper surface 21 and the lower surface 22. In some embodiments, the lower surface 22 of the semiconductor element 20 may be bonded to the top surface 11 of the substrate 10 by an adhesive 24. As shown in fig. 1, the semiconductor element 20 includes a plurality of first contacts (first terminals)25 disposed adjacent to the upper surface 21. In some embodiments, the first contact 25 may include at least one source terminal (source terminal), at least one gate terminal (gate terminal), and at least one drain terminal (drain terminal).

The first dielectric layer 30 covers a portion of the semiconductor element 20 and a portion of the substrate 10. The material of the first dielectric layer 30 may be, for example, polypropylene (PP). In some embodiments, a plurality of glass fibers (glass fibers) may be embedded in the first dielectric layer 30 to improve the material strength of the first dielectric layer 30. The first dielectric layer 30 has a top surface 31 and a bottom surface 32 opposite the top surface 31. In some embodiments, the first dielectric layer 30 may cover at least a portion of the peripheral surface 23 of the semiconductor device 20, and thus, the top surface 31 of the first dielectric layer 30 and the upper surface 21 of the semiconductor device 20 may not be substantially coplanar.

In some embodiments, the top surface 31 of the first dielectric layer 30 may be lower than the upper surface 21 of the semiconductor element 20. Therefore, there is a height difference X between the top surface 31 of the first dielectric layer 30 and the upper surface 21 of the semiconductor element 20. That is, the top portion of the semiconductor element 20 may protrude from the first dielectric layer 30. The height difference X may be less than or equal to about 30 μm to prevent the first dielectric layer 30 from covering the upper surface 21 of the semiconductor element 20. Alternatively, the height difference X may be greater than or equal to about 5 μm. In some embodiments, the height difference X may be about 5 μm to about 30 μm. In addition, the bottom surface 32 of the first dielectric layer 30 may be substantially coplanar with the bottom surface 12 of the substrate 10.

The second dielectric layer 40 covers the semiconductor element 20 and the first dielectric layer 30. The second dielectric layer 40 may be made of a photosensitive material (photoimageable material) such as a solder mask, and thus, the second dielectric layer 40 may define a plurality of openings 42 through the second dielectric layer 40 by, for example, an exposure and development process (subtractive process) to expose a portion of each first contact 25 (e.g., a portion of the top surface 252). Since the opening 42 is not formed by laser drilling, the manufacturing cost can be reduced.

The circuit layer 50 penetrates the second dielectric layer 40 to electrically connect the semiconductor device 20. In some embodiments, the circuit layer 50 may be disposed on the second dielectric layer 40 and extend into the opening 42 of the second dielectric layer 40. In addition, the circuit layer 50 may electrically connect or contact the exposed portion of each first contact 25 (i.e., the exposed portion of the top surface 252).

The surface treatment layer 70 covers the circuit layer 50 and the bottom surface 12 of the substrate 10 to prevent oxidation (oxidation) of the circuit layer 50 and the substrate 10.

In the embodiment shown in fig. 1, the circuit layer 50 is not covered by the second dielectric layer 40, so that heat generated by the semiconductor element 20 during operation can be dissipated through the circuit layer 50. In addition, the top surface 31 of the first dielectric layer 30 is not substantially coplanar with the upper surface 21 of the semiconductor element 20, so that a stress concentration phenomenon does not occur at corners of the semiconductor element 20, thereby preventing the first dielectric layer 30 and the second dielectric layer 40 from being peeled off from the corners of the semiconductor element 20. In addition, the opening 42 of the second dielectric layer 40 may be formed through an exposure and development process, and thus, the width of the opening 42 may be relatively large (for example, the width of the opening 42 may be 200 μm or more), and the depth of the opening 42 may be relatively small (for example, the depth of the opening 42 may be 15 μm to 25 μm). Accordingly, a relatively large current may be transmitted through a portion of the circuit layer 50 in the opening 42, and an electrical path (electrical path) through the portion of the circuit layer 50 in the opening 42 is shortened.

Fig. 2 shows a cross-sectional view of a semiconductor package structure 1a of some embodiments of the present disclosure. The semiconductor package 1a is similar to the semiconductor package 1 shown in fig. 1, except that the semiconductor package 1a further includes at least one dam (dam)60, and the top surface 31a of the first dielectric layer 30a is higher than the upper surface 21 of the semiconductor device 20.

A dam 60 may be disposed on the upper surface 21 of the semiconductor element 20 to surround the first contact 25. In some embodiments, the dam 60 may be ring-shaped (ring shape) in a top view, and may be disposed on the periphery of the upper surface 21 of the semiconductor element 20. In addition, the dam 60 may protrude from the top surface 31a of the first dielectric layer 30a to prevent the first dielectric layer 30a from covering the upper surface 21 of the semiconductor element 20 and the first contact 25. That is, the first dielectric layer 30a covers a part of the dam 60 and the entirety of the outer peripheral surface 23 of the semiconductor element 20. As shown in fig. 2, dam 60 has an upper surface 61 that is higher than top surface 31a of first dielectric layer 30a, a lower surface 62 opposite upper surface 61, and an outer side surface 63 extending between upper surface 61 and lower surface 62. The lower surface 62 may be attached to the upper surface 21 of the semiconductor element 20. The first dielectric layer 30a may cover a portion of the outer side surface 63. In addition, a second dielectric layer 40 may cover the dam 60.

Fig. 3 shows a cross-sectional view of a semiconductor package structure 1b of some embodiments of the present disclosure. The semiconductor package 1b is similar to the semiconductor package 1 shown in fig. 1, except for the structure of the substrate 10 a. The substrate 10a of fig. 3 further defines at least one cavity 13 recessed from the top surface 11. The semiconductor element 20 may be disposed in the cavity 13 of the substrate 10 a. In addition, the first dielectric layer 30 may cover the cavity 13 of the substrate 10 a.

Fig. 4 shows a cross-sectional view of a semiconductor package structure 1c of some embodiments of the present disclosure. The semiconductor package 1c is similar to the semiconductor package 1 shown in fig. 1 except for the structures of the substrate 10b and the semiconductor element 20 a. The substrate 10b of fig. 4 further includes at least one conductive pillar 15 protruding from the top surface 11. The conductive post 15 and the substrate 10b may be formed simultaneously. The semiconductor element 20a of fig. 4 further includes at least one second contact 26 disposed adjacent the lower surface 22. The second contact 26 may be electrically connected to the conductive post 15 through the substrate 10 b. In some embodiments, the second contact 26 may be electrically connected to the substrate 10b by a conductive adhesive 27.

In some embodiments, the second connection 26 may be a drain terminal (drain terminal), and the first connection 25 may include at least one source terminal (source terminal) and at least one gate terminal (gate terminal).

The conductive pillar 15 may be spaced apart from the semiconductor element 20 a. In some embodiments, the height h of the conductive pillar 15 may be less than the thickness t of the semiconductor element 20 a. That is, the top surface 152 of the conductive pillar 15 may be lower than the upper surface 21 of the semiconductor element 20 a.

In some embodiments, the conductive posts 15 may protrude from the top surface 31 of the first dielectric layer 30. That is, the first dielectric layer 30 covers a portion of the conductive post 15. The second dielectric layer 40 may cover the conductive post 15. In some embodiments, the second dielectric layer 40 may further define at least one opening 42a through the second dielectric layer 40 to expose a portion (e.g., a portion of the top surface 152) of the conductive pillar 15. The circuit layer 50 may extend into the opening 42a and electrically connect or contact the exposed portion of the conductive post 15 (i.e., the exposed portion of the top surface 152).

Fig. 5 shows a cross-sectional view of a semiconductor package structure 1d of some embodiments of the present disclosure. The semiconductor package 1d is similar to the semiconductor package 1c shown in fig. 4, except that the semiconductor package 1d further includes at least one dam (dam)60a, and the top surface 31b of the first dielectric layer 30b is higher than the upper surface 21 of the semiconductor device 20 a. A dam 60a may be disposed on the upper surface 21 of the semiconductor element 20a to surround the first contact 25. In addition, the dam 60a may protrude from the top surface 31b of the first dielectric layer 30b to prevent the first dielectric layer 30b from covering the upper surface 21 of the semiconductor element 20a and the first contact 25. That is, the first dielectric layer 30b covers a part of the dam 60a and the entirety of the outer peripheral surface 23 of the semiconductor element 20 a. As shown in fig. 5, dam 60a has an upper surface 61a above top surface 31b of first dielectric layer 30b, a lower surface 62a opposite upper surface 61a, and an outer side surface 63a extending between upper surface 61a and lower surface 62 a. The first dielectric layer 30b may cover a portion of the outer side surface 63 a.

In some embodiments, upper surface 61a of dam 60a may be higher than top surface 152 of conductive post 15. In addition, the second dielectric layer 40 may cover the dam 60 a.

Fig. 6 shows a cross-sectional view of a semiconductor package structure 1e of some embodiments of the present disclosure. The semiconductor package structure 1e is similar to the semiconductor package structure 1c shown in fig. 4, except that the semiconductor package structure 1e further includes at least one semiconductor device (semiconductor device)91, and the substrate 10c further includes at least one conductive pin (conductive pin) 17.

The semiconductor device 91 may be, for example, a semiconductor die (semiconductor die) or a semiconductor chip (semiconductor chip). The semiconductor device 91 may be disposed adjacent to the bottom surface 12 of the substrate 10 c. In some embodiments, the semiconductor device 91 may be disposed adjacent to the surface treatment layer 70. In addition, the semiconductor device 91 may be electrically connected to the conductive leads 17 through at least one bonding wire (bonding wire) 92.

The conductive pins 17 may be spaced apart from the conductive posts 15. In some embodiments, the conductive pins 17, the conductive posts 15, and the substrate 10c may be formed simultaneously. Conductive leads 17 may protrude from a top surface 31 and a bottom surface 32 of first dielectric layer 30. That is, the first dielectric layer 30 covers a portion of the conductive leads 17. A second dielectric layer 40 may cover conductive leads 17. In some embodiments, the second dielectric layer 40 may further define at least one opening 42b through the second dielectric layer 40 to expose a portion of the conductive pin 17 (e.g., a portion of the top surface 172). The circuit layer 50 may extend into the opening 42b and electrically connect or contact the exposed portion of the conductive pin 17 (i.e., the exposed portion of the top surface 172). In some embodiments, the conductive pins 17 may be strips (strip) or rings (ring) in a top view. However, in other embodiments, the semiconductor package structure 1e may include a plurality of conductive pins 17 configured in rows (rows) or loops (loops).

Fig. 7-16 show one or more stages of some embodiments of methods for fabricating semiconductor package structures of the present disclosure. In some embodiments, the method is for fabricating a semiconductor package structure 1 as shown in fig. 1.

Referring to fig. 7, a substrate 10 is provided. The base 10 may be, for example, a lead frame or a substrate. The substrate 10 has a top surface 11 and a bottom surface 12 opposite the top surface 11. The material of the substrate 10 may include a metal, such as copper (copper). Thus, the substrate 10 may be a heat dissipating element.

Referring to fig. 8, at least one semiconductor device 20 is disposed on a substrate 10. The semiconductor element 20 may be, for example, a power chip or a power die. The material of the semiconductor element 20 may be silicon (Si), silicon carbide (SiC), gallium nitride (GaN), or other suitable material. The semiconductor element 20 may be disposed on the top surface 11 of the substrate 10. The semiconductor element 20 has an upper surface 21 (e.g., an active surface), a lower surface 22 (e.g., a back side surface) opposite the upper surface 21, and a peripheral surface 23 extending between the upper surface 21 and the lower surface 22. In some embodiments, the lower surface 22 of the semiconductor element 20 may be bonded to the top surface 11 of the substrate 10 by an adhesive 24. As shown in fig. 8, the semiconductor element 20 includes a plurality of first contacts 25 disposed adjacent to the upper surface 21. In some embodiments, the first contact 25 may include at least one source terminal, at least one gate terminal, and at least one drain terminal.

Referring to fig. 9 to 12, a first dielectric layer 30 is formed to cover the substrate 10 and a portion of the semiconductor element 20. Referring to fig. 9, a multi-layer film (multi-layer film)80 is provided, and the multi-layer film 80 is disposed on a substrate 10. The multilayer film 80 includes a release film (release film)82 and a first dielectric layer 30 attached on the release film 82. The material of the first dielectric layer 30 may be, for example, polypropylene (PP). In some embodiments, a plurality of glass fibers may be embedded in the first dielectric layer 30 to improve the material strength of the first dielectric layer 30. In addition, the first dielectric layer 30 may define an opening 35 to accommodate the semiconductor device 20.

Referring to fig. 10, in some embodiments, the multilayer film 80 may include two release films 82, an intermediate element (intermediate element)84 interposed between the two release films 82, and the first dielectric layer 30 attached on the lowermost release film 82. The intermediate member 84 may be, for example, a Copper Clad Laminate (CCL). When the first dielectric layer 30 is thinner, the intermediate element 84 may be used to increase the total thickness (total thickness) of the multilayer film 80 to ensure that the total thickness of the multilayer film 80 is sufficient to be laminated in the following steps.

Referring to fig. 11, a multilayer film 80 is laminated on a substrate 10 such that a first dielectric layer 30 covers the substrate 10 and a portion of a semiconductor element 20. The release film 82 may cover the upper surface 21 of the semiconductor element 20 and the first contact 25 to prevent the first dielectric layer 30 from covering the upper surface 21 and the first contact 25.

As shown in fig. 11, the first dielectric layer 30 has a top surface 31 and a bottom surface 32 opposite the top surface 31. In some embodiments, the first dielectric layer 30 may cover at least a portion of the peripheral surface 23 of the semiconductor device 20, and thus, the top surface 31 of the first dielectric layer 30 and the upper surface 21 of the semiconductor device 20 may not be substantially coplanar.

In some embodiments, the top surface 31 of the first dielectric layer 30 may be lower than the upper surface 21 of the semiconductor element 20. Therefore, there is a height difference X between the top surface 31 of the first dielectric layer 30 and the upper surface 21 of the semiconductor element 20. That is, the top portion of the semiconductor element 20 may protrude from the first dielectric layer 30. The height difference X may be less than or equal to about 30 μm to prevent the first dielectric layer 30 from covering the upper surface 21 of the semiconductor element 20. Alternatively, the height difference X may be greater than or equal to about 5 μm. In some embodiments, the height difference X may be about 5 μm to about 30 μm. In addition, the bottom surface 32 of the first dielectric layer 30 may be substantially coplanar with the bottom surface 12 of the substrate 10.

Referring to fig. 12, the release film 82 is removed.

Referring to fig. 13, a second dielectric layer 40 is formed to cover the semiconductor element 20 and the first dielectric layer 30. The second dielectric layer 40 may be made of a photosensitive material (photosensitive material) or a photoimageable material (photoimageable material), such as a solder mask.

Referring to fig. 14, a plurality of openings 42 are formed through the second dielectric layer 40, for example, by an exposure and development process, to expose a portion of each first contact 25 (e.g., a portion of the top surface 252). Since the opening 42 is not formed by laser drilling, the manufacturing cost can be reduced.

Referring to fig. 15, a circuit layer 50 is formed through the second dielectric layer 40 to electrically connect the semiconductor elements 20. In some embodiments, a circuit layer 50 may be formed on the second dielectric layer 40 and in the opening 42 of the second dielectric layer 40. In addition, the circuit layer 50 may electrically connect or contact the exposed portion of each first contact 25 (i.e., the exposed portion of the top surface 252).

Referring to fig. 16, a surface finishing layer (surface finishing layer)70 is formed to cover the circuit layer 50 and the bottom surface 12 of the substrate 10. The surface treatment layer 70 may prevent oxidation (oxidation) of the circuit layer 50 and the substrate 10.

Subsequently, a singulation process (singulation process) is performed to obtain a plurality of semiconductor packages 1 of fig. 1.

Fig. 17-24 show one or more stages of some embodiments of methods for fabricating semiconductor package structures of the present disclosure. In some embodiments, the method is for manufacturing a semiconductor package structure 1a as shown in fig. 2. The first few stages of the illustrated process are the same or similar to those depicted in fig. 7-8. Fig. 17 depicts a stage subsequent to that depicted by fig. 8.

Referring to fig. 17, at least one dam (dam)60 is formed or disposed on the upper surface 21 of the semiconductor device 20 to surround the first contact 25. In some embodiments, the dam 60 may be ring-shaped (ring shape) in a top view, and may be disposed on the periphery of the upper surface 21 of the semiconductor element 20. Dam 60 has an upper surface 61, a lower surface 62 opposite upper surface 61, and an outer side surface 63 extending between upper surface 61 and lower surface 62. The lower surface 62 may be attached to the upper surface 21 of the semiconductor element 20.

Referring to fig. 18 to 20, a first dielectric layer 30a is formed to cover the substrate 10 and a portion of the semiconductor element 20. Referring to fig. 18, a multilayer film 80a is provided, and the multilayer film 80a is disposed on the substrate 10. The multilayer film 80a includes a release film 82a and a first dielectric layer 30a attached on the release film 82 a. The material of the first dielectric layer 30a may be, for example, polypropylene (PP). In some embodiments, a plurality of glass fibers may be embedded in the first dielectric layer 30a to improve the material strength of the first dielectric layer 30 a. In addition, the first dielectric layer 30a may define an opening 35a to accommodate the semiconductor device 20.

Referring to fig. 19, a multilayer film 80a is laminated on the substrate 10 such that the first dielectric layer 30a covers the substrate 10 and a portion of the semiconductor element 20. The release film 82a may cover the dam 60 to prevent the first dielectric layer 30a above the dam 60 from covering the upper surface 21 of the semiconductor element 20 and the first contact 25.

As shown in fig. 19, the top surface 31a of the first dielectric layer 30a may be higher than the upper surface 21 of the semiconductor element 20, and the dam 60 may protrude from the top surface 31a of the first dielectric layer 30 a. That is, the upper surface 61 of the dam 60 is higher than the top surface 31a of the first dielectric layer 30a, and the first dielectric layer 30a covers a portion (e.g., a portion of the outer side surface 63) of the dam 60 and the entirety of the outer peripheral surface 23 of the semiconductor element 20.

Referring to fig. 20, the release film 82a is removed.

Referring to fig. 21, a second dielectric layer 40 is formed to cover the dam 60, the semiconductor element 20 and the first dielectric layer 30 a. The second dielectric layer 40 may be made of a photosensitive material.

Referring to fig. 22, a plurality of openings 42 are formed through the second dielectric layer 40, for example, by an exposure and development process, to expose a portion of each first contact 25 (e.g., a portion of the top surface 252). Since the opening 42 is not formed by laser drilling, the manufacturing cost can be reduced.

Referring to fig. 23, a circuit layer 50 is formed through the second dielectric layer 40 to electrically connect the semiconductor elements 20. In some embodiments, a circuit layer 50 may be formed on the second dielectric layer 40 and in the opening 42 of the second dielectric layer 40. In addition, the circuit layer 50 may electrically connect or contact the exposed portion of each first contact 25 (i.e., the exposed portion of the top surface 252).

Referring to fig. 24, a surface finishing layer (surface finishing layer)70 is formed to cover the circuit layer 50 and the bottom surface 12 of the substrate 10. The surface treatment layer 70 may prevent the circuit layer 50 and the substrate 10 from being oxidized.

Subsequently, a singulation process (singulation process) is performed to obtain a plurality of semiconductor package structures 1a of fig. 2.

Unless otherwise specified, spatial descriptions such as "above," "below," "upper," "left," "right," "lower," "top," "bottom," "vertical," "horizontal," "side," "above," "below," "upper," "on … …," "under … …," and the like are directed relative to the orientation shown in the figures. It is to be understood that the spatial descriptions used herein are for purposes of illustration only and that actual implementations of the structures described herein may be spatially arranged in any orientation or manner, provided that the advantages of the embodiments of the present disclosure are not so arranged.

As used herein, the terms "substantially", "substantially" and "about" are used to describe and explain minor variations. When used in conjunction with an event or circumstance, the terms may refer to instances in which the event or circumstance occurs specifically, and instances in which the event or circumstance occurs in close proximity. For example, when used in conjunction with numerical values, the term can refer to a range of variation of less than or equal to ± 10% of the stated numerical value, such as less than or equal to ± 5%, less than or equal to ± 4%, less than or equal to ± 3%, less than or equal to ± 2%, less than or equal to ± 1%, less than or equal to ± 0.5%, less than or equal to ± 0.1%, or less than or equal to ± 0.05%. For example, two numerical values are considered to be "substantially" identical or equal if the difference between the two numerical values is less than or equal to ± 10% (e.g., less than or equal to ± 5%, less than or equal to ± 4%, less than or equal to ± 3%, less than or equal to ± 2%, less than or equal to ± 1%, less than or equal to ± 0.5%, less than or equal to ± 0.1%, or less than or equal to ± 0.05%) of the mean of the values.

Two surfaces can be considered co-planar or substantially co-planar if the displacement between the two surfaces is no greater than 5 μm, no greater than 2 μm, no greater than 1 μm, or no greater than 0.5 μm. A surface can be considered substantially flat if the displacement between the highest and lowest points of the surface is no greater than 5 μm, no greater than 2 μm, no greater than 1 μm, or no greater than 0.5 μm.

As used herein, the singular terms "a", "an" and "the" may include plural referents unless the context clearly dictates otherwise.

As used herein, the terms "conductive", "electrically conductive", and "electrical conductivity" refer to the ability to transmit electrical current. Conductive materials generally refer to those materials that exhibit little or zero resistance to the flow of electrical current. One measure of conductivity is siemens per meter (S/m). Typically, the conductive material is electrically conductiveA ratio greater than about 10⁴S/m (e.g. at least 10)⁵S/m or at least 10⁶S/m) of the above-mentioned material. The conductivity of a material can sometimes change with temperature. Unless otherwise specified, the conductivity of a material is measured at room temperature.

Additionally, amounts, ratios, and other numerical values are sometimes presented herein in a range format. It is to be understood that such range format is used for convenience and brevity, and should be interpreted flexibly to include not only the numerical values explicitly recited as the limits of the range, but also to include all the individual numerical values or sub-ranges encompassed within that range as if each numerical value and sub-range is explicitly recited.

While the present disclosure has been described and illustrated with reference to particular embodiments thereof, such description and illustration are not to be construed in a limiting sense. It should be understood by those skilled in the art that various changes may be made and equivalents substituted without departing from the true spirit and scope of the disclosure as defined by the appended claims. The illustrations may not be drawn to scale. Due to manufacturing processes and tolerances, there may be a difference between the process reproduction in this disclosure and the actual equipment. There may be other embodiments of the disclosure that are not specifically illustrated. The specification and drawings are to be regarded in an illustrative rather than a restrictive sense. Modifications may be made to adapt a particular situation, material, composition of matter, method, or process to the objective, spirit and scope of the present invention. All such modifications are intended to be within the scope of the appended claims. Although the methods disclosed herein have been described with reference to particular operations performed in a particular order, it should be understood that these operations may be combined, sub-divided, or reordered to form equivalent methods without departing from the teachings of the present disclosure. Accordingly, unless specifically indicated herein, the order and grouping of the operations is not a limitation of the present disclosure.