阅读说明：本技术 半导体器件 (Semiconductor device with a plurality of transistors ) 是由 田中常之 于 2019-07-09 设计创作，主要内容包括：本发明公开了一种半导体器件,包括基体、缓冲构件、框架、盖和半导体元件。陶瓷框架被安装在铜基体上,且钼缓冲构件被置于陶瓷框架与铜基体之间。半导体元件被密封在由盖限定的框架内的空间中。框架包括：顶部；下段部,该下段部被设置在顶部的下方,并且设置有输入电极和输出电极；以及上段部。上段部形成在输入电极和输出电极的布置方向上,并且形成在顶部的下方以及下段部的上方。上段部包括上段连接部,该上段连接部在与输入电极和输出电极的布置方向相交的方向上形成在下段部的周边上。(A semiconductor device includes a base body, a buffer member, a frame, a cover, and a semiconductor element. The ceramic frame was mounted on the copper base, and the molybdenum cushioning member was interposed between the ceramic frame and the copper base. The semiconductor element is sealed in a space within the frame defined by the cover. The frame includes: a top portion; a lower section provided below the top and provided with an input electrode and an output electrode; and an upper section. The upper stage portion is formed in the arrangement direction of the input electrodes and the output electrodes, and is formed below the top portion and above the lower stage portion. The upper stage portion includes an upper stage connecting portion formed on a periphery of the lower stage portion in a direction intersecting with an arrangement direction of the input electrodes and the output electrodes.)

1. A semiconductor device, comprising:

a base formed of copper;

a cushioning member formed of molybdenum;

a frame mounted on the base with the cushioning member interposed therebetween, the frame being formed of alumina ceramic;

a cover covering the frame; and

a semiconductor element sealed in a space within the frame defined by the cover,

wherein the frame comprises:

a top portion including a sealing ring, the cap being secured to the sealing ring;

a lower stage portion provided below the top portion, the lower stage portion being provided with an input electrode that inputs a signal to the semiconductor element and an output electrode that outputs a signal from the semiconductor element; and

an upper stage portion formed in an arrangement direction of the input electrode and the output electrode and at a position below the top portion and above the lower stage portion, wherein the upper stage portion includes an upper stage connection portion formed on a periphery of the lower stage portion in a direction intersecting the arrangement direction of the input electrode and the output electrode.

2. A semiconductor device, the semiconductor device comprising:

a base formed of copper;

a cushioning member formed of molybdenum;

a frame mounted on the base with the cushioning member interposed therebetween, the frame being formed of alumina ceramic;

a cover covering the frame; and

a semiconductor element sealed in a space within the frame defined by the cover,

wherein the frame comprises:

a top portion including a sealing ring, the cap being secured to the sealing ring;

a lower stage part disposed below the top part, the lower stage part being provided with an input electrode inputting a signal to the semiconductor element and an output electrode outputting a signal from the semiconductor element, wherein the lower stage part includes a reinforcing metal pattern disposed at a position on the same plane as that of the output electrode where the input electrode and the output electrode are not disposed, so as to be insulated from the input electrode and the output electrode; and

an upper stage portion that is formed in an arrangement direction of the input electrode and the output electrode, and that is formed at a position that is below the top portion and above the lower stage portion.

3. The semiconductor device according to claim 2, wherein the lower stage portion includes a frame opening that surrounds a periphery of the semiconductor element, the frame opening is provided with the reinforcing metal pattern, and the reinforcing metal pattern is a ground wiring that is electrically connected to the base body through the buffer member.

Technical Field

The present disclosure relates to a semiconductor device.

Background

The semiconductor device is mounted in, for example, a communication apparatus. The semiconductor device includes a copper base and a ceramic frame mounted on the base, and its semiconductor element is sealed in a space formed by the frame. Since the copper base and the ceramic frame have different linear expansion coefficients, cracks may be generated in the frame due to the difference in the linear expansion coefficients. JPS59-161845 disclosed a structure that prevents cracks from being generated in a frame by interposing a buffer member (molybdenum plate) formed of molybdenum between a substrate (package substrate) and the frame (package).

Disclosure of Invention

The present disclosure provides a semiconductor device. The semiconductor device includes a base body, a buffer member, a frame, a cover, and a semiconductor element. The substrate is formed of copper. The buffer member is formed of molybdenum. The frame is mounted on the base, and the cushioning member is interposed between the frame and the base, and the frame is formed of alumina ceramic. The cover covers the frame. The semiconductor element is sealed in a space within the frame defined by the cover. The frame includes a top portion, a lower segment portion and an upper segment portion. The top portion includes a sealing ring to which the cap is secured. The lower stage portion is provided below the top portion, and the lower stage portion is provided with an input electrode that inputs a signal to the semiconductor element and an output electrode that outputs a signal from the semiconductor element. The upper stage portion is formed in the arrangement direction of the input electrode and the output electrode, and is formed at a position below the top portion and above the lower stage portion. The upper stage portion includes an upper stage connecting portion formed on a periphery of the lower stage portion in a direction intersecting with an arrangement direction of the input electrodes and the output electrodes.

The present disclosure also provides a semiconductor device. The semiconductor device includes a base body, a buffer member, a frame, a cover, and a semiconductor element. The substrate is formed of copper. The buffer member is formed of molybdenum. The frame is mounted on the base, and the cushioning member is interposed between the frame and the base, and the frame is formed of alumina ceramic. The cover covers the frame. The semiconductor element is sealed in a space within the frame defined by the cover. The frame includes a top portion, a lower segment portion and an upper segment portion. The top portion includes a sealing ring to which the cap is secured. The lower section is disposed below the top. The lower stage portion is provided with an input electrode for inputting a signal to the semiconductor element and an output electrode for outputting a signal from the semiconductor element. The lower section includes a reinforcing metal pattern provided on the same plane as the output electrode at a position where the input electrode and the output electrode are not provided, to be insulated from the input electrode and the output electrode. The upper stage portion is formed in the arrangement direction of the input electrode and the output electrode, and is formed at a position below the top portion and above the lower stage portion.

Drawings

The foregoing and other objects, aspects and advantages will be better understood from the following detailed description of embodiments of the disclosure with reference to the drawings, in which:

fig. 1A and 1B are views for illustrating a semiconductor device according to one embodiment of the present disclosure.

Fig. 2 is an external perspective view of the frame of the first example.

Fig. 3A is a plan view of a main portion of the semiconductor device of the first example, and fig. 3B is a sectional view taken along line B-B of fig. 3A.

Fig. 4A is a plan view of a main portion of a semiconductor device of a second example, and fig. 4B is a sectional view taken along a line B-B of fig. 4A.

Detailed Description

[ problem to be solved by the present disclosure ]

The framework described in JP S59-161845 includes: a top (upper portion of the frame) whose upper side is covered with a cover, and the cover is fixed to the top; and a lower section (lower portion of the frame) provided on the lower portion with respect to the top portion. In the frame, a step is formed between the top portion and the lower section portion, and an electrode plate wire-bonded to the semiconductor element is provided on an upper surface of the step. Since deformation is concentrated at the boundary between the top portion and the lower section due to the difference in thickness between the top portion and the lower section, cracks may be generated in the lower section.

[ Effect of the present disclosure ]

According to the present disclosure, cracks can be prevented from occurring in the lower section of the frame.

[ description of embodiments of the present disclosure ]

Embodiments of the present disclosure will be described. A semiconductor device according to one embodiment of the present disclosure includes a base, a buffer member, a frame, a cover, and a semiconductor element. The substrate is formed of copper. The buffer member is formed of molybdenum. The frame is mounted on the base, and the cushioning member is interposed between the frame and the base, and the frame is formed of alumina ceramic. The cover covers the frame. The semiconductor element is sealed in a space within the frame defined by the cover. The frame includes a top portion, a lower segment portion and an upper segment portion. The top portion includes a sealing ring to which the cap is secured. The lower stage section is disposed below the top section, and is provided with an input electrode that inputs a signal to the semiconductor element and an output electrode that outputs a signal from the semiconductor element. The upper stage portion is formed in the arrangement direction of the input electrode and the output electrode, and is formed at a position below the top portion and above the lower stage portion. The upper stage portion includes an upper stage connecting portion formed on a periphery of the lower stage portion in a direction intersecting an arrangement direction of the input electrodes and the output electrodes.

A semiconductor device according to another embodiment of the present disclosure includes a base, a buffer member, a frame, a cover, and a semiconductor element. The substrate is formed of copper. The buffer member is formed of molybdenum. The frame is mounted on the base, and the cushioning member is interposed between the frame and the base, and the frame is formed of alumina ceramic. The cover covers the frame. The semiconductor element is sealed in a space within the frame defined by the cover. The frame includes a top portion, a lower segment portion and an upper segment portion. The top portion includes a sealing ring to which the cap is secured. The lower section is disposed below the top. The lower stage portion is provided with an input electrode for inputting a signal to the semiconductor element and an output electrode for outputting a signal from the semiconductor element. The lower section includes a reinforcing metal pattern provided on the same plane as the output electrode at a position where the input electrode and the output electrode are not provided, to be insulated from the input electrode and the output electrode. The upper stage portion is formed in the arrangement direction of the input electrode and the output electrode, and is formed at a position below the top portion and above the lower stage portion.

In another embodiment described above, the lower section may include a frame opening around a perimeter of the semiconductor element. The frame opening may be provided with a reinforcing metal pattern, and the reinforcing metal pattern may be a Ground (GND) wiring electrically connected to the base through the buffer member.

[ details of embodiments of the present disclosure ]

Hereinafter, detailed examples of a semiconductor device according to the present disclosure will be described with reference to the accompanying drawings. Fig. 1A and 1B are views for illustrating a semiconductor device according to an embodiment of the present disclosure.

The semiconductor device 100 includes a base 1, a cushioning member 20, a frame 30, a cover 70, and a semiconductor element 90. For example, the semiconductor device 100 may be mounted on the front end of a communication apparatus. By separating the cover 70, fig. 1A schematically shows the semiconductor element 90 mounted within the frame 30.

As shown in fig. 1A, the base 1 includes a base body 10 formed of copper. Both ends of the base body 10 are respectively provided with screw fixing portions 11, through which fixing screws (not shown) are inserted. A heat sink 12 is provided between the screw fixing portions 11, and the heat sink 12 is thinner than the screw fixing portions 11. As shown in fig. 1B, the central portion of the heat sink 12 is provided with a mount 13 protruding upward (Z direction in the drawing), and the semiconductor element 90 is mounted on the mount 13.

The cushioning member 20 is formed of molybdenum, and compensates for a difference in linear expansion coefficient between the base body 10 formed of copper and the frame 30 formed of alumina ceramic. As shown in fig. 1B, the cushioning member 20 includes a plate-shaped cushioning portion 22, and the cushioning portion 22 is centrally provided with a cushioning opening 21, the cushioning opening 21 penetrating through a front surface 22B and a rear surface 22 a. The mount table 13 penetrates the buffer opening 21, the rear surface 22a of the buffer portion 22 is in contact with the base body 10, and the front surface 22b of the buffer portion 22 is in contact with the frame 30.

The frame 30 is surrounded by four side walls extending in the X and Y directions shown in the drawing, and the frame 30 is formed in a square shape in appearance when viewed from the front side. As shown in fig. 1B, the frame 30 includes a lower section 40, an upper section 50, and a top 60. The lower stage portion 40 is mounted on the cushioning member 20. The upper stage 50 is located on the upper side with respect to the lower stage 40. The top 60 is located on the upper side relative to the upper section 50 and is attached to the lid 70.

The cover 70 is formed of, for example, gold tin. The lid 70 is secured to the top 60 with a sealing ring 61 interposed between the lid 70 and the top 60. Thus, the semiconductor element 90 is sealed in a gas-tight manner in the space defined by the cover 70 within the frame 30.

Fig. 2 is an external perspective view of a frame of the first example, fig. 3A is a plan view of a main portion of a semiconductor device of the first example, and fig. 3B is a sectional view taken along line B-B of fig. 3A. Fig. 3A shows the mount table 13 in order to easily understand the structure of the frame 30, but omits the semiconductor element 90 or the base body 10 described in fig. 1A and 1B.

The lower section 40 of the frame 30 includes a frame opening 41 and a step surface 42. The frame opening 41 is formed at the center to surround the mount table 13. The step surface 42 is formed at the outer side of the frame opening 41 so as to surround the frame opening 41 over the entire periphery.

The stepped surface 42 is provided with an input electrode 43, and the input electrode 43 is provided between the input terminal 81 and the mount 13 to input a signal to the semiconductor element 90 described in fig. 1A and 1B. The input electrode 43 is wire-bonded to the semiconductor element 90. The output electrode 44 is provided between the output terminal 82 and the mount 13 so as to output a signal from the semiconductor element 90. The output electrode 44 is wire-bonded to the semiconductor element 90. The input electrode 43 is formed to be wider than the output electrode 44.

In order to improve the airtightness inside the frame 30, the upper step portion 50 of the frame 30 is formed higher than the step surface 42. The upper stage surface 52 is disposed between the top 60 and the input electrode 43 and between the output electrode 44 and the top 60.

The upper stage portion 50 includes a pair of upper stage connecting portions 53, the pair of upper stage connecting portions 53 being formed in a direction (X direction of the drawing) intersecting with the arrangement direction (Y direction of the drawing) of the input electrodes 43 and the output electrodes 44. The pair of upper section connecting portions 53 solves the height difference between the top section 60 and the lower section 40. More specifically, the upper stage connecting portion 53 is formed along the inner wall of the frame 30 and on the periphery of the lower stage portion 40 to be one step higher than the lower stage portion 40. The upper section connection 53 is flush with, for example, the upper section surface 52. The upper-stage connecting portion 53 can be easily manufactured by changing a mold for forming the upper-stage portion 50.

The top section 60 and the lower section 40 are the locations in the frame 30 where the thickness variation is greatest. When there is a large height difference between the top portion 60 and the lower stage portion 40, when the semiconductor device is subjected to a thermal cycle test at-65 ℃ to 175 ℃ for 50 cycles, cracks extending in a direction (X direction of the drawing) intersecting the arrangement direction (Y direction of the drawing) of the input electrodes 43 and the output electrodes 44 are generated in the step surface 42, starting from the boundary between the top portion 60 and the lower stage portion 40 as a start position. Such cracks are a factor causing leakage failure.

However, as described above, since the upper-stage connecting portion 53 is formed between the top portion 60 and the lower-stage portion 40, it is possible to reduce the concentration of deformation generated at the boundary between the top portion 60 and the lower-stage portion 40 due to a large height difference between the top portion 60 and the lower-stage portion 40. Therefore, the semiconductor device 100 of this example can prevent the generation of cracks in the step surface 42.

In the first example described above, an example has been described in which the upper-stage connecting portion 53 is provided to solve a large height difference between the top portion 60 and the lower-stage portion 40. However, the present invention is not limited to this example.

Fig. 4A is a plan view of a main portion of a semiconductor device of a second example, and fig. 4B is a sectional view taken along a line B-B of fig. 4A.

As shown in fig. 4A and 4B, the upper stage portion 50 of this example includes an upper stage surface 52, the upper stage surface 52 being formed between the top 60 and the input electrode 43 and between the output electrode 44 and the top 60. Meanwhile, the step surface 42 of the lower section 40 reaches the inner wall of the frame 30, and there is a large height difference between the top portion 60 and the lower section 40.

However, the stepped surface 42 is provided with the reinforcing metal patterns 45, and the reinforcing metal patterns 45 are respectively provided at positions on the same plane as that of the output electrode 44 where the input electrode 43 and the output electrode 44 are not provided. Each of the metal patterns 45 is formed by gold plating (e.g., with a thickness of about 2.5(μm)), and is insulated from the input electrode 43 and the output electrode 44. The reinforcing metal pattern 45 can be easily produced by the same steps as those of the output electrode 44.

Because the reinforcing metal pattern 45 is formed on the step surface 42 in this way, it is possible to reduce the concentration of deformation occurring at the boundary between the top portion 60 and the lower stage portion 40 due to a large height difference between the top portion 60 and the lower stage portion 40 in this example. Therefore, the semiconductor device 100 of this example can prevent the generation of cracks in the step surface 42.

Further, as shown in fig. 4B, the frame opening 41 may be provided with a reinforcing metal pattern 46. In this case, the reinforcing metal pattern 46 is set as a ground wiring which is electrically connected to the base body 10 through the cushioning member 20. Therefore, the strength of the lower step portion 40 can be further improved.

Alternatively, the reinforcing metal pattern 47 may be provided in an inner wall of the frame 30 located on the outer side with respect to the step surface 42. This example can improve the strength of the lower stage portion 40.

It is to be understood that the embodiments and examples disclosed herein are illustrative and not restrictive in every respect. The scope of the invention is indicated by the scope of the claims rather than the foregoing meaning. All changes which come within the meaning and range of equivalency of the claims are to be embraced within their scope.